Ceramic tile teacup surface treatment device

The automatic positioning and plasma treatment of ceramic teacups are achieved by using motor-driven limit and adjustment components, which solves the safety hazards caused by manual adjustment in the existing technology and improves processing efficiency and safety.

CN224209645UActive Publication Date: 2026-05-08JINGDEZHEN BOYI CERAMICS CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
JINGDEZHEN BOYI CERAMICS CO LTD
Filing Date
2025-05-21
Publication Date
2026-05-08

AI Technical Summary

Technical Problem

Existing ceramic tile teacup surface treatment devices require manual adjustment of the angle during long-term processing, generating debris that is harmful to human health.

Method used

Using limiting and adjusting components, the motor drives gears and racks to move adjusting rods and rubber limiting blocks to limit the ceramic teacup. It is then cleaned using a plasma surface treatment machine, and combined with a rotating component, it achieves automated processing at different angles and heights.

Benefits of technology

The process automates the surface treatment of ceramic teacups, reducing debris generation and improving safety and processing efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of tile teacup surface treatment devices, and discloses a tile teacup surface treatment device which comprises a treatment frame, a limiting assembly, an adjusting assembly and a rotating assembly are arranged in the treatment frame, and the limiting assembly comprises a placing plate. A ceramic tile teacup is arranged at the top of the limiting assembly. A ceramic tile teacup is placed on the top of the placing plate, then a driving motor is operated, the output end of the driving motor rotates a motor rotating rod, the motor rotating rod rotates a gear, the gear is meshed with a guide rack and a second guide rack at the same time, the guide rack and the second guide rack drive two adjusting rods, and the adjusting rods drive rubber limiting blocks. The ceramic tile teacup is limited by the rubber limiting block, then the plasma surface treatment machine is operated, the surface of the material is cleaned, activated, modified and the like through the plasma technology, and harm to the human body caused by chippings generated by polishing is reduced.
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Description

Technical Field

[0001] This utility model relates to the technical field of ceramic tile teacup surface treatment device, and in particular to a ceramic tile teacup surface treatment device. Background Technology

[0002] Tile and teacup surface treatment equipment typically refers to devices used for finishing, polishing, cleaning, and decorating the surface of ceramics. These devices allow for smoother, more refined surfaces, as well as greater aesthetics and durability.

[0003] Most existing ceramic tile teacup surface treatment devices use polishing machines to remove the roughness of the ceramic tile teacup surface and achieve a smooth and shiny effect. However, the process of using a polishing machine often requires manual adjustment of the angle of the teacup to polish the surface of the curved teacup. During the long-term processing, a large amount of debris is often generated, which poses a certain risk to human health. Utility Model Content

[0004] To solve the above-mentioned technical problems, this utility model provides a surface treatment device for ceramic teacups.

[0005] This utility model is achieved by the following technical solution: a ceramic tile teacup surface treatment device, including a treatment rack, a limiting component inside the treatment rack, an adjusting component inside the treatment rack, and a rotating component inside the treatment rack.

[0006] The limiting component includes a placement plate, a ceramic teacup is placed on top of the limiting component, a rubber limiting block is contacted on the surface of the ceramic teacup, an adjusting rod is fixedly connected to the end of the rubber limiting block away from the ceramic teacup, an avoidance groove is opened on the inner wall of the processing rack, the outer wall of the adjusting rod is slidably connected to the inner wall of the avoidance groove, a guide rack is fixedly connected to the end of the adjusting rod away from the rubber limiting block, a gear is meshed on the surface of the guide rack, a motor rotating rod is fixedly connected to the end of the gear away from the guide rack, a drive motor is fixedly connected to the end of the motor rotating rod away from the gear, a motor mounting base is fixedly connected to the surface of the drive motor, and a plasma surface treatment machine is fixedly connected to the top of the processing rack, a second guide rack is meshed on the surface of the gear.

[0007] As a further improvement to the above solution, two rubber limiting blocks are provided, and the two rubber limiting blocks are symmetrically arranged with the ceramic teacup as the center. Two adjusting rods are provided, and the two adjusting rods are arranged to rotate around the surface of the drive motor. Two clearance grooves are provided.

[0008] Using the above technical solution, the ceramic teacup is placed on top of the placement plate. Then, by running the drive motor, the output end of the drive motor rotates the motor rotating rod, which in turn rotates the gear. The gear simultaneously meshes with the guide rack and guide rack two, causing the guide rack and guide rack two to drive two adjusting rods, which in turn drive the rubber limit block.

[0009] As a further improvement to the above solution, the adjustment component includes a second drive motor, the output end of which is fixedly connected to a threaded rod, the outer wall of which is threadedly connected to a threaded slider, the top of which is fixedly connected to a lifting support rod, and the end of the lifting support rod away from the threaded slider is fixedly connected to the bottom of the placement plate.

[0010] As a further improvement to the above solution, the inner wall of the processing rack is provided with a guide groove, the outer wall of the placement plate is slidably connected to the inner wall of the guide groove, a support rod housing is fixedly connected to the surface of the processing rack, a support slide rod is slidably connected to the inner wall of the support rod housing, and the end of the support slide rod away from the support rod housing is fixedly connected to the bottom of the motor mounting base.

[0011] As a further improvement to the above solution, two drive motors are provided, symmetrically arranged with the ceramic teacup as the center; two threaded sliders are provided, symmetrically arranged with the ceramic teacup as the center; and two guide grooves are provided.

[0012] With the above technical solution, the plasma surface treatment machine is a fixed design. By running the second drive motor, the output end of the second drive motor rotates the threaded rod, causing the threaded slider to move up and down along the surface of the threaded rod. The threaded slider drives the lifting support rod, and the lifting support rod drives the placement plate to slide up and down along the guide groove.

[0013] As a further improvement to the above solution, the rotating assembly includes a drive motor three, the output end of which is fixedly connected to a motor rotating rod three, and a limit groove is formed on the inner wall of the motor rotating rod three, with a limit slider slidably connected to the inner wall of the limit groove.

[0014] As a further improvement to the above solution, a rotating rod is fixedly connected to the top of the limiting slider, the outer wall of the rotating rod is slidably connected to the inner wall of the motor rotating rod three, a support shaft is fixedly connected to the end of the rotating rod away from the motor rotating rod three, the outer wall of the support shaft is rotatably connected to the inner wall of the placement plate, and the top of the support shaft is in contact with the bottom of the ceramic teacup.

[0015] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0016] This invention involves placing a ceramic teacup on top of a placement plate, then operating a drive motor to rotate a motor rod. The motor rod rotates a gear, which simultaneously meshes with a guide rack and a second guide rack. The guide rack and the second guide rack drive two adjusting rods, which in turn drive rubber limiting blocks to position the ceramic teacup. Then, a plasma surface treatment machine is used to clean, activate, and modify the material surface using plasma technology, reducing the harm to the human body caused by debris generated during polishing.

[0017] This invention utilizes a fixed design for the plasma surface treatment machine. By operating a second drive motor, the output end of the second drive motor rotates a threaded rod, causing a threaded slider to move up and down along the surface of the threaded rod. The threaded slider drives a lifting support rod, which in turn drives a placement plate to slide up and down along a guide groove, thereby adjusting the position of the surface treated by the plasma surface treatment machine for ceramic teacups of different heights. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0019] Figure 2 This is a schematic diagram of the limiting component structure of this utility model;

[0020] Figure 3 This is a schematic diagram of the structure of the plasma surface treatment machine of this utility model;

[0021] Figure 4 This utility model Figure 3 Enlarged structural diagram of section A in the middle;

[0022] Figure 5 This is a schematic diagram of the adjustment component structure of this utility model;

[0023] Figure 6 This is a schematic diagram of the guide groove structure of this utility model;

[0024] Figure 7 This utility model Figure 6 Enlarged structural diagram of section B.

[0025] Explanation of key symbols:

[0026] 1. Processing rack; 2. Limiting assembly; 201. Placement plate; 202. Tile teacup; 203. Rubber limiting block; 204. Adjusting rod; 205. Clearance groove; 206. Guide rack; 207. Gear; 208. Motor rotating rod; 209. Drive motor; 210. Motor mounting base; 211. Plasma surface treatment machine; 212. Guide rack II; 3. Adjusting assembly; 301. Drive motor II; 302. Threaded rod; 303. Threaded slider; 304. Lifting support rod; 305. Guide slide groove; 306. Support rod housing; 307. Support slide rod; 4. Rotating assembly; 401. Drive motor III; 402. Motor rotating rod III; 403. Limiting slide groove; 404. Limiting slider; 405. Rotating rod; 406. Support shaft. Detailed Implementation

[0027] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. It should be noted that, without conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments.

[0028] Example:

[0029] Please combine Figure 1-7 This embodiment provides a ceramic tile teacup surface treatment device, including a treatment rack 1, a limiting component 2, an adjusting component 3, and a rotating component 4.

[0030] The limiting component 2 includes a placement plate 201, a ceramic teacup 202 is placed on the top of the limiting component 2, a rubber limiting block 203 is placed in contact with the surface of the ceramic teacup 202, an adjusting rod 204 is fixedly connected to the end of the rubber limiting block 203 away from the ceramic teacup 202, a clearance groove 205 is opened on the inner wall of the processing rack 1, the outer wall of the adjusting rod 204 is slidably connected to the inner wall of the clearance groove 205, and a guide rack 206 is fixedly connected to the end of the adjusting rod 204 away from the rubber limiting block 203, the surface of the guide rack 206 is engaged with the... There is a gear 207. A motor rotating rod 208 is fixedly connected to the end of the gear 207 away from the guide rack 206. A drive motor 209 is fixedly connected to the end of the motor rotating rod 208 away from the gear 207. A motor mounting base 210 is fixedly connected to the surface of the drive motor 209. The end of the motor mounting base 210 away from the drive motor 209 is fixedly connected to the surface of the placement plate 201. A plasma surface treatment machine 211 is fixedly connected to the top of the processing rack 1. A guide rack 212 is meshed with the surface of the gear 207.

[0031] There are two rubber limit blocks 203, which are symmetrically arranged with the ceramic teacup 202 as the center. There are two adjusting rods 204, which are arranged to rotate around the surface of the drive motor 209. There are two clearance grooves 205.

[0032] The adjustment component 3 includes a second drive motor 301. A threaded rod 302 is fixedly connected to the output end of the second drive motor 301. A threaded slider 303 is threadedly connected to the outer wall of the threaded rod 302. A lifting support rod 304 is fixedly connected to the top of the threaded slider 303. The end of the lifting support rod 304 away from the threaded slider 303 is fixedly connected to the bottom of the placement plate 201.

[0033] The inner wall of the processing rack 1 is provided with a guide groove 305. The outer wall of the placement plate 201 is slidably connected to the inner wall of the guide groove 305. The surface of the processing rack 1 is fixedly connected with a support rod housing 306. The inner wall of the support rod housing 306 is slidably connected with a support slide rod 307. The end of the support slide rod 307 away from the support rod housing 306 is fixedly connected to the bottom of the motor mounting base 210.

[0034] There are two drive motors 301, which are symmetrically arranged with the ceramic teacup 202 as the center. There are also two threaded sliders 303, which are symmetrically arranged with the ceramic teacup 202 as the center. There are also two guide grooves 305.

[0035] The rotating component 4 includes a drive motor 3 401, and a motor rotating rod 3 402 is fixedly connected to the output end of the drive motor 3 401. A limit groove 403 is formed on the inner wall of the motor rotating rod 3 402, and a limit slider 404 is slidably connected to the inner wall of the limit groove 403.

[0036] A rotating rod 405 is fixedly connected to the top of the limiting slider 404. The outer wall of the rotating rod 405 is slidably connected to the inner wall of the motor rotating rod 402. A support shaft 406 is fixedly connected to the end of the rotating rod 405 away from the motor rotating rod 402. The outer wall of the support shaft 406 is rotatably connected to the inner wall of the placement plate 201. The top of the support shaft 406 is in contact with the bottom of the ceramic teacup 202.

[0037] The implementation principle of the ceramic tile teacup surface treatment device in this application embodiment is as follows: The ceramic tile teacup 202 is placed on top of the placement plate 201. Then, the drive motor 209 is operated, and the output end of the drive motor 209 rotates the motor rotating rod 208. The motor rotating rod 208 rotates the gear 207. The gear 207 simultaneously meshes with the guide rack 206 and the second guide rack 212, causing the guide rack 206 and the second guide rack 212 to drive two adjusting rods 204. The adjusting rods 204 drive the rubber limiting block 203, causing the rubber limiting block 203 to hold the ceramic tile teacup in place. 202 is limited, and then the plasma surface treatment machine 211 is run. Using plasma technology, the material surface is cleaned, activated, and modified. It can clamp and limit ceramic teacups 202 of different diameters. The plasma surface treatment machine 211 is a fixed design. Drive motor 301 rotates the threaded rod 302, causing the threaded slider 303 to move up and down along the surface of the threaded rod 302. The threaded slider 303 drives the lifting support rod 304, which in turn drives the placement plate 201 along... The guide slide 305 slides up and down, thereby adjusting the position of the surface treated by the plasma surface treatment machine 211 on ceramic teacups 202 of different heights. Simultaneously, the placement plate 201 moves up and down, driving the motor mounting base 210, which in turn drives the support slide rod 307. This causes the outer wall of the support slide rod 307 to move up and down along the inner wall of the support rod housing 306. At the same time, the placement plate 201 drives the support shaft 406, which in turn drives the rotating rod 405. The rotating rod 405 then drives the limiting slider 404 along the motor rotating rod... The motor rotating rod 302, which is provided in the motor 402, slides. By running the drive motor 301, the output end of the drive motor 301 rotates the motor rotating rod 302. The limiting slide groove 403 provided in the motor rotating rod 302 rotates the limiting slider 404. The limiting slider 404 rotates the rotating rod 405. The rotating rod 405 rotates the support shaft 406 inside the placement plate 201. The support shaft 406 rotates the ceramic teacup 202, thereby adjusting and rotating the ceramic teacup 202 to different angles.

[0038] The above embodiments are merely preferred embodiments of this utility model and should not be construed as limiting the scope of protection of this utility model. Any non-substantial changes and substitutions made by those skilled in the art based on this utility model shall fall within the scope of protection claimed by this utility model.

Claims

1. A surface treatment device for ceramic teacups, characterized in that, It includes a processing frame (1), a limiting component (2) is provided inside the processing frame (1), an adjusting component (3) is provided inside the processing frame (1), and a rotating component (4) is provided inside the processing frame (1); The limiting component (2) includes a placement plate (201). A ceramic teacup (202) is placed on the top of the limiting component (2). A rubber limiting block (203) is placed on the surface of the ceramic teacup (202). An adjusting rod (204) is fixedly connected to the end of the rubber limiting block (203) away from the ceramic teacup (202). An avoidance groove (205) is provided on the inner wall of the processing rack (1). The outer wall of the adjusting rod (204) is slidably connected to the inner wall of the avoidance groove (205). A guide rack (206) is fixedly connected to the end of the adjusting rod (204) away from the rubber limiting block (203). The surface of the guide rack (206) meshes with... A gear (207) is connected to the gear (207). A motor rotating rod (208) is fixedly connected to the end of the gear (207) away from the guide rack (206). A drive motor (209) is fixedly connected to the end of the motor rotating rod (208) away from the gear (207). A motor mounting base (210) is fixedly connected to the surface of the drive motor (209). The end of the motor mounting base (210) away from the drive motor (209) is fixedly connected to the surface of the placement plate (201). A plasma surface treatment machine (211) is fixedly connected to the top of the processing rack (1). A guide rack (212) is meshed with the surface of the gear (207).

2. The ceramic tile teacup surface treatment device as described in claim 1, characterized in that: Two rubber limiting blocks (203) are provided, and the two rubber limiting blocks (203) are symmetrically arranged with the ceramic teacup (202) as the center. Two adjusting rods (204) are provided, and the two adjusting rods (204) are arranged to rotate around the surface of the drive motor (209). Two clearance grooves (205) are provided.

3. The ceramic tile teacup surface treatment device as described in claim 1, characterized in that: The adjustment component (3) includes a second drive motor (301), the output end of which is fixedly connected to a threaded rod (302), the outer wall of which is threadedly connected to a threaded slider (303), the top of which is fixedly connected to a lifting support rod (304), and the end of the lifting support rod (304) away from the threaded slider (303) is fixedly connected to the bottom of the placement plate (201).

4. The ceramic tile teacup surface treatment device as described in claim 3, characterized in that: The processing rack (1) has a guide groove (305) on its inner wall. The outer wall of the placement plate (201) is slidably connected to the inner wall of the guide groove (305). The surface of the processing rack (1) is fixedly connected to a support rod housing (306). The inner wall of the support rod housing (306) is slidably connected to a support slide rod (307). The end of the support slide rod (307) away from the support rod housing (306) is fixedly connected to the bottom of the motor mounting base (210).

5. The ceramic tile teacup surface treatment device as described in claim 4, characterized in that: Two drive motors (301) are provided, and the two drive motors (301) are symmetrically arranged with the ceramic teacup (202) as the center. Two threaded sliders (303) are provided, and the two threaded sliders (303) are symmetrically arranged with the ceramic teacup (202) as the center. Two guide grooves (305) are provided.

6. The ceramic tile teacup surface treatment device as described in claim 1, characterized in that: The rotating component (4) includes a drive motor three (401), and a motor rotating rod three (402) is fixedly connected to the output end of the drive motor three (401). A limit groove (403) is opened on the inner wall of the motor rotating rod three (402), and a limit slider (404) is slidably connected to the inner wall of the limit groove (403).

7. The ceramic tile teacup surface treatment device as described in claim 6, characterized in that: The top of the limiting slider (404) is fixedly connected to a rotating rod (405). The outer wall of the rotating rod (405) is slidably connected to the inner wall of the motor rotating rod three (402). The end of the rotating rod (405) away from the motor rotating rod three (402) is fixedly connected to a support shaft (406). The outer wall of the support shaft (406) is rotatably connected to the inner wall of the placement plate (201). The top of the support shaft (406) is in contact with the bottom of the ceramic teacup (202).