Out-of-cavity self-cleaning device and system for carrier plate of plate-type PVD coating equipment

Abstract

The utility model relates to the field of photovoltaic coating equipment, and discloses a plate type PVD (Physical Vapor Deposition) coating equipment carrier plate out-of-cavity self-cleaning device and system, and the device comprises a plurality of functional chambers which are positioned on a coating equipment carrier plate return area and are sealed and protected at the periphery, and carrier plate conveying mechanisms arranged in the plurality of functional chambers. The function chamber comprises a laser primary cleaning function chamber, a normal pressure plasma cleaning function chamber, a maintenance function chamber and a waste gas treatment chamber communicated with each function chamber which are connected in sequence. And each functional chamber is internally provided with a gate valve with an isolation effect and / or an air curtain with an isolation spraying effect. A shell of the normal-pressure plasma cleaning function chamber is of a single-layer structure. The gas source of the plasma cleaning generator is O2 and / or N2, or H2 and / or NH3. According to the self-cleaning system, a plurality of self-cleaning devices are arranged in a multi-layer parallel mode or a segmented serial mode according to production requirements. The utility model not only can save equipment space and transport turnover links, but also improves the effective utilization rate of equipment.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic coating equipment, and in particular to a self-cleaning device and system for the outer cavity of a plate-type PVD coating equipment carrier. Background Technology

[0002] With the industrialization of flat panel displays, especially heterojunction solar cells, approaching maturity, key equipment such as plate-type PVD coating equipment, with its high capacity, high coating uniformity, and deposition rate, has been widely used. However, continuous coating in plate-type PVD coating equipment inevitably leads to the accumulation of coating byproducts on the carrier plate and vacuum chamber, which can easily detach and cause dust contamination. Traditional plate-type PVD coating equipment uses periodic equipment maintenance to clean the carrier plate and vacuum chamber; however, due to the large amount and complex distribution of byproducts adhering to the carrier plate, even with periodic cleaning, after repeated temperature and pressure changes, some deposits still randomly detach from the carrier plate in the vacuum chamber. In addition, cleaning the carrier plate inside the chamber inevitably increases the difficulty of self-cleaning the chamber and the online cleaning time. Utility Model Content

[0003] The purpose of this invention is to address the shortcomings of existing carrier plate cleaning technologies and to provide a self-cleaning device and system for the outer cavity of a plate-type PVD coating equipment carrier plate. This system not only provides thorough and efficient cleaning but also reduces the problems of existing technologies, such as occupying equipment startup time, increasing the difficulty of cavity self-cleaning, and increasing production costs.

[0004] To achieve the above objectives, the present invention adopts the following technical solution:

[0005] This utility model also discloses a self-cleaning device for the outer cavity of a plate-type PVD coating equipment carrier plate. The device includes several functional chambers located on the carrier plate return area of ​​the coating equipment and sealed on all sides, as well as a carrier plate conveying mechanism disposed in the several functional chambers. The functional chambers include a laser pre-cleaning functional chamber, an atmospheric pressure plasma cleaning functional chamber, a maintenance functional chamber, and an exhaust gas treatment chamber connected in sequence to each functional chamber. Each functional chamber is provided with a door valve for isolation and / or an air curtain for isolation spraying.

[0006] The shell of the atmospheric pressure plasma cleaning functional chamber is a single-layer structure; the atmospheric pressure plasma cleaning functional chamber includes a plasma cleaning chamber; a number of plasma cleaning generators are installed in the plasma cleaning chamber, and a cleaning rectifier is installed below the plasma cleaning generators. The gas source of the plasma cleaning generators is O2 and / or N2, or H2 and / or NH3.

[0007] Furthermore, when the gas source of the plasma cleaning generator is H2 and / or NH3, a passivation function chamber is also provided between the atmospheric pressure plasma cleaning function chamber and the maintenance function chamber.

[0008] The shell of the passivation chamber is a single-layer stainless steel or aluminum alloy sealed protective cover.

[0009] The passivation chamber is equipped with several plasma passivation generators and a passivation rectifier shroud located below the plasma passivation generators; the gas source for the plasma passivation generators is O2 and N2.

[0010] An air curtain is installed between the plasma passivation generators; a door valve and an air curtain are installed between the passivation function chamber and the maintenance function chamber.

[0011] Furthermore, the shell of the maintenance function chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the maintenance function chamber is equipped with several maintenance rectifiers for introducing maintenance ions and maintenance atmosphere.

[0012] Furthermore, there are two plasma cleaning chambers: a main plasma cleaning chamber for coarse plasma cleaning and a secondary plasma cleaning chamber for fine plasma cleaning; the main plasma cleaning chamber and the secondary plasma cleaning chamber are interconnected.

[0013] Furthermore, the laser pre-cleaning functional room includes a laser chamber, and the laser chamber is isolated from the coating equipment and the atmospheric pressure plasma cleaning functional room by valves and air curtains; a laser machine is installed in the laser chamber; the laser machine is located above the carrier plate conveying mechanism, and a dust removal hood for electrostatic dust removal is installed on the laser machine.

[0014] Furthermore, the shell of the laser chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; there are two laser chambers, namely a transverse laser chamber for transverse laser cleaning and a longitudinal laser chamber for longitudinal laser cleaning. The transverse laser chamber is equipped with several transversely moving laser heads, and the longitudinal laser chamber is equipped with several longitudinally moving laser heads; a high-power green laser is preferred as the laser.

[0015] Furthermore, the shell of the exhaust gas treatment chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the exhaust gas treatment chamber includes an exhaust gas treatment device for harmless gas treatment, a filter for filtering solid particles and dust, and an air inlet and a sewage outlet; the air inlet of the exhaust gas treatment chamber is connected to the exhaust gas outlets of the laser pre-cleaning functional chamber, the atmospheric pressure plasma cleaning functional chamber, the passivation functional chamber, and the maintenance functional chamber, respectively.

[0016] This utility model also discloses a self-cleaning system for the outer cavity of a plate-type PVD coating equipment carrier, which includes two sets of the above-mentioned self-cleaning devices for the outer cavity of the plate-type PVD coating equipment carrier, several lifting mechanisms and a conveyor line.

[0017] The two self-cleaning devices are arranged in parallel on two levels, with the head and tail ends of the self-cleaning devices connected to conveyor lines. The conveyor lines are connected to the inlet and outlet ends of the coating equipment through a lifting mechanism.

[0018] Alternatively, the two self-cleaning devices can be set up in segments and in series; the two self-cleaning devices are connected end to end, and a conveyor line for conveying the carrier plates to be cleaned and the carrier plates after cleaning is also set below; the inlet and outlet of the self-cleaning device are connected to the conveyor line, the inlet end and the outlet end of the coating equipment through lifting mechanisms at the beginning and end of the self-cleaning device, respectively.

[0019] This utility model has at least the following technical effects:

[0020] (1) This utility model is installed on the carrier plate return area of ​​the coating equipment. After each coating, the carrier plate can be cleaned and maintained in a timely manner during return, avoiding pollution caused by random shedding of the carrier plate due to the accumulation of deposits, and improving the coating quality. Compared with the existing external cleaning technology, it does not require a separate carrier plate cleaning device, saving equipment space and transportation and turnover links; compared with the existing internal cleaning technology, it has the following advantages: it does not increase the self-cleaning and maintenance time of the coating equipment, reduces the difficulty of internal self-cleaning, saves equipment maintenance time, and improves the effective utilization rate of the equipment.

[0021] (2) This utility model adopts an external atmospheric pressure dry cleaning method, which is more efficient and energy-saving than the existing internal vacuum cleaning technology; and more environmentally friendly and emission-reducing than the external carrier plate wet cleaning technology. Attached Figure Description

[0022] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the overall structure of Embodiment 1.

[0024] Figure 2 This is a schematic diagram of the laser pre-washing chamber in Example 1.

[0025] Figure 3 This is a schematic diagram of the atmospheric pressure plasma cleaning functional chamber in Example 1.

[0026] Figure 4 This is a schematic diagram of the overall structure of Embodiment 2.

[0027] Figure 5 This is a schematic diagram of the passivation chamber and the maintenance chamber in Example 2.

[0028] Figure 6 This is a simplified structural diagram of the self-cleaning device in Embodiment 2.

[0029] Figure 7 This is the self-cleaning system with segmented serial configuration in Embodiment 4.

[0030] Figure 8 This is the self-cleaning system with two parallel layers arranged in the upper and lower parts, as described in Example 5.

[0031] Explanation of key component symbols:

[0032] 1. Carrier plate conveying mechanism;

[0033] 2. Laser pre-cleaning chamber; 21. Horizontal laser chamber; 22. Vertical laser chamber; 23. Laser head;

[0034] 3. Atmospheric pressure plasma cleaning chamber; 31. Plasma cleaning generator; 32. Cleaning rectifier; 33. Main plasma cleaning chamber; 34. Secondary plasma cleaning chamber.

[0035] 4. Passivation functional chamber; 41. Plasma passivation generator; 42. Passivation rectifier;

[0036] 5. Maintenance function room; 51. Maintenance fairing;

[0037] 6. Septum cavity;

[0038] 71. First valve; 72. Second valve; 73. Third valve; 74. Fourth valve; 75. Fifth valve.

[0039] 81. First wind curtain; 82. Second wind curtain; 83. Third wind curtain; 84. Fourth wind curtain; 85. Fifth wind curtain; 86. Sixth wind curtain;

[0040] 9. Passivation and maintenance functional chamber;

[0041] 10. First self-cleaning device; 20. Second self-cleaning device; 30. Conveyor line; 40. First lifting mechanism; 50. Second lifting mechanism; 60. Third lifting mechanism; 70. Fourth lifting mechanism; 80. Fifth lifting mechanism. Detailed Implementation

[0042] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0043] In this utility model, unless otherwise stated, directional terms such as "up," "down," "left," and "right" are generally understood in conjunction with the accompanying drawings and the directions shown in actual applications.

[0044] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0045] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0046] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of the various ranges, the endpoint values ​​of the various ranges and individual point values, and individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. The terms "optional" and "discretionary" mean that they may or may not be included (or may or may not be present).

[0047] like Figure 1 As shown, this embodiment discloses a self-cleaning device for the outer cavity of a plate-type PVD coating equipment. The device includes several functional chambers located on the plate return area of ​​the coating equipment and sealed on all sides, as well as a plate conveying mechanism 1 disposed in the several functional chambers.

[0048] The functional rooms include, in sequence, a laser pre-cleaning functional room 2, an atmospheric pressure plasma cleaning functional room 3, a maintenance functional room 5, and an exhaust gas treatment room connected to each functional room. Each functional room is equipped with a door valve for isolation and / or an air curtain for isolation spraying.

[0049] In this embodiment, the gas source of the atmospheric pressure plasma cleaning chamber 3 is O2 and / or N2 gas. During the cleaning process, a passivation effect on the carrier plate will be generated. Therefore, this embodiment does not need to set up a passivation chamber.

[0050] In this embodiment, a first valve 71 is provided at the connection between the outlet of the coating equipment carrier plate and the laser pre-cleaning chamber 2, a second valve 72 is provided at the connection between the laser pre-cleaning chamber 2 and the atmospheric pressure plasma cleaning chamber 3, a fourth valve 74 is provided at the connection between the atmospheric pressure plasma cleaning chamber 3 and the maintenance chamber 5, and a fifth valve 75 is provided at the connection between the maintenance chamber 5 and the inlet of the coating equipment carrier plate.

[0051] Specifically, the shell of the exhaust gas treatment chamber is a single-layer stainless steel or aluminum alloy sealed protective cover. The exhaust gas treatment chamber (not shown in the attached diagram) includes an exhaust gas treatment device for harmless gas treatment, a filter for filtering solid particles and dust, and an air inlet and a sewage outlet. The air inlet of the exhaust gas treatment chamber is connected to the exhaust outlets of the laser pre-cleaning functional chamber 2, the atmospheric pressure plasma cleaning functional chamber 3, and the maintenance functional chamber 5, respectively, to collect, purify, and discharge the exhaust gas generated during cleaning.

[0052] Specifically, such as Figure 2 As shown, the laser pre-cleaning chamber 2 includes a laser cavity. A first air curtain 81 is installed at the outlet end of the first valve 71 and a second air curtain 82 is installed at the inlet end of the second valve 72. The isolation and blocking by the valves and air curtains can effectively prevent waste gases such as plasma from flowing into the external environment and causing air pollution. At the same time, it can also isolate the cleaning medium of the atmospheric pressure plasma cleaning chamber 3 from entering the laser cavity.

[0053] The laser chamber is enclosed by a single-layer stainless steel or aluminum alloy sealed protective cover. The laser chamber contains a laser machine and a laser exhaust port. The laser machine is located above the carrier plate conveying mechanism 1 and is equipped with a dust removal hood for electrostatic dust removal. The laser exhaust port is located below the carrier plate conveying mechanism 1 and is connected to the exhaust gas treatment chamber.

[0054] In this embodiment, two laser chambers are provided: a transverse laser chamber 21 for transverse laser cleaning and a longitudinal laser chamber 22 for longitudinal laser cleaning. The transverse laser chamber 21 contains several transversely moving laser heads 23, and the longitudinal laser chamber 22 contains several longitudinally moving laser heads 23. A high-power green laser is used. Using both the transverse and longitudinal laser chambers 21 and 22 in a separate configuration simplifies the internal structure of the laser chambers, reduces the failure rate of the device, and speeds up operation, thereby improving the efficiency of laser cleaning. Combined with the return mechanism of the PVD coating equipment, its spatial length is sufficient to match the lengths of the two laser chambers.

[0055] During use, the front and sides of the main frame of the carrier plate and the front of the sub-carrier plate are pre-cleaned using a high-energy laser with vaporizable silicon material through the transverse laser chamber 21 and the longitudinal laser chamber 22, removing the surface deposits. A combination of ion and electrostatic dust removal is then used to remove the smoke and dust generated by the laser vaporization or combustion of the deposits, preventing secondary pollution. A high-power green laser is preferred.

[0056] Specifically, such as Figure 3 As shown, the atmospheric pressure plasma cleaning functional chamber 3 includes a plasma cleaning chamber. Several plasma cleaning generators 31 are installed inside the plasma cleaning chamber, and a cleaning rectifier 32 is installed below each plasma cleaning generator 31. The gas source for the plasma cleaning generators 31 is O2 and / or N2 gas. Because O... + or N + Plasma is non-toxic, so the shell of the plasma cleaning chamber is made of a single layer of stainless steel or aluminum alloy sealed protective cover, which saves costs.

[0057] In this embodiment, two plasma cleaning chambers are provided: a main plasma cleaning chamber 33 for coarse plasma cleaning and a secondary plasma cleaning chamber 34 for fine plasma cleaning. The main plasma cleaning chamber 33 and the secondary plasma cleaning chamber 34 are interconnected. The coordinated cleaning of the main and secondary plasma cleaning chambers allows for rapid cleaning with high intensity followed by fine cleaning with low intensity. This synergy not only increases cleaning efficiency but also allows for independent control of the two plasma cleaning chambers, enhancing the convenience of plasma control. The gas volume can be adjusted according to cleaning requirements, improving the cleaning effect and reducing plasma consumption. Combined with the return mechanism of the PVD coating equipment, its spatial length is sufficient to match the length of the two laser chambers.

[0058] In use, O2 and / or N2 gas is introduced into several plasma cleaning generators 31 to generate high-energy O2-containing gases. + and / or N + The plasma, through several cleaning rectifiers 32, combined with the interactive transformation of the carrier plate pulse electric field and the pulsating negative cavity pressure, achieves fine cleaning by combining in-situ and remote directional flow. The preferred range of pulsating negative cavity pressure is -10Pa to -100Pa, with a pulsation period of 4s to 30s. The pump that generates the pulsating negative cavity pressure adopts frequency conversion control.

[0059] Specifically, such as Figure 1 As shown, the maintenance function chamber 5 is equipped with a sixth air curtain 86 at the outlet of the fourth valve 74, which is used to isolate other plasmas and spray to remove plasmas attached to the carrier plate.

[0060] The maintenance chamber 5 is equipped with several maintenance rectifiers 51. Maintenance ions and maintenance atmosphere are introduced into the maintenance rectifiers 51 to replace the surface pore gas.

[0061] In this embodiment, the surface pore gas replacement method is as follows: under a clean environment atmosphere, a trace amount of H2 is used. + A gas mixture with hydrogen atoms is used to displace the gas in the pores of the carrier plate surface; the clean environment atmosphere is as follows: temperature: 22 ℃~26 ℃, atmospheric pressure: 86 kPa~106 kPa, relative humidity: 40 %~60%, ozone concentration: not greater than 20μg / m3, cleanliness level: ISO1000.

[0062] Since the maintenance chamber 5 does not contain toxic gases, its shell is constructed using a low-cost, single-layer sealed protective cover made of stainless steel or aluminum alloy. The exhaust outlet of the maintenance chamber 5 is connected to the exhaust gas treatment chamber.

[0063] In this embodiment, compressed air is used as the isolation gas in the air curtain. Preferably, the quality grade of the compressed air should meet the requirements of ISO 8573.1 (GB / T 13277-1) class 1.2.2.

[0064] In order to ensure that the exhaust gas in each functional chamber can smoothly enter the exhaust gas treatment chamber, the negative pressure pump in the exhaust gas treatment chamber draws each chamber to a slightly negative pressure. The preferred range of negative pressure difference from normal pressure is -10Pa to -100Pa.

[0065] Depending on the length of the coating equipment and the cleanliness requirements of the carrier plate, the number of laser pre-cleaning chamber 2 and atmospheric pressure plasma cleaning chamber 3 can be increased.

[0066] In this embodiment, a laser suitable for removing large or strongly adhered residues is first used to clean the carrier substrate. The high-energy laser beam instantly vaporizes or peels off deposits (such as amorphous / microcrystalline silicon films or doped amorphous / microcrystalline silicon films) from the substrate surface. Then, plasma cleaning is performed, using ion bombardment and chemical reactions to remove fine particles, organic matter, or debris from the laser cleaning process, while simultaneously activating the substrate surface. Laser cleaning and plasma cleaning complement each other and are both essential. Laser cleaning followed by plasma cleaning is preferred to avoid surface roughness caused by plasma pretreatment, which could affect the laser's effectiveness.

[0067] In terms of location, the self-cleaning device is set on the carrier plate return area of ​​the coating equipment and is located outside the cavity. Compared with the existing external cleaning technology, it does not require a separate carrier plate cleaning device, saving equipment space and transportation and turnover links. Compared with the existing internal cleaning technology, it has the following advantages: it does not increase the self-cleaning maintenance time of the coating equipment, reduces the difficulty of internal self-cleaning, saves equipment maintenance time, and improves the effective utilization rate of the equipment.

[0068] Example 2:

[0069] like Figure 4 As shown, this embodiment discloses a self-cleaning device for the outer cavity of a plate-type PVD coating equipment, wherein the device includes several functional chambers located on the plate return area of ​​the coating equipment and sealed on all sides, and a plate conveying mechanism 1 disposed in the several functional chambers.

[0070] The difference between this embodiment and Embodiment 1 is that the gas source of the atmospheric pressure plasma cleaning chamber 3 in this embodiment is H2 and / or NH3. In order to extend the service life of the carrier plate, a passivation chamber 4 is added between the atmospheric pressure plasma cleaning chamber 3 and the maintenance chamber 5.

[0071] Specifically, the functional rooms include, in sequence, a laser pre-cleaning functional room 2, an atmospheric pressure plasma cleaning functional room 3, a passivation functional room 4, a maintenance functional room 5, and an exhaust gas treatment room connected to each functional room. Each functional room is equipped with a door valve for isolation and / or an air curtain for isolation spraying.

[0072] In this embodiment, a first valve 71 is provided at the connection between the outlet of the coating equipment carrier plate and the laser pre-cleaning chamber 2; a second valve 72 is provided at the connection between the laser pre-cleaning chamber 2 and the atmospheric pressure plasma cleaning chamber 3; a third valve 73 is provided at the connection between the atmospheric pressure plasma cleaning chamber 3 and the passivation chamber 4; a fourth valve 74 is provided at the connection between the passivation chamber 4 and the maintenance chamber 5; and a fifth valve 75 is provided at the connection between the maintenance chamber 5 and the inlet of the coating equipment carrier plate.

[0073] In this embodiment,

[0074] Specifically, such as Figure 5 As shown, the passivation chamber 4 is equipped with a third air curtain 83 at the outlet of the third valve 73 and a fourth air curtain 84 at the inlet of the fourth valve 74. The third air curtain 83 not only isolates the cleaning medium of the plasma cleaning chamber but also sprays the carrier plate after cleaning in the plasma cleaning chamber to remove the plasma adhering to the carrier plate, which is beneficial to the next passivation process. The fourth air curtain 84 is mainly used to isolate the passivation plasma and spray to remove the passivation plasma adhering to the carrier plate.

[0075] The passivation chamber 4 is equipped with several plasma passivation generators 41 and a passivation rectifier 42 located below the plasma passivation generators 41; wherein, the gas source of the plasma passivation generators 41 is O2 and N2.

[0076] In this embodiment, two plasma passivation generators 41 are installed in the passivation chamber 4 to passivate the carrier plate. A fifth air curtain 85 is installed between the two plasma passivation generators 41 to isolate the plasma between them, making the passivation easier to control.

[0077] In use, O2 and N2 gas sources generate N-rich gas through plasma passivation generator 41. + With part of O + Combining plasma, through several passivation rectifiers 42, and in conjunction with the interactive transformation of the carrier plate's pulsed electric field and pulsating negative cavity pressure, achieves all-round surface passivation modification of the aluminum alloy carrier plate, increasing surface density and hardness, and reducing impurities released from surface pores. The preferred range of pulsating negative cavity pressure is -10Pa to -100Pa, with a pulsation period of 4s to 30s. The pump generating the pulsating negative cavity pressure is frequency-controlled. The carrier plate needs to be sprayed and scrubbed by the third air curtain 83 and the fourth air curtain 84 before and after plasma passivation treatment.

[0078] Since the passivation chamber 4 does not contain toxic gases, its shell is constructed using a low-cost, single-layer stainless steel or aluminum alloy sealed protective cover. The exhaust outlet of the passivation chamber is connected to the exhaust gas treatment chamber.

[0079] Other technical features are consistent with those in Embodiment 1.

[0080] Example 3:

[0081] like Figure 6 As shown, this embodiment discloses a self-cleaning device for the outer cavity of a plate-type PVD coating equipment, wherein the device includes several functional chambers located on the plate return area of ​​the coating equipment and sealed on all sides, and a plate conveying mechanism 1 disposed in the several functional chambers.

[0082] This embodiment, based on Embodiment 2, combines the passivation chamber 4 and the maintenance chamber 5 of Embodiment 2 into a single passivation and maintenance chamber, simplifying the device cavity. Apart from the above features, the other technical features are consistent with Embodiment 2.

[0083] Specifically, the functional rooms include a laser pre-cleaning functional room 2, an atmospheric pressure plasma cleaning functional room 3, a passivation and maintenance functional room, and an exhaust gas treatment room connected in sequence to each functional room. Each functional room is equipped with a door valve for isolation and / or an air curtain for isolation spraying.

[0084] In this embodiment, the passivation and maintenance function chamber is equipped with several plasma passivation generators, and a passivation and maintenance hood 51 is installed below each plasma passivation generator. Air curtains are installed between adjacent plasma passivation generators, and air curtains are installed at both ends of the passivation and maintenance function chamber to reduce gas mixing and escape during carrier plate transport.

[0085] The passivation maintenance hood 51 is connected to a plasma passivation gas source via a plasma passivation generator, and the passivation maintenance hood 51 is connected to maintenance ions and maintenance atmosphere away from the plasma passivation generator.

[0086] Specifically, the plasma passivation gas source is O2 and N2. The maintenance ions are trace amounts of H2. + A gas mixed with hydrogen atoms.

[0087] After passivation is completed, the plasma passivation gas source is turned off. After being cleaned by air curtain spray, the maintenance ions and maintenance atmosphere are turned on. Through several passivation maintenance rectifiers 51, under the maintenance atmosphere, maintenance ions are used to replace the gas in the pores of the carrier plate surface to achieve carrier plate maintenance.

[0088] This embodiment is a simplified version of the self-cleaning device, suitable for situations where there are space requirements for the equipment.

[0089] Example 4:

[0090] like Figures 1 to 5 As shown, this embodiment discloses a self-cleaning method for the external self-cleaning device of the carrier plate in a plate-type PVD coating equipment, employing Embodiment 1, Embodiment 2, or Embodiment 3. It utilizes the carrier plate return area of ​​the plate-type PVD coating equipment to form several enclosed functional chambers. During carrier plate return, an external dry cleaning method combining physical and chemical cleaning techniques is used to remove deposits generated on the carrier plate during coating. This method includes a full-mode cleaning method and an optimized-mode cleaning method. Carrier plates used in the coating equipment must undergo either a full-mode cleaning method or an optimized-mode cleaning method before being reused in the coating equipment.

[0091] During self-cleaning, a full-mode cleaning method is used to clean the carrier plate once before it is sent to the coating equipment. After use in the coating equipment, when the carrier plate is transferred back to the return area, an optimized-mode cleaning method is used to clean it once before it is sent to the coating equipment. This cycle is repeated n times, followed by a full-mode cleaning, where n ranges from 2 to 20. For example, when n=2, the carrier plate returned for the first time is cleaned using the full-mode cleaning method and then sent to the coating equipment. The carrier plate returned for the second time is cleaned using the optimized-mode cleaning method and then sent to the coating equipment. The carrier plate returned for the third time is also cleaned using the optimized-mode cleaning method and then sent to the coating equipment. The carrier plate returned for the fourth time is cleaned using the full-mode cleaning method and then sent to the coating equipment. This cycle continues alternately.

[0092] Specifically, the full-mode cleaning method is as follows:

[0093] First, laser cleaning is performed: In the laser pre-cleaning chamber 2, the front and sides of the main frame of the carrier plate returned from the coating equipment and the front of the sub-carrier plate are pre-cleaned with a high-energy laser to remove the ITO adhering layer on the surface. Then, the smoke and dust generated by the laser vaporization or combustion of the adhering layer are removed by a combination of ion and electrostatic dust removal to avoid secondary pollution.

[0094] Then, atmospheric pressure plasma cleaning is performed: O2 and / or N2, or H2 and / or NH3 gas is introduced into the plasma cleaning generator 31 to generate high-energy O2-containing plasma. + and / or N + Plasma, or H + and / or NH3 + Plasma, combined with the interactive transformation of the carrier plate's pulsed electric field and pulsating negative cavity pressure, enables a combination of in-situ and remote directional flow for fine cleaning, removing residues and dead zones from high-energy laser cleaning. For example, it can remove ITO layer deposits generated during each coating process.

[0095] When the gas source introduced into the plasma cleaning generator is H2 and / or NH3 gas, in order to extend the service life of the carrier plate, the cleaned carrier plate also needs to be isolated and passivated: several atmospheric pressure plasma generators are used to generate N-rich gas. + With part of O + Combining plasma with the interactive transformation of pulsed electric field and pulsating negative cavity pressure on the carrier plate achieves all-round surface passivation modification of the aluminum alloy carrier plate, increasing surface density and hardness, and reducing impurities released from surface pores. The carrier plate needs to be purged with an isolation gas before and after plasma passivation treatment.

[0096] If the gas source introduced into the plasma cleaning generator is O2 and / or N2 gas, due to the O2 gas during the cleaning process... + and / or N + Plasma will passivate the carrier plate, so no passivation treatment is required.

[0097] Finally, perform carrier plate maintenance: in a clean environment, use a small amount of H... + A gas mixture of hydrogen atoms is used to displace the gas in the pores of the carrier plate surface; the clean environment atmosphere is as follows: temperature: 22 ℃~26 ℃, atmospheric pressure: 86 kPa~106 kPa, relative humidity: 40%~60%, ozone concentration: not greater than 20 μg / m³. 3 Cleanliness level: ISO 1000.

[0098] After maintenance, the substrate is sent to the coating equipment for use.

[0099] Because laser cleaning in the full-mode cleaning method cleans the adhesion layer more thoroughly, the carrier plate after cleaning with H2 and / or NH3 as gas sources is also isolated and passivated to extend the service life of the carrier plate.

[0100] Specifically, the optimized pattern cleaning method is as follows:

[0101] Instead of using laser cleaning, the laser pre-cleaning chamber 2 is used as a buffer isolation chamber. The carrier plates returned from the coating equipment are directly cleaned using atmospheric pressure plasma to remove the loose, island-like ITO deposits generated during each coating process, leaving a small amount of denser, flat substrate as a protective layer for the alloy carrier plate. Due to the presence of this small amount of denser substrate, the optimized cleaning method can omit plasma passivation treatment; only harmless spraying, isolation and gas washing, and surface pore gas replacement maintenance are performed on the carrier plates. The carrier plates are then sent to the coating equipment for use.

[0102] This embodiment employs a thorough full-mode cleaning followed by several simplified optimized-mode cleanings. The optimized modes omit laser cleaning and plasma passivation, removing only the loose, island-like deposits generated during each coating process, while retaining a small amount of denser, flat underlayer as a protective layer for the alloy carrier, and performing surface pore gas replacement maintenance. After each coating cycle, the carrier is promptly cleaned and maintained during return, preventing contamination caused by random shedding of accumulated deposits, thus improving coating quality and resolving the issue of cross-contamination during continuous coating of different process layers in plate-type PVD coating equipment. By combining the optimized and full-mode cleaning methods, the cleaning process is simplified, energy consumption is reduced, and cleaning costs are saved while maintaining the desired cleaning effect. This approach is more streamlined and efficient than existing cleaning technologies.

[0103] The entire cleaning process uses dry cleaning, which is more environmentally friendly and reduces emissions compared to wet cleaning technology for the external carrier plate.

[0104] Example 5:

[0105] like Figure 7 As shown, this embodiment also discloses a self-cleaning system for the outer cavity of a plate-type PVD coating equipment, which includes two sets of self-cleaning devices for the outer cavity of the plate-type PVD coating equipment according to Embodiment 1, Embodiment 2 or Embodiment 3, several lifting mechanisms and a conveyor line 30; the two sets of self-cleaning devices are the first self-cleaning device 10 and the second self-cleaning device 20, respectively.

[0106] When the length of the return zone is greater than the total length of the two self-cleaning devices, the two self-cleaning devices are arranged in segments and in series. Specifically, the first self-cleaning device 10 and the second self-cleaning device 20 are connected end to end, and a conveyor line 30 for conveying the carrier plate to be cleaned and the carrier plate after cleaning is also provided below. The discharge end of the coating equipment is connected to the head end of the first self-cleaning device 10 and the head end of the conveyor line 30 through the first lifting mechanism 40, and the middle part of the conveyor line 30 is connected to the tail end of the first self-cleaning device 10 and the head end of the second self-cleaning device 20 through the second lifting mechanism 50; the tail end of the second self-cleaning device 20 and the tail end of the conveyor line 30 are connected to the feed end of the coating equipment through the third lifting mechanism 60.

[0107] During use, the coating equipment sends the carrier plate to be cleaned into the return area, and the first part of the carrier plate and the second part of the carrier plate are allocated according to the set quantity.

[0108] The first section of the carrier plate to be cleaned is sent into the first self-cleaning device 10 for cleaning via the first lifting mechanism 40. After cleaning, the cleaned carrier plate is transported to the middle of the conveyor line 30 via the second lifting mechanism 50, and finally to the tail of the conveyor line 30. The cleaned carrier plate is then transported to the feeding end of the coating equipment via the third lifting mechanism 60 to complete the cleaning process.

[0109] The carrier plate to be cleaned in the second part is fed into the conveyor line 30 by the first lifting mechanism 40. When it reaches the middle of the conveyor line 30, it is transported to the second self-cleaning device 20 by the second lifting mechanism 50 for cleaning. After cleaning, the carrier plate is transported to the feeding end of the coating equipment by the third lifting mechanism 60 to complete the cleaning.

[0110] In this embodiment, by setting two sets of self-cleaning devices in segments and serially, and transporting them below via a conveyor line 30, the height space of the self-cleaning system is reduced without affecting the cleaning efficiency of multiple sets of self-cleaning devices.

[0111] Example 5:

[0112] like Figure 8 As shown, this embodiment also discloses a self-cleaning system for the outer cavity of a plate-type PVD coating equipment, which includes two sets of self-cleaning devices for the outer cavity of the plate-type PVD coating equipment as described in Embodiment 1 or Embodiment 2, several lifting mechanisms, and a conveyor line 30; the two sets of self-cleaning devices are a first self-cleaning device 10 and a second self-cleaning device 20, respectively.

[0113] When the length of the return zone is less than the total length of the two self-cleaning devices, the two self-cleaning devices are arranged in parallel, one above the other, with the head and tail ends of the self-cleaning devices connected to the conveyor line 30, respectively. Specifically, the first self-cleaning device 10 and the second self-cleaning device 20 are arranged in parallel, one above the other. The head ends of the first self-cleaning device 10 and the second self-cleaning device 20 are connected to the discharge end of the coating equipment through the fourth lifting mechanism 70, and the tail ends of the first self-cleaning device 10 and the second self-cleaning device 20 are connected to the feed end of the coating equipment through the fifth lifting mechanism 80.

[0114] In use, the coating equipment sends the carrier plate to be cleaned into the return area, and according to the set allocation, it is divided into a first part carrier plate and a second part carrier plate. The first part carrier plate and the second part carrier plate are transported to the first self-cleaning device 10 and the second self-cleaning device 20 respectively by the fourth lifting mechanism 70 for cleaning. After cleaning, the cleaned carrier plate is collected into the feeding end of the coating equipment by the fifth lifting mechanism 80 to complete the cleaning.

[0115] In this embodiment, the insufficient length of the return zone is overcome by arranging two sets of self-cleaning devices in parallel in a double layer. Although the height of the self-cleaning system is greater than that of Embodiment 3, it is structurally simpler, reducing the need for a lifting mechanism, and also has advantages in cleaning efficiency.

[0116] The self-cleaning systems in Examples 4 and 5 are configured with two sets of self-cleaning devices. This is merely one example used to illustrate the technology of this utility model and does not mean that the self-cleaning system can only have two sets of self-cleaning devices. Depending on production needs, any number of self-cleaning devices can be used in segmented serial configurations, parallel layer configurations, or a combination of both.

[0117] The preferred embodiments of this utility model have been described in detail above; however, this utility model is not limited thereto. Within the scope of the technical concept of this utility model, various simple modifications can be made to the technical solution of this utility model, including combining the various technical features in any other suitable manner. These simple modifications and combinations should also be considered as the content disclosed by this utility model and are all within the protection scope of this utility model.

Claims

1. A self-cleaning device for the outer cavity of a plate-type PVD coating equipment, characterized in that: The device includes several functional chambers located on the carrier plate return area of ​​the coating equipment and sealed on all sides, as well as a carrier plate conveying mechanism set in the several functional chambers. The functional chambers include a laser pre-cleaning functional chamber, an atmospheric pressure plasma cleaning functional chamber, a maintenance functional chamber, and an exhaust gas treatment chamber connected in sequence to each functional chamber. Each functional chamber is equipped with a door valve for isolation and / or an air curtain for isolation spraying. The shell of the atmospheric pressure plasma cleaning functional chamber is a single-layer structure; the atmospheric pressure plasma cleaning functional chamber includes a plasma cleaning chamber; a number of plasma cleaning generators are installed in the plasma cleaning chamber, and a cleaning rectifier is installed below the plasma cleaning generators. The gas source of the plasma cleaning generators is O2 or N2, or H2 or NH3.

2. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 1, characterized in that: When the gas source of the plasma cleaning generator is H2 or NH3, a passivation function chamber is also provided between the atmospheric pressure plasma cleaning function chamber and the maintenance function chamber. The shell of the passivation chamber is a single-layer stainless steel or aluminum alloy sealed protective cover. The passivation chamber is equipped with several plasma passivation generators and a passivation rectifier shroud located below the plasma passivation generators; the gas source for the plasma passivation generators is O2 or N2. An air curtain is installed between the plasma passivation generators; a door valve and an air curtain are installed between the passivation function chamber and the maintenance function chamber.

3. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 1, characterized in that: The shell of the maintenance function chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the maintenance function chamber is equipped with several maintenance rectifiers for introducing maintenance ions and maintenance atmosphere.

4. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 3, characterized in that: The plasma cleaning chamber is provided in two parts: a main plasma cleaning chamber for coarse plasma cleaning and a secondary plasma cleaning chamber for fine plasma cleaning; the main plasma cleaning chamber and the secondary plasma cleaning chamber are interconnected.

5. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 4, characterized in that: The laser pre-cleaning functional room includes a laser chamber. The laser chamber is isolated from the coating equipment and the atmospheric pressure plasma cleaning functional room by valves and air curtains. A laser machine is installed in the laser chamber. The laser machine is located above the carrier plate conveying mechanism and is equipped with a dust removal hood for electrostatic dust removal.

6. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 5, characterized in that: The shell of the laser chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; there are two laser chambers, namely a transverse laser chamber for transverse laser cleaning and a longitudinal laser chamber for longitudinal laser cleaning. The transverse laser chamber is equipped with several transversely moving laser heads, and the longitudinal laser chamber is equipped with several longitudinally moving laser heads.

7. The self-cleaning device outside the carrier cavity of the plate-type PVD coating equipment according to claim 2, characterized in that: The shell of the exhaust gas treatment chamber is a single-layer stainless steel or aluminum alloy sealed protective cover; the exhaust gas treatment chamber includes an exhaust gas treatment device for harmless gas treatment, a filter for filtering solid particles and dust, as well as an air inlet and a sewage outlet; the air inlet of the exhaust gas treatment chamber is connected to the exhaust gas outlets of the laser pre-cleaning functional chamber, the atmospheric pressure plasma cleaning functional chamber, the passivation functional chamber, and the maintenance functional chamber, respectively.

8. A self-cleaning system for the outer cavity of a plate-type PVD coating equipment, characterized in that... Includes two sets of self-cleaning devices for the outer cavity of the plate-type PVD coating equipment as described in any one of claims 1-7, several lifting mechanisms, and a conveyor line; The two self-cleaning devices are arranged in parallel on two levels, with the head and tail ends of the self-cleaning devices connected to conveyor lines. The conveyor lines are connected to the inlet and outlet ends of the coating equipment through a lifting mechanism. Alternatively, the two self-cleaning devices can be set up in segments and in series; the two self-cleaning devices are connected end to end, and a conveyor line for conveying the carrier plates to be cleaned and the carrier plates after cleaning is also set below; the inlet and outlet of the self-cleaning device are connected to the conveyor line, the inlet end and the outlet end of the coating equipment through lifting mechanisms at the beginning and end of the self-cleaning device, respectively.

Images