Gas supply system in magnetron sputtering coating equipment

Abstract

The utility model discloses a gas supply system in magnetron sputtering coating equipment, which provides gas required by coating for a vacuum coating chamber of the magnetron sputtering coating equipment, and comprises a gas supply component positioned in the vacuum coating chamber and a gas control device positioned outside the vacuum coating chamber, and the gas supply component is connected with the gas control device through a gas guide pipe; the air supply assembly comprises an air supply plate and a cooling plate, and the air supply plate and the cooling plate are separated through a carbon film; a graded air supply flow channel is arranged on the contact surface of the air supply plate and the cooling plate; the cooling plate is internally provided with a snakelike cooling flow channel, one side of the cooling plate is connected with a cooling pipe, and a cooling medium is introduced by the cooling pipe to circularly flow in the snakelike cooling flow channel so as to cool the air supply plate. Therefore, thermal deformation of the gas supply plate is avoided, the accuracy of the position of each gas supply port is ensured, the gas supply uniformity of each part of a coating workpiece is ensured, and the sputter coating quality is further improved.

Description

Technical Field

[0001] This utility model relates to the technical field of magnetron sputtering coating equipment, and in particular to a gas supply system in a magnetron sputtering coating equipment. Background Technology

[0002] Magnetron sputtering is a coating technique that increases plasma density and sputtering rate by introducing a magnetic field on the surface of a target cathode and using the magnetic field to confine charged particles. It is mainly used to prepare thin films of various materials such as metals, semiconductors, and insulators.

[0003] During magnetron sputtering, the ion beam bombarding the target surface generates a large amount of heat, which can cause the equipment to overheat, thereby affecting the stability of the equipment and the quality of the sputtered coating.

[0004] However, existing magnetron sputtering equipment usually uses circulating cooling water to cool the target core (magnetic rod), but no cooling is provided for other components such as the gas supply component. The lack of cooling will cause the gas supply component to deform at high temperatures, resulting in uneven gas supply to different parts of the workpiece and ultimately affecting the quality of the sputtered coating. Utility Model Content

[0005] The purpose of this invention is to provide a gas supply system in a magnetron sputtering coating equipment to solve the problem of uneven gas supply caused by the lack of cooling of the gas supply components in the coating equipment.

[0006] To solve the above-mentioned technical problems, this utility model provides a gas supply system in a magnetron sputtering coating equipment, which provides the gas required for coating to the vacuum coating chamber of the magnetron sputtering coating equipment. The system includes a gas supply component located inside the vacuum coating chamber and a gas control device located outside the vacuum coating chamber. The gas supply component and the gas control device are connected by a gas guide pipe.

[0007] The gas supply assembly includes a gas supply plate and a cooling plate, which are separated by a carbon film.

[0008] The contact surface between the air supply plate and the cooling plate is provided with a graded air supply channel, wherein the graded air supply channel includes a main air supply channel, a first-level air supply channel, a second-level air supply channel, a third-level air supply channel and a fourth-level air supply channel opened in the middle of the air supply plate.

[0009] The cooling plate has a serpentine cooling channel, and a cooling pipe is connected to one side of the cooling plate. The cooling medium is introduced through the cooling pipe and circulates in the serpentine cooling channel to cool the air supply plate.

[0010] Preferably, the gas supply assembly is provided in two sets, located on both sides of the rotating cathode in the vacuum coating chamber and extending along the length of the rotating cathode, and the sputtering rate and coating uniformity are controlled by the gas flow rate and pressure.

[0011] Preferably, the primary air supply channel extends from the end of the main air supply channel to both sides, the secondary air supply channel extends from the end of the primary air supply channel to both sides, the tertiary air supply channel extends from the end of the secondary air supply channel to both sides, and the quaternary air supply channel extends from the end of the tertiary air supply channel to both sides; after the main air supply channel is divided into four levels, 16 air supply ports are formed at both ends of the eight quaternary air supply channels.

[0012] Preferably, the 16 air supply ports are evenly spaced along the length of the air supply plate, and each air supply port penetrates the air supply plate, thereby uniformly guiding the gas into the vacuum coating chamber.

[0013] Preferably, the gas control device includes an integrated gas circuit board, on which a solenoid valve, a gas flow meter, and a manual valve are arranged sequentially along the gas flow direction. The solenoid valve, the gas flow meter, and the manual valve are connected in sequence to form a gas supply circuit.

[0014] Preferably, the solenoid valve, the gas flow meter, and the manual valve are each provided in three sets, arranged side by side on the integrated gas circuit board to form three gas supply circuits, which can provide three different types of gas.

[0015] Preferably, the outlets of the three sets of manual valves are respectively connected to the same four-way valve through air guide pipes. After the flow rates are regulated by the corresponding gas flow meters, the three gases are introduced into the air supply plate through the four-way valve and then uniformly guided into the vacuum coating chamber.

[0016] Compared with the prior art, the beneficial effects of this utility model are:

[0017] 1. This utility model adds a cooling plate to the air supply plate, and cools the air supply plate by circulating cooling medium in the serpentine cooling channel, thereby avoiding the air supply plate from deforming due to heat, ensuring the accuracy of the position of each air supply port, thereby ensuring the uniformity of air supply to each part of the coated workpiece, and further improving the quality of sputtering coating.

[0018] 2. The main air supply channel on the gas supply plate of this utility model is divided into four stages, and 16 air supply ports are formed at both ends of the eight four-stage air supply channels, which are evenly extended to both ends of the vacuum coating chamber. The gas control device equipped for the gas supply has three sets of solenoid valves, gas flow meters and manual valves, forming three gas supply paths, which can provide three different types of gas to the vacuum coating chamber. After the flow rate is regulated by the corresponding gas flow meters, the three types of gas are introduced into the gas supply plate through the four-way valve and evenly guided into the vacuum coating chamber. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of a magnetron sputtering coating equipment configured with the gas supply system of this utility model;

[0020] Figure 2 This is a front view of a magnetron sputtering coating equipment configured with the gas supply system of this utility model;

[0021] Figure 3 This is an exploded view of the gas supply component provided by this utility model;

[0022] Figure 4 This is a front view of the air supply plate provided by this utility model;

[0023] Figure 5 This is a rear view of the air supply plate provided by this utility model;

[0024] Figure 6 This is a cross-sectional view of the cooling plate provided by this utility model;

[0025] Figure 7 This is a schematic diagram of the structure of the pneumatic control device provided by this utility model;

[0026] Figure 8 This is a front view of the pneumatic control device provided by this utility model.

[0027] In the diagram: 1. Gas supply assembly; 101. Gas supply plate; 102. Cooling plate; 103. Carbon film; 1011. Main gas supply channel; 1012. Primary gas supply channel; 1013. Secondary gas supply channel; 1014. Tertiary gas supply channel; 1015. Quaternary gas supply channel; 1016. Gas inlet; 1021. Serpentine cooling channel; 1022. Cooling pipe; 201. Integrated gas circuit board; 202. Solenoid valve; 203. Gas flow meter; 204. Manual valve; 205. Four-way valve. Detailed Implementation

[0028] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become clearer from the following description and claims. It should be noted that the drawings are all in a very simplified form and use non-precise proportions, and are only used to facilitate and clarify the illustration of the embodiments of the present invention.

[0029] In the description of this utility model, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0030] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances. Example

[0031] This invention provides a gas supply system for a magnetron sputtering coating apparatus, supplying the gas required for coating to the vacuum coating chamber of the magnetron sputtering coating apparatus. Please refer to [link to relevant documentation]. Figure 1 and Figure 2 The gas supply system includes a gas supply component 1 located inside the vacuum coating chamber and a gas control device 2 located outside the vacuum coating chamber. The gas supply component 1 and the gas control device 2 are connected by a gas guide pipe.

[0032] For details, please refer to Figure 3 The gas supply assembly 1 includes a gas supply plate 101 and a cooling plate 102, which are separated by a carbon film 103. The cooling plate 102 is added to the gas supply plate 101, and the cooling medium circulating in the serpentine cooling channel cools the gas supply plate, thereby preventing heat deformation and ensuring the accuracy of each gas supply port position. This ensures the uniformity of gas supply to all parts of the workpiece and further improves the quality of sputtering coating.

[0033] For further details, please refer to Figure 4 and Figure 5The air supply plate 101 and the cooling plate 102 are provided with graded air supply channels, wherein the graded air supply channels include a main air supply channel 1011, a first-level air supply channel 1012, a second-level air supply channel 1013, a third-level air supply channel 1014 and a fourth-level air supply channel 1015, which are opened in the middle of the air supply plate 101.

[0034] For further details, please refer to Figure 6 The cooling plate 102 has a serpentine cooling channel 1021, and a cooling pipe 1022 is connected to one side of the cooling plate 102. The cooling medium is introduced by the cooling pipe 1022 and circulates in the serpentine cooling channel 1021 to cool the air supply plate 101.

[0035] In this embodiment, the gas supply component 1 is provided in two sets, which are located on both sides of the rotating cathode in the vacuum coating chamber and extend along the length of the rotating cathode. The sputtering rate and coating uniformity are controlled by the gas flow rate and pressure.

[0036] The primary air supply channel 1012 extends from the end of the main air supply channel 1011 to both sides; the secondary air supply channel 1013 extends from the end of the primary air supply channel 1012 to both sides; the tertiary air supply channel 1014 extends from the end of the secondary air supply channel 1013 to both sides; and the quaternary air supply channel 1015 extends from the end of the tertiary air supply channel 1014 to both sides. After the main air supply channel 1011 is divided into four levels, 16 air supply ports 1016 are formed at both ends of the eight quaternary air supply channels 1015. The 16 air supply ports 1016 are evenly spaced along the length of the air supply plate 101, and each air supply port 1016 penetrates the air supply plate 101, thereby uniformly guiding the gas into the vacuum coating chamber.

[0037] For details, please refer to Figure 7 and Figure 8 The gas control device 2 includes an integrated gas circuit board 201. A solenoid valve 202, a gas flow meter 203, and a manual valve 204 are arranged sequentially on the integrated gas circuit board 201 along the gas flow direction. The solenoid valve 202, the gas flow meter 203, and the manual valve 204 are connected in sequence to form a gas supply circuit.

[0038] In this embodiment, the solenoid valve 202, the gas flow meter 203, and the manual valve 204 are each provided in three sets, arranged side by side on the integrated gas circuit board 201 to form three gas supply circuits, which can provide three different types of gas. The outlets of the three sets of manual valves 204 are respectively connected to the same four-way valve 205 through gas guide pipes. After the flow rate is regulated by the corresponding gas flow meter 203, the three gases are introduced into the gas supply board 101 through the four-way valve 205 and then uniformly guided into the vacuum coating chamber.

[0039] The above description is only a description of the preferred embodiment of the present utility model and is not intended to limit the scope of the present utility model in any way. Any changes or modifications made by those skilled in the art based on the above disclosure shall fall within the protection scope of the claims.

Claims

1. A gas supply system in a magnetron sputtering coating apparatus, providing the gas required for coating to the vacuum coating chamber of the magnetron sputtering coating apparatus, characterized in that, It includes a gas supply assembly (1) located inside the vacuum coating chamber and a gas control device (2) located outside the vacuum coating chamber, wherein the gas supply assembly (1) and the gas control device (2) are connected by a gas guide pipe; The air supply assembly (1) includes an air supply plate (101) and a cooling plate (102), which are separated by a carbon film (103). The air supply plate (101) and the cooling plate (102) are provided with graded air supply channels, wherein the graded air supply channels include a main air supply channel (1011), a first-level air supply channel (1012), a second-level air supply channel (1013), a third-level air supply channel (1014), and a fourth-level air supply channel (1015) located in the middle of the air supply plate (101). The cooling plate (102) has a serpentine cooling channel (1021) and a cooling pipe (1022) is connected to one side of the cooling plate (102). The cooling medium is introduced by the cooling pipe (1022) and circulates in the serpentine cooling channel (1021) to cool the air supply plate (101).

2. The gas supply system in a magnetron sputtering coating apparatus as described in claim 1, characterized in that, The gas supply assembly (1) is provided in two sets, located on both sides of the rotating cathode in the vacuum coating chamber and extending along the length of the rotating cathode. The sputtering rate and coating uniformity are controlled by the gas flow rate and pressure.

3. The gas supply system in a magnetron sputtering coating apparatus as described in claim 1, characterized in that, The primary air supply channel (1012) extends from the end of the main air supply channel (1011) to both sides; the secondary air supply channel (1013) extends from the end of the primary air supply channel (1012) to both sides; the tertiary air supply channel (1014) extends from the end of the secondary air supply channel (1013) to both sides; and the quaternary air supply channel (1015) extends from the end of the tertiary air supply channel (1014) to both sides. After the main air supply channel (1011) is divided into four levels, 16 air supply ports (1016) are formed at both ends of the eight quaternary air supply channels (1015).

4. The gas supply system in a magnetron sputtering coating apparatus as described in claim 3, characterized in that, The 16 air supply ports (1016) are evenly spaced along the length of the air supply plate (101), and each air supply port (1016) penetrates the air supply plate (101), thereby guiding the gas evenly into the vacuum coating chamber.

5. The gas supply system in a magnetron sputtering coating apparatus as described in claim 1, characterized in that, The gas control device (2) includes an integrated gas circuit board (201). A solenoid valve (202), a gas flow meter (203), and a manual valve (204) are arranged sequentially on the integrated gas circuit board (201) along the gas flow direction. The solenoid valve (202), the gas flow meter (203), and the manual valve (204) are connected in sequence to form a gas supply circuit.

6. The gas supply system in a magnetron sputtering coating apparatus as described in claim 5, characterized in that, The solenoid valve (202), the gas flow meter (203), and the manual valve (204) are each provided in three sets, arranged side by side on the integrated gas circuit board (201) to form three gas supply circuits, which can provide three different types of gas.

7. The gas supply system in a magnetron sputtering coating apparatus as described in claim 6, characterized in that, The outlets of the three sets of manual valves (204) are respectively connected to the same four-way valve (205) through gas guide pipes. After the flow rate is regulated by the corresponding gas flow meter (203), the three gases are introduced into the gas supply plate (101) through the four-way valve (205) and then uniformly guided into the vacuum coating chamber.

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