High-stability exposure jig
By designing a highly stable exposure fixture and utilizing support components to improve its stability, the problems of stray light and insufficient stability in grating fabrication in existing exposure systems have been solved, achieving high-quality development of photoresist grating masks.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- BEI JING ZHI GE GUANG DIAN KE JI YOU XIAN GONG SI
- Filing Date
- 2025-07-31
- Publication Date
- 2026-05-19
AI Technical Summary
In existing exposure systems, speckle caused by laser coherence, imperfections in collimating lenses, and stray light problems caused by scattering from optical elements result in microscopic defects such as bent grating lines and rough surfaces in photoresist grating masks, which manifest as stray light problems on a macroscopic scale. Furthermore, the insufficient stability of existing exposure fixtures leads to the failure of phase compensation operations.
A highly stable exposure fixture was designed, comprising a base component, a pitch and rotation component, a substrate fixing component, and a support component. The support component improves the stability of the exposure fixture, ensuring that the interference fringes in the reference grating area do not jitter, and enabling effective phase compensation operation.
It effectively eliminates the defects of grid line bending and surface roughness in photoresist grating masks, improves the stray light problem of photoresist grating masks, and enhances the stability of the exposure system and the quality of grating fabrication.
Smart Images
Figure CN224263527U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of grating fabrication technology, specifically relating to a high-stability exposure fixture. Background Technology
[0002] Holographic gratings are made by forming periodic grooves on a substrate material through processes such as exposure, development, and etching. The exposure process requires the use of an exposure system.
[0003] The exposure system not only limits the fabrication area of the grating, but also determines the quality of the grating groove shape by affecting the change in the contrast of the interference fringes. Therefore, choosing a suitable exposure system is a prerequisite for the fabrication of high-quality planar holographic gratings.
[0004] Exposure systems can be divided into two main categories based on the method of acquiring plane waves: wavefront-division exposure systems and amplitude-division exposure systems. Wavefront-division exposure systems are typically Loehn mirror exposure systems, while amplitude-division exposure systems are typically dual-beam exposure systems.
[0005] like Figure 1 The diagram shows a Loewe mirror exposure system. The laser beam emitted by the laser is converted into a spherical wave after passing through the spatial filter 1 and reaches the collimating lens 2. After collimation, it becomes a parallel beam (plane wave). Part of the parallel beam is used as the first beam to illuminate the Loewe mirror 3. After being reflected by the Loewe mirror 3, it is used as the first exposure beam to illuminate the direction of the exposure fixture 4. The other part of the parallel beam is used as the second exposure beam to illuminate the direction of the exposure fixture 4. The first and second exposure beams form an interference field composed of interference fringes through interference exposure. The angle between the first and second exposure beams is adjusted by rotating the base 5 so that the period of the interference fringes in the interference field formed by the first and second exposure beams meets the required grating period requirements. The grating substrate with spin-coated photoresist is fixed on the exposure fixture. The photoresist on the grating substrate undergoes interference exposure in the interference field, and a photoresist mask is obtained on the grating substrate.
[0006] like Figure 2The diagram shows a dual-beam exposure system. The laser beam emitted by the laser is split into a first beam and a second beam by a beam splitter prism 6. The first beam is reflected light, which is S-polarized (TE-polarized light), and the second beam is transmitted light, which is P-polarized (TM-polarized light). The first reflected beam, after being reflected by the first mirror 8, is converted into a spherical wave by the first spatial filter 1-1 and reaches the first collimating lens 2-1. After collimation, it becomes a first parallel beam (plane wave). The second beam's polarization state is changed by the half-wave plate 7, converting it from P-polarized light to the desired S-polarized light. The second reflected beam, after being reflected by the second mirror 9, is converted into a spherical wave by the second spatial filter 1-2 and reaches the second collimating lens 2-2. After collimation, it becomes a second parallel beam (plane wave). The first and second parallel beams form an interference field composed of interference fringes through interference exposure. The grating substrate with spin-coated photoresist is fixed on the exposure fixture 4 and the exposure fixture is placed in the interference field. The photoresist on the grating substrate undergoes interference exposure in the interference field, and a photoresist mask is obtained on the grating substrate.
[0007] In order to prevent the parallel light illuminating the grating substrate from being reflected by the grating substrate to the collimating lens and then reflected again to the grating substrate to form stray light, the above-mentioned Loe lens exposure system and dual-beam exposure system need to increase the pitch angle of the grating substrate by rotating the exposure fixture. This allows the parallel light illuminating the grating substrate to be reflected by the grating substrate to the collimating lens and then reflected again to the area outside the exposure system.
[0008] The aforementioned Loewe mirror exposure system and dual-beam exposure system can all cause defects in the exposure interference field due to laser coherence-induced speckle, collimating lens defects, and stray light caused by optical element scattering. These defects are recorded on the photoresist mask during the exposure process, resulting in microscopic defects such as bent grating lines and rough surfaces in the photoresist grating mask after development. Macroscopically, the photoresist grating mask exhibits stray light problems, causing subsequent etched gratings to also have stray light issues.
[0009] To solve the above problems, the following solution is currently adopted:
[0010] A reference grating is fixed next to the grating substrate using an exposure fixture. The period of the reference grating is equal to the period of the interference fringes of the interference field where the grating substrate is located, and the grating line direction of the reference grating is the same as the grating line direction of the interference fringes of the interference field where the grating substrate is located.
[0011] The grating substrate and the reference grating are simultaneously exposed to an interference field formed by interference fringes created by the interference of the first and second exposure beams. The first and second exposure beams irradiate the reference grating, causing diffraction and forming moiré fringes in space. The grating substrate and the reference grating are moved a short distance along the grating vector direction or the grating line direction of the reference grating using an exposure fixture. When the exposure fixture moves the grating substrate and the reference grating along the grating vector direction of the reference grating, an acousto-optic modulator is used for phase compensation in the exposure system. When the exposure fixture moves the grating substrate and the reference grating along the grating line direction of the reference grating, piezoelectric ceramics are used for phase compensation in the exposure system.
[0012] Since the relative positions of the grating substrate and the reference grating are fixed, the phase and orientation of the interference fringes relative to the grating substrate in the interference field are equal to their phase and orientation relative to the reference grating. Furthermore, the phase and orientation of the interference fringes relative to the reference grating can be reflected by moiré fringes. In other words, the phase and orientation of the interference fringes relative to the grating substrate in the interference field can be locked using the moiré fringes formed by the reference grating within the interference field.
[0013] Ideally, the above operations can eliminate high-frequency errors in the interference field, reduce the curvature of the grating lines and the surface roughness of the photoresist grating mask, thereby improving the stray light problem of the photoresist grating mask. However, due to the insufficient stability of existing exposure fixtures, the interference fringes irradiated on the reference grating area exhibit jitter, which disrupts the phase compensation operation of the exposure system. As a result, the photoresist grating mask obtained after development still has defects such as grating line curvature and surface roughness at the microscopic level, and at the macroscopic level, it still exhibits the problem of stray light in the photoresist grating mask. Utility Model Content
[0014] In order to overcome the shortcomings of the prior art, this utility model provides a high-stability exposure fixture.
[0015] This utility model is achieved through the following technical solution:
[0016] This utility model provides a high-stability exposure fixture, including a base component, a pitch and rotation component, a substrate fixing component, and a first support component;
[0017] The bottom end of the pitch rotation component is connected to the top end of the base component, and the top end of the pitch rotation component is connected to the bottom end of the substrate fixing component to be exposed.
[0018] The bottom end of the first support component is connected to the top end of the base component, and the top end of the first support component abuts against the edge region inside the substrate fixing component to be exposed.
[0019] Furthermore, it also includes a second support component, the bottom end of which is connected to the top end of the base component, and the top end of the second support component abuts against the bottom end of the substrate fixing component to be exposed.
[0020] Furthermore, the first support component comprises multiple components.
[0021] Furthermore, the first support component includes a fixed base, a connecting rod, a connecting rod sleeve, and a top block;
[0022] The bottom end of the fixing seat is connected to the top end of the base component. The top end of the fixing seat is connected to the bottom end of the connecting rod through a connecting rod sleeve. The top end of the connecting rod is connected to the top block. The top block abuts against the edge area inside the substrate fixing component to be exposed.
[0023] Furthermore, the second support component is a lifting component, the bottom end of which is connected to the top end of the base component, and the top end of the lifting component can abut against the bottom end of the substrate fixing component to be exposed through lifting operation.
[0024] Furthermore, the base component is a movable base component.
[0025] Furthermore, the substrate fixing component to be exposed includes a substrate fixing plate;
[0026] A first fixing hole is formed in the central region of the substrate fixing plate to be exposed, and the first fixing hole is used to hold the substrate to be exposed.
[0027] The inner edge region of the substrate fixing plate to be exposed has a second fixing hole near the first fixing hole, and the second fixing hole is used to attach the reference grating.
[0028] Furthermore, a first support protrusion is provided at one end of the first fixing hole extending toward the inner center region of the first fixing hole, and the first support protrusion contacts and supports the edge position of the substrate to be exposed on the side to be exposed.
[0029] One end of the second fixing hole extends toward the inner center region of the second fixing hole and is provided with a second support protrusion. The second support protrusion contacts and supports the edge position of the opposite side of one side of the structure of the reference grating.
[0030] Furthermore, the substrate fixing plate to be exposed has a plurality of first connecting holes spaced apart near the first fixing hole, and the substrate fixing plate to be exposed has a plurality of second connecting holes spaced apart near the second fixing hole.
[0031] Compared with the prior art, the technical solution of this utility model has the following beneficial effects:
[0032] This invention provides a high-stability exposure fixture, comprising a base component, a pitch rotation component, a substrate fixing component, and a first support component. The bottom end of the pitch rotation component is connected to the top end of the base component, the top end of the pitch rotation component is connected to the bottom end of the substrate fixing component, the bottom end of the first support component is connected to the top end of the base component, and the top end of the first support component abuts against the edge region inside the substrate fixing component. The stability of the exposure fixture is improved by the first support component, ensuring that when the exposure fixture provided by this invention is used to set the substrate and reference grating and placed within the interference field of the exposure system, the interference fringes illuminating the reference grating region will not jitter, thus preventing damage to the phase compensation operation of the exposure system. This reduces or even eliminates microscopic defects such as grating line bending and surface roughness in the photoresist grating mask obtained after development, and macroscopically improves the stray light problem of the photoresist grating mask. Attached Figure Description
[0033] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0034] Figure 1 This is a schematic diagram of the existing Loehr lens exposure system;
[0035] Figure 2 This is a schematic diagram of an existing dual-beam exposure system;
[0036] Figure 3 A first-angle three-dimensional structural diagram of the high-stability exposure fixture provided by this utility model;
[0037] Figure 4 A second-angle three-dimensional structural diagram of the high-stability exposure fixture provided by this utility model;
[0038] Figure 5 A front view of a first example of a high-stability exposure fixture provided by this utility model;
[0039] Figure 6 A front view of a second example of the high-stability exposure fixture provided by this utility model.
[0040] Among them, 1-spatial filter, 1-1-first spatial filter, 1-2-second spatial filter, 2-collimating lens, 2-1-first collimating lens, 2-2-second collimating lens, 3-Loeis mirror, 4-exposure fixture, 5-base, 6-beam splitter, 7-half-wave plate, 8-first reflecting mirror, 9-second reflecting mirror, 10-slide rail, 11-slider, 12-first adapter plate, 13-rotating stage, 14-tilt adjustment mechanism, 15-second adapter plate, 16-base fixing plate to be exposed, 17-first fixing hole, 18-second fixing hole, 19-first support protrusion, 20-first connecting hole, 21-second connecting hole, 22-fixed seat, 23-connecting rod, 24-connecting rod sleeve, 25-top block, 26-second support component. Detailed Implementation
[0041] The technical solution of this utility model will be clearly and completely described below with reference to its embodiments. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.
[0042] In this document, the terms "first," "second," and other similar words are not intended to imply any order, quantity, or importance, but are merely used to distinguish different elements. The terms "one," "a," and other similar words are not intended to indicate the existence of only one of the stated things, but rather that the description refers only to one of the stated things, which may have one or more. The terms "comprising," "including," and other similar words are intended to indicate a logical relationship, not a spatial relationship. For example, "A includes B" means that logically B belongs to A, not that spatially B is located inside A. Furthermore, the meanings of the terms "comprising," "including," and other similar words should be considered open-ended, not closed. For example, "A includes B" means that B belongs to A, but B does not necessarily constitute all of A; A may also include other elements such as C, D, and E.
[0043] In this document, the terms "embodiment," "this embodiment," "preferred embodiment," and "one embodiment" do not imply that the description applies only to one specific embodiment, but rather that such description may also be applicable to one or more other embodiments. Those skilled in the art will understand that any description made herein relating to one embodiment can be substituted, combined, or otherwise incorporated with the descriptions in one or more other embodiments. Such substitutions, combinations, or other incorporations resulting in new embodiments are readily conceived by those skilled in the art and fall within the protection scope of this utility model.
[0044] In this description, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0045] This utility model provides a high-stability exposure fixture, including a base component, a pitch and rotation component, a substrate fixing component, and a first support component.
[0046] The bottom end of the pitch rotation component is connected to the top end of the base component, and the top end of the pitch rotation component is connected to the bottom end of the substrate fixing component to be exposed.
[0047] The bottom end of the first support component is connected to the top end of the base component, and the top end of the first support component abuts against the edge area inside the substrate fixing component to be exposed.
[0048] By improving the stability of the exposure fixture through the first support component, when the exposure fixture provided by this utility model is set with the substrate to be exposed and the reference grating and placed in the interference field of the exposure system, the interference fringes irradiated to the reference grating area will not jitter, and will not damage the phase compensation operation of the exposure system. This reduces or even eliminates microscopic defects such as grating line bending and surface roughness in the photoresist grating mask obtained after development, and macroscopically improves the stray light problem of the photoresist grating mask.
[0049] For example,
[0050] The aforementioned base component adopts a movable base component, such as... Figures 3-4 As shown, the movable base component includes, from bottom to top, a slide rail 10, a slider 11, and a first adapter plate 12.
[0051] The bottom end of the slider 11 is slidably connected to the slide rail 10, and the top end of the slider 11 is connected to the bottom end of the first adapter plate 12. The top end of the first adapter plate 12 is used to connect to the bottom end of the pitch and rotation component.
[0052] like Figure 5 As shown, the pitch rotation component, from bottom to top, includes a rotary table 13, a pitch adjustment mechanism 14, and a second adapter plate 15. Existing equipment can be used for the rotary table and pitch adjustment mechanism. The bottom end of the rotary table 13 is connected to the top end of the base component, the top end of the rotary table 13 is connected to the bottom end of the pitch adjustment mechanism 14, the top end of the pitch adjustment mechanism 14 is connected to the bottom end of the second adapter plate 15, and the top plate of the second adapter plate 15 is connected to the bottom end of the substrate fixing component to be exposed.
[0053] The aforementioned substrate fixing component includes a substrate fixing plate, the bottom end of which is connected to the top end of the pitch and rotation component.
[0054] The movable base component can move the substrate fixing component to be exposed, which is connected to the pitch and rotation component. The pitch and rotation component can adjust the angle of the substrate fixing component to be exposed.
[0055] A first fixing hole is opened in the central area of the substrate fixing plate to be exposed. The first fixing hole is used to hold the substrate to be exposed. The substrate to be exposed can be a grating substrate.
[0056] A second fixing hole is opened in the inner edge area of the substrate fixing plate to be exposed, near the first fixing hole. The second fixing hole is used to attach the reference grating.
[0057] To enhance the secure engagement of the substrate with the first fixing hole in the substrate fixing plate, a first support protrusion extends from one end of the first fixing hole toward the central area of the hole. This first support protrusion provides contact support to the edge of the substrate to be exposed on the exposed side. Simultaneously, the substrate fixing plate has multiple first connecting holes spaced apart near the first fixing hole. These connecting holes allow first engaging blocks to contact and support the edge of the substrate on the opposite side of the exposed side.
[0058] To enhance the secure engagement of the second fixing hole within the substrate mounting plate with the reference grating, a second support protrusion extends from one end of the second fixing hole toward its central region. This second support protrusion provides contact support to the edge of the reference grating on one side of its structure. Simultaneously, the substrate mounting plate has multiple second connecting holes spaced apart near the second fixing hole. These connecting holes allow for the installation of second engaging blocks that provide contact support to the edge of the reference grating on one side of its structure.
[0059] For example, the first support component includes a fixing base, a connecting rod, a connecting rod sleeve, and a top block. The bottom end of the fixing base is connected to the top end of the base component, the top end of the fixing base is connected to the bottom end of the connecting rod via the connecting rod sleeve, the top end of the connecting rod is connected to the top block, and the top block abuts against the edge region inside the substrate fixing component to be exposed. Preferably, multiple first support components can be used. Figures 1-2 The exposure fixture shown improves stability by setting four first support components around the substrate fixing component to abut against the edge area inside the substrate fixing component.
[0060] Further, as a preferred embodiment, such as Figure 6 As shown (Explanation:) Figure 6(Only the second support component of the exposure fixture is shown; the first support component is not shown.) The high-stability exposure fixture provided by this utility model further includes a second support component 16. The bottom end of the second support component 16 is connected to the top end of the base component, and the top end of the second support component abuts against the bottom end of the substrate fixing component to be exposed. Preferably, the second support component is a lifting component, which can use existing equipment. The bottom end of the lifting component is connected to the top end of the base component, and the top end of the lifting component can be raised to abut against the bottom end of the substrate fixing component through a lifting operation. The combination of the second support component and the first support component further improves the stability of the exposure fixture.
[0061] The above embodiments are only used to illustrate the technical solution of this utility model and are not intended to limit it. Although the utility model has been described in detail with reference to the above embodiments, those skilled in the art can still make modifications or equivalent substitutions to the specific implementation of this utility model. Any modifications or equivalent substitutions that do not depart from the spirit and scope of this utility model are within the protection scope of the claims of this utility model pending approval.
Claims
1. A high-stability exposure fixture, characterized in that, It includes a base component, a pitch and rotation component, a substrate fixing component, and a first support component; The bottom end of the pitch rotation component is connected to the top end of the base component, and the top end of the pitch rotation component is connected to the bottom end of the substrate fixing component to be exposed. The bottom end of the first support component is connected to the top end of the base component, and the top end of the first support component abuts against the edge region inside the substrate fixing component to be exposed.
2. The high-stability exposure fixture according to claim 1, characterized in that, It also includes a second support component, the bottom end of which is connected to the top end of the base component, and the top end of the second support component abuts against the bottom end of the substrate fixing component to be exposed.
3. The high-stability exposure fixture according to claim 1, characterized in that, The first support component comprises multiple components.
4. The high-stability exposure fixture according to claim 1, characterized in that, The first support component includes a fixed base, a connecting rod, a connecting rod sleeve, and a top block; The bottom end of the fixing seat is connected to the top end of the base component. The top end of the fixing seat is connected to the bottom end of the connecting rod through a connecting rod sleeve. The top end of the connecting rod is connected to the top block. The top block abuts against the edge area inside the substrate fixing component to be exposed.
5. The high-stability exposure fixture according to claim 2, characterized in that, The second support component is a lifting component. The bottom end of the lifting component is connected to the top end of the base component. The top end of the lifting component can abut against the bottom end of the substrate fixing component to be exposed through lifting operation.
6. The high-stability exposure fixture according to claim 1, characterized in that, The base component is a movable base component.
7. The high-stability exposure fixture according to claim 1, characterized in that, The substrate fixing component to be exposed includes a substrate fixing plate to be exposed; A first fixing hole is formed in the central region of the substrate fixing plate to be exposed, and the first fixing hole is used to hold the substrate to be exposed. The inner edge region of the substrate fixing plate to be exposed has a second fixing hole near the first fixing hole, and the second fixing hole is used to attach the reference grating.
8. The high-stability exposure fixture according to claim 7, characterized in that, One end of the first fixing hole extends toward the inner center region of the first fixing hole and is provided with a first support protrusion. The first support protrusion contacts and supports the edge of the substrate to be exposed on the exposed side. One end of the second fixing hole extends toward the inner center region of the second fixing hole and is provided with a second support protrusion. The second support protrusion contacts and supports the edge position of the opposite side of one side of the structure of the reference grating.
9. The high-stability exposure fixture according to claim 7, characterized in that, The substrate fixing plate to be exposed has a plurality of first connecting holes spaced apart near the first fixing hole, and the substrate fixing plate to be exposed has a plurality of second connecting holes spaced apart near the second fixing hole.