Exhaust device and single crystal furnace

Abstract

The utility model provides an exhaust device and single crystal furnace. Exhaust device includes: exhaust component, exhaust component has at least one exhaust passage, and the exhaust port of exhaust passage both ends respectively with the top surface and bottom surface of exhaust component intercommunication, and the projection of the circumferential inboard wall of exhaust passage in vertical direction's at least one part is located in the opening area of the exhaust port of exhaust passage and exhaust component's top surface intercommunication. The utility model solves the problem of poor performance of single crystal furnace exhaust component in the prior art.

Description

Technical Field

[0001] This utility model relates to the field of single crystal furnace technology, and more specifically, to an exhaust device and a single crystal furnace. Background Technology

[0002] In the field of single crystal furnace thermal field technology, precise control of the thermal environment is crucial for the growth of high-quality single crystals. As a key component of the thermal field system, the design of the argon gas exhaust assembly at the bottom of the single crystal furnace directly affects the thermal field performance and the quality and efficiency of single crystal growth. Currently, the mainstream practice in the industry is to use direct argon gas exhaust, with the exhaust port vertically downwards, directly below the thermal crucible components. This conventional direct argon gas exhaust technology has the following drawbacks:

[0003] The bottom insulation performance is severely inadequate: Due to the direct argon gas flow, a large amount of heat from the bottom of the crucible is rapidly carried away. Heat radiation from above the exhaust vent enters the gas delivery tube without obstruction and is then quickly dissipated into the external environment through the pipes, resulting in significant heat loss. Even with conventional insulation methods such as adding insulation cotton and optimizing insulation materials, the heat loss problem remains difficult to effectively control due to this poorly designed exhaust system. To maintain a constant furnace temperature and silicon melt temperature, the heating components must continuously consume more energy, which undoubtedly increases energy consumption significantly and consequently raises production costs substantially. In actual production scenarios, energy consumption remains consistently high, greatly compressing the potential for production efficiency.

[0004] The risk of electrode arcing increases significantly: During the direct argon venting process, volatiles generated in the thermal field are blown directly towards the four electrodes located next to the gas guide hood. These volatiles are mostly conductive impurities such as metal vapors and graphite particles produced by sublimation or decomposition at high temperatures. Their presence can easily cause instantaneous discharge arcing between the electrodes and the graphite components. Arson not only seriously threatens production safety but can also directly damage expensive equipment, significantly increasing maintenance costs and production risks. Once equipment failure is caused by arcing, the production process will be forced to stop, resulting in incalculable economic losses for the company, including product loss, equipment repair costs, and order delay compensation due to production stoppage.

[0005] Therefore, existing technologies suffer from poor performance of single-crystal furnace exhaust components. Utility Model Content

[0006] The main objective of this invention is to provide an exhaust device and a single crystal furnace to solve the problem of poor performance of exhaust components in existing single crystal furnaces.

[0007] To achieve the above objectives, according to one aspect of the present invention, an exhaust device is provided, comprising: an exhaust assembly having at least one exhaust channel, exhaust ports at both ends of the exhaust channel communicating with the top and bottom surfaces of the exhaust assembly respectively, and at least a portion of the projection of the circumferential inner sidewall of the exhaust channel in the vertical direction being located within the opening area of ​​the exhaust port communicating with the top surface of the exhaust assembly.

[0008] Furthermore, the end of the exhaust passage that connects to the top surface of the exhaust assembly is farther away from the axis of the exhaust assembly than the end of the exhaust passage that connects to the bottom surface of the exhaust assembly.

[0009] Furthermore, the exhaust passage is obliquely cylindrical, and the axis of the exhaust passage has an angle greater than 0 degrees and less than 90 degrees with the axis of the exhaust assembly.

[0010] Furthermore, the diameter of the exhaust port is greater than or equal to 60 mm and less than or equal to 160 mm; and / or the diameters of the two exhaust ports at both ends of the exhaust channel are the same.

[0011] Furthermore, there are multiple exhaust channels, which are equally spaced around the axis of the exhaust assembly.

[0012] Furthermore, multiple exhaust channels have the same shape.

[0013] Furthermore, the exhaust device also includes at least one air guide tube, the number of which is the same as the number of exhaust channels and corresponds one-to-one, and at least a portion of the air guide tube is disposed inside the corresponding exhaust channel and fits against the circumferential inner wall of the exhaust channel.

[0014] Furthermore, the circumferential outer wall at the top of the air guide has an overlapping flange, which abuts against the top surface of the exhaust assembly.

[0015] Furthermore, the exhaust assembly includes: an insulation layer, which is cylindrical, has an exhaust channel, and has a mounting flange on the circumferential outer wall at the bottom end of the insulation layer.

[0016] According to another aspect of the present invention, a single crystal furnace is provided, including the exhaust device described above.

[0017] Applying the technical solution of this utility model, the exhaust device in this application includes an exhaust component, the exhaust component has at least one exhaust channel, the exhaust ports at both ends of the exhaust channel are respectively connected to the top surface and bottom surface of the exhaust component, and at least a portion of the projection of the circumferential inner sidewall of the exhaust channel in the vertical direction is located in the opening area of ​​the exhaust port connected to the top surface of the exhaust channel and the exhaust component.

[0018] When using the exhaust device of this application, since at least a portion of the vertical projection of the circumferential inner wall of the exhaust channel is located within the opening area of ​​the exhaust port connecting the exhaust channel and the top surface of the exhaust assembly, the exhaust device can reflect heat back into the furnace through the inner wall of the exhaust channel. This reduces heat loss at the bottom of the thermal zone, significantly enhances bottom insulation performance, and reduces energy consumption and production costs. Therefore, compared with the straight, vertical exhaust channels in the prior art, the exhaust assembly of this application effectively improves the thermal environment during single crystal growth. Furthermore, the arrangement of the exhaust channel in this application optimizes the airflow distribution in the thermal zone, thereby better controlling the gas flow direction, reducing direct heat loss at the bottom of the thermal zone, and improving insulation performance. Therefore, the exhaust device of this application effectively solves the problem of poor performance of exhaust assemblies in existing single crystal furnaces. Attached Figure Description

[0019] The accompanying drawings, which form part of this application, are used to provide a further understanding of the present invention. The illustrative embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an undue limitation of the present invention. In the drawings:

[0020] Figure 1 A schematic diagram of the exhaust assembly of an exhaust device according to a specific embodiment of this application is shown;

[0021] Figure 2 A schematic diagram of the structure of an exhaust device according to a specific embodiment of this application is shown;

[0022] Figure 3 A schematic diagram of the air guide tube according to a specific embodiment of this application is shown.

[0023] The above figures include the following reference numerals:

[0024] 10. Exhaust assembly; 11. Exhaust passage; 12. Exhaust port; 13. Insulation layer; 14. Mounting flange; 20. Air guide tube; 21. Overlapping flange. Detailed Implementation

[0025] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0026] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0027] In this utility model, unless otherwise stated, directional terms such as "upper," "lower," "top," and "bottom" are generally used in relation to the direction shown in the accompanying drawings, or in relation to the vertical, perpendicular, or gravitational direction of the component itself; similarly, for ease of understanding and description, "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0028] To address the problem of poor performance of exhaust components in existing single-crystal furnaces, this application provides an exhaust device and a single-crystal furnace.

[0029] Furthermore, the single crystal furnace in this application has the following exhaust device.

[0030] like Figures 1 to 3 As shown, the exhaust device in this application includes an exhaust assembly 10, which has at least one exhaust channel 11. The exhaust ports 12 at both ends of the exhaust channel 11 are respectively connected to the top and bottom surfaces of the exhaust assembly 10, and at least a portion of the projection of the circumferential inner sidewall of the exhaust channel 11 in the vertical direction is located in the opening area of ​​the exhaust port 12 that is connected to the top surface of the exhaust assembly 10.

[0031] When using the exhaust device of this application, since at least a portion of the vertical projection of the circumferential inner wall of the exhaust channel 11 is located within the opening area of ​​the exhaust port 12, which connects the exhaust channel 11 and the top surface of the exhaust assembly 10, the exhaust device can reflect heat back into the furnace through the wall surface of the inner wall of the exhaust channel 11. This reduces heat loss at the bottom of the thermal field, significantly enhances bottom insulation performance, and reduces energy consumption and production costs. Therefore, compared with the straight-up-and-down exhaust channel 11 in the prior art, the exhaust assembly 10 of this application effectively improves the thermal field environment during single crystal growth. Furthermore, the arrangement of the exhaust channel 11 in this application optimizes the airflow distribution in the thermal field, thereby better controlling the gas flow direction, reducing direct heat loss at the bottom of the thermal field, and improving insulation performance. Therefore, the exhaust device of this application effectively solves the problem of poor performance of single crystal furnace exhaust assemblies in the prior art.

[0032] Specifically, the end of the exhaust channel 11 that connects to the top surface of the exhaust assembly 10 is away from the axis of the exhaust assembly 10 relative to the end that connects to the bottom surface of the exhaust channel 11. The principle of this structural design is to adjust the positions of both ends of the exhaust channel 11 to form a non-right-angle exhaust path, using a heat-reflecting surface to reflect heat back into the furnace, while avoiding direct airflow impact on the bottom of the hot zone, thus reducing heat loss. The implementation effect is reflected in optimized airflow distribution in the hot zone, improved stability of the hot zone and bottom insulation performance, thereby enabling the acquisition of higher quality single-crystal silicon during single-crystal growth. The application scenario is in the optimization of the bottom hot zone of a single-crystal furnace, especially suitable for high-precision single-crystal growth processes requiring precise control of the hot zone environment. The process involves correctly installing the tilted air guide 20 in the bottom hot zone assembly of the single-crystal furnace, ensuring the formation of a thermal isolation zone between it and the bottom insulation layer 13, and adjusting the tilt angle of the air guide 20 to achieve optimal heat reflection and airflow control.

[0033] In one specific embodiment of this application, the exhaust channel 11 is obliquely cylindrical, and the axis of the exhaust channel 11 has an angle greater than 0 degrees and less than 90 degrees with the axis of the exhaust assembly 10. The principle of this design is to utilize the special geometry of the obliquely cylindrical exhaust channel 11 to change the airflow path, allowing heat at the bottom of the hot zone to be effectively reflected back into the furnace through the heat reflector. Simultaneously, the obliquely cylindrical structure reduces the direct impact of airflow on the bottom of the hot zone, optimizing the airflow distribution within the hot zone. The implementation effect is improved insulation performance and hot zone stability at the bottom of the single crystal furnace, reduced energy consumption, and improved quality and efficiency of single crystal growth. The application scenario is in the design of hot zones in single crystal furnaces, particularly suitable for situations requiring improved bottom insulation performance and hot zone stability. The process involves installing an obliquely cylindrical inclined air guide 20 in the hot zone assembly at the bottom of the single crystal furnace, ensuring its tilt angle and position are precise to achieve effective heat reflection and reasonable airflow distribution.

[0034] Optionally, the diameter of the exhaust port 12 is greater than or equal to 60 mm and less than or equal to 160 mm; alternatively, the two exhaust ports 12 at both ends of the exhaust channel 11 have the same diameter. The principle of this design is to control the diameter of the exhaust port 12 to influence the airflow velocity and flow rate, thereby optimizing the airflow distribution within the hot zone and reducing heat loss. The implementation effect is to achieve effective control of heat at the bottom of the hot zone, improve insulation performance, and ensure smooth airflow, avoiding the impact of airflow turbulence on the stability of the hot zone. The application scenario is in the design of hot zones for single crystal furnaces, especially suitable for occasions requiring precise control of airflow velocity and flow rate. The process involves installing exhaust ports 12 with a specific diameter in the hot zone components at the bottom of the single crystal furnace, ensuring their matching with the air guide 20 to achieve optimal airflow control.

[0035] Preferably, there are multiple exhaust channels 11, which are equally spaced around the axis of the exhaust assembly 10. The principle of this design is to achieve a uniform airflow distribution through multiple equally spaced exhaust channels 11, avoiding the impact of excessive local airflow on the stability of the thermal field. At the same time, multiple exhaust channels 11 can increase the total area of ​​the heat reflective surface and enhance the heat reflection effect.

[0036] Preferably, the multiple exhaust channels 11 have the same shape. The principle behind this design is to ensure that all exhaust channels 11 have the same shape, achieving consistent airflow distribution and heat reflection, thus avoiding thermal inhomogeneity caused by differences in the shape of the exhaust channels 11. The effect is improved thermal uniformity and stability, reduced thermal fluctuations during single crystal growth, and enhanced quality and consistency of single crystal growth.

[0037] Specifically, the exhaust device also includes at least one air guide tube 20. The number of air guide tubes 20 is the same as the number of exhaust channels 11 and corresponds one-to-one. At least a portion of the air guide tube 20 is disposed inside the corresponding exhaust channel 11 and fits against the circumferential inner wall of the exhaust channel 11. By providing the air guide tube 20, the wall surface of the exhaust channel 11 can be effectively protected, thereby ensuring the performance of the exhaust device. Therefore, when the exhaust device is provided with an air guide tube 20, since the exhaust channel 11 is equipped with the air guide tube 20, the gas actually flows inside the air guide tube 20, and the shape of the air guide tube 20 can be similar to the shape of the exhaust channel 11.

[0038] Optionally, the circumferential outer wall of the top end of the air guide 20 has an overlapping flange 21, which abuts against the top surface of the exhaust assembly 10. This arrangement ensures the stability between the air guide 20 and the exhaust channel 11, preventing the air guide 20 from moving relative to the exhaust channel 11.

[0039] Optionally, the exhaust assembly 10 includes: a thermal insulation layer 13, which is cylindrical and has an exhaust channel 11. The bottom outer circumferential wall of the thermal insulation layer 13 has a mounting flange 14. The principle of this design is to ensure stable installation of the exhaust assembly 10 to the bottom of the single crystal furnace by providing the mounting flange 14 at the bottom of the thermal insulation layer 13. Simultaneously, the cylindrical thermal insulation layer 13 provides good thermal insulation, reducing heat loss from the bottom.

[0040] As can be seen from the above description, the embodiments of this utility model achieve the following technical effects:

[0041] 1. Effectively solves the problem of poor performance of exhaust components in single crystal furnaces in existing technologies;

[0042] 2. Simple structure and stable performance.

[0043] Obviously, the embodiments described above are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of this utility model.

[0044] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0045] It should be noted that the terms "first," "second," etc., used in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented in sequences other than those illustrated or described herein.

[0046] The above description is merely a preferred embodiment of this utility model and is not intended to limit the utility model. Various modifications and variations can be made to this utility model by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. An exhaust device, characterized in that, include: An exhaust assembly (10) has at least one exhaust channel (11), and exhaust ports (12) at both ends of the exhaust channel (11) are respectively connected to the top and bottom surfaces of the exhaust assembly (10). At least a portion of the projection of the circumferential inner sidewall of the exhaust channel (11) in the vertical direction is located in the opening area of ​​the exhaust port (12) connected to the top surface of the exhaust assembly (10).

2. The exhaust device according to claim 1, characterized in that, The end of the exhaust channel (11) that communicates with the top surface of the exhaust assembly (10) is away from the axis of the exhaust assembly (10) relative to the end of the exhaust channel (11) that communicates with the bottom surface of the exhaust assembly (10).

3. The exhaust device according to claim 1, characterized in that, The exhaust channel (11) is oblique cylindrical, and the axis of the exhaust channel (11) has an angle greater than 0 degrees and less than 90 degrees with the axis of the exhaust assembly (10).

4. The exhaust device according to claim 1, characterized in that, The diameter of the exhaust port (12) is greater than or equal to 60 mm and less than or equal to 160 mm; and / or The two exhaust ports (12) at both ends of the exhaust channel (11) have the same diameter.

5. The exhaust device according to claim 1, characterized in that, There are multiple exhaust channels (11), and the multiple exhaust channels (11) are arranged at equal intervals around the axis of the exhaust assembly (10).

6. The exhaust device according to claim 5, characterized in that, The multiple exhaust channels (11) have the same shape.

7. The exhaust device according to any one of claims 1 to 6, characterized in that, The exhaust device further includes at least one air guide tube (20), the number of which is the same as the number of the exhaust channels (11) and corresponds one-to-one, and at least a portion of the air guide tube (20) is disposed inside the corresponding exhaust channel (11) and fits against the circumferential inner sidewall of the exhaust channel (11).

8. The exhaust device according to claim 7, characterized in that, The top circumferential outer wall of the air guide tube (20) has an overlapping flange (21) that abuts against the top surface of the exhaust assembly (10).

9. The exhaust device according to any one of claims 1 to 6, characterized in that, The exhaust assembly (10) includes: The insulation layer (13) is cylindrical and has the exhaust channel (11). The circumferential outer wall of the bottom end of the insulation layer (13) has an mounting flange (14).

10. A single crystal furnace, characterized in that, The exhaust device includes any one of claims 1 to 9.

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