Laminated chip automatic cleaning device and ceramic roller type solar cell sintering furnace

Abstract

The application discloses a laminated sheet fragment automatic removing device and a ceramic roller type solar cell sintering furnace. The laminated sheet fragment automatic removing device comprises a fragment identification unit, is arranged above a ceramic roller and forms a visual detection area on the ceramic roller, and the visual detection area covers at least one silicon sheet; the laminated sheet identification unit is an infrared sensor array composed of a plurality of infrared sensors, the infrared sensor array is arranged at a gap of a plurality of ceramic roller wheels and forms an infrared detection area on the ceramic roller; the sheet kicking unit is arranged on the ceramic roller and located at the rear end of the fragment identification unit and the laminated sheet identification unit, and is used for kicking out the identified fragments and laminated sheets; the collecting unit is located below the sheet kicking unit and is used for collecting the fragments and laminated sheets kicked out by the sheet kicking unit; and the control unit is signal connected with the fragment identification unit, the laminated sheet identification unit and the sheet kicking unit respectively. The application realizes real-time automatic removal of the laminated sheets and fragments, does not need to rely on manual inspection and shutdown processing, and improves production efficiency.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic manufacturing, specifically to an automatic device for removing stacked cell debris and a ceramic roller conveyor solar cell sintering furnace. Background Technology

[0002] During silicon wafer sintering in a ceramic roller sintering furnace, wafer stacking and blockage often occur due to factors such as chipped edges, jamming, wafer warping, equipment vibration, or abnormal transmission speed. These problems lead to uneven heating of the wafers during high-temperature sintering, resulting in fragmentation. Accumulated fragments can obstruct the roller conveyor, affecting the subsequent wafer transport path. Continuous stacking necessitates equipment shutdown for cleaning, impacting production efficiency and potentially causing batch scratches on the wafers after blockage. Traditional solutions rely primarily on manual inspection and shutdown, failing to provide real-time automatic cleaning, severely affecting production continuity and product yield. Utility Model Content

[0003] The purpose of this application is to provide an automatic debris removal device for stacked solar cells and a ceramic roller conveyor solar cell sintering furnace to solve the problems of low production efficiency and unstable product quality caused by reliance on manual inspection and shutdown cleaning in the prior art.

[0004] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows:

[0005] An automatic wafer fragment removal device is suitable for mounting on a sintering furnace, the sintering furnace including a ceramic roller conveyor for transporting silicon wafers, the ceramic roller conveyor including a plurality of ceramic rollers arranged at equal intervals along the length direction, the automatic wafer fragment removal device including;

[0006] A fragment identification unit is arranged above the ceramic roller conveyor and forms a visual detection area on the ceramic roller conveyor, the visual detection area covering at least a single silicon wafer;

[0007] The stacked sheet recognition unit is an infrared sensor array composed of several infrared sensors. The infrared sensor array is arranged in the gaps between several ceramic rollers and forms an infrared detection area on the ceramic roller track.

[0008] The scrap kicking unit is disposed on the ceramic roller conveyor and located at the rear end of the fragment identification unit and the stacked fragment identification unit, and is used to kick out the identified fragments and stacked fragments;

[0009] A collection unit, located below the kicking unit, is used to collect the fragments and stacked pieces kicked out by the kicking unit;

[0010] The control unit is signal-connected to the fragment identification unit, the stacked fragment identification unit, and the kicking fragment unit, respectively.

[0011] In some embodiments, the ceramic roller conveyor is provided with a clearance area for the kicking unit to operate. The kicking unit includes a lifting cylinder and a push rod located within the clearance area. The push rod is obliquely mounted on the telescopic rod of the lifting cylinder and moves along the height direction under the action of the lifting cylinder.

[0012] In some embodiments, the end of the top rod is provided with a ceramic protective cap.

[0013] In some embodiments, the angle between the push rod and the horizontal plane is 45±2°, and the lifting height of the lifting cylinder is 8mm to 12mm.

[0014] In some embodiments, the ceramic roller conveyor is provided with a clearance area for the kicking unit to operate, the kicking unit including a lifting mechanism located within the clearance area and an adsorption traversing mechanism disposed above the ceramic roller conveyor.

[0015] In some embodiments, the kicking unit includes a lowering mechanism disposed above the ceramic roller conveyor and an adsorption traversing mechanism disposed on the lowering mechanism.

[0016] In some implementations, the fragment identification unit is a 2D camera and / or a 3D camera.

[0017] In some embodiments, the row arrangement direction of the infrared sensor array is consistent with the length direction of the ceramic roller conveyor, and a row of infrared sensors is arranged in the gap between every two adjacent ceramic rollers within the infrared detection area.

[0018] In some embodiments, the number of rows in the infrared sensor array is 1 to 20, and the number of columns is 3 to 20.

[0019] This application also provides a ceramic roller-type solar cell sintering furnace, including the aforementioned automatic removal device for stacked cell debris.

[0020] Due to the application of the above technical solution, the beneficial effects of this application compared with the prior art are as follows:

[0021] This application achieves real-time automatic removal of stacked and fragmented wafers by setting up a fragment identification unit, a stacked wafer identification unit, and a wafer kicking unit, eliminating the need for manual inspection and downtime, thereby improving production efficiency. Through the cooperation of the fragment identification unit and the stacked wafer identification unit, jamming or stacking problems are detected and cleared in real time, avoiding production line downtime as in traditional methods, improving production line continuity, and effectively reducing equipment damage caused by fragment accumulation, thus improving product yield and quality. Simultaneously, the signal connection between all units and the control unit allows the entire removal process to operate precisely and efficiently under automated control, avoiding the risk of human error, reducing labor costs, and extending equipment lifespan. Attached Figure Description

[0022] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this utility model. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the automatic debris removal device in an embodiment of this utility model.

[0024] Explanation of reference numerals in the attached figures:

[0025] 1-Stacked piece identification unit; 2-Kicking piece unit; 21-Lifting cylinder; 22-Push rod; 23-Ceramic protective cap; 3-Collection unit; 5-Fragment identification unit; 10-Ceramic roller; 20-Giveaway area. Detailed Implementation

[0026] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort should fall within the scope of protection of the present application.

[0027] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate for the embodiments of this application described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0028] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0029] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0030] Furthermore, the terms "installation," "setup," "equipped with," "connection," "linking," and "socketing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0031] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0032] One embodiment of this application provides a ceramic roller conveyor solar cell sintering furnace, which includes a furnace body and a ceramic roller conveyor mechanism installed inside the furnace body. The furnace body has a feed port and a discharge port respectively at both ends of the ceramic roller conveyor mechanism. The ceramic roller conveyor mechanism is provided with an irradiation zone and a sintering zone from the feed port to the discharge port. It is a conventional structure and will not be described in detail here.

[0033] To achieve real-time automatic removal of stacked wafers and debris, reduce manual intervention costs, and improve equipment safety and production efficiency, the ceramic roller conveyor solar cell sintering furnace is also equipped with an automatic stacked wafer and debris removal device. This device automatically identifies and removes stacked wafers and debris, ensuring that only silicon wafers that meet the requirements enter the subsequent processes.

[0034] It should be noted that in this embodiment, the automatic removal device for stacked fragments is respectively installed in the irradiation zone, sintering zone, feed port and discharge port, and the automatic removal device for stacked fragments is fixed to the furnace wall by a support frame and flange, the support frame being made of stainless steel.

[0035] Please see Figure 1 The aforementioned automatic wafer fragment removal device includes a fragment identification unit 5, a wafer stack identification unit 1, a wafer kicking unit 2, a collection unit 3, and a control unit. The collection unit 3 is located below the wafer kicking unit 2 and is used to collect the fragments and wafer stacks kicked out by the wafer kicking unit 2. In this embodiment, the collection unit 3 is a box with an open top, located below the wafer kicking unit 2 and arranged on the side of the ceramic roller conveyor. The cross-sectional area of ​​the box is larger than the cross-sectional area of ​​the silicon wafer.

[0036] A fragment identification unit 5 is arranged above the ceramic roller conveyor and forms a visual inspection area on the ceramic roller conveyor, the visual inspection area covering at least a single silicon wafer. In this embodiment, the fragment identification unit 5 is a 2D camera and / or a 3D camera. It is used at least to detect the edge morphology of the silicon wafer.

[0037] The stacked wafer identification unit 1 is an infrared sensor array composed of several infrared sensors. The infrared sensor array is arranged in the gaps between several ceramic rollers 10 and forms an infrared detection area on the ceramic roller track. In this embodiment, the detection accuracy of the infrared sensors is ≤0.5mm.

[0038] In detail, the row arrangement direction of the infrared sensor array is consistent with the length direction of the ceramic roller conveyor. Within the infrared detection area, a row of infrared sensors is arranged at the gap between every two adjacent ceramic rollers 10. The determination principle of the stacking identification unit 1 is as follows: when N consecutive infrared sensors are blocked in the length direction of the ceramic roller conveyor, i.e., the row arrangement direction of the infrared sensor array, it is determined to be a stacking, where N is the maximum number of infrared sensors that a single silicon wafer can cross in the length direction of the ceramic roller conveyor.

[0039] In some embodiments, the number of rows in the infrared sensor array is 1 to 20, and the number of columns is 3 to 20. This is determined by the size of the silicon wafer, and this application does not impose a specific limitation. It should be noted that, to facilitate the installation of the infrared sensors, in this embodiment, the ceramic roller 10 is hollow in the middle.

[0040] The kicking unit 2 is set on the ceramic roller conveyor and located at the rear end of the fragment identification unit 5 and the stacked fragment identification unit 1, and is used to kick out the identified fragments and stacked fragments.

[0041] In this embodiment, the ceramic roller conveyor is provided with a clearance area 20 for the operation of the wafer kicking unit 2. The wafer kicking unit 2 includes a lifting cylinder 21 and a push rod 22 located within the clearance area 20. The push rod 22 is obliquely mounted on the telescopic rod of the lifting cylinder 21 and moves along the height direction under the action of the lifting cylinder 21. When a stack or fragment is detected, the lifting cylinder 21 lifts and drives the push rod 22 upward to push the silicon wafer out. The silicon wafer slides into the collection unit 3 under the guidance of the oblique push rod 22. In this embodiment, the lifting time of the lifting cylinder 21 is set to 200ms to ensure that the silicon wafer returns to its original position after leaving the roller conveyor.

[0042] In some embodiments, a ceramic protective cap 23 is provided at the end of the push rod 22. The ceramic protective cap 23 has a Mohs hardness ≥ 8.

[0043] In some embodiments, the angle between the push rod 22 and the horizontal plane is 45±2°, and the lifting height of the lifting cylinder 21 is 8mm to 12mm. This application does not specifically limit this.

[0044] In other embodiments, the ceramic roller conveyor is provided with a clearance area 20 for the operation of the kicking unit 2. The kicking unit 2 includes a lifting mechanism located within the clearance area 20 and an adsorption traversing mechanism disposed above the ceramic roller conveyor. Specifically, the lifting mechanism includes a lifting cylinder 21 and a horizontal plate mounted on the telescopic rod of the lifting cylinder 21. The adsorption traversing mechanism includes a slide rail, a slider, a drive motor, and a suction cup, which is a conventional structure. When a stack or fragment is detected, the lifting cylinder 21 lifts the silicon wafer, which is then adsorbed by the adsorption traversing mechanism, moved traversably above the collection unit 3, and released.

[0045] In some embodiments, the wafer-kicking unit 2 includes a lowering mechanism disposed above the ceramic roller conveyor and an adsorption traversing mechanism disposed on the lowering mechanism. Specifically, the lowering mechanism is a lowering cylinder. When a stack or fragment is detected, the lowering cylinder drives the adsorption traversing mechanism to lower and adsorb the silicon wafer, which is then traversed to above the collection unit 3 and released.

[0046] The control unit is connected to the fragment identification unit 5, the stacked fragment identification unit 1, and the kick-out unit 2 via signals. Specifically, the controller controls the kick-out unit 2 to start or stop based on the identification results of the fragment identification unit 5 and the stacked fragment identification unit 1. It is worth noting that the control unit can implement control and information processing through a microcontroller or logic circuits, which is a conventional technical means.

[0047] Finally, it should be noted that the above are merely preferred embodiments of this application and are not intended to limit this application. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. An automatic wafer fragment removal device, suitable for assembly on a sintering furnace, the sintering furnace including a ceramic roller conveyor for transporting silicon wafers, the ceramic roller conveyor including a plurality of ceramic rollers arranged at equal intervals along the length direction, characterized in that, The automatic debris removal device includes: A fragment identification unit is arranged above the ceramic roller conveyor and forms a visual detection area on the ceramic roller conveyor, the visual detection area covering at least a single silicon wafer; The stacked sheet recognition unit is an infrared sensor array composed of several infrared sensors. The infrared sensor array is arranged in the gaps between several ceramic rollers and forms an infrared detection area on the ceramic roller track. The scrap kicking unit is disposed on the ceramic roller conveyor and located at the rear end of the fragment identification unit and the stacked fragment identification unit, and is used to kick out the identified fragments and stacked fragments; A collection unit, located below the kicking unit, is used to collect the fragments and stacked pieces kicked out by the kicking unit; The control unit is signal-connected to the fragment identification unit, the stacked fragment identification unit, and the kicking fragment unit, respectively.

2. The automatic debris removal device as described in claim 1, characterized in that, The ceramic roller conveyor is provided with a clearance area for the kicking unit to operate. The kicking unit includes a lifting cylinder and a push rod located in the clearance area. The push rod is obliquely mounted on the telescopic rod of the lifting cylinder and moves along the height direction under the action of the lifting cylinder.

3. The automatic debris removal device as described in claim 2, characterized in that, The end of the top rod is provided with a ceramic protective cap.

4. The automatic debris removal device as described in claim 2, characterized in that, The angle between the push rod and the horizontal plane is 45±2°, and the lifting height of the lifting cylinder is 8mm~12mm.

5. The automatic debris removal device as described in claim 1, characterized in that, The ceramic roller conveyor is provided with a clearance area for the kicking unit to operate. The kicking unit includes a lifting mechanism located in the clearance area and an adsorption and traversing mechanism located above the ceramic roller conveyor.

6. The automatic debris removal device as described in claim 1, characterized in that, The kicking unit includes a descending mechanism disposed above the ceramic roller conveyor and an adsorption traversing mechanism disposed on the descending mechanism.

7. The automatic debris removal device as described in claim 1, characterized in that, The fragment recognition unit is a 2D camera and / or a 3D camera.

8. The automatic debris removal device as described in claim 1, characterized in that, The infrared sensor array is arranged in the same direction as the length of the ceramic roller conveyor. Within the infrared detection area, a row of infrared sensors is provided at the gap between every two adjacent ceramic rollers.

9. The automatic debris removal device as described in claim 1, characterized in that, The infrared sensor array has 1 to 20 rows and 3 to 20 columns.

10. A ceramic roller conveyor type solar cell sintering furnace, characterized in that, Includes the automatic debris removal device as described in any one of claims 1 to 9.

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