An improved mask for filter facepiece and tooling

Abstract

The utility model relates to optical communication field more specifically, relate to a kind of mask and tool for improving filter face shape, including base material, the base material is made of magnetic attraction material, multiple mutually parallel rectangular slits are set in middle part, the total area of slit accounts for 23%-30% of base material area.The mask is set in the film-coated surface of glass substrate, so that interval arrangement film layer is deposited on glass substrate, the stress on the surface of glass substrate is broken, long-range transmission of stress is prevented, local stress is released through slit, so as to reduce overall warping, improve filter face shape.The tool for improving filter face shape is fixed on glass substrate by setting cover plate and magnetic attraction piece on cover plate, and forming adsorption force between mask, so as to deposit interval arrangement film layer on glass substrate, and instantaneous deformation of glass substrate during film-coating process can also be inhibited by clamping effect, so as to further improve filter face shape.

Description

Technical Field

[0001] This utility model relates to the field of optical communication, and more specifically, to a mask and tooling for improving the surface shape of a filter. Background Technology

[0002] In the field of communications, Mux / Demux are core functional devices whose main function is to multiplex multiple optical signals of different wavelengths onto a single optical fiber, or to separate a specific wavelength signal from a single optical fiber. Filters play a crucial role in this process, reflecting or transmitting optical signals of specific wavelengths. During multiplexing, the Mux combines optical signals of different wavelengths and transmits them through a single optical fiber. These optical signals propagate as waves in the fiber and are separated in the demultiplexer (Demux). The demultiplexer uses optical filters to separate the signals of different wavelengths to different output ports. In this way, each output port can obtain a signal of a specific wavelength, thus achieving multiplexing.

[0003] In the Mux / Demux design of optical communication, multiple filters are typically fixed to a prism by adhesive bonding to achieve selective wavelength multiplexing and demultiplexing. The surface shape of the filter is a crucial factor affecting the parallelism of the entire component's optical path. Traditional communication filters are usually made by depositing several alternating layers of TaO and SiO films on glass. Due to the stress of the film layers, the coated filters deform significantly. To improve the degree of filter deformation, one method is to increase the thickness of the glass. However, due to the miniaturization of components, the substrate thickness is usually required to be as thin as possible, and many applications do not have enough space to accommodate thicker filters. Another method is to deposit a SiO film on the back to balance the internal stress of the multilayer film on the front and reduce substrate bending. However, the stress of a single layer of SiO on the back is difficult to precisely match the cumulative stress of the complex multilayer film on the front, which may lead to new deformation modes. Furthermore, it requires the refractive index of the substrate and SiO to be as close as possible, thus also having certain limitations. Utility Model Content

[0004] The present invention aims to overcome at least one defect (deficiency) of the prior art and provide a mask and tooling for improving the surface shape of the filter, so as to solve the problem that the glass substrate is affected by the stress of the film layer, resulting in large deformation of the coated filter.

[0005] The technical solution adopted by this utility model is a mask for improving the surface shape of a filter, comprising a substrate material, the substrate material being made of a magnetic material, with a plurality of parallel rectangular slits arranged in the middle, the total area of ​​the slits accounting for 23%-30% of the area of ​​the substrate material.

[0006] This application utilizes a mask with multiple slits, which is placed in close contact with the side of a glass substrate to be coated during the coating process (hereinafter referred to as the front side). This allows for the deposition of spaced-apart film layers on the glass substrate, effectively breaking up the stress on the substrate surface, segmenting the continuous film layers, preventing long-distance stress transmission, and releasing localized stress through the slits. This reduces overall warpage and improves the filter's surface profile. The ratio of the total slit area to the total substrate material area, i.e., the slit proportion, needs to balance the stress release effect with the integrity of the mask's function. If the slit proportion is too large, the mechanical strength of the mask decreases, making the mask prone to deformation or breakage. Conversely, if the slit proportion is too small, stress release is insufficient, resulting in poor improvement in the filter's surface profile and affecting its optical performance. Therefore, the total slit area is set to 23%-30% of the substrate material area.

[0007] Furthermore, the ratio of the slit's length to its width is 24-30.

[0008] If the length-to-width ratio of the slit is too small, the slit appears too short. When the slit width is constant, its length is too short, and stress will be transmitted from the areas at both ends of the slit, resulting in an inability to effectively block stress transmission. If the slit length is constant, its width is too wide. An excessively wide slit weakens the overall mechanical strength of the mask. Furthermore, although the design intent is to cut off stress, an excessively wide slit leads to an overly large stress release area, creating new stress concentration points at the slit edges. This phenomenon is similar to the notch effect in mechanical structures, which may cause film cracks or localized peeling.

[0009] If the length-to-width ratio of the slit is too large, the slit will appear too long and thin. When the slit width is constant, its length will be too long, resulting in overly narrow borders at both ends and reduced mechanical strength of the mask. Conversely, if the slit length is constant, its width will be too narrow, increasing processing difficulty and cost, and also increasing the risk of coating blockage. Therefore, the length-to-width ratio of the slit is set to 24-30.

[0010] Furthermore, the ratio of the slit width to the net distance between two adjacent slits is 0.65-0.75.

[0011] An optimized parameter range is the ratio of slit width to the net distance between adjacent slits, which should be between 0.65 and 0.75. At this ratio, the slits effectively divide the film stress while retaining sufficient connecting bridges (i.e., the area between adjacent slits) to maintain the overall mask strength. If the ratio is too large, the slits will be too wide or the connecting bridges too narrow, failing to effectively resist thermal and mechanical stresses during the coating process. This can easily lead to bridge breakage or permanent deformation. Deformation of the connecting bridges will directly cause slit position shifts, resulting in inaccurate filter patterns and affecting the accuracy of coating area control. If the ratio is too small, the slits will be too narrow or the connecting bridges too wide, significantly limiting stress release. Residual stress will still concentrate in the connecting bridge area, causing overall mask warping or localized bulging, failing to achieve the expected deformation resistance target.

[0012] Furthermore, the width of the slit is 0.6-0.8 mm.

[0013] The width of the slit is a key parameter affecting stress release, coating quality, and mask lifespan. If the slit width is too large, it will weaken the overall mechanical strength of the mask. Secondly, although the design intent is to cut off stress, an excessively wide slit will result in an excessively large stress release area, creating new stress concentration points at the slit edges. Conversely, if the slit width is too small, it cannot effectively block the lateral transmission of film stress, causing residual stress to accumulate continuously within the film. This stress accumulation may lead to substrate warping after coating.

[0014] Furthermore, the thickness of the substrate material is less than 0.1 mm.

[0015] If the substrate material is too thick, a noticeable geometric shadow will form at the slit edge, causing a gradient in the deposition of the coating material on the glass surface. Secondly, if the substrate material is too thick, the slit sidewalls will trap more coating material, causing the slit opening to gradually narrow. Therefore, the substrate material thickness is set to less than 0.1 mm to reduce the impact of the mask slit edge on the film formation on the glass surface.

[0016] Furthermore, the base material is rectangular, with its edges parallel to the long and short sides of the slit, respectively. The edge parallel to the long side of the slit is 1.6-2.5 mm away from the nearest long side of the slit, and the edge parallel to the short side of the slit is 2.4-3.6 mm away from the nearest short side of the slit.

[0017] If the distance between the edge of the substrate material and the long or short side of the slit is too small, it will affect the mechanical strength of the mask, and it may tear during clamping or thermal expansion. Furthermore, a small distance is not conducive to clamping by the fixture. Conversely, if the distance between the edge of the substrate material and the long or short side of the slit is too large, the effective opening area will be reduced, leading to lower material utilization. Along the long side of the slit, in addition to the side borders, there are connecting bridges between the slits to release stress. However, in the short side region, stress is only released through the side borders. Therefore, the width of the side borders on the short side of the slit needs to be larger than the width of the side borders on the long side of the slit.

[0018] A tooling for improving the surface shape of a filter includes the aforementioned mask and a cover plate, wherein the cover plate is provided with a magnetic suction element.

[0019] This fixture includes a cover plate and a mask. The cover plate is equipped with a magnetic element, and the mask is made of a magnetic material. In use, the substrate is placed between the cover plate and the mask, with its front side facing the mask. The magnetic attraction fixes the mask to the front of the substrate, depositing spaced film layers onto the glass substrate. This breaks up the stress on the substrate surface, segments the continuous film layers, prevents long-distance stress transmission, and releases localized stress through the slits, thereby reducing overall warpage and improving the filter's surface profile. Furthermore, the clamping action of the cover plate and mask can also suppress instantaneous deformation of the glass substrate during the coating process, further reducing overall warpage and improving the filter's surface profile. The magnetic element is preferably a high-temperature resistant magnet to prevent magnetic attenuation at high temperatures.

[0020] Furthermore, there are multiple magnetic attractors, which are evenly distributed.

[0021] A single large magnetic element is used, with concentrated adsorption force in the central area and significant attenuation at the edges. Using multiple evenly distributed magnets ensures balanced adsorption forces across the mask area, preventing deformation of the mask or glass substrate due to excessive localized pressure. Furthermore, uniform magnetic force ensures no gaps between the mask and the glass substrate, preventing coating vapor from seeping into the slit edges.

[0022] Furthermore, it also includes a clamp that is detachably connected to the cover plate.

[0023] During coating, the edges of the photomask experience higher stress but less constraint, making them more prone to deformation. The fixture is used to fix the edges of the photomask, addressing the deformation problem caused by edge effects. In use, the glass substrate and photomask are installed between the cover plate and the fixture, and then the fixture is connected to the cover plate to fix the edges of the photomask. After coating, the fixture needs to be removed from the cover plate to remove the coated glass substrate; therefore, the fixture and cover plate are detachably connected. The connection method can be magnetic or bolted.

[0024] Furthermore, the clamp is a rectangular plate structure with a rectangular stepped opening in the middle.

[0025] The fixture is a rectangular plate structure with a certain thickness. A rectangular stepped opening is located in the center. One side opening is larger (slightly larger than the glass substrate and mask), facilitating the insertion and positioning of the glass substrate and mask. The other side opening is smaller, forming a continuous pressing edge around its perimeter to compress the mask edges. The stepped opening not only secures the mask edges and prevents warping but also wraps around the sides of the mask and glass substrate, preventing coating vapor from seeping in from the sides.

[0026] Compared with existing technologies, the beneficial effects of this invention are as follows: By setting a mask with multiple slits on the coated surface of a glass substrate, a film layer with spaced intervals is deposited on the glass substrate, which breaks up the stress on the surface of the glass substrate, prevents long-distance stress transmission, and releases local stress through the slits, thereby reducing overall warpage and improving the surface profile of the filter. The total area of ​​the slits accounts for 23%-30% of the area of ​​the substrate material to balance the stress release effect with the functional integrity of the mask. The ratio of the slit width to the net distance between two adjacent slits is 0.65-0.75, so that the slits can effectively divide the film layer stress while retaining sufficient connecting bridges to maintain the overall strength of the mask. The width of the slits is 0.6-0.8 mm to avoid the slits being too wide, which weakens the overall mechanical strength of the mask, and to prevent the formation of new stress concentration points at the slit edges due to an excessively large stress release area; and to avoid the slits being too narrow, which would fail to effectively block the lateral transmission of film layer stress, leading to the continuous accumulation of residual stress inside the film layer. To reduce the impact of the mask slit edges on the film formation on the glass substrate surface, the thickness of the substrate material is set to less than 0.1 mm. The fixture for improving the filter profile uses a cover plate with magnetic suction elements. These elements create an attractive force between the cover plate and the mask, fixing the mask to the glass substrate. This allows for the deposition of spaced-apart film layers on the glass substrate. The clamping action also suppresses instantaneous deformation of the glass substrate during the deposition process, further reducing overall warpage and improving the filter profile. Multiple magnetic suction elements are evenly distributed on the cover plate, ensuring balanced suction forces across the mask area. This prevents deformation of the mask or glass substrate due to excessive local pressure and ensures no gaps between the mask and the glass substrate, preventing deposition vapor from penetrating the slit edges. The fixture also includes clamps to secure the mask edges, addressing deformation issues caused by edge effects. The fixture has a plate-like structure with a rectangular stepped opening in the middle. While fixing the edge of the mask, it also wraps around the sides of the mask and the glass substrate to prevent coating vapor from seeping in from the side. Attached Figure Description

[0027] Figure 1 This is a structural diagram of a mask.

[0028] Figure 2 This is a front view of the mask sheet of the first embodiment.

[0029] Figure 3 This is a front view of the mask sheet in the second embodiment.

[0030] Figure 4 This is a front view of the mask sheet in the third embodiment.

[0031] Figure 5 This is a structural diagram of the cover plate.

[0032] Figure 6 This is a structural diagram of the fixture.

[0033] Figure 7 This is a structural diagram before tooling installation.

[0034] Figure 8 Structural diagram after tooling installation

[0035] 1. Mask, 11. Substrate material, 12. Slit, 2. Cover plate, 21. Magnet, 22. Through hole, 3. Fixture, 31. Threaded hole, 32. Stepped opening, 33. Clamping edge, 4. Glass substrate. Detailed Implementation

[0036] The accompanying drawings are for illustrative purposes only and should not be construed as limiting the scope of this invention. To better illustrate the following embodiments, some components in the drawings may be omitted, enlarged, or reduced, and do not represent the actual dimensions of the product. It is understandable to those skilled in the art that some well-known structures and their descriptions may be omitted in the drawings.

[0037] Example 1

[0038] like Figure 1 As shown, a mask 1 for improving the surface shape of a filter includes a substrate material 11. The substrate material 11 has a square structure with two opposite vertical sides and two opposite horizontal sides. A plurality of rectangular slits 12 are provided in the middle of the substrate material 11. The long sides of the slits 12 are parallel to the vertical sides of the substrate material 11, and the short sides of the slits 12 are parallel to the horizontal sides of the substrate material 11.

[0039] Specifically, such as Figure 2 As shown, the length L1 of both the vertical and horizontal sides of the base material 11 is 25 mm, and the area is 625 mm². 2The slit 12 has a length L of 18 mm and a width W of 0.7 mm, with an L / W ratio of 25.7. The net distance B between two adjacent slits 12 is 1 mm, with a W / B ratio of 0.7. A total of 13 slits 12 are provided, with a total area of ​​163.8 mm². 2 It accounts for 26.2% of the area of ​​the base material 11. The distance D1 between the two vertical edges of the base material 11 and the long side of its nearest slit 12 is 1.95 mm, and the distance D between the two horizontal edges and the short side of its nearest slit 12 is 3.5 mm.

[0040] If the substrate material 11 is too thick, a noticeable geometric shadow will form at the edge of the slit 12, causing a gradient change in the deposition of the coating material on the glass substrate surface. Secondly, if the substrate material 11 is too thick, the sidewalls of the slit 12 will trap more coating material, causing the opening of the slit 12 to gradually narrow. Therefore, the thickness of the substrate material 11 is set to less than 0.1 mm to reduce the impact of the slit 12 edge on the film formation on the glass substrate 4 surface.

[0041] Example 2

[0042] like Figure 1 As shown, a mask 1 for improving the surface profile of a filter includes a substrate material 11. The substrate material 11 has a square structure with two opposite vertical sides and two opposite horizontal sides. A plurality of rectangular slits 12 are provided in the middle of the substrate material 11. The long sides of the slits 12 are parallel to the vertical sides of the substrate material 11, and the short sides of the slits 12 are parallel to the horizontal sides of the substrate material 11. The thickness of the substrate material 11 is less than 0.1 mm.

[0043] Specifically, such as Figure 3 As shown, the length L1 of both the vertical and horizontal sides of the base material 11 is 25 mm, and the area is 625 mm². 2 The slit 12 has a length L of 19.2 mm and a width W of 0.8 mm, with an L / W ratio of 24. The net distance B between two adjacent slits 12 is 1.1 mm, with a W / B ratio of 0.73. A total of 12 slits 12 are provided, with a total area of ​​184.32 mm². 2 It accounts for 29.5% of the area of ​​the base material 11. The distance D1 between the two vertical edges of the base material 11 and the long side of its nearest slit 12 is 1.65 mm, and the distance D between the two horizontal edges and the short side of its nearest slit 12 is 2.9 mm.

[0044] Example 3

[0045] like Figure 1As shown, a mask 1 for improving the surface profile of a filter includes a substrate material 11. The substrate material 11 has a square structure with two opposite vertical sides and two opposite horizontal sides. A plurality of rectangular slits 12 are provided in the middle of the substrate material 11. The long sides of the slits 12 are parallel to the vertical sides of the substrate material 11, and the short sides of the slits 12 are parallel to the horizontal sides of the substrate material 11. The thickness of the substrate material 11 is less than 0.1 mm.

[0046] Specifically, such as Figure 4 As shown, the length L1 of both the vertical and horizontal sides of the base material 11 is 25 mm, and the area is 625 mm². 2 The slit 12 has a length L of 17.8 mm and a width W of 0.6 mm, with an L / W ratio of 29.7. The net distance B between two adjacent slits 12 is 0.9 mm, with a W / B ratio of 0.67. A total of 14 slits 12 are provided, with a total area of ​​149.52 mm². 2 It accounts for 23.9% of the area of ​​the base material 11. The distance D1 between the two vertical edges of the base material 11 and the long side of its nearest slit 12 is 2.45 mm, and the distance D between the two horizontal edges and the short side of its nearest slit 12 is 3.6 mm.

[0047] Example 4

[0048] like Figure 5 As shown, this embodiment provides a tooling for improving the surface shape of a filter, including a mask 1, a cover plate 2, and a fixture 3 as described in the above embodiment. The cover plate 2 has a thicker central region, and multiple high-temperature resistant magnets 21 are disposed in the central region. The magnets 21 are evenly distributed to ensure that the mask 1 is subjected to uniform force. Through holes 22 are respectively provided at the four corners of the cover plate 2. Figure 6 As shown, the clamp 3 is a rectangular plate structure with a certain thickness, made of rigid material. Threaded holes 31 are provided at its four corners, corresponding to the through holes 22 on the cover plate 2. A rectangular stepped opening 32 is provided in the middle of the clamp 3. The lower opening is larger, slightly larger than the dimensions of the glass substrate 4 and the mask 1, facilitating the insertion of the glass substrate 4 and the mask 1 from below. The upper opening is smaller, with continuous pressing edges 33 around its perimeter to compress the edges of the mask 1. The stepped opening 32 also wraps around the sides of the mask 1 and the glass substrate 4, preventing the coating material from seeping in from the sides.

[0049] like Figure 7 , Figure 8As shown, during use, the glass substrate 4 is placed between the cover plate 2 and the mask 1, with the side of the glass substrate 4 to be coated facing the mask 1. The magnet 21 on the cover plate 2 generates a magnetic attraction between itself and the mask 1, preventing the mask 1 from deforming or warping. Then, the clamp 3 is placed on the outside of the mask 1 and connected to the cover plate 2 with bolts to fix the edge of the mask 1 and prevent the edge of the mask 1 from deforming or warping.

[0050] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the technical solution of this utility model, and are not intended to limit the specific implementation of this utility model. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the claims of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A mask for improving the surface profile of a light filter, comprising a substrate material made of a magnetic material, wherein a plurality of parallel rectangular slits are disposed in the center, characterized in that, The total area of ​​the slits accounts for 23%-30% of the area of ​​the substrate material.

2. The mask for improving the surface profile of a filter according to claim 1, characterized in that, The ratio of the slit's length to its width is 24-30.

3. A mask for improving the surface profile of a filter according to claim 1, characterized in that, The ratio of the slit width to the net distance between two adjacent slits is 0.65-0.

75.

4. A mask for improving the surface profile of a filter according to any one of claims 1 to 3, characterized in that, The width of the slit is 0.6-0.8 mm.

5. A mask for improving the surface profile of a filter according to claim 4, characterized in that, The thickness of the substrate material is less than 0.1 mm.

6. A mask for improving the surface profile of a filter according to claim 4, characterized in that, The base material is rectangular, with its edges parallel to the long and short sides of the slit, respectively. The edge parallel to the long side of the slit is 1.6-2.5 mm away from the nearest long side of the slit, and the edge parallel to the short side of the slit is 2.4-3.6 mm away from the nearest short side of the slit.

7. A tooling for improving the surface shape of a light filter, characterized in that, The mask and cover plate according to any one of claims 1-6 are provided with a magnetic attraction element on the cover plate.

8. The tooling for improving the surface shape of a filter according to claim 7, characterized in that, There are multiple magnetic suction components, which are evenly distributed.

9. The tooling for improving the surface shape of a filter according to claim 8, characterized in that, It also includes a clamp that is detachably connected to the cover plate.

10. The tooling for improving the surface shape of a filter according to claim 9, characterized in that, The clamp is a rectangular plate structure with a rectangular stepped opening in the middle.

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