A material rack for plasma cleaning and a semiconductor device cleaning apparatus

Abstract

This utility model discloses a plasma cleaning rack and its semiconductor device cleaning equipment, including an anode plate, a cathode plate, and a rack base. The cathode plate and anode plate are vertically arranged and staggered. The upper part of both the cathode plate and anode plate is fixed to a rack frame, and the anode plate and the rack frame are electrically connected. An insulating sleeve is provided between the cathode plate and the rack frame. The end of the cathode plate and anode plate away from the rack frame is fixed to the rack base, and the cathode plate and the rack base are electrically connected. A space for placing the workpiece to be cleaned is left between the cathode plate and anode plate. Perforations are evenly distributed on the cathode plate and anode plate. The rack of this utility model adopts a vertical anode plate and cathode plate design, which can support a large number of material boxes to meet the needs of batch processing. The dense holes of the electrode plate ensure a uniform plasma cleaning environment. When the workpiece to be cleaned is placed in this environment, the cleaning effect of the batch of material boxes is highly consistent.

Images