Semiconductor device workpiece stage and wafer inspection apparatus

Abstract

This invention provides a semiconductor equipment workpiece stage and a wafer inspection device. The semiconductor equipment workpiece stage includes a first reflector and a plurality of first laser rulers. The first reflector is disposed on the stage of the semiconductor equipment workpiece stage to move with the stage along a first direction. The plurality of first laser rulers are disposed on a support base of the semiconductor equipment workpiece stage. The plurality of first laser rulers are arranged sequentially at intervals along the first direction, and the distance between any two adjacent first laser rulers is less than the width of the first reflector along the first direction. The first laser rulers are configured to emit laser light along a second direction and receive laser light reflected by the first reflector. The semiconductor equipment workpiece stage can use laser rulers for closed-loop control over a wider range, thus expanding the movement range of existing staged stages and consequently expanding the working range of wafer inspection equipment such as scanning electron microscopes and optical cameras.

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