Shutter device for a lithographic machine and lithographic machine comprising such a shutter device

Abstract

The application discloses a shutter device of a photoetching machine and the photoetching machine, and relates to the technical field of photoetching machines. The shutter device comprises a shutter assembly, a first lens part and a second lens part. The first lens part is arranged on one side of the shutter assembly corresponding to the through holes, and a plurality of first lenses are arranged on the first lens part. The second lens part is arranged on the other side of the shutter assembly corresponding to the through holes, and a plurality of second lenses are arranged on the second lens part. The light of the illumination light source of the photoetching machine passes through the through holes from the first lens part to the second lens part, and the shutter assembly can control the opening and closing states of the through holes. The first lens part and the second lens part before and after the shutter assembly are arranged as a plurality of lens combinations, and the through holes of the shutter assembly are correspondingly arranged as a plurality of through holes. In this way, a plurality of focal points are formed through the plurality of lenses, heat is dispersed, excessive heat concentration is avoided, and the influence caused by heat concentration is reduced.

Description

Technical Field

[0001] This application relates to the field of lithography machine technology, and in particular to a shutter device for a lithography machine and the lithography machine thereof. Background Technology

[0002] A lithography machine is a core piece of equipment in semiconductor manufacturing. Its specific purpose is to transfer circuit patterns from a photomask onto a silicon wafer using optical projection. The lithography machine's illumination system provides the light field to ensure accurate projection of the photomask pattern onto the silicon wafer. Furthermore, the shutter mechanism within the illumination system acts as a switch to control the light path, thereby controlling the exposure time. A typical shutter mechanism uses a single aperture combined with single lenses on either side of the aperture; the opening and closing of the aperture controls the switching of the light path.

[0003] However, the single lens and aperture design means that all light is focused into a single lens. When using a high-power light source, this can lead to excessive heat generation, which in turn affects the thermal stability of the shutter mechanism and increases the requirements for its thermal stability. Utility Model Content

[0004] The embodiments of this application provide a shutter device for a lithography machine and the lithography machine itself, which can homogenize the light source by arranging multiple through holes and lenses to avoid heat concentration.

[0005] In a first aspect, embodiments of this application provide a shutter device for a lithography machine, the device comprising:

[0006] Shutter assembly having multiple through holes;

[0007] A first lens element is disposed on one side of the shutter assembly corresponding to the through hole. The first lens element is provided with a plurality of first lenses, and the plurality of first lenses are arranged in a one-to-one correspondence with the plurality of through holes.

[0008] The second lens element is disposed on the other side of the shutter assembly corresponding to the through hole. The second lens element is provided with a plurality of second lenses, and the plurality of second lenses are configured to correspond one-to-one with the plurality of through holes.

[0009] In this process, the illumination light source of the lithography machine passes through the through hole from the first lens element and enters the second lens element, and the shutter assembly can control the opening and closing state of the through hole.

[0010] In some embodiments, the shutter assembly includes:

[0011] A first shutter assembly, wherein the first shutter assembly is provided with a plurality of first through holes;

[0012] The second shutter component has multiple second through holes, which can be combined with the first through hole to form the through hole; the second shutter component and the first shutter component can move relative to each other, so that the first shutter component and the second shutter component are misaligned or overlapped;

[0013] The first shutter component and the second shutter component are offset to keep the through hole closed; the first shutter component and the second shutter component are overlapped to keep the through hole open.

[0014] In some embodiments, the shutter assembly further includes a first guide rail, the first shutter being slidably disposed on the first guide rail; the first shutter being movable relative to the second shutter being via the first guide rail;

[0015] And / or, the shutter assembly further includes a second guide rail, the second shutter being slidably disposed on the second guide rail; the second shutter being movable relative to the first shutter via the second guide rail.

[0016] In some embodiments, the second shutter member has a groove on the side facing the first shutter member, and the shutter assembly further includes a slider, the slider comprising:

[0017] A cover plate, the cover plate having a through groove, the cover plate being disposed on the side of the second shutter component corresponding to the groove, the groove and the through groove together forming a mounting groove;

[0018] A ball bearing, which is movably disposed within the mounting groove, with a portion of the ball bearing protruding from the groove on the side away from the recess;

[0019] The first shutter component has a groove on the side facing the second shutter component, with the corresponding portion of the ball exposed.

[0020] In some embodiments, the shutter assembly further includes a first rotating shaft, the first shutter member is connected to the first rotating shaft, the first rotating shaft is used to drive the first shutter member to rotate, and the first shutter member rotates relative to the second shutter member via the first rotating shaft;

[0021] And / or, the shutter assembly further includes a second rotating shaft, the second shutter member being connected to the second rotating shaft, the second rotating shaft being used to drive the second shutter member to rotate, the second shutter member rotating relative to the first shutter member via the second rotating shaft, and the first rotating shaft and the second rotating shaft being located on the same axis.

[0022] In some embodiments, the diameter of the second through hole gradually decreases in the direction from the first through hole to the second through hole;

[0023] Alternatively, in the direction from the first through hole to the second through hole, the diameters of the first through hole and the second through hole gradually decrease, and the minimum diameter of the first through hole is greater than or equal to the maximum diameter of the second through hole.

[0024] In some embodiments, the shutter device further includes a cooling assembly, the cooling assembly comprising:

[0025] A first cooling pipe is disposed on the first shutter component to cool and reduce the temperature of the first shutter component;

[0026] The second cooling pipe is installed on the second shutter component to cool and reduce its temperature.

[0027] In some embodiments, the shutter device further includes:

[0028] A blocking member is disposed on the side of the second lens member away from the shutter assembly, and the blocking member is movable relative to the second lens member to block at least a portion of the second lens.

[0029] In some embodiments, the shutter assembly includes:

[0030] The third shutter component is provided with a plurality of through holes;

[0031] Multiple micro shutters are provided, and each of the multiple micro shutters is configured to correspond one-to-one with a multiple of the through holes. The micro shutters are used to control the opening and closing of the through holes.

[0032] Secondly, embodiments of this application provide a lithography machine, which includes an illumination system and a shutter device. The shutter device is disposed in the optical path of the illumination system, and the shutter device is any of the shutter devices described above.

[0033] The beneficial effects of this application are: by setting the first and second lens elements before and after the shutter assembly as a structure of multiple lens combinations, and by setting multiple through holes in the shutter assembly accordingly, multiple focal points are formed through multiple lenses, thereby dispersing heat, avoiding excessive heat concentration, and reducing the impact caused by heat concentration. Attached Figure Description

[0034] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0035] Figure 1This is a schematic diagram of the shutter device structure according to one embodiment of this application;

[0036] Figure 2 This is a schematic diagram of the structure of a first shutter member or a second shutter member according to an embodiment of this application;

[0037] Figure 3 This is a schematic diagram of the shutter assembly structure according to an embodiment of this application;

[0038] Figure 4 This is one embodiment of the present application. Figure 1 Enlarged schematic diagram of part A of the structure;

[0039] Figure 5 This is a schematic diagram of the shutter assembly structure according to another embodiment of this application;

[0040] Figure 6 This is a schematic diagram of the through-hole shape structure of one embodiment of this application;

[0041] Figure 7 This is a schematic diagram of the through-hole shape structure of another embodiment of this application;

[0042] Figure 8 This is another embodiment of the present application. Figure 1 Enlarged schematic diagram of part A of the structure;

[0043] Figure 9 This is a schematic diagram of the shutter device structure according to another embodiment of this application;

[0044] Figure 10 This is a schematic diagram of the shutter assembly structure of another embodiment of this application.

[0045] Explanation of reference numerals in the attached drawings: 10-Shutter assembly; 100-Through hole; 20-First lens; 21-First lens; 30-Second lens; 31-Second lens; 11-First shutter assembly; 111-First through hole; 12-Second shutter assembly; 121-Second through hole; 13-First guide rail; 14-Second guide rail; 122-Groove; 15-Sliding component; 151-Cover plate; 152-Through groove; 16-Mounting groove; 153-Ball bearing; 112-Roll groove; 17-First rotating shaft; 18-Second rotating shaft; 40-Cooling assembly; 41-First cooling pipe; 42-Second cooling pipe; 50-Shielding component; 60-Third shutter assembly; 70-Micro shutter. Detailed Implementation

[0046] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0047] Please refer to Figure 1 One embodiment of this application provides a shutter device for a lithography machine, the device comprising:

[0048] Shutter assembly 10, shutter assembly 10 having multiple through holes 100.

[0049] The first lens element 20 is disposed on one side of the shutter assembly 10 corresponding to the through hole 100. The first lens element 20 is provided with a plurality of first lenses 21, and the plurality of first lenses 21 are arranged in a one-to-one correspondence with the plurality of through holes 100.

[0050] The second lens element 30 is located on the other side of the corresponding through hole 100 of the shutter assembly 10. The second lens element 30 is provided with a plurality of second lenses 31, and the plurality of second lenses 31 are configured to correspond one-to-one with the plurality of through holes 100.

[0051] In this process, the light from the illumination source of the lithography machine passes through the through hole 100 from the first lens 20 and enters the second lens 30. The shutter assembly 10 can control the opening and closing state of the through hole 100.

[0052] In this embodiment, the shutter assembly 10 is provided with a plurality of through holes 100, each of which can allow light to pass through. When the light from the illumination source of the lithography machine passes through, the shutter assembly 10 controls the passage or non-passage of light by controlling the opening and closing state of the through holes 100, thereby controlling the exposure process.

[0053] In this embodiment, the first lens element 20 is provided with a plurality of first lenses 21, which are used to uniformly process the light from the illumination source of the lithography machine, that is, to divide the incident light source into a plurality of sub-beams, thereby achieving a uniform light effect, so as to uniformly illuminate the light and eliminate the high heat concentration of a single beam. At the same time, the uniform processing can also reduce the diffraction interference of a single beam, reduce stray light in the optical path, and improve imaging contrast.

[0054] In one embodiment, the first lens element 20 is a compound eye lens.

[0055] In this embodiment, the second lens element 30 is referenced to the first lens element 20 and is also provided with a plurality of second lenses 31. The second lenses 31 and the first lenses 21 are all in one-to-one correspondence with the through holes 100 of the shutter assembly 10 to form optical channels for multiple sub-beams after separation, so as to ensure the stable transmission of light after uniform processing.

[0056] In another embodiment, the second lens element 30 is a compound eye lens.

[0057] In this embodiment, the shutter assembly 10 controls the opening and closing state of the through hole 100. It can control the opening and closing of multiple through holes 100 simultaneously, or it can control the opening and closing of each through hole 100 independently.

[0058] Please refer to Figure 1 , Figure 2 and Figure 3 In one embodiment, the specific structure of the shutter assembly 10 is further optimized, and the shutter assembly 10 includes:

[0059] The first shutter component 11 has multiple first through holes 111.

[0060] The second shutter component 12 is provided with a plurality of second through holes 121, and the second through holes 121 and the first through holes 111 can together form a through hole 100; the second shutter component 12 and the first shutter component 11 can move relative to each other; so that the first shutter component 11 and the second shutter component 12 are misaligned or overlapped.

[0061] The first shutter component 11 and the second shutter component 12 are offset to keep the through hole 100 closed; the first shutter component 11 and the second shutter component 12 are overlapped to keep the through hole 100 open.

[0062] In this embodiment, the structure of the shutter assembly 10 is further optimized. Specifically, it is configured as two relative moving first shutter members 11 and second shutter members 12. Multiple first through holes 111 are provided on the first shutter member 11, and multiple second through holes 121 are provided on the second shutter member 12. When the first through holes 111 and the second through holes 121 overlap, the aforementioned through holes 100 can be formed. Therefore, by controlling the relative movement of the first shutter members 11 and the second shutter members 12, the opening and closing of the multiple through holes 100 of the shutter assembly 10 can be controlled simultaneously, that is, the opening or closing of the shutter assembly 10 can be controlled.

[0063] In one embodiment, the first shutter member 11 and the second shutter member 12 are made of a plate-like material.

[0064] In one embodiment, the first shutter element 11 and the second shutter element 12 are made of metal. In another embodiment, the first shutter element 11 and the second shutter element 12 are made of iron plates.

[0065] In this embodiment, the opening and closing of the through hole 100 is further controlled by controlling the first shutter member 11 and the second shutter member 12. At this time, the formation of the door opening and closing system only needs to go through the position of the through hole 100.

[0066] In this embodiment, the first shutter member 11 and the second shutter member 12 are misaligned. At this time, the first through hole 111 and the second through hole 121 are also misaligned. When they are completely misaligned, that is, when the projections of the first through hole 111 and the second through hole 121 on the same side plane do not overlap, the through hole 100 is in a closed state. In this case, the shutter assembly 10 is in a closed state, and light cannot pass through the through hole 100. Alternatively, the first shutter member 11 and the second shutter member 12 can be overlapped. In this case, the first through hole 111 and the second through hole 121 can partially overlap or completely overlap. The through hole 100 is in an open state, that is, the shutter assembly 10 is in an open state, and light can pass through the through hole 100.

[0067] In this embodiment, the second shutter member 12 and the first shutter member 11 can move relative to each other so that the first shutter member 11 and the second shutter member 12 are misaligned or overlapped. This can be done by having the first shutter member 11 move while the second shutter member 12 remains stationary, or by having the second shutter member 12 move while the first shutter member 11 remains stationary, or by having the first shutter member 11 and the second shutter member 12 move simultaneously.

[0068] Please refer to Figure 3 In one embodiment, the motion structure of the first shutter member 11 and the second shutter member 12 is further optimized. The shutter assembly 10 is further provided with a first guide rail 13. The first shutter member 11 is slidably disposed on the first guide rail 13. The first shutter member 11 moves relative to the second shutter member 12 through the first guide rail 13.

[0069] And / or, the shutter assembly 10 further includes a second guide rail 14, on which a second shutter member 12 is slidably disposed; the second shutter member 12 moves relative to the first shutter member 11 via the second guide rail 14.

[0070] In this embodiment, the first shutter member 11 can move relative to the second shutter member 12 via the first guide rail member 13, so that the two can switch between misalignment and overlap, thereby controlling the opening and closing state of the through hole 100. Specifically, the first guide rail member 13 is provided with a slide rail, and the first shutter member 11 can be driven by a motor or other driving method to move along the slide rail on the first guide rail member 13.

[0071] In this embodiment, the second shutter member 12 can move relative to the first shutter member 11 via the second guide rail member 14, so that the two can switch between misalignment and overlap, thereby controlling the opening and closing state of the through hole 100. Specifically, the second guide rail member 14 is also provided with a slide rail, and the second shutter member 12 can be driven by a motor or other driving method to move along the slide rail on the second guide rail member 14.

[0072] In one embodiment, the first guide rail 13 and the second guide rail 14 are sliding guide rails or ball bearing guide rails. In another embodiment, both the first guide rail 13 and the second guide rail 14 are provided with lead screws, the telescopic ends of which are connected to the first shutter 11 or the second shutter 12, and the relative movement between them is controlled by telescoping. In another embodiment, the first shutter 11 and the second shutter 12 can also be driven to move electromagnetically, as detailed in existing technology. In yet another embodiment, the first shutter 11 and the second shutter 12 can also move through gear and rack engagement, as detailed in existing technology.

[0073] Please refer to Figure 1 and Figure 4 In one embodiment, the structure of the shutter assembly 10 is further optimized. The second shutter member 12 has a groove 122 on the side facing the first shutter member 11. The shutter assembly 10 also includes a slider 15, which includes:

[0074] The cover plate 151 has a through groove 152. The cover plate 151 is located on one side of the groove 122 corresponding to the second shutter component 12. The groove 122 and the through groove 152 together form the mounting groove 16.

[0075] The ball bearing 153 is movably disposed within the mounting groove 16, and a portion of the ball bearing 153 protrudes from the side of the through groove 152 away from the recess 122.

[0076] The first shutter assembly 11 has a groove 112 on the side facing the second shutter assembly 12, with the corresponding exposed ball bearing 153.

[0077] In this embodiment, to avoid affecting the optical path, the first shutter member 11 and the second shutter member 12 should be as close as possible. However, this would increase the friction between them during relative movement, thus affecting the stability of the structure. Therefore, this embodiment adds a sliding structure to reduce the friction between them. The cover plate 151, together with the second shutter member 12, forms a mounting groove 16 to accommodate the ball bearing 153, allowing the ball bearing 153 to move within the mounting groove 16. Simultaneously, a portion of the ball bearing 153 is exposed on the side of the cover plate 151 facing the first shutter member 11, so that it contacts the first shutter member 11 during relative movement. The rolling of the ball bearing 153 reduces the friction during relative movement. The first shutter member 11 is designed with a groove 112 corresponding to the ball bearing 153 to ensure a tight fit between the first shutter member 11 and the second shutter member 12, increasing their fit.

[0078] Please refer to Figure 5In one embodiment, another method of relative movement of the first shutter member 11 and the second shutter member 12 is provided. The shutter assembly 10 further includes a first rotating shaft 17, the first shutter member 11 is connected to the first rotating shaft 17, and the first rotating shaft 17 is used to drive the first shutter member 11 to rotate. The first shutter member 11 rotates relative to the second shutter member 12 through the first rotating shaft 17.

[0079] And / or, the shutter assembly 10 further includes a second rotating shaft 18, the second shutter member 12 is connected to the second rotating shaft 18, the second rotating shaft 18 is used to drive the second shutter member 12 to rotate, the second shutter member 12 rotates relative to the first shutter member 11 through the second rotating shaft 18, and the first rotating shaft 17 and the second rotating shaft 18 are located on the same axis.

[0080] In this embodiment, the first shutter element 11 is rotated relative to the second shutter element 12 via the first rotating shaft 17, achieving misalignment and overlap between the two. In this embodiment, the second shutter element 12 is rotated relative to the first shutter element 11 via the second rotating shaft 18, achieving misalignment and overlap between the two. The rotation method can be defined by the positions of the first rotating shaft 17 and the second rotating shaft 18. When the axis of the first rotating shaft 17 and the second rotating shaft 18 is positioned off-center from the center of the first shutter element 11 and the second shutter element 12, the first shutter element 11 and the second shutter element 12 rotate around this axis. Conversely, when the axis of the first rotating shaft 17 and the second rotating shaft 18 is positioned at the center of the first shutter element 11 and the second shutter element 12, the first shutter element 11 and the second shutter element 12 rotate around this axis.

[0081] Please refer to Figure 6 Furthermore, the shape of the through hole 100 is improved, and the diameter of the second through hole 121 gradually decreases in the direction from the first through hole 111 to the second through hole 121.

[0082] Alternatively, please refer to Figure 7 In the direction from the first through hole 111 to the second through hole 121, the diameters of the first through hole 111 and the second through hole 121 gradually decrease, and the minimum diameter of the first through hole 111 is greater than or equal to the maximum diameter of the second through hole 121.

[0083] In this embodiment, the specific shape of the through-hole 100 is further improved, therefore the shapes of the first through-hole 111 and / or the second through-hole 121 that together form the through-hole 100 are improved. In the former case, only the aperture of the second through-hole 121 is set to gradually decrease in the direction of light emission. In the other case, the apertures of the first through-hole 111 and the second through-hole 121 can also be set to gradually decrease in the direction of light emission. Both of these settings can guide the light to gradually converge, reduce sharp abrupt changes at the edge of the light-transmitting aperture, thereby reducing light diffraction and making the edge of the output light spot clearer.

[0084] Please refer to Figure 1 and Figure 8 In one embodiment, the structure of the shutter device is further optimized by including a cooling assembly 40, which comprises:

[0085] The first cooling pipe 41 is installed on the first shutter component 11 to cool down the first shutter component 11.

[0086] The second cooling pipe 42 is installed on the second shutter component 12 to cool down the second shutter component 12.

[0087] In this embodiment, a cooling assembly 40 is provided, wherein a coolant is provided in both the first cooling pipe 41 and the second cooling pipe 42. The coolant circulates within the pipes to cool the first shutter component 11 and the second shutter component 12. Furthermore, the first cooling pipe 41 and the second cooling pipe 42 can absorb the heat generated by the shutter assembly 10 when a high-energy light beam passes through it, preventing the first shutter component 11 and the second shutter component 12 from expanding and deforming due to high heat, which would change the shape of the through hole 100 and thus avoid affecting the exposure accuracy.

[0088] Please refer to Figure 9 In one embodiment, the shutter mechanism is further optimized by including:

[0089] A blocking member 50 is disposed on the side of the second lens 30 away from the shutter assembly 10. The blocking member 50 is movable relative to the second lens 30 to block at least a portion of the second lens 31.

[0090] In this embodiment, a blocking member 50 is added to control the area of ​​the light region after passing through the second lens element 30. The blocking member 50 is movable relative to the second lens element 30 to block at least a portion of the second lens 31 on the second lens element 30, or even completely block the second lens 31. This arrangement can control the size of the exposed area or the size of the exposed area. The blocking member 50 is located on the side of the second lens element 30 away from the shutter assembly 10 to further avoid interference with the cooperation between the shutter assembly 10 and the first lens element 20 and the second lens element 30.

[0091] Please refer to Figure 10 In one embodiment, the shutter device is further optimized by providing shutter assembly 10 including:

[0092] The third shutter component 60 has multiple through holes 100.

[0093] Multiple micro shutters 70 are provided, and each micro shutter 70 is configured to correspond one-to-one with a multiple through hole 100. The micro shutters 70 are used to control the opening and closing of the through holes 100.

[0094] In this embodiment, the relative movement of the two shutter components is eliminated, and only one shutter component is used. Each of the multiple through-holes 100 on the shutter component corresponds to an independently controllable micro-shutter 70. The opening and closing of each through-hole 100 is independently controlled by this micro-shutter 70. In this way, the opening and closing of each through-hole 100 can also be controlled by controlling the opening and closing of each micro-shutter 70. This configuration also allows control over the size of the exposed area or region.

[0095] Another embodiment of this application provides a lithography machine, which includes an illumination system and a shutter device. The shutter device is disposed in the optical path of the illumination system and is any of the shutter devices in the above embodiments.

[0096] In this embodiment, the illumination system is the core component of the lithography machine, used to provide a uniform, high-intensity exposure light source and control the shape of the light field. The shutter device is used to control the on / off state of the light path and adjust the exposure time. In addition, the lithography machine also includes a projection system for projection, a mask stage for holding the mask, and a wafer stage for holding the wafer, etc. For specific structures, please refer to the existing technology, which will not be described in detail here.

[0097] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. A shutter device for a photolithography machine, characterized in that, The device includes: Shutter assembly having multiple through holes; A first lens element is disposed on one side of the shutter assembly corresponding to the through hole. The first lens element is provided with a plurality of first lenses, and the plurality of first lenses are arranged in a one-to-one correspondence with the plurality of through holes. The second lens element is disposed on the other side of the shutter assembly corresponding to the through hole. The second lens element is provided with a plurality of second lenses, and the plurality of second lenses are configured to correspond one-to-one with the plurality of through holes. In this process, the illumination light source of the lithography machine passes through the through hole from the first lens element and enters the second lens element, and the shutter assembly can control the opening and closing state of the through hole.

2. The shutter device of the lithography machine according to claim 1, characterized in that, The shutter assembly includes: A first shutter assembly, wherein the first shutter assembly is provided with a plurality of first through holes; The second shutter component has multiple second through holes, which can be combined with the first through hole to form the through hole; the second shutter component and the first shutter component can move relative to each other, so that the first shutter component and the second shutter component are misaligned or overlapped; The first shutter component and the second shutter component are offset to keep the through hole closed; the first shutter component and the second shutter component are overlapped to keep the through hole open.

3. The shutter device of the lithography machine according to claim 2, characterized in that, The shutter assembly also includes a first guide rail, on which the first shutter member is slidably disposed; the first shutter member moves relative to the second shutter member via the first guide rail. And / or, the shutter assembly further includes a second guide rail, the second shutter being slidably disposed on the second guide rail; the second shutter being movable relative to the first shutter via the second guide rail.

4. The shutter device of the lithography machine according to claim 2, characterized in that, The second shutter component has a groove on the side facing the first shutter component, and the shutter assembly also includes a slider, the slider comprising: A cover plate, the cover plate having a through groove, the cover plate being disposed on the side of the second shutter component corresponding to the groove, the groove and the through groove together forming a mounting groove; A ball bearing, which is movably disposed within the mounting groove, with a portion of the ball bearing protruding from the groove on the side away from the recess; The first shutter component has a groove on the side facing the second shutter component, with the corresponding portion of the ball exposed.

5. The shutter device of the lithography machine according to claim 2, characterized in that, The shutter assembly further includes a first rotating shaft, the first shutter member is connected to the first rotating shaft, the first rotating shaft is used to drive the first shutter member to rotate, and the first shutter member rotates relative to the second shutter member through the first rotating shaft; And / or, the shutter assembly further includes a second rotating shaft, the second shutter member being connected to the second rotating shaft, the second rotating shaft being used to drive the second shutter member to rotate, the second shutter member rotating relative to the first shutter member via the second rotating shaft, and the first rotating shaft and the second rotating shaft being located on the same axis.

6. The shutter device of the lithography machine according to claim 2, characterized in that, In the direction from the first through hole to the second through hole, the diameter of the second through hole gradually decreases; Alternatively, in the direction from the first through hole to the second through hole, the diameters of the first through hole and the second through hole gradually decrease, and the minimum diameter of the first through hole is greater than or equal to the maximum diameter of the second through hole.

7. The shutter device of the lithography machine according to claim 2, characterized in that, The shutter device further includes a cooling assembly, which comprises: A first cooling pipe is disposed on the first shutter component to cool and reduce the temperature of the first shutter component; The second cooling pipe is installed on the second shutter component to cool and reduce its temperature.

8. The shutter device of the lithography machine according to claim 1, characterized in that, The shutter device also includes: A blocking member is disposed on the side of the second lens member away from the shutter assembly, and the blocking member is movable relative to the second lens member to block at least a portion of the second lens.

9. The shutter device of the lithography machine according to claim 1, characterized in that, The shutter assembly includes: The third shutter component is provided with a plurality of through holes; Multiple micro shutters are provided, and each of the multiple micro shutters is configured to correspond one-to-one with a multiple of the through holes. The micro shutters are used to control the opening and closing of the through holes.

10. A lithography machine, characterized in that, The lithography machine includes an illumination system and a shutter device, wherein the shutter device is disposed in the optical path of the illumination system, and the shutter device is the shutter device described in any one of claims 1-9.

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