Cleaning system, synthesis system for biochemical synthesis

Abstract

The application discloses a cleaning system and a synthesis system for biochemical synthesis. The cleaning system for biochemical synthesis comprises a positive pressure gas supply system, a cleaning reagent supply system, a pressure plate lifting device, a positive pressure sealing device, a scraping device and a wiping device. The pressure plate lifting device is used for controlling the lifting of the positive pressure sealing device. The scraping device can supply the cleaning reagent to the CPG carrier hole plate and effectively clean the excess reagent outside the holes. The wiping device is used for wiping and cleaning the scraping device when the scraping device moves to a preset working position. The positive pressure sealing device is used for pressing the CPG carrier hole plate to be cleaned and forming a plurality of positive pressure cavities. The plurality of positive pressure cavities are respectively communicated with the positive pressure gas supply system and are used for positively cleaning a plurality of areas of the hole plate, thereby realizing high-throughput cleaning and greatly improving the sample quantity in single cleaning. The device can effectively and quickly clean each stage in the synthesis process, effectively improves the synthesis instrument throughput and synthesis efficiency.

Description

Technical Field

[0001] This disclosure relates to the field of biosynthesis technology, and in particular to a cleaning system and a synthesis system for biochemical synthesis. Background Technology

[0002] Currently, the cleaning method used in traditional column synthesizers is injection-type. According to a set time, the solvent is injected into a syringe containing CPG carrier by controlling a solenoid valve. The solvent waste in the syringe is discharged by positive pressure above and vacuum below. Due to the limitations of the structural principle, each syringe corresponds to one injection line. Therefore, the throughput of a single synthesis is not very high. A common 8-line injection line through 12 stations corresponds to a 96-well plate, so the throughput is 96. If you want to increase the throughput, you can only achieve it by setting up multiple stations. However, if a single station uses a 384-well plate, the maximum throughput can be 4 stations, 1536. But as the throughput increases, the overall size of the instrument increases, the number of pipelines increases, and the liquid supply system becomes more complicated, affecting the stability of the instrument and hindering synthesis production. Utility Model Content

[0003] In view of this, the present disclosure provides a cleaning system and a synthesis system for biochemical synthesis, which at least partially solves the problems of low synthesizer throughput and low synthesis efficiency in the prior art.

[0004] In a first aspect, embodiments of this disclosure provide a cleaning system for biochemical synthesis, comprising:

[0005] A positive pressure gas supply system is used to provide several sets of positive pressure gas sources;

[0006] A cleaning reagent supply system is used to provide different types of cleaning reagents;

[0007] A support device includes a support member and a support member mounted on top of the support member, the support member being connected to the support member;

[0008] The pressure plate lifting device installed on the bearing member includes a power component and a pressure plate assembly installed at the power output end of the power component. The pressure plate assembly has the freedom to lift and lower along the longitudinal axis of the power output end of the power component.

[0009] A positive pressure sealing device is installed below the pressure plate assembly; the positive pressure sealing device has a first initial working position and a positive pressure working position, and when the positive pressure working position is in the positive pressure working position, the positive pressure sealing device presses the CPG carrier orifice plate to be cleaned and forms a plurality of positive pressure chambers, and the plurality of positive pressure chambers are respectively connected to a plurality of groups of positive pressure air sources;

[0010] The coating device includes a load-bearing crossbeam mounted on the side of the support member, and a lateral movement device, a coating pressing device, and a slit coating device mounted on the load-bearing crossbeam. The coating pressing device is mounted on the power output end of the lateral movement device and has a horizontal movement degree of freedom under the drive of the lateral movement device. The slit coating device is mounted on the coating pressing device and has a lifting degree of freedom under the drive of the coating pressing device.

[0011] The wiping device installed on the support member wipes and cleans the scraping pressing device and the slit scraping device when the scraping device moves to the preset working position.

[0012] Secondly, this application discloses a synthesis system for DNA chip synthesis, including a central control center and a cleaning system for biochemical synthesis, wherein the positive pressure gas supply system, the cleaning reagent supply system, and the pressure plate lifting device are signal-connected to the central control center.

[0013] The cleaning system for biochemical synthesis disclosed in this application provides several sets of positive pressure gas sources through a positive pressure gas supply system. When the positive pressure sealing device is in the positive pressure working position and presses the CPG carrier orifice plate to be cleaned to form a positive pressure chamber, the positive pressure gas source can quickly press the cleaning reagent into every corner of the orifice plate. Compared with traditional gravity or simple pressure methods, it can more efficiently ensure that the reagent and the substance to be cleaned come into full contact, accelerate the cleaning process, and improve cleaning efficiency. At the same time, the design of the positive pressure chamber allows each area to be cleaned to be cleaned in an independent positive pressure environment, avoiding mutual interference between different areas and ensuring the accuracy of cleaning. The slit scraping device in the scraping device can achieve vertical and horizontal movement under the drive of the scraping pressing device and the lateral movement device to perform scraping operation on the surface of the orifice plate, which can effectively remove stubborn impurities and residues, further improving the cleaning effect. The cleaning reagent supply system can provide different types of cleaning reagents, and can accurately select the appropriate reagent for cleaning according to different biochemical synthesis needs and the characteristics of the substance to be cleaned, ensuring the targeting and comprehensiveness of cleaning. This system breaks away from the throughput limitations of traditional column synthesizers where each syringe corresponds to one injection line. Through the cooperation of a positive pressure gas supply system and a positive pressure sealing device, it can simultaneously clean CPG carrier plates corresponding to multiple positive pressure chambers, achieving high-throughput cleaning and greatly increasing the number of samples cleaned per cycle.

[0014] The above description is merely an overview of the technical solution disclosed herein. In order to better understand the technical means of this disclosure and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this disclosure more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0015] To more clearly illustrate the technical solutions of the embodiments of this disclosure, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is an assembly diagram of the scraping and cleaning system for biochemical synthesis disclosed in this embodiment.

[0017] Figure 2 for Figure 1 A three-dimensional schematic diagram of the load-bearing device.

[0018] Figure 3 for Figure 1 A three-dimensional schematic diagram of the medium pressure plate lifting device.

[0019] Figure 4 for Figure 1 A three-dimensional schematic diagram of a positive pressure sealing device.

[0020] Figure 5 for Figure 4 Another perspective diagram.

[0021] Figure 6 for Figure 1 A schematic diagram of the coating device.

[0022] Figure 7 for Figure 6 Schematic diagram of the transverse motion device.

[0023] Figure 8 yes Figure 6 Schematic diagram of the scraping and pressing device.

[0024] Figure 9 yes Figure 6 Schematic diagram of a narrow slit coating device.

[0025] Figure 10 yes Figure 9 An explosion diagram.

[0026] Figure 11 yes Figure 10 A three-dimensional schematic diagram of the injection head.

[0027] Figure 12 yes Figure 1 Schematic diagram of the wiping device.

[0028] Explanation of reference numerals in the attached figures:

[0029] 100. Load-bearing device; 110. Support component; 1111. Gantry vertical plate; 1112. Gantry column; 1113. Column base plate; 112. Gantry base plate; 120. Load-bearing component; 121. Linear bearing;

[0030] 200. Pressure plate lifting device; 210. Servo motor; 220. Linear module; 230. Guide rod; 240. Push head; 250. Push head cross plate; 260. Pressure equalizing plate;

[0031] 300. Positive pressure sealing device; 310. Positive pressure cover plate; 311. First air supply through hole; 320. Positive pressure partition plate; 321. Second air supply through hole; 322. Partition groove; 330. Positive pressure partition plate; 331. Sealing groove; 332. Pressure dividing through hole; 333. Limiting groove; 334. Protruding structure; 340. Sealing ring;

[0032] 400. Scraping device; 410. Bearing beam; 420. Lateral motion device; 421. Module servo motor; 422. Lateral motion module; 423. Module origin sensor; 424. Module limit sensor; 425. Module cable chain; 430. Scraping pressing device; 431. Scraping pressing screw motor; 432. Screw motor mounting plate; 433. Screw nut; 434. Screw nut base; 435. Guide slider; 436. Scraper pressing base; 437. Guide slide rail; 440. Slit scraper device; 441. Injection head connecting plate; 442. Injection head; 4421. L-shaped through hole; 4422. Primary distribution tank; 4423. Transition tank; 4424. Secondary distribution tank; 4425. Discharge tank; 443. Injection pressure plate; 444. Injection connector; 445. Adjusting set screw; 446. Silicone scraper; 447. Scraper fixing plate;

[0033] 500. Wiping device; 510. Wiping device base plate; 520. Wiping device side plate; 530. Unwinding shaft; 540. Cloth roll; 550. Cloth roll stepper motor; 560. Rewinding shaft; 570. Cloth roll clamping component; 571. Clamping fixing block; 572. Clamping movable shaft; 573. Clamping polyurethane block; 574. Clamping auxiliary shaft; 580. Cloth roll wiping shaft. Detailed Implementation

[0034] The present disclosure will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for illustrative purposes only and are not intended to limit the scope of the disclosure. Furthermore, it should be noted that, for ease of description, only the parts relevant to the present disclosure are shown in the accompanying drawings.

[0035] It should be noted that, where there is no conflict, the embodiments and features described in this disclosure can be combined with each other. The technical solutions of this disclosure will now be described in detail with reference to the accompanying drawings and embodiments.

[0036] Unless otherwise stated, the exemplary implementations / embodiments shown are to be understood as providing exemplary features of various details that provide ways in which the technical concepts of this disclosure can be implemented in practice. Therefore, unless otherwise stated, the features of various implementations / embodiments may be additionally combined, separated, interchanged and / or rearranged without departing from the technical concepts of this disclosure.

[0037] The use of crosshairs and / or shading in the accompanying drawings is generally used to clarify the boundaries between adjacent components. Thus, unless otherwise stated, the presence or absence of crosshairs or shading does not convey or indicate any preference or requirement for the specific material, material properties, dimensions, proportions, commonalities between the illustrated components, or any other characteristics, properties, etc., of the components. Furthermore, in the accompanying drawings, the dimensions and relative dimensions of components may be exaggerated for clarity and / or descriptive purposes. When exemplary embodiments can be implemented differently, a specific process sequence may be performed in a different order than that described. For example, two consecutively described processes may be performed substantially simultaneously or in the reverse order of their description. Furthermore, the same reference numerals denote the same components.

[0038] When a component is referred to as being "on" or "above" another component, "connected to," or "joined to" another component, the component may be directly on, directly connected to, or directly joined to the other component, or there may be intermediate components. However, when a component is referred to as being "directly on" another component, "directly connected to," or "directly joined to" another component, there are no intermediate components. Therefore, the term "connection" can refer to a physical connection, an electrical connection, etc., and may or may not have intermediate components.

[0039] For descriptive purposes, this disclosure may use spatial relative terms such as “below,” “under,” “below,” “down,” “above,” “above,” “higher,” and “side (e.g., in a “sidewall”)” to describe the relationship between one component and another component as shown in the accompanying drawings. In addition to the orientations depicted in the drawings, the spatial relative terms are also intended to encompass different orientations of the device during use, operation, and / or manufacture. For example, if the device in the drawings is flipped, a component described as “below” or “under” another component or feature would subsequently be positioned “above” said other component or feature. Thus, the exemplary term “below” can encompass both “above” and “below” orientations. Furthermore, the device may be otherwise positioned (e.g., rotated 90 degrees or in other orientations), thus interpreting the spatial relative descriptive terms used herein accordingly.

[0040] The terminology used herein is for the purpose of describing particular embodiments and is not intended to be limiting. As used herein, unless the context clearly indicates otherwise, the singular forms “a” and “the” are intended to include the plural forms as well. Furthermore, when the terms “comprising” and / or “including” and variations thereof are used in this specification, it indicates the presence of the stated features, integrals, steps, operations, parts, components, and / or groups thereof, but does not exclude the presence or addition of one or more other features, integrals, steps, operations, parts, components, and / or groups thereof. It should also be noted that, as used herein, the terms “substantially,” “about,” and other similar terms are used as approximate terms rather than as terms of degree, thus explaining the inherent biases in measurements, calculated values, and / or provided values ​​that would be recognized by one of ordinary skill in the art.

[0041] Reference Figure 1 This application discloses a cleaning system for biochemical synthesis, including a positive pressure gas supply system (not shown in the figure), a cleaning reagent supply system (not shown in the figure), a support device 100, a pressure plate lifting device 200, a positive pressure sealing device 300, a scraping device 400, and a wiping device 500. The positive pressure gas supply system is used to provide several sets of positive pressure gas sources for positive pressure cleaning of CPG carrier in CPG carrier well plates. The cleaning reagent supply system is used to provide different types of cleaning reagents. The support device 100 includes a support member 110 and a support member 120 installed on the top of the support member 110, and the support member 120 is connected to the support member 110.

[0042] The pressure plate lifting device 200 is mounted on the bearing member 120, and specifically includes a power component and a pressure plate assembly installed at the power output end of the power component. The pressure plate assembly has the freedom to lift and lower along the longitudinal axis of the power output end of the power component.

[0043] The positive pressure sealing device 300 is installed below the pressure plate assembly. The positive pressure sealing device 300 has a first initial working position and a positive pressure working position. When the positive pressure working position is in the positive pressure position, the positive pressure sealing device 300 presses the CPG carrier orifice plate to be cleaned and forms a plurality of positive pressure chambers. The plurality of positive pressure chambers are respectively connected to a plurality of positive pressure air sources.

[0044] The scraping device 400 is used to clean residual reagents from the surface of the CPG carrier plate. Specifically, it includes a support beam 410 mounted on the side of the support member 110, and a transverse motion device 420, a scraping pressing device 430, and a slit scraping device 440 mounted on the support beam 410. The scraping pressing device 430 is mounted on the power output end of the transverse motion device 420 and has a horizontal movement degree of freedom under the drive of the transverse motion device 420. The slit scraping device 440 is mounted on the scraping pressing device 430 and has a lifting degree of freedom under the drive of the scraping pressing device 430.

[0045] Wiping device 500 is installed on support member 110 and is used to wipe and clean scraping device 400 when scraping device 400 moves to preset working position.

[0046] After the CPG-based synthesis reaction is completed, cleaning is initiated. Specifically, the coating device 400 is activated to inject cleaning reagents and remove excess reagents from the well plates, ensuring that the reagents penetrate the CPG carriers or are removed. After a preset time (1 to 10 minutes) for CPG carrier penetration, the positive pressure cleaning system is activated to blow away the cleaning reagents from the chambers using positive pressure. The positive pressure can be 0.2-0.4 MPa to ensure the CPG carriers are thoroughly cleaned. Once the coating device 400 has finished coating, it moves to a preset wiping position, and the wiping device 500 is activated to clean the coating device 400.

[0047] In this embodiment, the positive pressure gas supply system provides a positive pressure gas source capable of positive pressure cleaning the CPG carrier in the CPG carrier well plate. Under a positive pressure of 0.2-0.4 MPa, the cleaning reagent can penetrate deeper and faster into the CPG carrier, effectively removing impurities and residues, ensuring thorough cleaning. The cleaning reagent supply system provides different types of cleaning reagents, allowing for precise selection of appropriate reagents based on the specific biochemical synthesis reaction and the characteristics of the substances to be cleaned, further improving the targeting and effectiveness of the cleaning. The slit scraping device 440 of the scraping device 400, driven by the scraping pressing device 430 and the lateral movement device 420, performs scraping operations on the surface of the CPG carrier well plate. This effectively cleans residual reagents from the well plate surface, preventing residual reagents from interfering with subsequent experiments or synthesis reactions, and ensuring the cleanliness of the well plate surface.

[0048] The system, through multiple positive pressure chambers formed by the positive pressure gas supply system and the positive pressure sealing device 300, can simultaneously clean multiple areas on the CPG carrier plate, thus overcoming the throughput limitations of traditional cleaning methods and greatly increasing the number of samples cleaned in a single operation, meeting the needs of large-scale biochemical synthesis.

[0049] In this embodiment, the scraping device 400 is first activated to inject cleaning reagent and remove excess reagent, ensuring that the reagent fully penetrates the CPG carrier. After a preset time, the positive pressure cleaning system is activated to blow away the cleaning reagent in the chamber. This orderly cleaning process design makes the cleaning process more efficient and shortens the overall cleaning time. The efficient cleaning process and high-throughput cleaning capacity allow more samples to be cleaned per unit time, improving the utilization efficiency of the equipment, reducing the cleaning cost per unit sample, and the system's stability and self-cleaning function reduce equipment maintenance costs and downtime, further improving cost-effectiveness.

[0050] Reference Figure 2 The support member 110 includes two sets of brackets, and the load-bearing member 120 is a horizontal plate. The horizontal plate and the two sets of brackets form a gantry structure. The horizontal plate is provided with motor mounting holes and two column mounting holes.

[0051] The power assembly includes a servo motor 210 and a linear module 220 mounted on the power output end of the servo motor 210. The linear module 220 is fixed in the motor mounting hole. The pressure plate assembly includes a pusher head 240 mounted on the end of the linear module 220, a pusher head template 250 mounted on the end of the pusher head 240, and a pressure equalizing plate 260 fixedly connected to the pusher head template 250. The pusher head 240 is located at the center of the pusher head template 250. There are two pressure equalizing plates 260, which are symmetrically arranged on both sides of the pusher head 240.

[0052] The pusher template 250 is also equipped with two guide rods 230, the free ends of which pass through two column mounting holes respectively; the longitudinal center axis of the guide rods 230 is parallel to the longitudinal center axis of the linear module 220.

[0053] In this application, the support member 110 and the load-bearing member 120 of the bearing device 100 cooperate with each other to provide a stable foundation for the entire system; the pressure plate lifting device 200, the scraping device 400, and other components all have clearly defined installation positions and movement modes, ensuring the stability of the system during operation. Compared with traditional methods, which increase the overall size of the instrument and the complexity of the piping as the throughput increases, thus affecting stability, this system reduces the instability factors caused by complex structures through reasonable structural design and modular layout.

[0054] Reference Figure 3The support system includes a gantry vertical plate 1111, a gantry column 1112, a column base plate 1113, and a gantry base plate 112. The gantry vertical plate 1111 and the gantry base plate 112 are connected and fixed with screws. Similarly, the gantry column 1112 and the column base plate 1113 are connected and fixed with screws to ensure the support stability of the support system. This stable structure can withstand the forces generated by components such as the pressure plate lifting device 200 during movement, providing a solid foundation for the normal operation of the system.

[0055] The horizontal plate is connected to the gantry vertical plate 1111 and the gantry column 1112 by screws, which strengthens the overall integrity of the support structure. As a bridge connecting different components, the horizontal plate connects the gantry vertical plate 1111 and the gantry column 1112 together, so that the entire support forms a more stable frame structure, which improves the support's ability to resist external forces and vibrations and helps maintain the stability of the system during operation.

[0056] Furthermore, a linear bearing 121 is installed on the horizontal plate, which works in conjunction with the guide rod 230 to complete the linear guidance function. The linear bearing 121 can provide low-friction, high-precision linear motion guidance, ensuring that the pressure plate lifting device 200 moves along a precise linear trajectory during the rising and falling process. This precise guidance can reduce deviations and swaying during the movement, ensuring the accuracy of the position of the pressure equalizing plate 260 during rising or falling, thereby improving the working accuracy and reliability of the system.

[0057] The pressure plate lifting device 200 is connected to the top of the horizontal plate by screws. When the servo motor 210 is started, it drives the push head 240 to move up or down through the linear module 220, which in turn drives the pressure equalizing plate 260 to move up or down.

[0058] Reference Figure 4 and Figure 5 The positive pressure sealing device 300 includes a positive pressure cover plate 310, a positive pressure partition plate 320, a positive pressure partition plate 330, and a sealing ring 340 arranged sequentially. The top of the positive pressure cover plate 310 is fixedly connected to two pressure equalizing plates 260. The positive pressure cover plate 310 has several first air supply holes 311 for installing several pipe joints that are respectively connected to several sets of positive pressure air sources.

[0059] The positive pressure partition plate 320 has a plurality of second air supply holes 321. On the side of the positive pressure partition plate 320 away from the positive pressure cover plate 310, there are a plurality of partition grooves 322 that communicate with the plurality of second air supply holes 321 respectively. In this embodiment, there are 6 first air supply holes 311 and 6 second air supply holes 321. The inner diameter of the first air supply hole 311 is larger and is used to fix and install pipe joints. The inner diameter of the second air supply hole 321 is smaller and is used to deliver gas downward.

[0060] A sealing groove 331 is provided on the first side of the positive pressure partition 330. The area of ​​the sealing groove 331 is greater than the sum of the areas of several partitioned grooves 322. Several pressure-dividing through holes 332 are provided in the sealing groove 331. The pressure-dividing through holes 332 are evenly arranged to provide a uniform and stable air source.

[0061] A limiting groove 333 is provided on the second side of the positive pressure partition 330, and the limiting groove 333 is correspondingly provided with the sealing groove 331; wherein, the second side of the positive pressure partition 330 is the side away from the positive pressure partition plate 320; the limiting groove 333 has a number of protruding structures 334, and each protruding structure 334 is correspondingly provided with each partition groove 322.

[0062] The sealing ring 340 is embedded in the limiting groove 333. The sealing ring 340 has several sub-rings, each sub-ring surrounding each protruding structure 334. The side of the sealing ring 340 away from the positive pressure partition 330 protrudes from the positive pressure partition 330. The sealing ring 340 is machined according to the groove size of the positive pressure partition 330, allowing for a tight fit and ensuring sealing. The protruding portion of the sealing ring 340 away from the positive pressure partition 330, together with the pressed CPG carrier orifice plate, forms several positive pressure chambers. The positive pressure gas supplied through several gas supply lines dries the cleaning reagent remaining in the positive pressure chambers.

[0063] The protruding part of the sealing ring 340 away from the side of the positive pressure partition 330 forms several positive pressure cavities with the pressed CPG carrier orifice plate.

[0064] In this embodiment, the positive pressure sealing device 300 divides the large reaction area into several independent positive pressure sealing areas through partitioned sealing. Matching orifice plates form an openable and closable positive pressure chamber, which can control the soaking of reagents in the CPG carrier within the corresponding orifice plates, ensuring that the reagents can completely fill the pores of the CPG carrier. At the same time, after the reaction is completed, the pressure can be increased to drain all unreacted reagents, ensuring no residue. This effectively solves the problems of insufficient soaking time, poor soaking effect, and incomplete cleaning in the prior art, improves the contact efficiency between reagents and CPG carrier and the sufficiency of the reaction, thereby making high-load plate synthesis reactions easier to achieve and effectively improving the quality of the synthesis reaction and the purity of the product.

[0065] The positive pressure sealing device 300 divides the large-area reaction zone into several small positive pressure sealing zones, and then performs precise pressure control on each sealing zone. By dividing the sealing zone and controlling the pressure in each zone, an openable and closable positive pressure chamber can be formed, which controls different reagents to complete the required reaction process in the orifice plate CPG and cleans up the waste liquid.

[0066] This device features a precise and stable structure, highly resistant reagent contact materials, multi-zone control enabling large-area synthetic reactions, and flexible reaction processes. The positive pressure sealing device 300, with its precise and stable structure, highly resistant reagent contact materials, multi-zone control enabling large-area synthetic reactions, and flexible reaction processes, plays a crucial role in biosynthesis, especially DNA synthesis.

[0067] Furthermore, the groove depth of the partition groove 322 is h1, and the thickness of the positive pressure partition plate 320 is H1.

[0068] The depth of the sealing groove 331 is h2, and the thickness of the positive pressure partition 330 is H2.

[0069] Reference Figure 6 and Figure 7 The lateral motion device 420 includes a module servo motor 421 fixed to the supporting crossbeam 410 and a lateral motion module 422 installed at the power output end of the module servo motor 421. The lateral motion device 420 is used to control the lateral movement of the scraping and pressing device 430. The lateral motion module 422 is used for transmission and is fixed to the module servo motor 421. This fixing method ensures the stability of the transmission process. Stable transmission can reduce the shaking and deviation during the movement, making the lateral movement of the scraping and pressing device 430 more stable, and further improving the accuracy and consistency of the cleaning operation.

[0070] The load-bearing crossbeam 410 is also equipped with a module origin sensor 423, a module limit sensor 424, and a module drag chain 425. The module origin sensor 423 and the module limit sensor 424 are set to correspond to the two extreme movement positions of the lateral movement module 422. Specifically, the module origin sensor 423 can determine the initial position of the scraping and pressing device 430, providing an accurate reference point for subsequent movement, while the module limit sensor 424 can limit the movement range of the scraping and pressing device 430 to prevent it from exceeding the safe range and avoid damage to the equipment or affecting the cleaning effect due to excessive movement. Through the cooperation of these two sensors, precise control of the lateral movement position of the scraping and pressing device 430 can be achieved. The setting of the limit sensor can send a signal in time when the scraping and pressing device 430 reaches the limit position to stop the motor operation and avoid damage to the equipment due to collisions or other reasons. This not only protects the equipment itself, but also improves the safety of the operator.

[0071] The module cable chain 425 is used for routing the module servo motor 421 and sensor cables. It can neatly store and protect the cables. During the lateral movement of the coating pressing device 430, the cables move with the movement. Without the protection of the cable chain, the cables are easily damaged by friction and pulling, leading to circuit failures. The module cable chain 425 can provide a relatively safe movement environment for the cables, extend their service life, and ensure the normal operation of the equipment. Storing the cables in the cable chain makes the cable layout more neat and orderly, facilitating inspection and maintenance by operators. When cable repair or replacement is required, the corresponding cable can be found more easily, reducing maintenance time and workload.

[0072] The scraping and pressing device 430 includes a screw motor assembly installed on the bearing beam 410 and a screw nut assembly installed on the power output end of the screw motor assembly. The screw nut assembly has the freedom of lifting and moving under the action of the screw motor assembly.

[0073] The lead screw motor assembly includes a scraping and pressing lead screw motor 431 and a lead screw motor mounting plate 432; the lead screw nut assembly includes a lead screw nut 433 that matches the lead screw in the scraping and pressing lead screw motor 431, a lead screw nut base 434 that is fixedly connected to the lead screw nut 433, and a guide slider 435 that is fixedly installed on the side of the lead screw nut base 434.

[0074] Furthermore, the coating pressing device 430 also includes a coating pressing base 436, on which a guide rail 437 is provided to match the guide slider 435. By engaging the guide slider 435 and the guide rail 437, the nut assembly can be guided during its movement, ensuring precise control of its rising or falling position.

[0075] Furthermore, the lead screw assembly is also equipped with a sensor baffle to trigger the module limit sensor 424 and the module origin sensor 423. When the lead screw assembly rises or falls to its limit position, the sensor baffle will trigger the corresponding sensor, which will transmit a signal to the control system. The control system can then stop the operation of the lead screw motor in a timely manner based on these signals, thereby achieving precise control over the lifting position of the scraping and pressing device 430. This position feedback mechanism ensures that the scraping device 400 operates within a safe range, improving the reliability and stability of the equipment.

[0076] Reference Figures 8 to 11The slit coating device 440 includes an injection head connecting plate 441 fixedly connected to the nut assembly, and a slit injection assembly fixedly mounted on the injection head connecting plate 441. The slit injection assembly includes an injection head 442 and an injection pressure plate 443 fixedly connected to the injection head. An L-shaped through-hole 4421 is formed inside the injection head and connected to a supply unit via an installed injection connector 444 to provide the required cleaning reagent for a single application. The connection between the L-shaped through-hole 4421 and the supply unit allows for precise delivery of the required cleaning reagent for a single application. This precise supply avoids reagent waste and prevents excessive reagent injection that could cause liquid overflow around the orifice plate, affecting the cleaning effect and subsequent operations. Furthermore, it can accurately supply reagent according to a preset amount for different specifications of CPG carrier orifice plates and different cleaning requirements, ensuring the standardization and consistency of the cleaning process. The L-shaped through-hole design of the 4421 helps maintain the stability of reagent flow. During the injection process, the L-shaped structure can buffer the flow rate of the reagent, reducing problems such as liquid splashing and uneven injection caused by excessive or unstable flow rate, so that the reagent can flow smoothly into the CPG carrier pores.

[0077] The injection head connecting plate 441 is also equipped with an adjusting screw 445, which, in conjunction with two fixing screws, can adjust the level of the injection head, thereby allowing for overall level adjustment of the slit injection assembly. A level injection head ensures that the reagent flows out evenly from the injection head, preventing uneven reagent distribution on the orifice plate due to tilting of the injection head. This ensures consistent reagent injection volume in each orifice, improving the consistency of the cleaning effect.

[0078] A scraper assembly is fixed to the side of the injection head away from the injection plate. The scraper assembly is used to clean the cleaning reagent on the orifice plate. Specifically, the scraper assembly includes a silicone scraper 446 and a scraper fixing plate 447. The silicone scraper 446 is disposed between the scraper fixing plate 447 and the injection head, and the silicone scraper 446 is suspended to scrape and clean the liquid coating on the surface of the CPG carrier orifice plate during the overall translation process.

[0079] The silicone scraper 446 possesses excellent flexibility and elasticity, allowing it to closely adhere to the surface of the CPG carrier plate. During overall translation, it effectively removes liquid outside the orifices from the plate. The silicone material exhibits a certain degree of resistance to reagents, preventing corrosion or damage upon contact, thus ensuring the scraper's lifespan and the stability of the coating effect.

[0080] Furthermore, the distance between the silicone scraper 446 protruding from the injection head is 0.5mm-1mm; the length of the silicone scraper 446 is greater than the length of the injection head. This design allows the scraper to scrape the liquid outside the hole into the hole during the scraping process, thereby replenishing the liquid inside the hole. This not only prevents excessive injection of cleaning reagent, but also meets the reagent amount required by the CPG carrier inside the hole, ensuring full contact between the reagent and the CPG carrier, and improving the cleaning and reaction effect.

[0081] The scraper fixing plate 447 includes a flattening part, a first edge part, and a second edge part. The first edge part and the second edge part form a first obtuse angle and a second obtuse angle with the flattening part, respectively. The first edge part and the second edge part are arranged facing the cleaning movement direction to prevent the reagent from overflowing from both sides. This design can play a blocking role during the scraping process to prevent the reagent from overflowing from both sides of the orifice plate, ensuring the cleanliness of the cleaning process, and also avoiding reagent waste and pollution to the surrounding environment.

[0082] In this embodiment, the liquid supply unit slowly pours liquid into the orifices of the CPG carrier plate through the injection head, that is, pours a preset type of cleaning reagent into the orifices. After pouring in the preset amount, the liquid supply is stopped, and then the lateral movement device is activated, which in turn drives the slit scraping device to move. The silicone scraper scrapes off the excess liquid on the CPG carrier plate. This process has two functions: first, it cleans the liquid outside the orifices of the CPG carrier plate under the scraping action of the silicone scraper; second, it scrapes the liquid outside the orifices of the plate into the orifices to replenish the liquid inside the orifices, so as to achieve full contact between the cleaning reagent and the CPG carrier inside the orifices. This setting can prevent the excessive injection of cleaning reagent and meet the reagent requirements of the CPG carrier inside the orifices. During the movement, the silicone scraper can collect the excess reagent to the edge of the stage and then collect it uniformly.

[0083] Reference Figure 9 Referring to 11, the side of the injection head is provided with a primary liquid distribution groove 4422, a transition groove 4423, a secondary liquid distribution groove 4424, and an outlet groove 4425. The primary liquid distribution groove 4422 is connected to the L-shaped through hole 4421. The length of the primary liquid distribution groove 4422 is greater than the length of the transition groove 4423, the length of the primary liquid distribution groove 4422 is greater than the length of the secondary liquid distribution groove 4424, the length of the transition groove 4423 is less than the length of the secondary liquid distribution groove 4424, and the length of the outlet groove 4425 is greater than the width of the corresponding hole area on the orifice plate.

[0084] The transition tank 4423 is located between the primary liquid separator 4422 and the secondary liquid separator 4424; the secondary liquid separator 4424 is located between the transition tank 4423 and the outlet tank 4425; the depth of the primary liquid separator 4422 is greater than the depth of the transition tank 4423, and the depth of the primary liquid separator 4422 is the same as the depth of the secondary liquid separator 4424; the depth of the outlet tank 4425 is less than the depth of the transition tank 4423; the side of the injection plate is a sealing plane, and the sealing plane and the side of the injection head form an injection flow channel.

[0085] Furthermore, the depth of the primary separation tank 4422 is 2.0mm-3.0mm; the depth of the outlet tank 4425 is 0.01mm-0.02mm.

[0086] In operation, a single type of cleaning reagent is supplied through the liquid supply unit and enters the injection channel through the L-shaped through-hole 4421. Specifically, it first enters the primary liquid distribution tank 4422, which is used to buffer part of the reagent. Under the action of gravity and liquid supply pressure, it flows to the transition tank 4423 and fills the transition tank 4423. Then it flows evenly to the secondary liquid distribution tank 4424, which is filled. Subsequently, it flows out from the outlet tank 4425. A slit-shaped rain curtain is formed at the lower edge of the slit injection component to spray the cleaning reagent into the hole, ensuring the uniformity of liquid supply.

[0087] The primary dispensing tank 4422 buffers some reagents. When the supply unit provides cleaning reagents, the primary dispensing tank 4422 acts as a buffer, preventing unstable liquid output due to sudden changes in supply pressure. It stores a certain amount of reagent, ensuring a continuous and stable supply to the transition tank 4423 during subsequent dispensing processes, thus guaranteeing the smoothness of the entire injection process. The larger length and space of the primary dispensing tank 4422 facilitate the initial dispersion of the incoming reagents. After entering the primary dispensing tank 4422 through the L-shaped through-hole 4421, the reagents diffuse within the tank, preparing for more uniform dispensing in the subsequent process. This allows the reagents to be more widely distributed before entering the transition tank 4423, reducing the problem of excessively large or small local flow rates that may be caused by centralized liquid supply.

[0088] The transition tank 4423 is positioned between the primary separating tank 4422 and the secondary separating tank 4424. Its length and depth are both less than those of the primary and secondary separating tanks 4422 and 4424, respectively. This structural feature allows the transition tank 4423 to regulate the flow rate of reagents flowing from the primary separating tank 4422. When a large amount of reagent flows into the primary separating tank 4422, the transition tank 4423, with its smaller space, can limit the flow, preventing excessive reagent from flooding into the secondary separating tank 4424 at once. This ensures that the reagent flows into the secondary separating tank 4424 more evenly. The transition tank 4423 can further mix and homogenize the reagents. During the flow of reagents from the primary separating tank 4422 into the transition tank 4423, the structural change of the tank causes a certain degree of disturbance in the reagents, which helps to eliminate potential concentration and flow rate differences, making the reagents more uniform before entering the secondary separating tank 4424.

[0089] The secondary separatory tank 4424 is longer than the transition tank 4423, and its depth is the same as that of the primary separatory tank 4422. When the reagent flows from the transition tank 4423 into the secondary separatory tank 4424, the secondary separatory tank 4424 can be fully filled and the reagent is distributed in a secondary manner. Due to its larger space and suitable depth, the reagent can diffuse more widely in the secondary separatory tank 4424, which further improves the uniformity of the reagent. This provides a good foundation for the uniform discharge from the outlet tank 4425 in the subsequent process.

[0090] The length of the outlet groove 4425 is greater than the width of the corresponding orifice area on the orifice plate, and the groove depth is relatively shallow. This design allows the reagent flowing from the secondary dispensing groove 4424 into the outlet groove 4425 to form a slit-shaped rain curtain at the lower edge of the slit injection assembly. The slit-shaped rain curtain can cover the corresponding orifice area of ​​the entire orifice plate, ensuring that the cleaning reagent can be evenly sprayed into the orifice. The shallow groove depth design helps to control the outflow speed and flow rate of the reagent, so that the reagent flows out in a more stable and uniform state, avoiding local flow rates that are too high or too low, thereby improving the uniformity of the liquid supply.

[0091] Through the multi-stage design of the primary dispensing tank 4422, transition tank 4423, secondary dispensing tank 4424, and outlet tank 4425, along with the injection flow channel formed by the injection pressure plate, the entire injection system can uniformly supply the cleaning reagent into the orifices of the CPG carrier plate. This uniform supply method ensures that the reagent dosage and concentration in each orifice are consistent, meeting the requirements for orifice plate cleaning and improving the consistency and reliability of the cleaning effect. The multi-stage dispensing tank design allows the injection system to adapt to different supply pressure and flow rate changes. When the supply pressure is unstable or the flow rate fluctuates, each dispensing tank can buffer, adjust, and distribute the reagent, ensuring that the reagent flowing out of the outlet tank 4425 is uniform and stable, enhancing the system's adaptability and stability.

[0092] Reference Figure 12 The wiping device 500 includes an L-shaped support assembly, and a fabric roll unwinding assembly, a fabric roll rewinding assembly, and a fabric roll transition assembly installed on the L-shaped support assembly. The L-shaped support assembly includes a wiping device base plate 510 and a wiping device side plate 520 that are fixedly connected. This structural design allows the fabric roll unwinding assembly, the fabric roll rewinding assembly, and the fabric roll transition assembly to be installed on it in an orderly manner, ensuring the relative positional accuracy between the components, thereby ensuring the stability and smoothness of the fabric roll during operation.

[0093] The fabric roll unwinding assembly includes an unwinding shaft 530 mounted on the side plate 520 of the wiping device and a fabric roll 540 sleeved on the unwinding shaft 530; the fabric roll winding assembly includes a fabric roll stepper motor 550 mounted on the side plate 520 of the wiping device and a winding shaft 560 mounted on the power output end of the fabric roll stepper motor 550. The fabric roll winding assembly drives the winding shaft 560 to rotate through the fabric roll stepper motor 550, realizing the automated recycling of the fabric roll 540. This automated operation not only improves work efficiency but also ensures the stable speed and tension of the fabric roll 540 recycling, avoiding the problems of non-standard operation and uneven tension that may occur when manually recycling the fabric roll 540.

[0094] The fabric roll transition assembly includes a fabric roll clamping component 570 and a fabric roll wiping shaft 580, which, along with the take-up shaft 560, form a triangular layout. The clamping component 570 exerts a lower pressure on the fabric roll 540 than the wiping shaft 580, effectively clamping the fabric roll 540 inwards. This prevents excess clean fabric from being released from the unwind shaft 530 due to inertia when the fabric roll stepper motor 550 stops after starting to collect dirty fabric. Simultaneously, the clamping polyurethane block 573 and the clamping auxiliary shaft 574 within the clamping component 570 work together to provide inward clamping force to the fabric roll 540, preventing it from veering off course during operation and ensuring the stability and accuracy of its operation.

[0095] Specifically, the fabric roll clamping component 570 includes a clamping fixing block 571, a clamping movable shaft 572, a clamping polyurethane block 573, and a clamping auxiliary shaft 574. The clamping fixing block 571 is fixedly installed on the side plate 520 of the wiping device, the clamping movable shaft 572 is installed on the clamping fixing block 571, and the clamping polyurethane block 573 is sleeved on the outside of the clamping movable shaft 572. The clamping auxiliary shaft 574 is installed on the side plate 520 of the wiping device and is arranged parallel to the clamping movable shaft 572. The combined action of the clamping auxiliary shaft 574 and the clamping polyurethane block 573 provides an inward clamping force to the fabric roll 540 passing through it, preventing the fabric roll 540 from deviating during operation.

[0096] In this embodiment, two polyurethane compression blocks 573 are provided, both of which are cylindrical in shape, to prevent damage to the fabric roll 540. The polyurethane material has good flexibility and wear resistance, so it will not scratch or damage the fabric roll 540 while applying compression force to it, thus extending the service life of the fabric roll 540.

[0097] In this embodiment, one end of the fabric roll passes sequentially through a fabric roll clamping member (i.e., through the clamping polyurethane block and the clamping auxiliary shaft), then wraps around the fabric roll wiping shaft from above and is fixed to the take-up shaft, forming a semi-enclosure of the fabric roll wiping shaft. The fabric segment located between the fabric roll wiping shaft and the fabric roll clamping member has a downward sloping angle, and the fabric segment located between the fabric roll wiping shaft and the fabric roll clamping member forms an acute angle with the fabric segment located between the fabric roll wiping shaft and the take-up shaft. The fabric segment located within a preset range of the fabric roll wiping shaft serves as the wiping surface. This layout allows the fabric roll to fully utilize the fabric surface for wiping during operation, improving the efficiency of fabric roll usage.

[0098] In wiping mode, the top of the cloth roll wiping shaft contacts the bottom of the slot coating device (i.e., the slot liquid injection assembly and silicone scraper), forming an arc-shaped wiping area. Driven by the cloth roll stepper motor, the take-up shaft rotates to rewind the cloth roll located in the wiping shaft area, replacing it with a clean cloth roll. This contact method allows the cloth roll to better conform to the bottom of the slot coating device, increasing the wiping contact area and thus improving the wiping effect, enabling more effective removal of impurities and stains from the surface of the coating device.

[0099] Specifically, when the scraping device moves to the preset working position, the wiping device cleans the scraping pressing device and the slit scraping device. This not only ensures the cleanliness of the scraping device and prevents impurities from accumulating and affecting the cleaning effect, but also reduces the frequency and workload of manual maintenance, improving the reliability and service life of the system. The automatic wiping function reduces the frequency and workload of manual maintenance. Operators no longer need to frequently clean the scraping device manually, reducing labor intensity and the risk of equipment damage due to improper operation. This helps improve the reliability and service life of the entire system and reduces equipment maintenance costs.

[0100] In this embodiment, the scraping cleaning system, the positive pressure cleaning system, and the third-party directional drive device constitute a cleaning system for DNA synthesis using CPG carrier-filled well plates. The pressure plate lifting device in the third-party directional drive device achieves precise lifting and lowering of the positive pressure cleaning system through a power component, ensuring a consistent positive pressure effect when processing well plates of different sizes and shapes, thereby improving reaction efficiency and consistency. The groove of the positive pressure partition is matched with the sealing ring to ensure the sealing of the positive pressure chamber. The multiple partition sealing pressure plates of the sealing ring further enhance the sealing effect, prevent gas leakage, and ensure the reliability and efficiency of the cleaning and reaction process. The protruding part of the sealing ring and the pressed well plate form a positive pressure chamber. This design can effectively isolate different reaction areas, prevent cross-contamination between different reactions, and improve the purity of the reaction, the accuracy of gas pressure cleaning, and the effective cleaning effect.

[0101] In this application, the pressure plate lifting device, the lateral movement device, and the scraping and pressing device all possess clearly defined power drives and degrees of freedom of movement, enabling automated operation through program control. Operators only need to set the relevant parameters, and the system can automatically complete the cleaning process, reducing the complexity and errors of manual operation. The degrees of freedom of movement of each device allow the system to be flexibly adjusted according to different orifice plate specifications and cleaning requirements during the cleaning process. For example, the scraping device can adjust the scraping range and force according to the size and shape of the orifice plate to adapt to different cleaning tasks.

[0102] The cleaning system for biochemical synthesis disclosed in this application provides several sets of positive pressure gas sources through a positive pressure gas supply system. When the positive pressure sealing device is in the positive pressure working position and presses the CPG carrier orifice plate to be cleaned to form a positive pressure chamber, the positive pressure gas source can quickly press the cleaning reagent into every corner of the orifice plate. Compared with traditional gravity or simple pressure methods, it can more efficiently ensure that the reagent and the substance to be cleaned come into full contact, accelerate the cleaning process, and improve cleaning efficiency. At the same time, the design of the positive pressure chamber allows each area to be cleaned to be cleaned in an independent positive pressure environment, avoiding mutual interference between different areas and ensuring the accuracy of cleaning. The slit scraping device in the scraping device can achieve vertical and horizontal movement under the drive of the scraping pressing device and the lateral movement device to perform scraping operation on the surface of the orifice plate, which can effectively remove stubborn impurities and residues, further improving the cleaning effect. The cleaning reagent supply system can provide different types of cleaning reagents, and can accurately select the appropriate reagent for cleaning according to different biochemical synthesis needs and the characteristics of the substance to be cleaned, ensuring the targeting and comprehensiveness of cleaning. This system breaks away from the throughput limitations of traditional column synthesizers where each syringe corresponds to one injection line. Through the cooperation of a positive pressure gas supply system and a positive pressure sealing device, it can simultaneously clean CPG carrier plates corresponding to multiple positive pressure chambers, achieving high-throughput cleaning and greatly increasing the number of samples cleaned per cycle.

[0103] In this application, the modular design of the system gives it good scalability. For example, the number of positive pressure gas source groups can be increased, the scale of the cleaning reagent supply system can be adjusted, or the number of orifice plates that can be placed on the support device can be increased according to actual needs, so as to adapt to biochemical synthesis cleaning tasks of different scales.

[0104] Traditional column synthesizers are limited by their structural principles, making it difficult to increase the throughput of a single synthesis. Usually, increasing throughput can only be achieved by increasing the number of stations. The cleaning system for biochemical synthesis disclosed in this application breaks away from this one-to-one injection method. It no longer relies on each syringe corresponding to one injection line, and can simultaneously clean more CPG carrier plates, thereby significantly increasing the throughput of a single synthesis. Moreover, unlike traditional methods, it does not lead to a significant increase in the overall size of the instrument or an overly complex tubing and liquid supply system as the throughput increases. Specifically, the positive pressure gas supply system can provide several sets of positive pressure gas sources to supply gas to multiple positive pressure chambers simultaneously, and the cleaning reagent supply system can also provide different types of cleaning reagents to meet the cleaning needs of multiple plates.

[0105] Traditional methods, when increasing throughput, result in increased overall instrument size, more tubing, and a more complex liquid supply system, which can severely impact instrument stability. The cleaning system for biochemical synthesis disclosed in this application simplifies the structure and operation of the cleaning process by employing a positive pressure gas supply system, a cleaning reagent supply system, and a unique scraping device. This reduces instability factors caused by complex tubing and multiple workstations, thereby improving instrument stability during operation and facilitating continuous synthetic production. Furthermore, the coordination between the scraping and wiping devices makes the cleaning process more orderly, reducing instability factors caused by complex structures and operations, thus enhancing instrument stability.

[0106] In this application, a positive pressure sealing device can press the CPG carrier orifice plate to be cleaned into several positive pressure chambers when in the positive pressure working position. The orifice plate is cleaned using a positive pressure air source. Compared with traditional injection cleaning, positive pressure cleaning can more effectively discharge solvent waste liquid and clean more thoroughly. The disclosed slit scraping device, driven by the lateral movement device and the scraping pressing device, can scrape and clean the orifice plate. This scraping operation can further remove impurities on the surface and inside of the orifice plate, improving the cleaning effect. The wiping device installed on the support member disclosed in this application can wipe and clean the scraping pressing device and the slit scraping device when the scraping device moves to the preset working position, ensuring the cleanliness of the scraping device and avoiding the accumulation of impurities on the scraping device, thereby further improving the accuracy and reliability of cleaning, while also reducing the workload of manual maintenance.

[0107] Secondly, this application discloses a synthesis system for DNA chip synthesis, including a central control center and a cleaning system for biochemical synthesis disclosed in the first aspect of this application, a positive pressure gas supply system, a cleaning reagent supply system, a pressure plate lifting device, and a signal connection to the central control center.

[0108] In the description of this specification, the references to terms such as "one embodiment / mode," "some embodiments / modes," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment / mode or example is included in at least one embodiment / mode or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment / mode or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments / modes or examples. Furthermore, without contradiction, those skilled in the art can combine and integrate the different embodiments / modes or examples described in this specification, as well as the features of different embodiments / modes or examples.

[0109] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0110] Those skilled in the art should understand that the above embodiments are merely for illustrating the present disclosure and are not intended to limit the scope of the disclosure. Those skilled in the art can make other changes or modifications based on the above disclosure, and these changes or modifications still fall within the scope of the present disclosure.

Claims

1. A cleaning system for biochemical synthesis, characterized in that, include: A positive pressure gas supply system is used to provide several sets of positive pressure gas sources; A cleaning reagent supply system is used to provide different types of cleaning reagents; A support device includes a support member and a support member mounted on top of the support member, the support member being connected to the support member; The pressure plate lifting device installed on the bearing member includes a power component and a pressure plate assembly installed at the power output end of the power component. The pressure plate assembly has the freedom to lift and lower along the longitudinal axis of the power output end of the power component. A positive pressure sealing device is installed below the pressure plate assembly; the positive pressure sealing device has a first initial working position and a positive pressure working position, and when the positive pressure working position is in the positive pressure working position, the positive pressure sealing device presses the CPG carrier orifice plate to be cleaned and forms a plurality of positive pressure chambers, and the plurality of positive pressure chambers are respectively connected to a plurality of groups of positive pressure air sources; The coating device includes a load-bearing crossbeam mounted on the side of the support member, and a lateral movement device, a coating pressing device, and a slit coating device mounted on the load-bearing crossbeam. The coating pressing device is mounted on the power output end of the lateral movement device and has a horizontal movement degree of freedom under the drive of the lateral movement device. The slit coating device is mounted on the coating pressing device and has a lifting degree of freedom under the drive of the coating pressing device. The wiping device installed on the support member wipes and cleans the scraping pressing device and the slit scraping device when the scraping device moves to the preset working position.

2. The cleaning system for biochemical synthesis according to claim 1, characterized in that, The support includes two sets of brackets, and the load-bearing component is a horizontal plate. The horizontal plate and the two sets of brackets form a gantry structure. The horizontal plate has a motor mounting hole and two column mounting holes; The power assembly includes a servo motor and a linear module mounted on the power output end of the servo motor, the linear module being fixed in the motor mounting hole; The pressure plate assembly includes a pusher head installed at the end of the linear module, a pusher head template installed at the end of the pusher head, and a pressure equalizing plate fixedly connected to the pusher head template; The pusher head is disposed at the center of the pusher head template; Two pressure equalizing plates are provided, and the two pressure equalizing plates are symmetrically arranged on both sides of the push head; The pusher template is also provided with two guide rods, the free ends of which pass through the two column mounting holes respectively; the longitudinal center axis of the guide rods is parallel to the longitudinal center axis of the linear module.

3. The cleaning system for biochemical synthesis according to claim 2, characterized in that, The positive pressure sealing device includes a positive pressure cover plate, a positive pressure partition plate, a positive pressure partition plate, and a sealing ring arranged in sequence; the top of the positive pressure cover plate is fixedly connected to the two equalizing plates. The positive pressure cover plate is provided with several first air supply holes for installing several pipe joints that are respectively connected to several groups of positive pressure air sources. The positive pressure partition plate is provided with a plurality of second air supply holes, and the side of the positive pressure partition plate away from the positive pressure cover plate is provided with a plurality of partition grooves that are respectively connected to the plurality of second air supply holes. The positive pressure partition has a sealing groove on its first side, and the area of ​​the sealing groove is greater than the sum of the areas of the partitioned grooves; the sealing groove has a plurality of pressure-dividing through holes. A limiting groove is provided on the second side of the positive pressure partition, and the limiting groove is correspondingly provided with the sealing groove; wherein, the second side of the positive pressure partition is the side away from the positive pressure partition plate; the limiting groove has a plurality of protruding structures, and each protruding structure is correspondingly provided with each partition groove.

4. The cleaning system for biochemical synthesis according to claim 3, characterized in that, The groove depth of the partitioned recess is h1, and the thickness of the positive pressure partition plate is H1. The depth of the sealing groove is h2, and the thickness of the positive pressure partition is H2.

5. The cleaning system for biochemical synthesis according to claim 3, characterized in that, The sealing ring is embedded in the limiting groove. The sealing ring has several sub-rings, each of which surrounds each of the protruding structures. The side of the sealing ring away from the positive pressure partition protrudes from the positive pressure partition. The protruding portion of the sealing ring away from the side of the positive pressure partition forms several positive pressure cavities with the pressed CPG carrier perforated plate.

6. The cleaning system for biochemical synthesis according to claim 1, characterized in that, The lateral motion device includes a module servo motor fixed to the bearing beam and a lateral motion module installed at the power output end of the module servo motor. The load-bearing crossbeam is also equipped with a module origin sensor, a module limit sensor, and a module drag chain. The module origin sensor and the module limit sensor are set to correspond to the two extreme movement positions of the transverse movement module. The scraping and pressing device includes a lead screw motor assembly installed on the supporting crossbeam and a lead screw nut assembly installed on the power output end of the lead screw motor assembly. The lead screw nut assembly has the freedom of lifting and moving under the action of the lead screw motor assembly.

7. The cleaning system for biochemical synthesis according to claim 6, characterized in that, The slit coating device includes an injection head connecting plate fixedly connected to the nut assembly, and a slit injection assembly fixedly disposed on the injection head connecting plate. The slit injection assembly includes an injection head and an injection pressure plate fixedly connected to the injection head. An L-shaped through hole is provided inside the injection head, and the L-shaped through hole is connected to the liquid supply unit to provide the cleaning reagent required for a single use. The side of the injection head is provided with a primary liquid distribution groove, a transition groove, a secondary liquid distribution groove, and an outlet groove. The primary liquid distribution groove is connected to the L-shaped through hole. The length of the primary liquid distribution groove is greater than the length of the transition groove, the length of the primary liquid distribution groove is greater than the length of the secondary liquid distribution groove, the length of the transition groove is less than the length of the secondary liquid distribution groove, and the length of the outlet groove is greater than the width of the corresponding hole area on the orifice plate. The transition tank is disposed between the primary liquid separator and the secondary liquid separator; the secondary liquid separator is disposed between the transition tank and the outlet tank; the depth of the primary liquid separator is greater than the depth of the transition tank, and the depth of the primary liquid separator is the same as the depth of the secondary liquid separator; the depth of the outlet tank is less than the depth of the transition tank. The side of the injection plate is a sealing plane, and the sealing plane and the side of the injection head form an injection channel.

8. The cleaning system for biochemical synthesis according to claim 7, characterized in that, A scraper assembly is fixed to the side of the injection head away from the injection pressure plate. The scraper assembly is used to clean the cleaning reagent on the orifice plate. The scraper assembly includes a silicone scraper and a scraper fixing plate. The silicone scraper is disposed between the scraper fixing plate and the injection head, and the silicone scraper is suspended. The distance by which the silicone scraper protrudes from the injection head is 0.5mm-1mm; The length of the silicone scraper is greater than the length of the injection head.

9. The cleaning system for biochemical synthesis according to claim 1, characterized in that, The wiping device includes an L-shaped support assembly, and a fabric roll unwinding assembly, a fabric roll winding assembly, and a fabric roll transition assembly installed on the L-shaped support assembly; The L-shaped support assembly includes a base plate for the wiping device and a side plate for the wiping device; The cloth roll unwinding assembly includes an unwinding shaft installed on the side plate of the wiping device and a cloth roll sleeved on the unwinding shaft; The fabric roll take-up assembly includes a fabric roll stepper motor mounted on the side plate of the wiping device and a take-up shaft mounted on the power output end of the fabric roll stepper motor. The fabric roll transition assembly includes a fabric roll clamping component and a fabric roll wiping shaft, wherein the fabric roll clamping component, the fabric roll wiping shaft, and the winding shaft form a triangular layout; the height at which the fabric roll clamping component acts on the fabric roll is lower than the height at which the fabric roll wiping shaft acts on the fabric roll. One end of the cloth roll is fixed to the take-up shaft after passing through the cloth roll clamping member and the cloth roll wiping shaft in sequence.

10. A synthesis system for synthesizing DNA chips, characterized in that, It includes a central control center and a cleaning system for biochemical synthesis as described in any one of claims 1-9, wherein the positive pressure gas supply system, the cleaning reagent supply system, and the pressure plate lifting device are signal-connected to the central control center.

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