Mass spectrometer and ion implantation apparatus

Abstract

The application discloses a mass analyzer and an ion implantation device. The mass analyzer comprises a plate body assembly, which comprises at least two adjacent plate bodies arranged at intervals at positions at the end of a vacuum channel, and at least one plate body is movably arranged in the vacuum channel so that the size and / or position of the interval between the adjacent plate bodies can be adjusted; and two column body assemblies are arranged on the respective plate bodies and are rotationally matched with the corresponding plate bodies, and the interval between the adjacent column body assemblies serves as an analysis slit. The embodiment can adjust the size and / or position of the analysis slit by adjusting the interval between the adjacent plate bodies, thereby meeting different mass analysis requirements. Moreover, the column body assemblies are rotationally arranged on the corresponding plate bodies, so that the degree of impact of each position of the peripheral wall of the column body assemblies by an ion beam is uniform, thereby facilitating reduction of the maintenance cost and frequency of the plate body assembly.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing, and in particular to a quality analyzer and an ion implantation device. Background Technology

[0002] Ion implanters are key equipment in the front-end processes of integrated circuit manufacturing and are widely used in semiconductor surface doping processes.

[0003] In an ion implanter, the ions emitted by the ion source typically include not only the desired target ions but also unwanted impurity ions. To remove these impurity ions, a mass analyzer is placed after the extraction electrode. Ions with different mass-to-charge ratios deflect differently within the mass analyzer; only target ions can pass through the analytical slit at the end of the mass analyzer, while impurity ions remain trapped inside. Therefore, the mass analyzer enables the screening of target ions.

[0004] However, current quality analyzers still need improvement. Utility Model Content

[0005] The problem solved by this utility model embodiment is to provide a mass analyzer and ion implantation device to meet different performance requirements for the mass analyzer.

[0006] To address the aforementioned problems, this utility model provides a quality analyzer, comprising: a cavity having a vacuum channel for ion beam flow; a plate assembly comprising at least two adjacent plates disposed at the ends of the vacuum channel and spaced apart, at least one plate being movably mounted within the vacuum channel such that the size of the gap between adjacent plates is adjustable, or the position of the gap between adjacent plates is adjustable, or both the size and position of the gap between adjacent plates are adjustable; and two column assemblies, respectively disposed on each of the plates and rotatably engaged with the corresponding plates, the gap between adjacent column assemblies serving as an analytical slit; each column assembly comprising: a column rotatably disposed on the plate; and a first driving mechanism disposed on the plate and connected to the column, the first driving mechanism being used to drive the column to rotate.

[0007] Optionally, in two adjacent plates spaced apart, both plates are movably connected to the cavity.

[0008] Optionally, the plate movably connected to the cavity is a movable plate, which is rotatably connected to the cavity, or the movable plate is movably connected to the cavity.

[0009] Optionally, when the movable plate is rotatably connected to the cavity, the movable plate includes a rotating portion rotatably connected to the cavity; or, the movable plate includes a fixed portion fixedly connected to the cavity and a rotating portion rotatably connected to the fixed portion.

[0010] Optionally, the rotating portion of the movable plate has a constraint end away from the analysis slit, and the remaining rotating portion rotates around the constraint end.

[0011] Optionally, the plate assembly further includes: a second drive mechanism, mounted on the cavity and connected to the rotating part of the movable plate, the second drive mechanism being used to drive the rotating part of the movable plate to rotate.

[0012] Optionally, when there are two movable plates, the rotating parts of the two movable plates rotate synchronously through the same second drive mechanism, or the rotating parts of the two movable plates rotate independently through different second drive mechanisms.

[0013] Optionally, when the movable plate is movably connected to the cavity, the movable plate includes a first movable portion that movably engages with the cavity; or, the movable plate includes a fixed portion that is fixedly connected to the cavity, and a second movable portion that movably engages with the fixed portion. When the movable plate includes a first movable portion that movably engages with the cavity, the end of the first movable portion away from the analytical slit is movably mounted in the inner wall of the vacuum channel of the cavity, so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable. When the movable plate includes a fixed portion that is fixedly connected to the cavity, and a second movable portion that movably engages with the fixed portion, the end of the fixed portion away from the analytical slit is fixedly connected to the inner wall of the vacuum channel of the cavity, and the second movable portion moves in the direction of the line connecting the fixed portion and the second movable portion, so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

[0014] Optionally, when the end of the first movable portion away from the analysis slit is movably installed in the inner wall of the vacuum channel of the cavity, the inner wall of the vacuum channel has a receiving hole for accommodating one end of the first movable portion; one end of the first movable portion is movably disposed in the receiving hole so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

[0015] Optionally, the receiving hole is a blind hole.

[0016] Optionally, the plate assembly further includes: a third drive mechanism, mounted on the cavity and connected to the first moving part or the second moving part, the third drive mechanism being used to drive the first moving part or the second moving part to move, so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

[0017] Optionally, when there are two movable plates, the two movable plates move synchronously through the same third drive mechanism, or the two movable plates move independently through different third drive mechanisms.

[0018] Optionally, the plate is made of a non-metallic material, or the surface of the plate is covered with a first non-metallic protective layer.

[0019] Optionally, the non-metallic plate may include a graphite plate, a silicon plate, or a ceramic plate; the first non-metallic protective layer may include a graphite protective layer, a silicon protective layer, or a ceramic protective layer.

[0020] Optionally, the plate has an end near the analytical slit; the column is rotatably mounted on the end of the plate.

[0021] Optionally, the column is made of a non-metallic material, or the surface of the column is covered with a second non-metallic protective layer.

[0022] Optionally, the non-metallic column includes a graphite column, a silicon column, or a ceramic column; the second non-metallic protective layer includes a graphite protective layer, a silicon protective layer, or a ceramic protective layer.

[0023] Accordingly, this utility model embodiment also provides an ion implantation device, including: an ion source; an extraction electrode, the extraction electrode being used to extract an ion beam from the ion source; and a quality analyzer, located on the side of the extraction electrode facing away from the ion source, for receiving the ion beam extracted by the extraction electrode.

[0024] Compared with the prior art, the technical solution of this utility model embodiment has the following advantages:

[0025] The quality analyzer provided in this embodiment includes a plate assembly. The plate assembly includes at least two adjacent plates disposed at the end of the vacuum channel and spaced apart. At least one plate is movably installed in the vacuum channel so that the size of the gap between the adjacent plates is adjustable, or the position of the gap between the adjacent plates is adjustable, or both the size and position of the gap between the adjacent plates are adjustable. Two column assemblies are respectively disposed on each of the plates, and the two column assemblies are rotatably engaged with the corresponding plates. The gap between the adjacent column assemblies serves as an analytical slit. Since at least one of the plates is movably installed within the vacuum channel, the size of the analytical slit can be adjusted by changing the spacing between adjacent plates, thereby increasing the size of the analytical slit and allowing more target ions to pass through, thus improving the transmission efficiency of the ion beam. Alternatively, adjusting the size of the analytical slit can reduce the probability of ions with mass-to-charge ratios close to the target ions passing through the analytical slit, thereby improving the resolution of the mass analyzer. Furthermore, adjusting the spacing between adjacent plates can adjust the position of the analytical slit, enabling the mass analyzer to filter ions with different mass-to-charge ratios, thus adjusting the filtering range of the mass analyzer. Furthermore, the two column assemblies are respectively mounted on each of the plates and rotate with the corresponding plates, so that the degree of impact of the ion beam on each position of the outer peripheral wall of the column assembly is more consistent. Compared with the scheme where the ion beam near the analysis slit only impacts the fixed positions of the components on both sides of the analysis slit, the replacement cycle of the column assembly in this scheme is longer, which helps to reduce the maintenance cost and maintenance frequency of the column assembly, and thus helps to reduce the cost of the ion implantation process. Attached Figure Description

[0026] Figure 1 A top view of the positional relationship between the mass analyzer, the lead-in power supply, and the ion source in the first embodiment of this utility model;

[0027] Figure 2 This is a magnified view of a portion of region A in the image;

[0028] Figure 3 This is a schematic diagram of the plate assembly and column assembly of the second embodiment of the present invention in a vacuum channel. Detailed Implementation

[0029] In existing technologies, the size of the analysis slit in a mass analyzer is typically fixed. This can lead to a limited number of target ions passing through the slit per unit time when high ion beam transmission efficiency is required, making it difficult to meet the demands for high ion beam transmission efficiency. Furthermore, when high resolution is required, ions with similar charge-to-mass ratios have similar turning radii, making it difficult to completely separate impurity ions from target ions through a fixed-size analysis slit. Moreover, the position of the analysis slit is usually fixed, which can limit the mass range of the mass analyzer.

[0030] To address the aforementioned technical problems, this utility model provides a quality analyzer, comprising: a cavity having a vacuum channel for ion beam flow; a plate assembly comprising at least two adjacent plates disposed at the ends of the vacuum channel and spaced apart, at least one plate being movably mounted within the vacuum channel such that the size of the gap between adjacent plates is adjustable, or the position of the gap between adjacent plates is adjustable, or both the size and position of the gap between adjacent plates are adjustable; and two column assemblies, respectively disposed on each of the plates and rotatably engaged with the corresponding plates, the gap between adjacent column assemblies serving as an analytical slit.

[0031] The solution disclosed in this utility model embodiment includes a plate assembly, which includes at least two adjacent plates disposed at the end of the vacuum channel and spaced apart. At least one of the plates is movably installed in the vacuum channel so that the size of the gap between the adjacent plates is adjustable, or the position of the gap between the adjacent plates is adjustable, or both the size and position of the gap between the adjacent plates are adjustable. Two column assemblies are respectively disposed on each of the plates, and the two column assemblies are rotatably engaged with the corresponding plates. The gap between the adjacent column assemblies serves as an analysis slit. Since at least one of the plates is movably installed within the vacuum channel, the size of the analytical slit can be adjusted by changing the spacing between adjacent plates, thereby increasing the size of the analytical slit and allowing more target ions to pass through, thus improving the transmission efficiency of the ion beam. Alternatively, adjusting the size of the analytical slit can reduce the probability of ions with mass-to-charge ratios close to the target ions passing through the analytical slit, thereby improving the resolution of the mass analyzer. Furthermore, adjusting the spacing between adjacent plates can adjust the position of the analytical slit, enabling the mass analyzer to filter ions with different mass-to-charge ratios, thus adjusting the filtering range of the mass analyzer. Furthermore, the two column assemblies are respectively mounted on each of the plates and rotate with the corresponding plates, so that the degree of impact of the ion beam on each position of the outer peripheral wall of the column assembly is more consistent. Compared with the scheme where the ion beam near the analysis slit only impacts the fixed positions of the components on both sides of the analysis slit, the replacement cycle of the column assembly in this scheme is longer, which helps to reduce the maintenance cost and maintenance frequency of the column assembly, and thus helps to reduce the cost of the ion implantation process.

[0032] To make the above-mentioned objectives, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0033] Figure 1 A top view schematic diagram of the positional relationship between the mass analyzer, the power supply, and the ion source in the first embodiment of this utility model. Figure 2 This is a magnified view of a portion of region A in the image.

[0034] refer to Figures 1 to 2In this embodiment, the mass analyzer 30 includes: a cavity 100 having a vacuum channel 101 for ion beam flow; a plate assembly 110 including at least two adjacent plates 111 disposed at the end of the vacuum channel 101 and spaced apart, at least one plate 111 being movably mounted in the vacuum channel 101 so that the size of the gap between adjacent plates 111 is adjustable, or the size and position of the gap between adjacent plates 111 are adjustable; and two column assemblies 130 respectively disposed on each of the plates 111 and rotatably engaged with the corresponding plates 111, the gap between adjacent column assemblies 130 serving as an analytical slit 115.

[0035] In this embodiment, the quality analyzer 30 further includes an electromagnet structure 140, which is disposed on the outer wall of the cavity 100.

[0036] The electromagnet structure 140 is used to generate a specific magnetic field within the vacuum channel 101 to ensure that the target ions in the ion beam can be deflected to a specified direction.

[0037] The analytical slit 115 is used to allow target ions to pass through, thereby screening out the target ions.

[0038] Since at least one of the plates 111 is movably installed within the vacuum channel 101, the size of the analytical slit 115 can be adjusted by changing the spacing between adjacent plates 111, thereby increasing the size of the analytical slit 115 and allowing more target ions to pass through it, thus improving the transmission efficiency of the ion beam. Alternatively, adjusting the size of the analytical slit 115 can reduce its size, thereby decreasing the probability of ions with mass-to-charge ratios close to the target ions passing through the analytical slit 115, thus improving the resolution of the mass analyzer 30. Furthermore, adjusting the spacing between adjacent plates can also adjust the size and position of the analytical slit 115, allowing the mass analyzer 30 to filter ions with different mass-to-charge ratios while adjusting resolution and transmission efficiency, thus improving the filtering range of the mass analyzer 30.

[0039] The size of the analysis slit 115 refers to the size of the interval between adjacent column assemblies 130.

[0040] In this embodiment, the plate 111 has a blocking surface (not shown) for facing the ion beam. When the plate 111 is in the reset state, the blocking surface is perpendicular to the path of the ion beam.

[0041] The reset state refers to the position of the plate 111, which is movably installed in the vacuum channel 101, when it has not been displaced.

[0042] In this embodiment, the plate 111 has a plate end 113 near the analysis slit, that is, the side of the plate 111 away from the inner wall of the vacuum channel 101 of the cavity 100 is the plate end 113.

[0043] In this embodiment, the plate 111 is made of a non-metallic material, which helps to reduce the probability of metal contamination caused by ion beam impact on the plate 111. In other embodiments, the surface of the plate is covered with a first non-metallic protective layer.

[0044] Specifically, the non-metallic plate 111 includes a graphite plate, a silicon plate, or a ceramic plate.

[0045] Graphite, elemental silicon, and ceramics all possess excellent high-temperature resistance. Selecting graphite, elemental silicon, or ceramics as the material for the plate 111 is beneficial for improving its service life. For reasons similar to those regarding the non-metallic plate 111 comprising a graphite plate, a silicon plate, or a ceramic plate, in other embodiments, the first non-metallic protective layer comprises a graphite protective layer, an elemental silicon protective layer, or a ceramic protective layer.

[0046] In this embodiment, in two adjacent plates 111 spaced apart, both plates 111 are movably connected to the cavity 100, which facilitates increasing the adjustable range of the size of the analysis slit 115, thereby helping to further meet the requirements of different performance characteristics (e.g., resolution, transmission efficiency) of the quality analyzer 30.

[0047] In this embodiment, the plate 111, which is movably connected to the cavity 100, serves as the movable plate 112.

[0048] Specifically, such as Figure 2 As shown, the movable plate 112 is rotatably connected to the cavity 100, such that the size of the analysis slit 115 is determined by the rotation angle of the movable plate 112.

[0049] in, Figure 2 The direction of the blue arrow in the middle indicates the rotation direction of the movable plate 112.

[0050] It should be noted that when both plates 111 are rotatably connected to the cavity 100, the rotation angle of each movable plate 112 can be independently adjusted, thereby enabling fine-tuning of the position of the analysis slit 115.

[0051] In this embodiment, when the movable plate 112 is rotatably connected to the cavity 100, the movable plate 112 includes a rotating portion 1121 rotatably connected to the cavity 100, which simplifies the structure of the movable plate 112 and helps to reduce the manufacturing cost of the movable plate 112.

[0052] In other embodiments, when the movable plate is rotatably connected to the cavity, the movable plate includes a fixed portion fixedly connected to the cavity and a rotating portion rotatably connected to the fixed portion.

[0053] In this embodiment, the rotating portion 1121 of the movable plate 112 has a constraint end 1122 on the side away from the analysis slit 115, and the remaining rotating portion 1121 rotates around the constraint end 1122.

[0054] The end of the movable plate 112 away from the analysis slit 115 is the constraint end 1122, which is beneficial to allow the rotating part 1121 to obtain a larger displacement distance on the side closer to the analysis slit 115 when the rotating part 1121 rotates at a small angle, thereby increasing the adjustable range of the size of the analysis slit 115.

[0055] In this embodiment, the plate assembly 110 further includes a second driving mechanism, which is mounted on the cavity 100 and connected to the rotating portion 1121 of the movable plate 112. The second driving mechanism is used to drive the rotating portion 1121 of the movable plate 112 to rotate.

[0056] The second driving mechanism drives the rotating part 1121 of the movable plate 112 to rotate, which helps to reduce the difficulty of making the rotating part 1121 rotate.

[0057] It should be noted that the second drive mechanism includes a first rotating shaft (not shown), which is connected to the rotating part 1121 of the movable plate 112.

[0058] As an example, when there are two movable plates 112, the rotating parts 1121 of the two movable plates 112 rotate synchronously through the same second drive mechanism, which makes it easier for the two movable plates 112 to rotate synchronously, thereby simplifying the complexity of adjusting the size of the analysis slit 115 and correspondingly reducing the difficulty of adjusting the size of the analysis slit 115.

[0059] Specifically, the first driving component 116 includes: a first power source (not shown); a first worm gear (not shown), which is drivenly connected to the first power source. The first power source can be a motor or other components that can improve power; two first gears (not shown), which are respectively disposed on both sides of the first worm gear and drivenly connected to the first worm gear; two second gears (not shown), which are respectively disposed on the side of the corresponding first gear away from the first worm gear and drivenly connected to the corresponding first gear; and two first rotating shafts, which respectively pass through the corresponding second gear. One end of the first rotating shaft is drivenly connected to the corresponding second gear, and the other end of the first rotating shaft is drivenly connected to the corresponding rotating part 1121.

[0060] In other embodiments, the first drive element may also include other components capable of enabling the two movable plates to rotate synchronously.

[0061] As another example, when there are two movable plates 112, the rotating parts 1121 of the two movable plates 112 rotate independently through different second drive mechanisms, which facilitates independent adjustment of the rotation angle of each movable plate 112, thereby facilitating fine-tuning of the position of the analysis slit 115.

[0062] Moreover, the rotating parts 1121 of the two movable plates 112 can rotate independently through different second drive mechanisms. Even if one of the second drive mechanisms fails to work properly, the size of the analysis slit 115 can still be adjusted through the other second drive mechanism.

[0063] Two column assemblies 130 are respectively disposed on each of the plates 111 and are rotatably engaged with the corresponding plates 111. This facilitates timely rotation of the column assemblies 130, ensuring that the degree of impact of the ion beam on various positions of the outer peripheral wall of the column assembly 130 is more consistent. Compared with the scheme where the ion beam near the analysis slit only impacts the fixed positions of the components on both sides of the analysis slit 115, the replacement cycle of the column assembly 130 in this embodiment is longer, which helps to reduce the maintenance cost and frequency of the column assembly 130, and thus helps to reduce the cost of the ion implantation process.

[0064] in, Figure 2 The direction of the black dashed arrow in the middle indicates the rotation direction of the column assembly 130.

[0065] In this embodiment, the column assembly includes: a column 131, rotatably mounted on the plate 111; and a first driving mechanism 132, mounted on the plate 111 and connected to the column 131, wherein the first driving mechanism 132 is used to drive the column 131 to rotate.

[0066] Driving the column 131 via the first driving mechanism 132 helps reduce the difficulty of rotating the column assembly 130 with the plate 111.

[0067] The first drive mechanism 132 can be installed on the side of the plate 111 away from the inside of the cavity 100. Specifically, it can include a motor and a worm gear structure. The worm of the worm gear structure is coaxially and fixedly connected to the column 131. The worm of the worm gear mechanism is coaxially connected to the motor. The motor is fixed on the side of the plate away from the inside of the cavity. Through the drive of the motor and the transmission of the worm gear structure, the column 131 is driven to rotate.

[0068] In this embodiment, the column 131 is rotatably mounted on the end 113 of the plate. The column 131 can protect the end 113 of the plate, thereby reducing the probability of damage to the end 113 of the plate.

[0069] In this embodiment, the column 131 is made of a non-metallic material, which helps to reduce the probability of metal contamination caused by ion beam impact on the column 131. In other embodiments, the surface of the column 131 is covered with a second non-metallic protective layer.

[0070] Specifically, the non-metallic column 131 includes a graphite column, a silicon column, or a ceramic column.

[0071] Graphite, elemental silicon, and ceramics all possess excellent high-temperature resistance. Using graphite, elemental silicon, or ceramics as the material for the pillar 131 is beneficial for improving its service life. For reasons similar to those regarding the non-metallic pillar 131 including graphite, elemental silicon, or ceramic pillars, in other embodiments, the second non-metallic protective layer includes a graphite protective layer, an elemental silicon protective layer, or a ceramic protective layer.

[0072] Figure 3 This is a schematic diagram of the plate assembly and column assembly of the second embodiment of the present invention in a vacuum channel.

[0073] The similarities between the second embodiment and the previous embodiment will not be repeated here. The difference between the second embodiment and the previous embodiment is that at least one of the plates 211 is movably installed in the vacuum channel 201, so that the size of the gap between adjacent plates 211 is adjustable, or the position of the gap between adjacent plates 211 is adjustable, or the size and position of the gap between adjacent plates 211 are adjustable.

[0074] Therefore, by adjusting the spacing between adjacent plates 211, the size of the analytical slit 215 can be adjusted to increase its size, allowing more target ions to pass through and thus improving the transmission efficiency of the ion beam. Alternatively, adjusting the size of the analytical slit 215 can reduce its size, thereby decreasing the probability of ions with mass-to-charge ratios close to the target ions passing through the analytical slit 215 and thus improving the resolution of the mass analyzer. Furthermore, by adjusting the spacing between adjacent plates 211, the position of the analytical slit 215 can be adjusted, enabling the mass analyzer to filter ions with different mass-to-charge ratios, thus adjusting the filtering range of the mass analyzer.

[0075] In this embodiment, as Figure 3 As shown, the movable plate 212 is movably connected to the cavity 100, such that the size of the analysis slit 215 is determined by the displacement distance of the movable plate 212.

[0076] in, Figure 3 The blue arrow in the middle indicates the direction of movement of the movable plate 212, and the black dashed arrow indicates the direction of rotation of the column assembly 230.

[0077] It should be noted that when both plates 211 are movably connected to the cavity 200, the displacement distance of each movable plate 212 can be independently adjusted, thereby adjusting the position of the analytical slit 215 or adjusting the size and position of the analytical slit 215.

[0078] In this embodiment, when the movable plate 212 is movably connected to the cavity 200, the movable plate 212 includes a first movable portion 2121 that movably engages with the cavity 200, which simplifies the structure of the movable plate 212 and helps to reduce the manufacturing cost of the movable plate 212.

[0079] Specifically, when the movable plate 212 includes a first movable portion 2121 that moves in conjunction with the cavity 200, one end of the first movable portion 2121 away from the analysis slit 215 is movably mounted in the inner wall of the vacuum channel 201 of the cavity 200, so that the portion of the movable plate 212 protruding from the inner wall of the vacuum channel 201 is retractable, that is, the size of the portion of the movable plate 212 protruding from the inner wall of the vacuum channel 201 is adjustable.

[0080] The first movable part 2121 is movably mounted in the inner wall of the vacuum channel 201 of the cavity 200 at one end away from the analysis slit 215, so that the size of the portion of the movable plate 212 protruding from the inner wall of the vacuum channel 201 can be adjusted.

[0081] In other embodiments, when the movable plate is movably connected to the cavity, the movable plate includes a fixed portion fixedly connected to the cavity and a second movable portion movably engaged with the fixed portion. Accordingly, when the movable plate includes a fixed portion fixedly connected to the cavity and a second movable portion movably engaged with the fixed portion, the end of the fixed portion away from the analytical slit is fixedly connected to the inner wall of the vacuum channel of the cavity, and the second movable portion moves in the direction of the line connecting the fixed portion and the second movable portion, so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

[0082] As an example, when the end of the first movable portion 2121 away from the analysis slit 215 is movably installed in the inner wall of the vacuum channel 201 of the cavity 200, the inner wall of the vacuum channel 201 has a receiving hole 202 for accommodating one end of the first movable portion 2121; one end of the first movable portion 2121 is movably disposed in the receiving hole 202 so that the portion of the movable plate 212 protruding from the inner wall of the vacuum channel 201 is telescopic, that is, by adjusting the length of the portion of the first movable portion 2121 disposed in the inner wall of the vacuum channel 201, the size of the portion of the movable plate 212 protruding from the inner wall of the vacuum channel 201 is adjusted, thereby helping to reduce the difficulty of moving the end of the first movable portion 2121 away from the analysis slit 215 in the inner wall of the vacuum channel 201 of the cavity 200.

[0083] Specifically, the receiving hole 202 is a blind hole, which prevents ions from escaping to the outside of the cavity 200 through the receiving hole 202 during the flow process.

[0084] In this embodiment, when the movable plate 212 is movably connected to the vacuum channel 201, in two adjacent plates 211 spaced apart, both plates 211 are movably connected to the vacuum channel 201, that is, both plates 211 are rotatably connected to the vacuum channel 201, which can adjust the position of the analytical slit 215, thereby enabling the mass analyzer to screen out ions with different mass-to-charge ratios.

[0085] In this embodiment, the plate assembly 210 further includes a third driving mechanism (not shown), which is mounted on the cavity 200 and connected to the first moving part 2121. The third driving mechanism is used to drive the first moving part 2121 to move so that the portion of the movable plate 212 protruding from the inner wall of the vacuum channel 201 is retractable.

[0086] Driving the first moving part 2121 to move by the third driving mechanism helps to reduce the difficulty of moving the first moving part 2121.

[0087] Since one end of the first moving part 2121 is movably disposed in the receiving hole 202, the third driving mechanism is used to drive one end of the first moving part 2121 to move in the receiving hole 202.

[0088] In other embodiments, the third drive mechanism is mounted on the cavity and connected to the second moving part, the third drive mechanism being used to drive the second moving part to move so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

[0089] Since the fixed part is fixedly connected to the inner wall of the vacuum channel of the cavity at one end away from the analysis slit, the second moving part moves in the direction of the line connecting the fixed part and the second moving part; correspondingly, the third driving mechanism is used to drive the second moving part to move so that the size of the overlapping part between the second moving part and the fixed part changes, thereby making the portion of the movable plate protruding from the inner wall of the vacuum channel retractable.

[0090] As an example, when there are two movable plates 212, the two movable plates 212 can move synchronously through the same third drive mechanism, which helps to simplify the complexity of adjusting the size of the analysis slit 215 and correspondingly reduces the difficulty of adjusting the size of the analysis slit 215.

[0091] Specifically, the second drive mechanism includes: a third power source; a third gear (not shown), which is drivenly connected to the third power source (e.g., the third power source includes a motor, and the third gear is drivenly connected to the drive shaft of the motor); two racks, disposed on both sides of the third gear and drivenly connected to the third gear respectively; and two connecting members, respectively disposed between the corresponding rack and the corresponding movable plate 212, with one end of the connecting member fixedly connected to the corresponding rack and the other end of the connecting member fixedly connected to the corresponding movable plate 212.

[0092] In other embodiments, the second drive mechanism may also include other components capable of enabling synchronous movement of the two movable plates.

[0093] As another example, when there are two movable plates 212, the two movable plates 212 can move independently through different third drive mechanisms, which facilitates the independent adjustment of the displacement distance of each movable plate 212, thereby facilitating the adjustment of the position of the analysis slit 215 or the adjustment of the size and position of the analysis slit 215.

[0094] Specifically, the second drive mechanism includes two third power sources, each of which is connected to a corresponding movable plate 212. The third power source can directly drive the corresponding movable plate 212 to move (e.g., the third power source includes a linear motor), or it can indirectly drive the movable plate 212 to move through other components disposed between the third power source and the corresponding movable plate 212.

[0095] Accordingly, this utility model also provides an injection device.

[0096] Reference Figures 1 to 2 The ion beam generating device includes: an ion source 10; an extraction electrode 20, the extraction electrode 20 being used to extract an ion beam from the ion source 10; and a mass analyzer 30, as described in this embodiment of the invention, located on the side of the extraction electrode 20 facing away from the ion source 10, for receiving the ion beam extracted by the extraction electrode 20.

[0097] Since at least one of the plates 111 is movably installed within the vacuum channel 101, the size of the analytical slit 115 can be adjusted by changing the spacing between adjacent plates 111, thereby increasing the size of the analytical slit 115 and allowing more target ions to pass through, thus improving the transmission efficiency of the ion beam. Alternatively, adjusting the size of the analytical slit 115 can reduce its size, thereby decreasing the probability of ions with mass-to-charge ratios close to the target ions passing through the analytical slit 115, thus improving the resolution of the mass analyzer 30. Furthermore, the position of the analytical slit 115 can be adjusted by changing the spacing between adjacent plates 111, enabling the mass analyzer 30 to filter ions with different mass-to-charge ratios, thereby adjusting the filtering range of the mass analyzer 30. Furthermore, the two column assemblies 130 are respectively mounted on each of the plates 111 and rotate in conjunction with the corresponding plates 111, which facilitates timely rotation of the column assemblies 130. This ensures that the degree of impact of the ion beam on various positions of the outer peripheral wall of the column assembly 130 is more consistent. Compared with the scheme where the ion beam near the analysis slit only impacts the fixed positions of the components on both sides of the analysis slit, the replacement cycle of the column assembly 130 in this scheme is longer, which helps to reduce the maintenance cost and maintenance frequency of the column assembly 130, and thus helps to reduce the cost of the ion implantation process.

[0098] For a detailed description of the quality analyzer 30, please refer to the detailed description of the foregoing embodiments, which will not be repeated in this embodiment.

[0099] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A quality analyzer, characterized in that, include: A cavity having a vacuum channel for the flow of an ion beam; A plate assembly, the plate assembly comprising at least two adjacent plates disposed at a distance from the end of the vacuum channel, at least one of the plates being movably mounted within the vacuum channel such that the size of the gap between the adjacent plates is adjustable, or the position of the gap between the adjacent plates is adjustable, or both the size and position of the gap between the adjacent plates are adjustable. Two column assemblies are respectively disposed on each of the plates and are rotatably engaged with the corresponding plates. The interval between adjacent column assemblies serves as an analysis slit. The column assembly includes: a column, which is rotatably mounted on the plate; A first driving mechanism is disposed on the plate and connected to the column. The first driving mechanism is used to drive the column to rotate.

2. The quality analyzer as described in claim 1, characterized in that, In two adjacent plates spaced apart, each plate is movably connected to the cavity.

3. The quality analyzer as described in claim 1 or 2, characterized in that, The plate that is movably connected to the cavity is a movable plate, which is rotatably connected to the cavity, or the movable plate is movably connected to the cavity.

4. The quality analyzer as described in claim 3, characterized in that, When the movable plate is rotatably connected to the cavity, the movable plate includes a rotating portion rotatably connected to the cavity; or, the movable plate includes a fixed portion fixedly connected to the cavity and a rotating portion rotatably connected to the fixed portion.

5. The quality analyzer as described in claim 4, characterized in that, The rotating portion of the movable plate has a constraint end away from the analysis slit, and the remaining rotating portion rotates around the constraint end.

6. The quality analyzer as described in claim 4, characterized in that, The plate assembly further includes a second drive mechanism, which is mounted on the cavity and connected to the rotating part of the movable plate. The second drive mechanism is used to drive the rotating part of the movable plate to rotate.

7. The quality analyzer as described in claim 6, characterized in that, When there are two movable plates, the rotating parts of the two movable plates rotate synchronously through the same second drive mechanism, or the rotating parts of the two movable plates rotate independently through different second drive mechanisms.

8. The quality analyzer as described in claim 3, characterized in that, When the movable plate is movably connected to the cavity, the movable plate includes a first movable part that movably engages with the cavity; or, the movable plate includes a fixed part that is fixedly connected to the cavity, and a second movable part that movably engages with the fixed part. In the case where the movable plate includes a first movable portion that moves in conjunction with the cavity, the end of the first movable portion away from the analysis slit is movably mounted in the inner wall of the vacuum channel of the cavity, so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable; In the case where the movable plate includes a fixed part that is fixedly connected to the cavity and a second movable part that is movably engaged with the fixed part, the end of the fixed part away from the analysis slit is fixedly connected to the inner wall of the vacuum channel of the cavity, and the second movable part moves in the direction of the line connecting the fixed part and the second movable part, so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

9. The quality analyzer as described in claim 8, characterized in that, When the end of the first movable part away from the analysis slit is movably installed in the inner wall of the vacuum channel of the cavity, the inner wall of the vacuum channel has a receiving hole for accommodating one end of the first movable part; one end of the first movable part is movably disposed in the receiving hole so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

10. The quality analyzer as described in claim 9, characterized in that, The receiving hole is a blind hole.

11. The quality analyzer as described in claim 8, characterized in that, The plate assembly further includes a third drive mechanism, which is mounted on the cavity and connected to the first moving part or the second moving part. The third drive mechanism is used to drive the first moving part or the second moving part to move so that the portion of the movable plate protruding from the inner wall of the vacuum channel is retractable.

12. The quality analyzer as described in claim 11, characterized in that, When there are two movable plates, the two movable plates move synchronously through the same third drive mechanism, or the two movable plates move independently through different third drive mechanisms.

13. The quality analyzer as described in claim 1, characterized in that, The plate is made of a non-metallic material, or the surface of the plate is covered with a first non-metallic protective layer.

14. The quality analyzer as described in claim 13, characterized in that, The non-metallic plate includes a graphite plate, a silicon plate, or a ceramic plate; the first non-metallic protective layer includes a graphite protective layer, a silicon protective layer, or a ceramic protective layer.

15. The quality analyzer as described in claim 1, characterized in that, The plate has an end near the analytical slit; the column is rotatably mounted on the end of the plate.

16. The quality analyzer as described in claim 1, characterized in that, The column is made of a non-metallic material, or the surface of the column is covered with a second non-metallic protective layer.

17. The quality analyzer as described in claim 16, characterized in that, The non-metallic column includes a graphite column, a silicon column, or a ceramic column; the second non-metallic protective layer includes a graphite protective layer, a silicon protective layer, or a ceramic protective layer.

18. An ion implantation device, characterized in that, include: Ion source; Extraction electrode, the extraction electrode being used to extract an ion beam from the ion source; The mass analyzer according to any one of claims 1 to 17 is located on the side of the extraction electrode facing away from the ion source, and is used to receive the ion beam extracted by the extraction electrode.

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