A baffle mechanism and coating equipment

Abstract

This utility model relates to the field of evaporation coating technology, specifically disclosing a baffle mechanism and coating equipment. The baffle mechanism includes a central shaft, a support plate, a shielding plate, and an adjusting plate. The support plate is rotatably mounted on the central shaft and has openings. A substrate is placed on the support plate corresponding to the openings. The shielding plate is fixedly connected to the end of the central shaft away from the support plate and has flow holes that align vertically with the openings, allowing vapor from the evaporation source to flow through the flow holes and the openings and deposit onto the substrate. The adjusting plate is rotatably mounted on the central shaft and attached to the shielding plate. In this utility model, the adjusting plate can rotate around the central shaft, adjusting the shielding area of ​​the flow holes and thus the shape and size of the adjustable holes. This allows for adaptation to products with different linear gradient requirements, avoiding the need to redesign and process different baffles and reducing production costs.

Description

Technical Field

[0001] This utility model relates to the field of evaporation coating technology, and in particular to a baffle mechanism and coating equipment. Background Technology

[0002] Evaporation source deposition is a physical vapor deposition technique that uses an evaporation source to heat solid materials to a high temperature, causing them to evaporate into a gaseous state, which is then deposited and condensed on the substrate surface to form a thin film. Currently, in optoelectronic devices, the thickness of certain thin films needs to be linearly and gradually varied in space according to certain requirements to achieve specific functions. Therefore, whether the gradual variation of the film thickness meets the requirements is crucial to realizing the function of the optoelectronic device.

[0003] Existing technologies achieve spatial gradients in film thickness using baffles. This involves placing a baffle of a specific shape between the vapor deposition source and the workpiece turntable. As the turntable rotates, the degree of obstruction by the baffle varies at different locations on the substrate, resulting in different deposition rates and ultimately different film thicknesses at different locations. However, existing baffles have poor adaptability to different products, and different linear gradient requirements necessitate the redesign and fabrication of different baffles. This leads to cumbersome baffle replacements and high production costs. Utility Model Content

[0004] The purpose of this utility model is to provide a baffle mechanism and coating equipment to solve the problems of poor adaptability of baffles to different products in the prior art, the need to redesign and process different baffles for different linear gradient requirements, which leads to cumbersome baffle replacement and high production costs.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] On the one hand, this utility model provides a baffle mechanism for blocking the steam flow emitted by an evaporation source, the baffle mechanism comprising:

[0007] Central axis:

[0008] A carrier plate, which is rotatably mounted on the central axis, has an opening, and a substrate is placed on the carrier plate corresponding to the position of the opening;

[0009] A shielding disk is fixedly connected to one end of the central axis away from the support disk. The shielding disk is provided with flow holes, which can correspond to the openings in the vertical direction, so that the vapor flow emitted by the evaporation source is deposited on the substrate through the flow holes and the openings.

[0010] An adjusting plate is rotatably mounted on the central shaft and attached to the shielding plate. The adjusting plate is used to shield the flow hole to form an adjustable hole. The width of the adjustable hole gradually increases from the side closest to the center of the shielding plate outwards.

[0011] As an alternative to the above-mentioned baffle mechanism, the adjusting plate includes a connecting part and a blocking part connected to the connecting part. The connecting part is rotatably disposed on the central axis and corresponds to the middle position of the blocking plate. The blocking part corresponds to the flow hole.

[0012] As an alternative to the above-mentioned baffle mechanism, the connecting part is a rectangular structure, the blocking part is a triangular structure, and one side of the connecting part and one side of the blocking part are shared.

[0013] As an alternative to the aforementioned baffle mechanism, the flow hole is a fan-shaped annular hole.

[0014] As an alternative to the above-mentioned baffle mechanism, the adjusting plate includes several plates, which are stacked sequentially along the central axis.

[0015] As an alternative to the above-mentioned baffle mechanism, the flow holes include a plurality of holes, which are arranged radially outward from the center of the baffle plate.

[0016] As an alternative to the aforementioned baffle mechanism, the baffle plate has a planar structure.

[0017] As an alternative to the above-mentioned baffle mechanism, the opening includes a plurality of holes, which are arranged radially outward from the center of the bearing plate.

[0018] As an alternative to the aforementioned baffle mechanism, the bearing plate can be a planar structure or a crown-shaped structure.

[0019] On the other hand, this utility model provides a coating device, including the baffle mechanism as described above.

[0020] The beneficial effects of this utility model are as follows:

[0021] The baffle mechanism includes a central shaft, a support plate, a shielding plate, and an adjusting plate. The support plate is rotatably mounted on the central shaft and has openings. A substrate is placed on the support plate at the position corresponding to the openings, so that the support plate can drive the substrate to rotate as it rotates around the central shaft. Meanwhile, a shielding plate is fixedly connected to the end of the central axis away from the carrier plate. The shielding plate is provided with flow holes, which can correspond to the openings in the vertical direction, so that the vapor flow emitted from the evaporation source can be deposited onto the substrate through the flow holes and the openings, thereby achieving thin film deposition on the substrate. An adjusting plate is rotatably mounted on the central axis and attached to the shielding plate. The adjusting plate is used to shield the flow holes to form adjustable holes. The width of the adjustable holes is set to gradually increase from the side near the center of the shielding plate to the outer periphery. Thus, as the substrate rotates with the carrier plate, the width of the adjustable holes corresponding to different positions on the substrate is different, resulting in different deposition rates and ultimately different film thicknesses at different positions, thereby obtaining a linearly gradient film thickness. Since the adjusting plate can rotate around the central axis, the shielding area of ​​the adjusting plate on the flow holes can be adjusted, thereby adjusting the shape and size of the adjustable holes. This allows for adaptation to products with different linear gradient requirements, thus avoiding the need to redesign and process different baffles and reducing production costs. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the baffle mechanism provided in an embodiment of the present utility model.

[0023] In the picture:

[0024] 1. Central shaft; 2. Bearing plate; 21. Opening; 3. Blocking plate; 31. Flow hole; 4. Adjusting plate; 41. Connecting part; 42. Blocking part. Detailed Implementation

[0025] The technical solution of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0026] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. The terms "first position" and "second position" refer to two different positions. Moreover, "above," "on top of," and "over" the first feature in relation to the second feature includes the first feature directly above and diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "under," and "below" the first feature in relation to the second feature includes the first feature directly below and diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0027] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0028] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.

[0029] like Figure 1 As shown, this embodiment provides a baffle mechanism for blocking the steam flow emitted by the evaporation source.

[0030] The baffle mechanism includes a central shaft 1, a support plate 2, a shielding plate 3, and an adjusting plate 4. The support plate 2 is rotatably mounted on the central shaft 1 and has an opening 21. A substrate is placed on the support plate 2 corresponding to the opening 21, so that the support plate 2 can drive the substrate to rotate as it rotates around the central shaft 1. Optionally, the support plate 2 can achieve rotation through a gear mechanism or a belt mechanism.

[0031] Meanwhile, the shielding plate 3 is fixedly connected to the end of the central shaft 1 away from the carrier plate 2. The shielding plate 3 is provided with a flow hole 31, which can correspond to the opening 21 in the vertical direction so that the steam flow emitted from the evaporation source can be deposited on the substrate through the flow hole 31 and the opening 21, thereby realizing the deposition of thin film on the substrate. The adjusting plate 4 is rotatably set on the central shaft 1 and attached to the shielding plate 3. The adjusting plate 4 is used to shield the flow hole 31 to form an adjustable hole. The width of the adjustable hole is set to gradually increase from the side close to the center of the shielding plate 3 to the outer periphery. Thus, as the substrate rotates with the carrier plate 2, the width of the adjustable hole corresponding to different positions of the substrate is different, resulting in different deposition rates and ultimately different film thicknesses at different positions, thereby obtaining a linear gradient film thickness. Since the adjusting plate 4 can rotate around the central shaft 1, the shielding area of ​​the adjusting plate 4 on the flow hole 31 can be adjusted, thereby adjusting the shape and size of the adjustable hole. This can achieve the adaptation to products with different linear gradient requirements, thereby avoiding the need to redesign and process different baffles and reducing production costs.

[0032] Furthermore, the adjusting plate 4 includes a connecting portion 41 and a blocking portion 42 connected to the connecting portion 41. The connecting portion 41 is rotatably mounted on the central shaft 1 and corresponds to the middle position of the blocking disk 3. The blocking portion 42 corresponds to the flow hole 31, so that the connecting portion 41 will not block the flow hole 31 during rotation. The shape and size of the adjustable hole can be adjusted simply by changing the position of the blocking portion 42, thereby improving the accuracy of the linear gradient of the film thickness on the substrate. Optionally, the connecting portion 41 is fitted with the central shaft 1 through a through hole with a transition fit or a slight interference fit, so that the adjusting plate 4 can rotate relative to the central shaft 1.

[0033] Specifically, the connecting part 41 has a rectangular structure, and the shielding part 42 has a triangular structure. One side of the connecting part 41 and one side of the shielding part 42 are shared, thereby reducing the processing difficulty of the adjusting plate 4. The width of the shielding part 42 gradually decreases from the side near the center of the shielding disk 3 towards the outer periphery, so that after the shielding part 42 shields the flow hole 31, the width of the adjustable hole can gradually increase from the side near the center of the shielding disk 3 towards the outer periphery. Optionally, the flow hole 31 is a fan-shaped hole, so that the triangular shielding part 42 can cooperate with the fan-shaped hole, making the shape of the adjustable hole regular and easy to adjust, thereby reducing the difficulty of controlling the linear gradient of the film thickness on the substrate.

[0034] Furthermore, the adjustment plate 4 comprises several plates, which are stacked sequentially along the central axis 1. This stacking of the adjustment plates 4 allows the several shielding parts 42 to cooperate with each other, further dynamically adjusting the shape and size of the adjustable holes to meet actual working conditions. The flow holes 31 comprise several, arranged radially outward from the center of the shielding disk 3. Each flow hole 31 can be shielded by at least one shielding part 42, allowing several adjusted vapor flows to be emitted through the adjustable holes, thereby increasing the film formation rate on the substrate. Optionally, the shielding disk 3 has a planar structure, and the flow holes 31 are designed as planar holes. This ensures that the adjustable holes formed after the adjustment plate 4 shields the flow holes 31 are also planar holes, facilitating accurate control of the vapor flow deposition rate on the substrate surface and achieving gradient film thickness deposition. Alternatively, a plurality of flow holes 31 are arranged symmetrically in pairs, and the blocking part 42 includes two parts, which are located on opposite sides of the connecting part 41, and the two blocking parts 42 are used to block the two symmetrical flow holes 31.

[0035] Furthermore, the openings 21 include a plurality of holes, which are arranged radially outward from the center of the support disk 2. This allows for the deposition of films on a plurality of substrates through the openings 21, thus achieving the gradient thin film deposition requirements of multiple substrates in a single operation. Optionally, the support disk 2 has a planar or crown-shaped structure, allowing for the placement of different substrates according to actual working conditions, thereby improving the deposition quality of the substrates.

[0036] This embodiment also provides a coating equipment, including the baffle mechanism as described above. By using the baffle mechanism as described above, the shape and size of the adjustable hole can be dynamically adjusted, thereby adapting to products with different linear gradient requirements, thus avoiding the need to redesign and process different baffles and reducing production costs.

[0037] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make other variations or modifications based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A shutter mechanism for shielding a vapor stream emitted from an evaporation source, characterized by, The baffle mechanism includes: Central axis (1): A support plate (2) is rotatably mounted on the central shaft (1). The support plate (2) is provided with an opening (21). A substrate is placed on the support plate (2) corresponding to the position of the opening (21). A shielding disk (3) is fixedly connected to one end of the central shaft (1) away from the bearing disk (2). The shielding disk (3) is provided with a flow hole (31). The flow hole (31) can correspond to the opening (21) in the vertical direction so that the steam flow emitted by the evaporation source is deposited on the substrate through the flow hole (31) and the opening (21). Adjustment plate (4), the adjustment plate (4) is rotatably mounted on the central shaft (1) and attached to the shielding plate (3), the adjustment plate (4) is used to shield the flow hole (31) to form an adjustable hole; the width of the adjustable hole is gradually increased from the side close to the center of the shielding plate (3) towards the outer periphery.

2. The baffle mechanism according to claim 1, characterized in that, The adjusting plate (4) includes a connecting part (41) and a blocking part (42) connected to the connecting part (41). The connecting part (41) is rotatably disposed on the central shaft (1) and corresponds to the middle position of the blocking plate (3). The blocking part (42) corresponds to the flow hole (31).

3. The baffle mechanism according to claim 2, characterized in that, The connecting part (41) has a rectangular structure, the blocking part (42) has a triangular structure, and one side of the connecting part (41) and one side of the blocking part (42) are set together.

4. The baffle mechanism according to claim 2, characterized in that, The flow hole (31) is a fan-shaped hole.

5. The baffle mechanism according to claim 2, characterized in that, The adjustment plate (4) comprises several plates, which are stacked sequentially along the central axis (1).

6. The baffle mechanism according to claim 5, characterized in that, The flow holes (31) include a plurality of holes, which are arranged radially outward from the center of the shielding disk (3).

7. The baffle mechanism according to claim 1, characterized in that, The shielding disc (3) has a planar structure.

8. The baffle mechanism according to claim 1, characterized in that, The opening (21) includes several holes, and the several openings (21) are arranged radially outward from the center of the bearing disk (2).

9. The baffle mechanism according to claim 1, characterized in that, The bearing plate (2) has a planar structure or a crown-shaped structure.

10. A coating apparatus, characterized in that, Includes the baffle mechanism as described in any one of claims 1 to 9.

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