Low-temperature stirred deposition apparatus
By designing the cooling and stirring mechanisms of the low-temperature stirring deposition device, the problems of poor low-temperature control and uneven mixing in traditional devices are solved, achieving stable low-temperature growth and high-quality deposition results.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHENZHEN KUOWEI ATOMIC NEW MATERIALS CO LTD
- Filing Date
- 2025-08-18
- Publication Date
- 2026-07-03
AI Technical Summary
Traditional deposition devices lack cryogenic control mechanisms, making it difficult to precisely control the size of single atoms/clusters of particles. These particles are unstable in their motion, prone to adhesion and loss, uneven mixing, and easily oxidized and deteriorated, thus affecting the deposition quality.
It adopts a low-temperature stirred deposition device, which includes a cooling mechanism and a stirring mechanism to achieve stable deep low-temperature cooling. It is equipped with a stirring rod and stirring blades, combined with a protective gas to prevent oxidation, and an isolation design to avoid frost formation.
Stable low-temperature growth of single-atom/cluster particles was achieved, particle size was precisely controlled, adhesion loss was reduced, mixing uniformity and deposition quality were improved, oxidation and deterioration were prevented, and stable operation of the device was ensured.
Smart Images
Figure CN224450834U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of atomic layer deposition technology, and in particular to a low-temperature stirring deposition apparatus. Background Technology
[0002] In the field of coating deposition of single-atom / cluster particles with sample powder, traditional deposition devices have significant technical limitations. Existing devices generally lack effective cryogenic control mechanisms, failing to provide a stable, deep cryogenic environment for the deposition process. This results in difficulty in precisely controlling the size of single-atom / cluster particles, and the particles' unstable motion makes them prone to adhering to the deposition chamber walls, causing losses and affecting deposition efficiency. Furthermore, traditional devices often lack dedicated stirring mechanisms, making it difficult to fully mix single-atom / cluster particles and sample powder, leading to poor coating uniformity and failing to meet the requirements for high-quality deposition. In addition, some devices lack effective anti-oxidation protection measures, allowing single-atom / cluster particles and sample powder to easily oxidize and deteriorate upon contact with air, further reducing deposition quality. These problems have become key bottlenecks restricting the improvement of coating deposition effects. Utility Model Content
[0003] To address the shortcomings of the existing technology, the technical problem to be solved by this utility model is to provide a low-temperature stirring deposition device that can achieve stable deep low-temperature cooling of the deposition chamber, and, in conjunction with a stirring mechanism, ensure uniform mixing of single-atom / cluster particles with sample powder. At the same time, protective gas filling is used to prevent oxidation, reduce particle loss, and improve the deposition coating quality.
[0004] To solve the above-mentioned technical problems, the present invention provides a low-temperature stirring deposition device, comprising a reaction chamber, wherein the reaction chamber has a reaction cavity, the reaction chamber is provided with a feed inlet for single-atom or cluster particles to enter the reaction cavity, the reaction chamber is provided with an inlet and an outlet for gas to enter and exit, the reaction cavity is provided with a deposition chamber for mixing single-atom or cluster particles with powder, a cooling mechanism is provided between the deposition chamber and the reaction cavity to cool the deposition chamber, and a stirring mechanism is also provided between the deposition chamber and the reaction chamber to make the single-atom or cluster particles and powder mix evenly.
[0005] Furthermore, the cooling mechanism includes a condensation chamber, an inlet pipe, and an outlet pipe. Both the inlet pipe and the outlet pipe are connected to the condensation chamber to introduce a cooling medium into the condensation chamber or to export the cooling medium from the condensation chamber. The deposition chamber is located inside the condensation chamber and its opening is exposed outside the condensation chamber.
[0006] Furthermore, the inlet pipe is located at the lower part of the condensing chamber to introduce the cooling medium into the condensing chamber from bottom to top, and the outlet pipe is located at the upper part of the condensing chamber. The inlet pipe and the outlet pipe are arranged opposite each other in the radial direction.
[0007] Furthermore, a first isolation chamber is provided between the condensation chamber and the reaction chamber.
[0008] Furthermore, a second isolation cavity is provided between the inlet tube and the outlet tube and the reaction chamber, and the two second isolation cavities are respectively used to isolate at least a portion of the inlet tube and at least a portion of the outlet tube from the reaction chamber.
[0009] Furthermore, the reaction chamber is provided with isolation rings surrounding the inlet tube and the outlet tube at the positions where the inlet tube and the outlet tube pass through.
[0010] Furthermore, the reaction chamber is provided with a feed pipe, one end of which is connected to the outside and the other end extends into the reaction chamber. The feed pipe has a feed port that connects the reaction chamber to the outside of the reaction chamber. The end of the feed pipe that extends into the reaction chamber is provided with a feeding pipe, which extends from the feed pipe toward the opening of the deposition chamber so as to allow single-atom or cluster particles to be fed into the deposition chamber.
[0011] Furthermore, the stirring mechanism includes a stirring rod, stirring blades, and a rotary drive assembly. One end of the stirring rod extends into the deposition chamber, and the other end extends out of the reaction chamber and is connected to the rotary drive assembly. The stirring blades are disposed at the end of the stirring rod that extends into the deposition chamber.
[0012] Furthermore, the stirring blade is assembled to the end of the stirring rod via a sleeve. The sleeve has an insertion hole that matches the outer diameter of the stirring rod. The stirring rod and the inner wall of the insertion hole are interference-fitted to fix each other. The stirring blade is connected to or integrally formed on the outer side of the sleeve.
[0013] Furthermore, a first sealing ring is provided around the stirring rod at the position where the stirring rod passes through the reaction chamber, and the first sealing ring is fixed to the reaction chamber by a sealing pressure ring.
[0014] The low-temperature stirred deposition apparatus of this invention has at least the following beneficial effects: Stable deep low-temperature cooling of the deposition chamber (down to -120℃) is achieved through a cooling mechanism (such as a liquid nitrogen condenser), which promotes the growth of single atoms / clusters to precisely control particle size, while simultaneously stabilizing particle motion and reducing adhesion loss on the deposition chamber wall; Equipped with a stirring mechanism (stirring rod and stirring blades), the stirring blades are rotated by a rotary drive component, ensuring thorough mixing and agitation of single-atom / cluster particles with the sample powder, significantly improving coating uniformity and solving the problem of poor coating quality in traditional apparatuses. The reaction chamber is equipped with an inlet and an outlet, allowing the introduction of protective gas to create a positive pressure environment. Combined with sealing structures (such as sealing rings and pressure rings), air is isolated, effectively preventing oxidation and deterioration of single atoms / clusters and sample powder. The isolation design between the condensation chamber and the reaction chamber (such as a first isolation chamber) avoids frost formation around the chambers due to low temperatures, ensuring stable operation of the device. The bottom wall, side walls, and end caps of the reaction chamber are detachably connected, and the stirring blades and stirring rods are detachably assembled via sleeves, facilitating the removal of deposited samples, cleaning of the device's interior, or component maintenance, thus improving operational practicality. Attached Figure Description
[0015] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:
[0016] Figure 1 This is a schematic diagram of the structure of an embodiment of the low-temperature stirred deposition apparatus of this utility model. Figure 1 ;
[0017] Figure 2 This is an exploded view of an embodiment of the low-temperature stirring deposition apparatus of this utility model;
[0018] Figure 3 This is a schematic diagram of the structure of an embodiment of the low-temperature stirred deposition apparatus of this utility model. Figure 2 ;
[0019] Figure 4 for Figure 3 Schematic diagram of the cross-sectional structure at point AA;
[0020] Figure 5 This is a schematic diagram of the structure of an embodiment of the low-temperature stirred deposition apparatus of this utility model. Figure 3 ;
[0021] Figure 6 for Figure 5 Schematic diagram of the cross-sectional structure at point BB;
[0022] Figure 7 for Figure 6 A partial structural diagram at point A in the middle;
[0023] Figure 8 for Figure 6 A schematic diagram of the local structure at point B.
[0024] The meanings of the labels in the attached diagram are as follows:
[0025] Reaction chamber 1, reaction cavity 11, feed pipe 12, feed inlet 121, feeding pipe 122, air inlet 13, air outlet 14, chamber bottom wall 15, first groove 151, second groove 152, third groove 153, chamber side wall 16, end cap 17, perforation 171, sealing ring groove 172, first sealing ring 173, sealing pressure ring 174, second fixing hole 175, assembly ring 18, first fixing hole 181, second sealing ring 182;
[0026] Sedimentation chamber 2;
[0027] Cooling mechanism 3, condensation chamber 31, inlet pipe 32, outlet pipe 33, first isolation chamber 34, second isolation chamber 35, isolation ring 36;
[0028] The stirring mechanism 4, stirring rod 41, first limiting surface 411, fourth limiting surface 412, stirring blade 42, sleeve 43, second limiting surface 431, rotary motor 44, coupling 45, third limiting surface 451, and bracket 46. Detailed Implementation
[0029] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions of this application will be clearly and completely described below in conjunction with specific embodiments and corresponding drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0030] The following disclosure provides various embodiments or examples of different features for implementing this utility model. Specific examples of components and arrangements will be described below to simplify the utility model. Of course, these are merely examples and are not intended to limit the utility model. For example, in the following description, forming a first component above or on a second component may include embodiments where the first and second components are in direct contact, or embodiments where other components may be formed between the first and second components such that the first and second components are not in direct contact. Additionally, reference numerals and / or characters may be repeated in various instances of the utility model. Such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or configurations.
[0031] Furthermore, spatial relation terms such as "below," "under," "below," "above," and "above" may be used herein to readily describe the relationship between one element or component and another element (or components) or component (or components) as shown in the figures. In addition to the orientations shown in the figures, spatial relation terms will encompass various different orientations of the device in use or operation. The device may be positioned in other ways (rotated 90 degrees or in other orientations) and will be interpreted accordingly through the spatial relation descriptors used herein.
[0032] Furthermore, the technical parts described in this utility model and the appended claims are mainly the improved technical parts of this utility model, and do not limit the object protected by this utility model to only having these technical parts. Other known necessary components (structures and / or methods) and / or non-essential components of the protected object, other than the technical parts described in this utility model and the appended claims, are not included in this utility model and the appended claims because they do not involve the improvement scope of this utility model. However, this does not mean that the object protected by this utility model does not possess these known components.
[0033] The present invention will be further described below with reference to the accompanying drawings.
[0034] Please refer to Figure 1 , Figure 2 , Figure 3 and Figure 4 The low-temperature stirred deposition apparatus of this invention includes a reaction chamber 1, which has a reaction cavity 11. The reaction chamber 1 is provided with a feed inlet 121 for single-atom or cluster particles to enter the reaction cavity 11. The reaction chamber 1 is provided with an air inlet 13 and an air outlet 14 communicating with the reaction cavity 11 for gas to enter and exit. A deposition chamber 2 is provided inside the reaction cavity 11 for mixing single-atom or cluster particles with powder. A cooling mechanism 3 is provided between the deposition chamber 2 and the reaction cavity 11 to cool the deposition chamber 2. A stirring mechanism 4 is also provided between the deposition chamber 2 and the reaction chamber 1 to ensure uniform mixing of single-atom or cluster particles with powder.
[0035] The reaction chamber 1 includes a bottom wall 15, a side wall 16, and an end cap 17, which together enclose the reaction cavity 11. To facilitate assembly of the side wall 16, bottom wall 15, and end cap 17, they are detachably connected. For example, the bottom wall 15 is configured as a boss, and its upper end is recessed to form a first groove 151 into which the side wall 16 is inserted. The inner diameter of the first groove 151 matches the outer diameter of the side wall 16, allowing the side wall 16 to be press-fitted into the first groove 151. The side wall 16 has an opening at its upper end, and the end cap 17 is fitted to the opening of the side wall 16 via an assembly ring 18 to cover the opening, thus forming a sealed reaction cavity 11. The inner diameter of the assembly ring 18 matches the inner diameter of the chamber sidewall 16 for a sealing fit. The end cap 17 is located at the upper end of the assembly ring 18, and a first fixing hole 181 is provided between the end cap 17 and the assembly ring 18. Several first fixing holes 181 are spaced apart around the assembly ring 18, and a first fixing bolt (not shown) can be fitted into each first fixing hole 181 to connect the end cap 17 and the assembly ring 18. A second sealing ring 182 is also provided between the end cap 17 and the assembly ring 18 to increase the sealing between them, thereby improving the sealing performance of the reaction chamber 11. This removable reaction chamber 1 facilitates the removal of deposited samples by the user and also facilitates cleaning or maintenance of the reaction chamber 1. The air inlet 13 and the air outlet 14 are both located on the chamber sidewall 16 and communicate with the reaction chamber 11. To facilitate the formation of a natural upward airflow within the reaction chamber 11, and to ensure that the gas entering the reaction chamber 11 through the inlet 13 can more thoroughly expel the original gas from the reaction chamber 11 through the outlet 14, the inlet 13 is located at the lower part of the chamber sidewall 16 to allow protective gas to be introduced into the reaction chamber 11 from bottom to top, and the outlet 14 is located at the upper part of the chamber sidewall 16 to allow gas to flow out. The inlet 13 and the outlet 14 are arranged radially opposite to each other to form a more natural airflow path.
[0036] Please refer to Figure 4 , Figure 5 , Figure 6 and Figure 8The cooling mechanism 3 is disposed on the bottom wall 15 of the chamber and includes a condensation chamber 31, an inlet pipe 32 for introducing a cooling medium into the condensation chamber 31, and an outlet pipe 33 for discharging the cooling medium from the condensation chamber 31. A first isolation chamber 34 is also provided between the condensation chamber 31 and the bottom wall 15 of the chamber. For example, the bottom wall of the first groove 151 is recessed downward to form a second groove 152, and the inner diameter of the second groove 152 matches the outer diameter of the first isolation chamber 34 so that the first isolation chamber 34 can be inserted into it. The condensation chamber 31 is fixedly disposed at the upper end of the first isolation chamber 34 and is not in communication with the condensation chamber 31. The inlet pipe 32 penetrates the bottom wall 15 of the chamber from bottom to top to extend into the reaction chamber 11 and connects to the lower part of the outer peripheral wall of the condensation chamber 31 to communicate with the interior of the condensation chamber 31. The outlet pipe 33 penetrates the bottom wall 15 of the chamber from bottom to top and connects to the upper part of the outer peripheral wall of the condensation chamber 31 to communicate with the interior of the condensation chamber 31. The height difference between the connection point of the inlet pipe 32 and the condensation chamber 31 and the connection point of the outlet pipe 33 and the condensation chamber 31 facilitates the cooling medium entering through the inlet pipe 32 to remain in the condensation chamber 31 for a sufficient time. It also allows the new cooling medium entering through the inlet pipe 32 to more thoroughly expel the residual, heat-absorbing old cooling medium from the bottom up through the outlet pipe 33, thereby better maintaining the low temperature inside the condensation chamber 31. The inlet pipe 32 and the outlet pipe 33 are arranged radially opposite each other to form a more natural airflow path.
[0037] A second isolation chamber 35 is also provided between the inlet tube 32 and the outlet tube 33 and the reaction chamber 11. The second isolation chamber 35 isolates at least a portion of the inlet tube 32 or the outlet tube 33 from the reaction chamber 11. For example, in this embodiment, the bottom wall of the first groove 151 is recessed downwards to form two third grooves 153, which are respectively opened at the positions where the inlet tube 32 and the outlet tube 33 penetrate the bottom wall 15 of the chamber. A second isolation chamber 35 is inserted into each of the third grooves 153. An isolation ring 36 is also provided around the bottom wall 15 of the chamber at the positions where the inlet tube 32 and the outlet tube 33 penetrate, respectively. The isolation ring 36 is used to increase the sealing of the second isolation chamber 35. The arrangement of the first isolation chamber 34 and the second isolation chamber 35 ensures that the cooling medium in the condensation chamber 31, the inlet pipe 32 and the outlet pipe 33 is kept at a greater distance from the inner wall of the reaction chamber 11, thus effectively preventing frost from forming on the outer wall of the reaction chamber 1.
[0038] The deposition chamber 2 is located within the condensation chamber 31, with its opening facing upwards and exposed to the condensation chamber 31. A feed pipe 12 is provided on the side wall 16 of the chamber, with one end connected to the outside and the other end extending inwards into the reaction chamber 11. An inlet 121 is provided within the feed pipe 12, connecting the reaction chamber 11 to the outside. A feeding pipe 122, connected to the feeding inlet 121, is provided at the end of the feed pipe 12 extending into the reaction chamber 11. The feeding pipe 122 extends obliquely downwards from the feed pipe 12 towards the opening of the deposition chamber 2, enabling the introduction of single-atom or cluster particles into the deposition chamber 2.
[0039] The stirring mechanism 4 includes a stirring rod 41, stirring blades 42, and a rotary drive assembly. The stirring rod 41 passes through the end cap 17, with its upper end extending upwards into the reaction chamber 1 and its lower end extending downwards into the deposition chamber 2. One end of the stirring rod 41 extending into the deposition chamber 2 is detachably connected to the blades, and the other end of the stirring rod 41 extends out of the reaction chamber 1 and is connected to the rotary drive assembly. For example, the end of the stirring rod 41 extending into the deposition chamber 2 has at least one first limiting surface 411, and the blades are mounted on the lower end of the stirring rod 41 via a sleeve 43. The sleeve 43 has a second limiting surface 431 that matches the at least one first limiting surface 411. The first limiting surface 411 and the second limiting surface 431 cooperate to restrict the circumferential rotation of the sleeve 43 relative to the stirring rod 41. In this embodiment, the end of the stirring rod 41 extending into the sedimentation chamber 2 is radially recessed to form a first limiting groove, which also axially extends through the lower end of the stirring rod 41. One radial side of the first limiting groove is configured as the first limiting surface 411. The sleeve 43 has an insertion hole for inserting the stirring rod 41, the inner diameter of which matches the outer diameter of the stirring rod 41 to achieve an interference fit. The inner peripheral wall of the insertion hole protrudes radially inward to form a limiting block that matches the first limiting groove, and one radial side of the limiting block is configured as the second limiting surface 431. When the sleeve 43 is fitted onto the end of the stirring rod 41, the limiting block is inserted into the first limiting groove, and the first limiting surface 411 and the second limiting surface 431 are tightly fitted together for limiting. As will be understood by those skilled in the art, the first limiting surface 411 is not limited to the first limiting groove formed on the stirring rod 41, and the second limiting surface 431 is not limited to the limiting block formed inside the sleeve 43. The purpose of the first limiting surface 411 and the second limiting surface 431 is to cooperate with each other to restrict the circumferential rotation of the sleeve 43 relative to the stirring rod 41. Based on this, the first limiting surface 411 and the second limiting surface 431 can also be formed in other ways, for example: a limiting block protruding from the end of the stirring rod 41, or a limiting groove formed by a recess inside the sleeve 43. The shape and number of the limiting block and the limiting groove are not limited, as long as they can achieve the function of circumferential limiting. The blade is connected to or integrally formed on the outer surface of the sleeve 43. The connection method can be plug-in, bolt connection, or welding, etc. In this embodiment, the blade is integrally formed with the sleeve 43.
[0040] The rotary drive assembly includes a rotary motor 44 and a coupling 45. The rotary motor 44 is mounted on the upper end of the end cover 17 via a bracket 46. The output shaft of the rotary motor 44 extends out of the reaction chamber 1. It should be understood that the rotary drive assembly is not limited to the rotary motor 44 and coupling 45 described in this embodiment. It can also be a cylinder driven with a reducer or gear set to achieve rotary motion, or a lead screw drive to achieve the rotation of the rotating parts. Those skilled in the art can also use other known technologies to achieve the effect of rotary drive. The output shaft of the rotary motor 44 and the upper end of the stirring rod 41 extend from both ends of the coupling 45 into the coupling 45 to achieve mutual connection. The coupling 45 has a third limiting surface 451 inside. The other end of the stirring rod 41 opposite the assembly end of the sleeve 43 has a fourth limiting surface 412 that limits and cooperates with the third limiting surface 451. When the third limiting surface 451 and the fourth limiting surface 412 are in close contact, the output shaft and the stirring rod 41 are in coaxial contact. The third limiting surface 451 and the fourth limiting surface 412 cooperate to restrict the relative circumferential rotation of the output shaft and the stirring rod 41. The coupling 45 is assembled outside the output shaft and the stirring rod 41 to connect them. In this embodiment, the end of the output shaft is radially recessed with a second limiting groove, and the third limiting surface 451 is formed on one radial side of the second limiting groove. Similar to the first limiting surface 411 and the second limiting surface 431 mentioned above, the formation of the third limiting surface 451 and the fourth limiting surface 412 is not limited to the structure in this embodiment, as long as they can play a circumferential limiting role.
[0041] Please refer to Figure 7 Furthermore, the end cap 17 has a through hole 171 through which the stirring rod 41 passes. The upper end of the end cap 17 is recessed downwards to form a sealing ring groove 172 surrounding the through hole 171. A first sealing ring 173 is provided within the sealing ring groove 172, encircling the stirring rod 41. The inner diameter of the first sealing ring 173 matches the outer diameter of the stirring rod 41. A sealing pressure ring 174 is also provided at the upper end of the end cap 17 corresponding to the sealing ring groove 172. A second fixing hole 175 is provided between the sealing pressure ring 174 and the end cap 17. Several second fixing holes 175 are arranged at intervals around the stirring rod 41. Each second fixing hole 175 can accommodate a second fixing bolt (not shown in the figure) to connect the sealing pressure ring 174 to the end cap 17.
[0042] One embodiment of the low-temperature stirred deposition apparatus of this invention operates as follows: In the initial state, all components of the apparatus are assembled together. Powder for coating single atoms / clusters is pre-placed in the deposition chamber 2. When a reaction is required, the single-atom generator or cluster generator is first connected to the feed inlet 121, and then protective gas is introduced into the reaction chamber 11 through the air inlet 13. As the protective gas is continuously introduced, the air originally present in the reaction chamber 11 is discharged from the air outlet 14. The air inlet 13 is closed when the protective gas fills the reaction chamber 11. Next, single atoms or clusters are fed into the deposition chamber 2 through the protective gas via the feed inlet 121 and the feeding pipe 122. The motor is started, and the output shaft of the motor rotates, driving the stirring rod 41 to rotate. The stirring rod 41 then drives the blades to rotate, continuously stirring and agitating the powder and single atoms / clusters. This process constantly adjusts the contact surface between the powder and the single atoms / clusters, ensuring that the powder evenly coats the outside of the single atoms / clusters. The protective gas prevents the single atoms / clusters from reacting with the air.
[0043] During the deposition process, both the inlet pipe 32 and the outlet pipe 33 are connected to an external cooling device (not shown in the figure) so that the cooling medium enters the condensation chamber 31 through the inlet pipe 32 and exits the condensation chamber 31 through the outlet pipe 33, thus maintaining the temperature of the condensation chamber 31 at the target temperature. By adjusting the cooling device to change the temperature of the cooling medium, the temperature inside the condensation chamber 31 is changed, further altering the temperature of the deposition chamber 2, thereby cultivating clusters of particles of a specific size.
[0044] Compared with existing technologies, the low-temperature stirred deposition apparatus of this invention has several advantages: Firstly, by using a cooling mechanism (such as a liquid nitrogen condenser) to achieve stable deep low-temperature cooling of the deposition chamber (down to -120°C), it promotes the growth of single atoms / clusters to precisely control particle size, while simultaneously stabilizing particle motion and reducing adhesion loss on the deposition chamber walls. Secondly, equipped with a stirring mechanism (stirring rod and stirring blades), the stirring blades are rotated by a rotary drive assembly, ensuring thorough mixing and agitation of single-atom / cluster particles with the sample powder, significantly improving coating uniformity and solving the problems of traditional apparatuses. The problem of poor coating quality is addressed by the following measures: The reaction chamber is equipped with an inlet and an outlet, allowing the introduction of protective gas and the creation of a positive pressure environment. Combined with a sealing structure (such as a sealing ring or sealing pressure ring), air is isolated, effectively preventing oxidation and deterioration of single atoms / clusters and sample powder. The isolation design between the condensation chamber and the reaction chamber (such as a first isolation chamber) avoids frost formation around the chamber due to low temperatures, ensuring stable operation of the device. The bottom wall, side walls, and end cap of the reaction chamber are detachably connected, and the stirring blades and stirring rods are detachably assembled via a sleeve, facilitating the removal of deposited samples, cleaning of the device interior, or component maintenance, thus improving operational practicality.
[0045] The above embodiments only illustrate preferred implementations of this utility model, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.
Claims
1. A cryogenic stirred deposition apparatus comprising a reaction chamber, characterized by: The reaction chamber has a reaction cavity, which is provided with a feed inlet for single-atom or cluster particles to enter the reaction cavity. The reaction chamber is provided with an inlet and an outlet for gas to enter and exit, which are connected to the reaction cavity. The reaction cavity is provided with a deposition chamber for mixing single-atom or cluster particles with powder. A cooling mechanism is provided between the deposition chamber and the reaction cavity to cool the deposition chamber. A stirring mechanism is also provided between the deposition chamber and the reaction chamber to make the single-atom or cluster particles and powder mix evenly.
2. The cryogenic stirred deposition apparatus of claim 1, wherein: The cooling mechanism includes a condensation chamber, an inlet pipe, and an outlet pipe. Both the inlet pipe and the outlet pipe are connected to the condensation chamber to introduce a cooling medium into the condensation chamber or to export the cooling medium from the condensation chamber. The deposition chamber is located inside the condensation chamber and its opening is exposed outside the condensation chamber.
3. The cryogenic stirred deposition apparatus of claim 2, wherein: The inlet pipe is connected to the condensing chamber at the lower part of the condensing chamber to introduce the cooling medium into the condensing chamber from bottom to top, and the outlet pipe is connected to the condensing chamber at the upper part of the condensing chamber. The inlet pipe and the outlet pipe are arranged opposite each other in the radial direction.
4. The cryogenic stirred deposition apparatus of claim 2, wherein: A first isolation chamber is also provided between the condensation chamber and the reaction chamber.
5. The cryogenic stirred deposition apparatus of claim 2, wherein: A second isolation cavity is provided between the inlet tube and the outlet tube and the reaction chamber, and the two second isolation cavities are respectively used to isolate at least a portion of the inlet tube and at least a portion of the outlet tube from the reaction chamber.
6. The cryogenic stirred deposition apparatus of claim 5, wherein: The reaction chamber is provided with isolation rings surrounding the inlet tube and the outlet tube at the positions where the inlet tube and the outlet tube pass through.
7. The cryogenic stirred deposition apparatus of claim 1, wherein: The reaction chamber is provided with a feed pipe, one end of which is connected to the outside and the other end extends into the reaction chamber. The feed pipe has a feed port that connects the reaction chamber to the outside of the reaction chamber. The end of the feed pipe that extends into the reaction chamber is provided with a feeding pipe, which extends from the feed pipe toward the opening of the deposition chamber so as to allow single-atom or cluster particles to be fed into the deposition chamber.
8. The cryogenic stirred deposition apparatus of claim 1, wherein: The stirring mechanism includes a stirring rod, stirring blades, and a rotary drive assembly. One end of the stirring rod extends into the sedimentation chamber, and the other end extends out of the reaction chamber and is connected to the rotary drive assembly. The stirring blades are disposed at the end of the stirring rod that extends into the sedimentation chamber.
9. The cryogenic stirred deposition apparatus of claim 8, wherein: The stirring blade is assembled to the end of the stirring rod via a sleeve. The sleeve has an insertion hole that matches the outer diameter of the stirring rod. The stirring rod and the inner wall of the insertion hole are interference-fitted to fix each other. The stirring blade is connected to or integrally formed on the outer side of the sleeve.
10. The cryogenic stirred deposition apparatus of claim 8, wherein: A first sealing ring is provided around the stirring rod at the position where the stirring rod passes through the reaction chamber, and the first sealing ring is fixed to the reaction chamber by a sealing pressure ring.