Adjustable cleaning basket for wafer etching processing

Abstract

This utility model belongs to the field of wafer etching technology, specifically relating to an adjustable cleaning basket for wafer etching. It includes two symmetrically arranged upper support rods, each with a vertical rod fixed to its top center. A common lifting rod is fixed to the top of each vertical rod. Two symmetrically arranged U-shaped adjusting rods are movably inserted into the two upper support rods. When loading wafers of different diameters, this adjustable cleaning basket allows for manual pulling of an S-shaped lever, causing it to deform outwards through a weakened section. This disengages the positioning block from its corresponding positioning slot, allowing adjustment of the height of the upper support rods and the distance between the two U-shaped adjusting rods. This facilitates adaptation to the etching and cleaning needs of wafers of different diameters, improving the equipment's versatility and process safety.

Description

Technical Field

[0001] This utility model belongs to the field of wafer etching processing technology, specifically relating to an adjustable cleaning basket for wafer etching processing. Background Technology

[0002] In semiconductor manufacturing, wafer etching is a critical process, and the subsequent cleaning process significantly impacts wafer surface quality. The cleaning basket, as a core tool for supporting and securing the wafer, directly influences the cleaning effect and operational efficiency through its structural design.

[0003] Currently, most cleaning baskets on the market are fixed structures, with internal support spacing and clamping mechanisms only suitable for wafers of a single size. However, with the diversification of semiconductor processes, wafer size requirements are becoming increasingly diverse. For example, R&D or special processes may involve 6-inch, 8-inch, 12-inch, or even larger wafers. Existing fixed baskets cannot flexibly adjust their internal support structures, resulting in incompatible loading of wafers of different diameters. This necessitates the use of multiple sets of dedicated baskets, increasing equipment costs and reducing the flexibility and efficiency of the production line.

[0004] Therefore, there is an urgent need for an adjustable cleaning basket with a stable structure and convenient adjustment to adapt to the etching and cleaning needs of wafers of different diameters, thereby improving the versatility of the equipment and the safety of the process.

[0005] The information disclosed in this background section is intended only to enhance the understanding of the overall background of this utility model and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Utility Model Content

[0006] The purpose of this invention is to provide an adjustable cleaning basket for wafer etching processes to solve the problems of the prior art.

[0007] To achieve the above objectives, this utility model provides the following technical solution:

[0008] An adjustable cleaning basket for wafer etching includes two symmetrically arranged upper support rods. A vertical rod is fixedly connected to the top center of each upper support rod. A common lifting rod is fixedly connected to the top of each vertical rod. Two symmetrically arranged U-shaped adjusting rods are movably inserted into the two upper support rods. Multiple equidistant limiting grooves are formed on the inner wall of each U-shaped adjusting rod on its opposite side. Two symmetrically arranged lifting rods are fixedly connected to the bottom end of each U-shaped adjusting rod. The lifting rods are movably inserted into L-shaped adjusting rods. Two L-shaped adjusting rods on the same side are movably inserted into the same lower support rod. The two lower support outer rods are fixedly connected at their midpoints by a bottom support rod, and the top of the bottom support rod has multiple equally spaced slots. Two symmetrically arranged integrated adjustment and positioning components are installed at the top of each of the two upper support outer rods, and these integrated adjustment and positioning components are also connected to the U-shaped adjustment rod. Two symmetrically arranged integrated adjustment and positioning components are also installed at the top of each of the two lower support outer rods, and these integrated adjustment and positioning components are all connected to the L-shaped adjustment rod. Each L-shaped adjustment rod is equipped with an integrated adjustment and positioning component, and these integrated adjustment and positioning components are all connected to the lifting rod.

[0009] Preferably, the integrated adjustment and positioning assembly includes a through-hole opened at the top of the upper support outer rod, the top of the lower support outer rod, or the outer wall of the L-shaped adjustment rod, and an S-shaped lever is integrally formed on one side of the inner wall of the through-hole through a weakening part of an "Ω"-shaped structure.

[0010] Preferably, a positioning block is fixed to one side wall of the S-shaped lever, which is attached to the outside of the U-shaped adjusting rod, the outside of the L-shaped adjusting rod, or the outside of the lifting rod. The positioning block has symmetrically arranged inclined surfaces at one end away from the S-shaped lever.

[0011] Preferably, the S-shaped lever, the weakening part, and the positioning block are all made of ABS plastic.

[0012] Preferably, a plurality of equidistant positioning grooves are provided on the outer side wall of the U-shaped adjusting rod, the outer side of the L-shaped adjusting rod, or the outer side of the lifting rod. The positioning grooves are used for the positioning block to be engaged and fixed.

[0013] Preferably, the inner width of the bracket is equal to the inner width of the limiting groove, and the number of brackets is equal to the number of limiting grooves.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] (1) The adjustable cleaning basket for wafer etching processing of this utility model can be manually pulled to cause the S-shaped lever to deform outward through the weakened part when loading wafers of different diameters. This causes the positioning block to disengage from the corresponding positioning groove. At this time, the height of the upper support rod can be adjusted, and the distance between the two U-shaped adjustment rods can also be adjusted, so as to facilitate the etching and cleaning needs of wafers of different diameters and improve the versatility and process safety of the equipment. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the overall three-dimensional first-view structure of this utility model;

[0017] Figure 2 This is a schematic diagram of the overall three-dimensional second-view structure of this utility model;

[0018] Figure 3 This is a schematic diagram of the overall side view unfolded structure of this utility model;

[0019] Figure 4 This is an enlarged structural diagram of point A of this utility model;

[0020] Explanation of key figure labels:

[0021] 1. Upper support outer rod; 11. Vertical rod; 12. Lifting rod; 13. U-shaped adjusting rod; 131. Limiting groove; 14. Lifting rod; 15. L-shaped adjusting rod; 16. Lower support outer rod; 17. Bottom support rod; 171. Support groove; 2. Integrated adjustment and positioning assembly; 21. S-shaped lever; 211. Through-hole; 22. Weakening part; 23. Positioning block; 24. Positioning groove. Detailed Implementation

[0022] The technical solution of this utility model patent will be clearly and completely described below. Obviously, the described embodiments are only some, not all, of the embodiments of this utility model. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0023] In the description of this utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the utility model.

[0024] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0025] Currently, most cleaning baskets on the market are fixed structures, with internal support spacing and clamping mechanisms only suitable for wafers of a single size. However, with the diversification of semiconductor processes, wafer size requirements are becoming increasingly diverse. For example, R&D or special processes may involve 6-inch, 8-inch, 12-inch, or even larger wafers. Existing fixed baskets cannot flexibly adjust their internal support structures, resulting in incompatible loading of wafers of different diameters. This necessitates the use of multiple sets of dedicated baskets, increasing equipment costs and reducing the flexibility and efficiency of the production line.

[0026] See attached document Figure 1-4 An adjustable cleaning basket for wafer etching includes two symmetrically arranged upper support rods 1. Each upper support rod 1 has a vertical rod 11 fixedly connected to its top center. The top of each vertical rod 11 is fixedly connected to the same lifting rod 12. Two symmetrically arranged U-shaped adjusting rods 13 are movably inserted into the two upper support rods 1. Multiple equidistant limiting grooves 131 are formed on the inner wall of each U-shaped adjusting rod 13 on its opposite side. Two symmetrically arranged lifting rods 14 are fixedly connected to the bottom of each U-shaped adjusting rod 13. The lifting rods 14 are movably inserted into L-shaped adjusting rods 15. The two L-shaped adjusting rods 15 on the same side are movably inserted into the same lower... On the supporting outer rod 16, the two lower supporting outer rods 16 are fixedly connected at their middle parts by a bottom support rod 17. The top of the bottom support rod 17 is provided with multiple equally spaced slots 171. The top of each of the two upper supporting outer rods 1 is equipped with two symmetrically arranged integrated adjustment and positioning components 2, and the integrated adjustment and positioning components 2 are also connected to the U-shaped adjustment rod 13. The top of each of the two lower supporting outer rods 16 is also equipped with two symmetrically arranged integrated adjustment and positioning components 2, and the integrated adjustment and positioning components 2 are all connected to the L-shaped adjustment rod 15. The L-shaped adjustment rod 15 is equipped with an integrated adjustment and positioning component 2, and the integrated adjustment and positioning components 2 are all connected to the lifting rod 14.

[0027] Furthermore, such as Figure 1-4As shown, in order to enable loading and adaptation for wafers of different diameters, an integrated adjustment and positioning assembly 2 is provided. This assembly includes a through-hole 211 at the top of the upper support rod 1, the top of the lower support rod 16, or the outer wall of the L-shaped adjustment rod 15. An S-shaped lever 21 is integrally formed on one inner wall of the through-hole 211 through an Ω-shaped weakening part 22. A positioning block 23 is fixed to one side wall of the S-shaped lever 21, which is attached to the outside of the U-shaped adjustment rod 13, the L-shaped adjustment rod 15, or the lifting rod 14. The positioning block 23 has symmetrically arranged inclined surfaces at one end away from the S-shaped lever 21. The S-shaped lever 21, the weakening part 22, and the positioning block 23 are all made of ABS plastic. Multiple equidistant positioning grooves 24 are provided on one side wall of the outside of the U-shaped adjustment rod 13, the L-shaped adjustment rod 15, or the lifting rod 14. These positioning grooves 24 are used to engage and fix the positioning block 23.

[0028] The integrated adjustment and positioning component 2 adopts an integrated design, which is lightweight and simple in structure, and can be easily adjusted and positioned. It is convenient to operate and highly practical.

[0029] Furthermore, such as Figure 1-4 As shown, the inner width of the bracket 171 is equal to the inner width of the limiting groove 131, and the number of brackets 171 is equal to the number of limiting grooves 131.

[0030] In actual use, when loading wafers of different diameters, the S-shaped lever 21 can be manually pulled to cause it to deform outward through the weakening part 22, and the positioning block 23 can be disengaged from the corresponding positioning groove 24. At this time, the height of the upper support rod 1 can be adjusted, and the distance between the two U-shaped adjustment rods 13 can also be adjusted, so as to facilitate the etching and cleaning needs of wafers of different diameters, improve the versatility of the equipment and the safety of the process.

[0031] The foregoing description of specific exemplary embodiments of the present invention is for illustrative and explanatory purposes. These descriptions are not intended to limit the present invention to the precise forms disclosed, and it will be apparent that many changes and variations can be made in accordance with the foregoing teachings. The exemplary embodiments were chosen and described in order to explain the specific principles of the present invention and its practical application, thereby enabling those skilled in the art to implement and utilize various different exemplary embodiments of the present invention, as well as various different choices and variations. The scope of the present invention is intended to be defined by the claims and their equivalents.

Claims

1. An adjustable cleaning basket for wafer etching, comprising two symmetrically arranged upper support rods (1), each upper support rod (11) having a vertical rod (11) fixedly connected to its top center, and the top of each of the two vertical rods (11) having a single lifting rod (12) fixedly connected to its top, characterized in that, Two symmetrically arranged U-shaped adjusting rods (13) are movably inserted into the two upper support outer rods (1). Multiple equidistant limiting grooves (131) are opened on the inner wall of the opposite side of the two U-shaped adjusting rods (13). Two symmetrically arranged lifting rods (14) are fixed to the bottom end of the two U-shaped adjusting rods (13). The lifting rods (14) are movably inserted into the L-shaped adjusting rods (15). The two L-shaped adjusting rods (15) on the same side are movably inserted into the same lower support outer rod (16). The middle parts of the two lower support outer rods (16) are fixedly connected by a bottom support rod (17). Multiple equidistant brackets (171) are opened on the top of the bottom support rod (17). Two symmetrically arranged integrated adjustment and positioning components (2) are installed at the top of each of the two upper support outer rods (1), and the integrated adjustment and positioning components (2) are also connected to the U-shaped adjustment rod (13); Two symmetrically arranged integrated adjustment and positioning components (2) are also installed at the top of the two lower support outer rods (16), and the integrated adjustment and positioning components (2) are connected to the L-shaped adjustment rod (15). Each of the L-shaped adjusting rods (15) is equipped with an integrated adjusting and positioning component (2), which is connected to the lifting rod (14).

2. The adjustable cleaning basket for wafer etching as described in claim 1, characterized in that, The integrated adjustment and positioning component (2) includes a through-hole (211) opened at the top of the upper support outer rod (1), the top of the lower support outer rod (16), or the outer wall of the L-shaped adjustment rod (15). An S-shaped paddle (21) is integrally formed on one side of the inner wall of the through-hole (211) through a weakening part (22) of an "Ω"-shaped structure.

3. The adjustable cleaning basket for wafer etching according to claim 2, characterized in that, A positioning block (23) is fixed to one side wall of the S-shaped lever (21) on the outside of the U-shaped adjusting rod (13), the outside of the L-shaped adjusting rod (15), or the outside of the lifting rod (14). The positioning block (23) has a symmetrically arranged inclined surface at one end away from the S-shaped lever (21).

4. The adjustable cleaning basket for wafer etching according to claim 3, characterized in that, The S-shaped paddle (21), the weakening part (22), and the positioning block (23) are all made of ABS plastic.

5. An adjustable cleaning basket for wafer etching according to claim 4, characterized in that, Multiple equidistant positioning grooves (24) are provided on the outer side wall of the U-shaped adjusting rod (13), the outer side of the L-shaped adjusting rod (15), or the outer side of the lifting rod (14). The positioning grooves (24) are used for the positioning block (23) to be inserted and fixed.

6. An adjustable cleaning basket for wafer etching according to claim 1, characterized in that, The inner width of the bracket (171) is equal to the inner width of the limiting groove (131), and the number of the brackets (171) is equal to the number of the limiting grooves (131).

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