A polishing apparatus for producing an aluminum nitride substrate

Abstract

The utility model relates to aluminium nitride substrate processing equipment technical field especially relates to a kind of aluminium nitride substrate production polishing device.Its technical scheme includes support frame, one end of support frame is fixedly installed with auxiliary support, support frame and auxiliary support are all rotationally installed with several roller assemblies, the top of several roller assemblies is placed with substrate, two polishing components are fixedly installed on support frame, protective cover is equipped on polishing component, two limiting components are fixedly installed on auxiliary support, substrate is placed between the position of two limiting components.The utility model is limited to substrate by limiting component in horizontal direction and vertical direction, prevent substrate from producing sway in polishing and the process of push, improve the stability of polishing operation, the debris generated by protective cover can be shielded to polishing, avoid debris to fall on the upper surface of substrate, save the time of cleaning substrate surface debris, effectively improve processing efficiency.

Description

Technical Field

[0001] This utility model relates to the technical field of aluminum nitride substrate processing equipment, and in particular to an aluminum nitride substrate production polishing device. Background Technology

[0002] Aluminum nitride substrates possess high thermal conductivity, insulation, and chemical stability, making them widely used in power devices, integrated circuit packaging, and other fields. During the manufacturing process, the edges of the aluminum nitride substrates require polishing to prevent rough edges from causing electric field concentration, which could lead to partial discharge or signal reflection. Polishing the edges also prevents cracks from forming and propagating, thus avoiding substrate failure.

[0003] In existing aluminum nitride substrate polishing processes, clamping fixtures are typically used to position the substrate, followed by polishing of the substrate edges by a rotating grinding wheel. During this process, the grinding wheel needs to move laterally along the substrate edges to ensure that the substrate edges are fully polished. A large amount of debris is generated during polishing, some of which falls to the ground, while the rest is scattered on the upper surface of the substrate. After polishing, a significant amount of time is required to clean the debris adhering to the substrate surface, which is time-consuming, labor-intensive, and significantly reduces production efficiency. Therefore, this application proposes an aluminum nitride substrate production polishing apparatus that can prevent debris from scattering onto the substrate surface. Utility Model Content

[0004] The purpose of this invention is to address the problem in the prior art that polishing debris easily falls onto the substrate surface, requiring a significant amount of time to clean it. This invention proposes a polishing device for aluminum nitride substrate production that can prevent debris from falling onto the substrate surface.

[0005] The technical solution of this utility model: A polishing device for producing aluminum nitride substrates, comprising a support frame, an auxiliary bracket fixedly mounted at one end of the support frame, and a plurality of roller assemblies rotatably mounted on both the support frame and the auxiliary bracket, with a substrate placed on top of the plurality of roller assemblies, and further comprising:

[0006] A polishing assembly, comprising two polishing assemblies fixedly mounted on a support frame, wherein each polishing assembly is provided with a protective cover for blocking debris and preventing it from falling onto the upper surface of the substrate;

[0007] The limiting components are provided in two and fixedly installed on the auxiliary bracket. The substrate is placed between the two limiting components. The limiting components are used to limit the substrate and prevent it from shaking.

[0008] Optionally, the grinding assembly includes a first U-shaped frame, which is fixedly mounted on a support frame. A grinding wheel is rotatably mounted on the first U-shaped frame, and a servo motor is fixedly mounted on the top of the first U-shaped frame. The output end of the servo motor is fixedly connected to one end of the grinding wheel connecting shaft.

[0009] Optionally, the protective cover is fixedly installed on the first U-shaped frame, and a silicone pad is fixedly installed on the lower surface of the protective cover, with the bottom of the silicone pad contacting the upper surface of the substrate.

[0010] Optionally, the limiting component includes a second U-shaped frame, which is fixedly mounted on an auxiliary support. Several rubber rollers are rotatably mounted on the inner side of the second U-shaped frame, and the end of the substrate contacts a matching rubber roller.

[0011] Optionally, a plurality of third U-shaped frames are fixedly installed on the upper surface of the second U-shaped frame, and pressing rollers are rotatably installed on the third U-shaped frames, with the bottom end of the pressing rollers contacting the upper surface of the substrate.

[0012] Optionally, the roller assembly includes a rotating shaft, and a plurality of rotating shafts are provided and rotatably mounted on the support frame and auxiliary bracket, and a plurality of support rollers are fixedly mounted on the rotating shafts.

[0013] Optionally, several limiting sleeves are fixedly installed on the two inner side walls of the support frame and the auxiliary bracket, and the ends of the rotating shaft are inserted into the matching limiting sleeves and rotatably connected to them.

[0014] Compared with the prior art, this application includes at least one of the following beneficial technical effects: the substrate is supported by a roller assembly, and the rolling of the rollers facilitates pushing the substrate to the position of the polishing assembly; the limiting assembly limits the substrate in the horizontal and vertical directions to prevent the substrate from shaking during polishing and pushing, thereby improving the stability of the polishing operation; the protective cover can shield the polishing debris, preventing the debris from falling onto the upper surface of the substrate, saving time for cleaning debris from the substrate surface, and effectively improving production efficiency. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0016] Figure 2 This is a schematic diagram of the support frame and auxiliary support structure of this utility model;

[0017] Figure 3 This is a schematic diagram of the grinding component structure of this utility model;

[0018] Figure 4 This is a schematic diagram of the limiting component structure of this utility model;

[0019] Figure 5 This utility model Figure 2 An enlarged diagram of A in the diagram.

[0020] Attached reference numerals: 1. Supporting frame;

[0021] 2. Roller assembly; 21. Rotary shaft; 22. Support roller; 23. Limiting sleeve;

[0022] 3. Grinding components; 31. First U-shaped frame; 32. Servo motor; 33. Protective cover; 34. Silicone pad; 35. Grinding wheel;

[0023] 4. Limiting component; 41. Second U-shaped frame; 42. Third U-shaped frame; 43. Rubber roller; 44. Pressing roller;

[0024] 5. Substrate;

[0025] 6. Auxiliary support. Detailed Implementation

[0026] The technical solution of this utility model will be further described below with reference to the accompanying drawings and specific embodiments.

[0027] Example

[0028] like Figures 1-3 As shown, the present invention proposes an aluminum nitride substrate production polishing apparatus, comprising a support frame 1, an auxiliary bracket 6 fixedly mounted at one end of the support frame 1, and several roller assemblies 2 rotatably mounted on both the support frame 1 and the auxiliary bracket 6. The roller assemblies 2 support the substrate 5, and the substrate 5 is easily moved by the rolling of the support rollers 22. Limiting components 4 are fixedly mounted on two outer side walls of the auxiliary bracket 6, which are far apart from each other. When the substrate 5 is inserted into the inner side of the two limiting components 4, the limiting components 4 limit the substrate 5 in the horizontal and vertical directions. During the pushing and polishing process of the substrate 5, it can prevent the substrate 5 from shaking, effectively improving the stability of the polishing operation. Grinding components 3 are fixedly installed on the two outer side walls of the support frame 1 that are far apart from each other. A protective cover 33 is fixedly installed on the grinding component 3. The bottom end and the end away from the substrate 5 of the protective cover 33 are open structures. The debris generated during polishing is blocked by the protective cover 33, which can prevent the debris from splashing to one side of the substrate 5 and avoid the debris from falling on the upper surface of the substrate 5. This saves the time required to clean the debris on the upper surface of the substrate 5 and effectively improves production efficiency.

[0029] like Figure 1 and Figure 3As shown, to facilitate polishing of the edge of the substrate 5, a grinding wheel 35 is rotatably mounted on the first U-shaped frame 31 of the polishing assembly 3. One end of the grinding wheel 35 contacts the edge of the substrate 5. A servo motor 32 is fixedly mounted on the top of the first U-shaped frame 31. The output end of the servo motor 32 is fixedly connected to the top of the connecting shaft on the grinding wheel 35. The servo motor 32 drives the grinding wheel 35 to rotate, ensuring that the grinding wheel 35 can polish the edge of the substrate 5. During this process, the operator pushes the substrate 5 to the side where the grinding wheel 35 is installed, which facilitates the comprehensive polishing of the edge of the substrate 5. Alternatively, mechanical equipment can be used to push the substrate 5. The method of pushing and moving the substrate 5 is not the focus of this application and will not be described in detail here.

[0030] Furthermore, in order to prevent the protective cover 33 from scratching the upper surface of the substrate 5, a silicone pad 34 is fixedly installed at the bottom of the protective cover 33. Since the silicone pad 34 is made of soft material, it will not obstruct the substrate 5 during the movement of the substrate 5, and will also prevent scratches from being left on the upper surface of the substrate 5, thus effectively improving the protection effect of the substrate 5.

[0031] Secondly, a silicone gasket 34 is provided between the protective cover 33 and the substrate 5. The silicone gasket 34 can seal the gap between the protective cover 33 and the substrate 5, preventing debris from splashing from the gap onto the upper surface of the substrate 5.

[0032] like Figure 1 and Figure 4 As shown, in order to prevent the substrate 5 from wobbling horizontally during the pushing and polishing process, the second U-shaped frame 41 on the limiting component 4 is fixed to the outer wall of the auxiliary support 6. Several rubber rollers 43 are rotatably installed on the inner side of the second U-shaped frame 41. The substrate 5 is inserted between two second U-shaped frames 41. At this time, both ends of the substrate 5 are located inside the matching second U-shaped frames 41. The rubber rollers 43 are in contact with the edge of the substrate 5. The rubber rollers 43 limit the substrate 5 horizontally to prevent it from wobbling.

[0033] Furthermore, in order to prevent the substrate 5 from shaking vertically, several third U-shaped frames 42 are fixedly installed on the top of the second U-shaped frame 41. Pressing rollers 44 are rotatably installed on the third U-shaped frames 42. The bottom end of the pressing rollers 44 contacts the upper surface of the substrate 5. Combined with the support rollers 22 supporting the lower surface of the substrate 5, the substrate 5 can be vertically limited to prevent it from shaking vertically, effectively improving the stability of the substrate 5 during pushing and polishing.

[0034] Secondly, considering that the polished end of the substrate 5 gradually moves away from the auxiliary support 6, in order to avoid the polished end being unable to be stably limited, a limiting component 4 can be added to the support frame 1 on the side away from the polishing component 3 to enhance the stability of limiting the substrate 5.

[0035] like Figure 2 and Figure 5 As shown, to facilitate the installation of the roller assembly 2, several support rollers 22 are fixedly installed on the rotating shaft 21 at equal intervals. The roller assembly 2 is composed of the rotating shaft 21 and the support rollers 22. Several limiting sleeves 23 are fixedly installed on the two inner side walls of the support frame 1 and the auxiliary bracket 6. When installing the rotating shaft 21, first insert the end of the rotating shaft 21 into the inside of the limiting sleeve 23, and then fix the limiting sleeve 23 on the inner side walls of the support frame 1 and the auxiliary bracket 6 by screws or welding. This can securely install the rotating shaft 21 and effectively improve the ease of installation of the roller assembly 2.

[0036] In this embodiment, one end of the substrate 5 is first inserted between the two second U-shaped frames 41. The rubber rollers 43 on both sides of the substrate 5 provide horizontal positioning. At this time, the pressing roller 44 presses against the upper surface of the substrate 5. Combined with the support roller 22 supporting the bottom of the substrate 5, the substrate 5 is vertically positioned, preventing wobbling when pushed towards the polishing assembly 3 and improving the stability of the substrate 5 during polishing. When the edge of the substrate 5 contacts the grinding wheel 35, the servo motor 32 drives the grinding wheel 35 to rotate, keeping the substrate 5 in a lateral pushing state. The edges of the substrate 5 are fully polished. During the polishing process, a large amount of debris is generated and detached from the substrate 5 by the grinding wheel 35. The protective cover 33 blocks this debris to prevent it from falling onto the upper surface of the substrate 5. The bottom of the protective cover 33 and the side away from the substrate 5 are provided with openings to ensure that the debris falls to the ground and avoids the accumulation of a large amount of debris in the mounting area of ​​the grinding wheel 35. When polishing the substrate 5, the problem of debris falling and adhering to the upper surface of the substrate 5 is solved. There is no need to spend a lot of time cleaning the debris on the upper surface of the substrate 5, which saves time and effort and effectively improves production efficiency.

[0037] The above specific embodiments are merely several optional embodiments of this utility model. Based on the technical solution of this utility model and the relevant teachings of the above embodiments, those skilled in the art can make various alternative improvements and combinations to the above specific embodiments.

Claims

1. A polishing apparatus for producing aluminum nitride substrates, comprising a support frame (1), an auxiliary bracket (6) fixedly mounted at one end of the support frame (1), and a plurality of roller assemblies (2) rotatably mounted on both the support frame (1) and the auxiliary bracket (6), wherein a substrate (5) is placed on top of the plurality of roller assemblies (2), characterized in that, Also includes: Grinding assembly (3), two grinding assemblies (3) are provided and fixedly installed on the support frame (1). The grinding assembly (3) is provided with a protective cover (33), which is used to block debris and prevent it from falling onto the upper surface of the substrate (5). The limiting component (4) has two components and is fixedly installed on the auxiliary support (6). The substrate (5) is placed between the two limiting components (4). The limiting component (4) is used to limit the substrate (5) and prevent it from shaking. The limiting component (4) includes a second U-shaped frame (41). The second U-shaped frame (41) is fixedly installed on the auxiliary support (6). Several rubber rollers (43) are rotatably installed on the inner side of the second U-shaped frame (41). The end of the substrate (5) contacts the matching rubber roller (43). Several third U-shaped frames (42) are fixedly installed on the upper surface of the second U-shaped frame (41). Pressing rollers (44) are rotatably installed on the third U-shaped frame (42). The bottom end of the pressing rollers (44) contacts the upper surface of the substrate (5).

2. The aluminum nitride substrate production polishing apparatus according to claim 1, characterized in that, The grinding assembly (3) includes a first U-shaped frame (31), which is fixedly mounted on the support frame (1). A grinding wheel (35) is rotatably mounted on the first U-shaped frame (31). A servo motor (32) is fixedly mounted on the top of the first U-shaped frame (31). The output end of the servo motor (32) is fixedly connected to one end of the connecting shaft of the grinding wheel (35).

3. The aluminum nitride substrate production polishing apparatus according to claim 2, characterized in that, The protective cover (33) is fixedly installed on the first U-shaped frame (31), and a silicone pad (34) is fixedly installed on the lower surface of the protective cover (33). The bottom of the silicone pad (34) is in contact with the upper surface of the substrate (5).

4. The aluminum nitride substrate production polishing apparatus according to claim 1, characterized in that, The roller assembly (2) includes a rotating shaft (21), which is provided in a plurality of which are rotatably mounted on the support frame (1) and the auxiliary bracket (6). A plurality of support rollers (22) are fixedly mounted on the rotating shaft (21).

5. The polishing apparatus for producing aluminum nitride substrates according to claim 4, characterized in that, Several limiting sleeves (23) are fixedly installed on the two inner walls of the support frame (1) and the auxiliary bracket (6). The end of the rotating shaft (21) is inserted into the matching limiting sleeve (23) and rotatedly connected to it.

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