一种掩膜版对准调节装置
By introducing a mirror fine-tuning and base adjustment mechanism into the lithography machine, the problems of mirror installation deviation and platform pose deviation in the photomask alignment device were solved, achieving efficient and precise optical alignment and improving imaging clarity and alignment efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SHANGHAI XINYIDONG SEMICON TECH CO LTD
- Filing Date
- 2025-10-17
- Publication Date
- 2026-07-17
AI Technical Summary
The existing photomask alignment device of the lithography machine has a small error that cannot be effectively compensated during the installation of the mirror and the carrier platform, which leads to problems such as blurred imaging, alignment marks deviating from the field of view or no image being found. Relying on manual adjustment is inefficient and has limited accuracy.
A mask alignment adjustment device was designed, including a mirror fine-tuning mechanism and a base adjustment mechanism. By driving the mirror to move along the X and Y axes and rotate around the Z axis, and adjusting the levelness and deflection of the support platform, the installation deviation of the mirror and the tilt of the support platform are precisely corrected to ensure that the image of the alignment mark is located in the center of the field of view of the image receiver.
It improves the alignment accuracy and efficiency of lithography machines, reduces imaging blur and mark offset, shortens the debugging cycle, and avoids repeated attempts that rely on human experience.
Smart Images
Figure CN224519136U_ABST