A plasma-enhanced chemical vapor deposition apparatus

Abstract

The embodiment of the specification provides a kind of plasma enhanced chemical vapor deposition equipment, including window structure, equipment cavity and remote plasma;Window structure is installed on the shell of equipment cavity by clamp;Remote plasma is used to convert process gas in equipment cavity into plasma state and generate fluorine ion;Remote plasma is connected with window structure by cleaning pipeline, and switch is arranged on the cleaning pipeline, and the switch is used to transport fluorine ion to the surface of window structure through the cleaning pipeline to clean the surface of window structure.By this window structure, by opening the switch, fluorine ion generated by remote plasma work can be transported to the surface of window body through the cleaning pipeline, and the surface film layer of the surface of window body is reacted to realize the cleaning of window body, to ensure the observation effect of window to the reaction process in equipment;When cleaning work is completed, close the switch, to avoid excessive cleaning caused by repeated cleaning to cause damage to window.

Description

Technical Field

[0001] This specification relates to the field of vapor deposition equipment technology, and in particular to a plasma-enhanced chemical vapor deposition (PECVD) apparatus. Background Technology

[0002] When depositing thin films using a PECVD (Plasma-Enhanced Chemical Vapor Deposition) machine, the plasma ignition process within the chamber can be observed through a viewing window in the chamber wall. However, existing viewing windows are primarily made of flat quartz glass. Due to limitations in the size of the viewing window opening, observing the environment inside the chamber using flat quartz glass is quite laborious. Furthermore, over time, a thin film accumulates on the surface of the quartz glass, further affecting the observation of the chamber's internal conditions.

[0003] In view of this, the embodiments of this specification are intended to provide a plasma-enhanced chemical vapor deposition apparatus. Utility Model Content

[0004] In view of the above-mentioned problems in the prior art, the purpose of the embodiments in this specification is to provide a plasma-enhanced chemical vapor deposition apparatus.

[0005] To solve the above-mentioned technical problems, the specific technical solutions of the embodiments in this specification are as follows:

[0006] This specification provides an embodiment of a plasma-enhanced chemical vapor deposition apparatus, including a window structure, an apparatus cavity, and a remote plasma;

[0007] The viewing window structure is mounted on the outer shell of the device cavity by clamps;

[0008] The remote plasma is used to convert the process gas inside the equipment cavity into a plasma state and generate fluoride ions;

[0009] The remote plasma is connected to the window structure via a cleaning pipeline. A switch is installed on the cleaning pipeline to deliver fluoride ions generated by the remote plasma to the surface of the window structure for cleaning.

[0010] Specifically, the main body of the window includes quartz glass and a connecting platform;

[0011] The connecting platform includes a boss and a truncated cone disposed around the boss. The boss is located on the side facing the clamp, and the truncated cone is located on the side facing the equipment cavity. The quartz glass is disposed on the boss, and the surface of the quartz glass is convex.

[0012] Preferably, the surface of the quartz glass is coated with a corrosion-resistant film.

[0013] Specifically, the diameter of the boss is smaller than the inner diameter of the clamp, and the outer diameter of the frustum is larger than the inner diameter of the clamp;

[0014] When the frustum is secured between the clamp and the outer shell of the device cavity, the boss extends at least partially from the inner diameter of the clamp.

[0015] Furthermore, the clamp is provided with a plurality of connecting holes evenly distributed thereon. The connecting holes are used to cooperate with the connecting parts to detachably connect the clamp to the outer shell of the equipment cavity.

[0016] Preferably, the distance between the connecting hole and the center point of the clamp is greater than the radius of the main body of the window.

[0017] Specifically, the device cavity is provided with a plurality of mounting holes, and the mounting holes correspond one-to-one with the connection holes.

[0018] Furthermore, the window structure also includes a sealing ring, which is disposed between the window body and the device cavity.

[0019] Furthermore, the window structure also includes a sealing ring support ring;

[0020] The frustum has a groove on the side facing the equipment cavity, and the equipment cavity has a mounting groove.

[0021] The sealing ring support ring includes a first snap-fit ​​edge that engages with the groove and a second snap-fit ​​edge that engages with the mounting groove. A sealing ring fixing part is provided between the first snap-fit ​​edge and the second snap-fit ​​edge, and the sealing ring fixing part is used to fix the sealing ring.

[0022] Preferably, the clamp is made of stainless steel.

[0023] Using the above technical solution, the plasma-enhanced chemical vapor deposition (PECVD) apparatus provided in this specification not only allows the remote plasma to convert the process gas inside the apparatus cavity into a plasma state, but also, after a film layer is deposited on the surface of the viewing window, turning on the switch allows the fluoride ions generated by the remote plasma operation to be transported to the surface of the viewing window via a cleaning pipeline, reacting with the film layer on the surface of the viewing window to clean the viewing window and ensure the viewing window's ability to observe the reaction process inside the apparatus. After the cleaning work is completed, the switch can be turned off to avoid repeated cleaning that could cause over-cleaning and damage to the viewing window.

[0024] To make the above and other objects, features and advantages of the embodiments of this specification more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0025] To more clearly illustrate the technical solutions in the embodiments or prior art of this specification, the drawings used in the description of the embodiments or prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this specification. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0026] Figure 1 A schematic diagram of the window structure is shown;

[0027] Figure 2 An exploded view of the window structure is shown;

[0028] Figure 3 A schematic diagram of the viewport structure from another perspective is shown;

[0029] Figure 4 A cross-sectional view of the window structure assembled on a plasma-enhanced chemical vapor deposition device is shown.

[0030] Figure 5 A schematic diagram of a plasma-enhanced chemical vapor deposition (PECVD) apparatus is shown.

[0031] Explanation of symbols in the attached drawings:

[0032] 10. Window structure;

[0033] 11. Quartz glass; 12. Connecting platform; 121. Boss; 122. Frustum; 123. Groove; 13. Sealing ring; 14. Sealing ring support ring; 15. Connecting component;

[0034] 20. Equipment cavity; 21. Mounting slot;

[0035] 30. Clamps;

[0036] 40. Remote plasma;

[0037] 50. Clean the pipeline; 51. Switch. Detailed Implementation

[0038] The technical solutions in the embodiments of this specification will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this specification, and not all embodiments. Based on the embodiments in this specification, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this specification.

[0039] It should be noted that the terms "first," "second," etc., used in this specification, claims, and the foregoing drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, apparatus, product, or device that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or devices.

[0040] This specification provides a plasma-enhanced chemical vapor deposition (PECVD) apparatus to address the problem in the prior art where a film layer accumulates on the surface of the viewing window of a PCVD apparatus over time, adversely affecting the observation results.

[0041] like Figures 1 to 5 As shown, the plasma-enhanced chemical vapor deposition apparatus provided in the embodiments of this specification includes a viewing window structure 10, an apparatus cavity 20, and a remote plasma 40;

[0042] The viewing window structure 10 is mounted on the outer shell of the device cavity 20 by a clamp 30;

[0043] The remote plasma 40 is used to convert the process gas in the equipment cavity 20 into a plasma state and generate fluoride ions.

[0044] The remote plasma 40 is connected to the window structure 10 via a cleaning pipeline 50, and a switch 51 is provided on the cleaning pipeline 50. The switch 51 is used to transport fluoride ions generated by the remote plasma 40 to the surface of the window structure 10 via the cleaning pipeline 50 to clean the surface of the window structure 10.

[0045] The switch 51 controls the opening and closing of the cleaning pipeline 50. When the switch 51 is open, fluoride ions generated by the remote plasma 40 can be delivered to the surface of the window structure 10 and clean the surface of the window structure 10. When the switch 51 is closed, the delivery of fluoride ions can be stopped.

[0046] The embodiment of this specification provides a viewing window structure. Remote plasma can not only convert process gases within the equipment cavity into a plasma state, but also, after a film layer is deposited on the surface of the viewing window structure, fluoride ions generated by the remote plasma operation can be transported to the surface of the viewing window structure via the cleaning pipeline by turning on a switch. These fluoride ions react with the film layer on the surface of the viewing window structure (the reaction products are then pumped away), thus cleaning the viewing window structure and ensuring the viewing window's ability to observe the reaction process within the equipment. Furthermore, after cleaning is completed, the switch can be turned off to cut off the delivery of fluoride ions, avoiding repeated cleaning that could cause over-cleaning and damage to the viewing window.

[0047] like Figure 2 As shown, the window structure 10 includes quartz glass 11 and a connecting platform 12;

[0048] The connecting platform 12 includes a boss 121 and a frustum 122 disposed around the boss 121. In some feasible embodiments, the boss 121 and the frustum 122 can be integrally formed. Specifically, the boss 121 is located on the side facing the clamp 30, and the frustum 122 is located on the side facing the device cavity 20. The size of the boss 121 is smaller than the size of the frustum 122, and the size of the boss 121 is adapted to the inner diameter of the clamp 30; and the boss 121 protrudes beyond the frustum 122.

[0049] The quartz glass 11 is disposed at the boss 121, and at least one side of the surface of the quartz glass 11 is convex.

[0050] In the embodiments described in this specification, convex quartz glass is preferably used to amplify the reaction process inside the equipment cavity 20, making it easier for operators to observe.

[0051] In some other feasible embodiments, the surface of the quartz glass 11 may also be planar.

[0052] Preferably, in the embodiments of this specification, the surface of the quartz glass 11 is coated with a corrosion-resistant film.

[0053] Specifically, the corrosion-resistant film can be a TiN film. Fluorine ions can remove the film layer deposited on the surface of the quartz glass 11 without damaging the corrosion-resistant film layer, thereby helping to extend the service life of the window structure 10.

[0054] Specifically, in the embodiments of this specification, the diameter of the boss 121 is smaller than the inner diameter of the clamp 30, and the outer diameter of the frustum 122 is larger than the inner diameter of the clamp 30;

[0055] When the frustum 122 is secured between the clamp 30 and the outer shell of the device cavity 20, the boss 121 can extend at least partially from the inner diameter of the clamp 30, so that the quartz glass 11 can also be exposed from the inner diameter of the clamp 30.

[0056] The frustum 122 can be clamped by the clamp 30 and the outer shell of the equipment cavity 20 to ensure the stability of the viewing window structure 10 on the equipment; while the quartz glass 11 can be exposed from the middle of the clamp 30 to ensure the observation effect of the reaction inside the equipment.

[0057] Specifically, the clamp 30 is provided with a plurality of connecting holes evenly distributed thereon. The connecting holes are used to cooperate with the connector 15 to detachably connect the clamp 30 to the outer shell of the equipment cavity 20.

[0058] The outer shell of the equipment cavity 20 is also provided with multiple mounting holes. These mounting holes are adapted to the connecting holes on the clamp 30; that is, the number of mounting holes is equal to the number of connecting holes, and the positional distribution of the mounting holes is the same as that of the connecting holes, meaning each connecting hole has a corresponding mounting hole. After passing the connector 15 (such as a bolt or screw) through the connecting hole on the clamp 30, and then placing the window structure 10 between the clamp 30 and the outer shell of the equipment cavity 20, the connector is further passed through the corresponding mounting hole on the outer shell of the equipment cavity 20, thus achieving a stable installation of the window structure 10.

[0059] Furthermore, the distance between the connecting hole and the center point of the clamp 30 is greater than the radius of the window structure 10. That is, when the window structure 10 is installed using the connector 15, the connector 15 will be located on the periphery of the window structure 10 as a whole, and the installation process will not be interfered with by the window structure 10.

[0060] In some preferred embodiments, the window structure 10 further includes a sealing ring 13 disposed between the window structure 10 and the device cavity 20.

[0061] The sealing ring 13 is used to ensure the airtightness of the plasma-enhanced chemical vapor deposition equipment after the window structure is installed.

[0062] Furthermore, such as Figure 3 and Figure 4 As shown, the window structure 10 also includes a sealing ring support ring 14;

[0063] The frustum 122 has a groove 123 on the side facing the device cavity 20, and the device cavity 20 has a mounting groove 21.

[0064] The sealing ring support ring 14 includes a first snap-fit ​​edge that engages with the groove 123 and a second snap-fit ​​edge that engages with the mounting groove 21. A sealing ring fixing part is provided between the first snap-fit ​​edge and the second snap-fit ​​edge; the sealing ring fixing part is used to fix the sealing ring 13. In some specific embodiments, the sealing ring 13 can be sleeved on the sealing ring fixing part of the sealing ring support ring 14. When the sealing ring 13 is assembled on the sealing ring support ring 14, and the sealing ring support ring 14 is assembled between the viewing window structure 10 and the equipment cavity 20, the sealing ring 13 will be in close contact with the equipment cavity 20 and the viewing window structure 10, ensuring the airtightness of the equipment cavity.

[0065] The sealing ring support ring 14 can disperse the clamping force of the clamp 30 and protect the sealing ring 13 from local shearing; it can also compensate for the flatness deviation between the window structure 10 and the equipment cavity 20, ensuring uniform pressure and further guaranteeing the sealing effect of the equipment.

[0066] Preferably, in the embodiments of this specification, the clamp 30 is made of stainless steel.

[0067] It should be noted that, in the embodiments of this specification, the use of the terms "comprising" or "including" to describe combinations of elements, components, parts, or steps herein also contemplates embodiments essentially composed of these elements, components, parts, or steps. The use of the term "may" herein is intended to indicate that any described attribute "may" include is optional. Multiple elements, components, parts, or steps can be provided by a single integrated element, component, part, or step. Alternatively, a single integrated element, component, part, or step can be divided into multiple separate elements, components, parts, or steps. The use of "a" or "an" to describe an element, component, part, or step does not imply exclusion of other elements, components, parts, or steps.

[0068] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from the others. Similar or identical parts between embodiments can be referred to interchangeably. The above embodiments are only for illustrating the technical concept and features of this utility model, and are intended to enable those skilled in the art to understand the content of this utility model and implement it accordingly. They should not be construed as limiting the scope of protection of this utility model. All equivalent changes or modifications made in accordance with the spirit and essence of this utility model should be included within the scope of protection of this utility model.

Claims

1. A plasma-enhanced chemical vapor deposition apparatus, characterized in that, It includes a viewing window structure (10), a device cavity (20), and a remote plasma (40); The viewing window structure (10) is mounted on the outer shell of the equipment cavity (20) by means of a clamp (30); The remote plasma (40) is used to convert the process gas in the equipment cavity (20) into a plasma state and generate fluoride ions; The remote plasma (40) is connected to the window structure (10) via a cleaning pipeline (50). A switch (51) is provided on the cleaning pipeline (50). The switch (51) is used to transport fluoride ions generated by the remote plasma (40) to the surface of the window structure (10) via the cleaning pipeline (50) to clean the surface of the window structure (10).

2. The plasma-enhanced chemical vapor deposition apparatus according to claim 1, characterized in that, The window structure (10) includes quartz glass (11) and a connecting platform (12); The connecting platform (12) includes a boss (121) and a truncated cone (122) disposed around the boss (121). The boss (121) is located on the side facing the clamp (30), and the truncated cone (122) is located on the side facing the equipment cavity (20). The quartz glass (11) is disposed on the boss (121), and the surface of the quartz glass (11) is convex.

3. The plasma-enhanced chemical vapor deposition apparatus according to claim 2, characterized in that, The surface of the quartz glass (11) is coated with a corrosion-resistant film.

4. The plasma-enhanced chemical vapor deposition apparatus according to claim 2, characterized in that, The diameter of the boss (121) is smaller than the inner diameter of the clamp (30), and the outer diameter of the frustum (122) is larger than the inner diameter of the clamp (30); When the frustum (122) is secured between the clamp (30) and the outer shell of the device cavity (20), the boss (121) extends at least partially from the inner diameter of the clamp (30).

5. The plasma-enhanced chemical vapor deposition apparatus according to claim 4, characterized in that, The clamp (30) is provided with a plurality of connecting holes evenly distributed on it. The connecting holes are used to cooperate with the connecting parts to detachably connect the clamp (30) to the outer shell of the equipment cavity (20).

6. The plasma-enhanced chemical vapor deposition apparatus according to claim 5, characterized in that, The distance between the connecting hole and the center point of the clamp (30) is greater than the radius of the window structure (10).

7. The plasma-enhanced chemical vapor deposition apparatus according to claim 5, characterized in that, The device cavity (20) is provided with a plurality of mounting holes, and the mounting holes correspond one-to-one with the connection holes.

8. The plasma-enhanced chemical vapor deposition apparatus according to claim 2, characterized in that, The window structure (10) also includes a sealing ring (13), which is disposed between the window structure (10) and the device cavity (20).

9. The plasma-enhanced chemical vapor deposition apparatus according to claim 8, characterized in that, It also includes a sealing ring support ring (14); The frustum (122) has a groove (123) on the side facing the equipment cavity (20), and the equipment cavity (20) has a mounting groove (21); The sealing ring support ring (14) includes a first snap-fit ​​edge that engages with the groove (123) and a second snap-fit ​​edge that engages with the mounting groove (21). A sealing ring fixing part is provided between the first snap-fit ​​edge and the second snap-fit ​​edge, and the sealing ring fixing part is used to fix the sealing ring (13).

10. The plasma-enhanced chemical vapor deposition apparatus according to claim 1, characterized in that, The clamp (30) is made of stainless steel.

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