A system for use with a gas purification device

Abstract

The utility model provides a kind of application system of gas purification device, including multiple independent settings purification unit, and the import end of each purification unit can be connected to first feed pipe, the export end of each purification unit can be connected to first discharge pipe, and each purification unit includes purifier body, purifier body is set in heating furnace.The application system of gas purification device of the utility model, the application system can install adaptation multiple purifier bodies, when using, using purifier body of single path, and the purity of target gas can be implemented detection by target gas analyzer, after reducing to set threshold, the purifier body of new purifier body of a way can be replaced by closing use, this process can be carried out in production, without affecting the continuity of production, and the purifier body of replacement can be closed by two manual valves, internal material can be avoided to leak, easy to operate.

Description

Technical Field

[0001] This utility model belongs to the field of gas purification, and in particular relates to an application system of a gas purification device. Background Technology

[0002] Semiconductor material manufacturing processes, such as photolithography, require ultra-high purity argon or other specific gases. Generally, the purity of procured gases often fails to meet these requirements, containing impurities and other contaminants. For example, semiconductor manufacturing involves atomic-level operations; insufficient gas purity introduces impurities such as metal ions and particulate matter, leading to lattice defects, increased leakage current, and directly impacting chip performance and yield. For instance, contact with oxygen can cause the formation of an oxide layer in metal interconnect layers, resulting in increased resistance and signal attenuation. Therefore, further purification of procured gases is necessary to meet industrial production requirements. Gas purifiers are commonly used in pharmaceuticals and semiconductors, where extremely high gas purity is required. Current technologies necessitate the purification of procured gases before use to meet production demands, hindering continuous online production and impacting efficiency. Summary of the Invention

[0003] In view of this, the present invention aims to propose an application system for a gas purification device to solve the problems of existing technologies where the purity of elemental gases cannot meet production requirements, affecting product quality, and the inability to purify gases online, thus affecting production efficiency.

[0004] To achieve the above objectives, the technical solution of this utility model is implemented as follows:

[0005] An application system for a gas purification device includes multiple independently configured purification units. The inlet of each purification unit is connected to a first feed pipe, and the outlet of each purification unit is connected to a first discharge pipe. Each purification unit includes a purifier body, which is installed inside a heating furnace. A first manual valve is installed at each end of the purifier body. The outlet of the first feed pipe is connected to the inlet of a first filter. The first manual valve located at the front end of the purifier body is connected to the outlet of the first filter. An automatic inlet valve is installed at the inlet of the first feed pipe. The first manual valve located at the rear end of the purifier body is connected to the inlet of the first discharge pipe. A target gas analyzer is installed on the first discharge pipe.

[0006] Furthermore, a first electronic pressure regulating valve is provided on the first feed pipe, and the first electronic pressure regulating valve is located at the rear end of the inlet automatic valve.

[0007] Furthermore, a first pressure relief pipe is provided on the first feed pipe, the first pressure relief pipe is located between the first electronic pressure regulating valve and the first filter, and a first safety unloading valve is provided on the first pressure relief pipe.

[0008] Furthermore, a first check valve is provided on the first pressure relief pipe, and the first check valve is located at the rear end of the first safety unloading valve.

[0009] Furthermore, a first flow controller is also provided on the first feed pipe, and the first flow controller is located at the rear end of the first filter.

[0010] Furthermore, each purifier body is provided with a first branch pipe, and each first branch pipe is provided with a second check valve and a first control valve.

[0011] Furthermore, a second flow controller, a first pressure sensor, and a first temperature sensor are respectively installed on the discharge pipe.

[0012] Furthermore, a second temperature sensor is installed inside the heating furnace.

[0013] Compared with the prior art, the application system of the gas purification device described in this utility model has the following advantages: the application system can be installed and adapted to multiple purifier bodies. In application, a single-path purifier body is used, and the purity of the target gas can be detected by the target gas analyzer. When the purity drops to a set threshold, the used purifier body can be shut down and a new purifier body can be replaced. This process can be carried out in production without affecting the continuity of production. Moreover, the replaced purifier body can be closed by two manual valves to prevent internal leakage of substances, and the operation is simple. Attached Figure Description

[0014] The accompanying drawings, which form part of this utility model, are used to provide a further understanding of the utility model. The illustrative embodiments of the utility model and their descriptions are used to explain the utility model and do not constitute an undue limitation of the utility model. In the drawings:

[0015] Figure 1 This is a control schematic diagram of an application system for a gas purification device according to an embodiment of the present invention;

[0016] Figure 2 This is a schematic diagram of the structure of a gas purification device according to an embodiment of the present invention;

[0017] Figure 3 This is a cross-sectional schematic diagram of a gas purification device according to an embodiment of the present invention;

[0018] Figure 4 This is a schematic diagram of the exploded structure of a gas purification device according to an embodiment of the present invention;

[0019] Figure 5 This is an exploded structural diagram of the fit between the adapter groove and the sealing ring at the front end of the outer shell according to an embodiment of the present invention.

[0020] Explanation of reference numerals in the attached figures:

[0021] 101-First feed pipe; 102-First discharge pipe; 103-Heating furnace; 104-First manual valve; 105-First filter; 106-Inlet automatic valve; 107-Target gas analyzer; 108-First electronic pressure regulating valve; 109-First pressure relief pipe; 110-First safety unloading valve; 111-First check valve; 112-First flow controller; 113-First branch pipe; 114-Second check valve; 115-First control valve; 116-Second flow controller; 117-First pressure sensor; 118-First temperature sensor; 119-Second temperature sensor;

[0022] 300-Purifier body; 301-Outer shell; 302-Front end cover; 303-Rear end cover; 304-Filter element; 305-Connecting pipe; 306-Screw sleeve; 307-First filter screen; 308-Adaptive fitting; 309-Annular platform; 310-Sealing ring; 311-Second filter screen. Detailed Implementation

[0023] It should be noted that, unless otherwise specified, the embodiments and features described in these embodiments of the present invention can be combined with each other.

[0024] In the description of this utility model, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0025] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0026] The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0027] like Figures 2-5 As shown, a gas purification device includes a housing 301, a front cover 302, a rear cover 303, and a filter element 304. The front cover 302 is detachably installed at the front end of the housing 301, and the rear cover 303 is welded to the rear end of the housing 301. Each of the front cover 302 and the rear cover 303 has an opening and closing structure, which is a needle valve or diaphragm valve of the prior art. The housing 301 is filled with a filter medium, and the filter element 304 is installed on the inner ring of the housing 301 near the rear cover 303. The filter medium sequentially includes a deoxidizer layer, a desulfurizer layer, and a dehydration layer. The deoxidizer layer is filled with a deoxidizer of the prior art, the desulfurizer layer is filled with a desulfurizer of the prior art, and the dehydration layer is filled with a molecular sieve or a desiccant. In this device, the filter medium can be easily replaced by removing the front cover 302. It is easy to operate and has a wide range of applicable working conditions.

[0028] The front cover 302 and the rear cover 303 are respectively provided with a connecting pipe 305. The connecting pipe 305 is fixedly connected to one end of the opening and closing structure. By providing the connecting pipe 305 on the front and rear covers, it is convenient to install and adapt the opening and closing structure without damaging the front and rear covers, and the service life of the front and rear covers can be improved.

[0029] The filter element 304 has a barrel-shaped structure with filter holes evenly distributed on the sidewalls. The filter element 304 is installed at one end of the connecting pipe 305 located in the middle of the rear end cover 303. The other end of the connecting pipe 305 is connected to the opening and closing structure. In this embodiment, the filter element 304 is a prior art ultrapure filter with a filtration accuracy of 0.003μm. It performs terminal ultrapure filtration on the target gas to be purified and final filtration on extremely small particles to obtain ultrapure gas. Through media filtration combined with filter element filtration, the gas purity can ultimately meet the requirements of industrial production.

[0030] The front inner ring of the outer casing 301 is provided with a first filter screen 307. The filter pore size of the first filter screen 307 is larger than that of the filter element 304. The first filter screen 307 is a fine filter membrane of the prior art, and the filtration accuracy is selectable from 1 to 2.5 μm.

[0031] To facilitate the disassembly, assembly, and support of the first filter screen 307, the first filter screen 307 is installed to the first end of the adapter 308, and the outer periphery of the first end of the adapter 308 is threaded to the inner ring of the front end of the housing 301. The second end of the adapter 308 is threaded to the inner ring of the front end cover 302. As an example, the thread adopts the American standard NPT 60° tapered thread.

[0032] To facilitate the assembly and disassembly of the adapter 308, an annular platform 309 is provided around the adapter 308. Both ends of the annular platform 309 abut against one end of the front cover 302 and the front end of the outer shell 301, respectively. A sealing ring 310 is provided between one end of the annular platform 309 and one end of the front cover 302, and between the other end of the annular platform 309 and the front end of the outer shell 301. The sealing ring 310 ensures a seal in this area. During implementation, an adapter groove is provided at each end of the annular platform 309 or at the front end of the outer shell 301 and one end of the front cover 302. The depth H of the adapter groove is less than the thickness D of the sealing ring 310. During thread tightening, the sealing ring is compressed, thereby enhancing the sealing effect. Each sealing ring 310 is installed in one adapter groove. The sealing rings are made of silicone nitride rubber, which has excellent heat resistance. A high-precision sealing thread design and a soft, high-temperature resistant gasket are used for combined sealing. This component can be disassembled to replace expired / ineffective activated materials, improving the service life of the purification device. Furthermore, the design pressure for the component thread seal in this embodiment is 5 MPa, and its sealing performance test must meet the requirement of <1×10 -10 pa·m 3 / s, for example, using American standard NPT 60° tapered thread, its sealing performance can reach 1×10 -12 pa·m 3 / s.

[0033] A second filter screen 311 is provided on the inner ring of the end of the adapter 308 near the front cover 302. The pore size of the second filter screen 311 is larger than that of the first filter screen 307. The second filter screen 311 is a micro-particle filter membrane of the prior art. The minimum particle diameter selection range is 2.5μm, which is higher than that of the external large particle filter. It belongs to secondary particulate filtration. The total thickness of the membrane and membrane sheet is 3mm. The large particle filter is installed at the inlet end of the opening and closing structure corresponding to the front cover 302. Its minimum particle diameter can be selected from 2.5μm to 5μm. It is made of a metal wire network structure and is a replaceable accessory. It is also the prior art. Similarly, in order to facilitate the disassembly, assembly and support of the second filter screen 311, the second filter screen 311 is installed in the screw sleeve 306. The outer periphery of the screw sleeve 306 is detachably connected to the adapter 308. The second filter screen 311 and the first filter screen 307 are arranged parallel to each other.

[0034] The outer shell 301 can be made of 316L SS stainless steel or Hastelloy. One end of the connecting pipe 305 is fixedly connected to the filter element 304, and the other end of the connecting pipe 305 passes through the rear cover 303 and is connected to the opening and closing structure.

[0035] The working process of a gas purification device:

[0036] The filter medium filled inside the outer shell 301 can be used to purify the application gas by deoxygenation, desulfurization, and dehydration. The second filter screen 311, the first filter screen 307 and the filter element 304 can be used to purify the application gas by physical means such as particulate matter filtration.

[0037] In use, the gas enters the housing 301 after passing through the opening and closing structure on the front cover 302, the front cover 302, the second filter screen 311, and the first filter screen 307. After the gas reacts fully with the filter medium inside the housing 301, it is discharged to the outside of the housing 301 through the filter element 304. In order to ensure the filtration efficiency of the filter medium for the gas, the device can be placed in a high-temperature environment or the outside of the housing 301 can be heated. The first end of the adapter 308 is threaded to the inner ring of the front end of the housing 301, and the second end of the adapter 308 is threaded to the inner ring of the front cover 302. This facilitates the disassembly of the housing 301 and the end cover, and makes it easy to fill and unload the filter medium into and out of the housing 301.

[0038] Using the gas purification device described in this invention, the target application gas can be purified to meet the requirements of industrial production.

[0039] As one example, the gas used is argon, whose main impurities include: very little water, sulfides mainly composed of hydrogen sulfide, solid particulate matter, and oxygen.

[0040] The gas purifier filters in the following order: large molecular solid particles, small molecular solid particles, oxygen, sulfides, and moisture. It uses a second filter screen 311 and a first filter screen 307 for graded filtration of solid particles. Oxygen, sulfides, and moisture are removed using the filter media filled within the outer shell 301. The filter media includes, in sequence, a deoxidizer layer, a desulfurizer layer, and a dehydration layer. The deoxidizer layer is filled with a deoxidizer from the prior art, the desulfurizer layer is filled with a desulfurizer from the prior art, and the dehydration layer is filled with a molecular sieve. Before purification, the filter media needs to be heated and activated to 350°C. After passing through the filter media, the gas passes through a filter element 304 with a precision of 0.003 μm for final particle filtration of the outlet gas. In this example, the purified gas purity meets industrial production requirements.

[0041] like Figure 1As shown, an application system for a gas purification device includes multiple independently configured purification units. The inlet of each purification unit is connected to a first feed pipe 101, and the outlet of each purification unit is connected to a first discharge pipe 102. Each purification unit includes a purifier body 300, which is the aforementioned gas purification device. The purifier body 300 is disposed within a heating furnace 103. A second temperature sensor 119 (based on existing technology) is installed within the heating furnace 103 to detect the temperature inside the furnace. The heating furnace 103 is a high-temperature box-type resistance furnace (based on existing technology). In this embodiment, the control method is through a controller. Any controller capable of implementing the functions described in this utility model disclosure can be used. As an example, the controller is a PLC (Programmable Logic Controller). The power supply is also common knowledge in the art. Furthermore, this document primarily aims to protect mechanical devices, therefore... The aforementioned known technologies will not be explained in detail. The signal of the second temperature sensor is connected to the controller. The temperature inside the heating furnace 103 is detected by the second temperature sensor 119 to enable the controller to control the temperature inside the heating furnace 103. A first manual valve 104 is installed at each end of the purifier body 300. The outlet end of the first feed pipe 101 is connected to the inlet end of the first filter 105. The first manual valve 104 located at the front end of the purifier body 300 is connected to the outlet end of the first filter 105, which is the aforementioned large particle filter. An inlet automatic valve 106 is provided at the inlet end of the first feed pipe 101. The inlet automatic valve 106 is a solenoid valve of the prior art. The signal of the inlet automatic valve 106 is connected to the controller. The first manual valve 104 located at the rear end of the purifier body 300 is connected to the inlet end of the first discharge pipe 102. A target gas analyzer 107 is installed on the first discharge pipe 102. The target gas analyzer 107 is model H-Sorb. The X600 target gas analyzer 107 is connected to the controller. This application system can be equipped with multiple purifier bodies 300. In application, a single-path purifier body 300 is used, and the purity of the target gas can be detected in real time by the target gas analyzer 107. When the purity drops to the set threshold, the used purifier body 300 can be shut down and replaced with a new purifier body 300. This process can be carried out in production without affecting the continuity of production. The replaced purifier body 300 can be closed by two manual valves to prevent internal leakage. The operation is simple. The gas outlet of the purifier application area of ​​this system can be connected to multiple processes such as semiconductor lithography, and can also be used for micro-welding.

[0042] A first electronic pressure regulating valve 108 is installed on the first feed pipe 101. The model of the first electronic pressure regulating valve 108 is MY-59. The first electronic pressure regulating valve 108 is connected to the controller and is located at the rear end of the inlet automatic valve 106. The first electronic pressure regulating valve 108 is used to adjust the gas pressure of the gas to be purified in the first feed pipe 101 so that the gas pressure in the first feed pipe 101 is at a predetermined value.

[0043] A first pressure relief pipe 109 is provided on the first feed pipe 101. The first pressure relief pipe 109 is located between the first electronic pressure regulating valve 108 and the first filter 105. A first safety unloading valve 110 is provided on the first pressure relief pipe 109. The first safety unloading valve 110 is model NCSV-212 and is equipped with a pressure sensor. The first electronic pressure regulating valve 108 is connected to the controller. A pressure sensor is provided after the first electronic pressure regulating valve 108 to monitor the pressure and control the opening of the first electronic pressure regulating valve 108 through the controller to achieve pressure regulation. A pressure sensor is provided before the first electronic pressure regulating valve 108 to monitor the pressure at the feed inlet. If the first electronic pressure regulating valve 108 malfunctions, the first safety unloading valve 110 automatically releases pressure. This works by triggering a controller fault alarm when the pressure sensor reading rises, and then closing all valves on the first inlet pipe 101 and the first outlet pipe 102. A first check valve 111 is installed on the first pressure relief pipe 109, and is located at the rear end of the first safety unloading valve 110. The first safety unloading valve has automatic pressure relief capability, and a pressure sensor located at its rear end monitors the pressure in the downstream pipeline.

[0044] A first flow controller 112 is also provided on the first feed pipe 101. The first flow controller 112 is located at the rear end of the first filter 105 and is connected to the controller. The model of the first flow controller 112 is FDC-320 gas mass flow controller, which is used to control the flow rate of the gas medium on the first feed pipe 101.

[0045] Each purifier body 300 is provided with a first branch pipe 113, and each first branch pipe 113 is provided with a second one-way valve 114 and a first control valve 115. The first control valve 115 is a solenoid valve of the prior art. The first control valve 115 is connected to the controller. The first control valve 115 is used to cut off the passage at the outlet end of the first feed pipe 101.

[0046] A second flow controller 116, a first pressure sensor 117, and a first temperature sensor 118 are respectively installed on the discharge pipe. The first pressure sensor 117 and the first temperature sensor 118 are both existing technologies and are used to detect the pressure and temperature of the gas medium at the outlet end of the discharge pipe. The second flow controller 116 is an FDC-320 gas mass flow controller, which is used to control the flow rate of the gas medium on the first discharge pipe 102. The second flow controller 116, the first pressure sensor 117, and the first temperature sensor 118 are respectively connected to the controller.

[0047] Application process of a gas purification device system:

[0048] Semiconductor material manufacturing processes, such as photolithography, require ultra-high purity argon or other gases. Generally, the purity of procured gases is only 99.9% to 99.999%, and they contain impurities and other contaminants. A purification system can perform ultra-high purity purification on these gases. Through the system's automated gas filtration, purification, and heating catalytic purification functions, the gas purity can be increased to 99.99999%, a 100-fold increase. The system also features a purification device performance monitoring function. A gas analyzer and flow meter are installed at the back end of the purification device. By monitoring the gas concentration and flow rate, the system's performance is assessed. If the gas flow rate and concentration are below the normal operating range, the system automatically pauses and prompts the user to replace the purification device with a backup.

[0049] The above description is merely a preferred embodiment of this utility model and is not intended to limit the scope of this utility model. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of this utility model are permitted.

[0050] All of these should be included within the protection scope of this utility model.

Claims

1. An application system for a gas purification device, characterized in that: It includes multiple independently configured purification units, and the inlet of each purification unit can be connected to the first feed pipe (101), and the outlet of each purification unit can be connected to the first discharge pipe (102). Each purification unit includes a purifier body, which is set in a heating furnace (103). A first manual valve (104) is installed at each end of the purifier body. The outlet of the first feed pipe (101) is connected to the inlet of the first filter (105). The first manual valve (104) located at the front end of the purifier body is connected to the outlet of the first filter (105). An inlet automatic valve (106) is set at the inlet of the first feed pipe (101). The first manual valve (104) located at the rear end of the purifier body is connected to the inlet of the first discharge pipe (102). A target gas analyzer (107) is set on the first discharge pipe (102).

2. The application system of the gas purification device according to claim 1, characterized in that: A first electronic pressure regulating valve (108) is provided on the first feed pipe (101), and the first electronic pressure regulating valve (108) is located at the rear end of the inlet automatic valve (106).

3. The application system of the gas purification device according to claim 2, characterized in that: A first pressure relief pipe (109) is provided on the first feed pipe (101). The first pressure relief pipe (109) is located between the first electronic pressure regulating valve (108) and the first filter (105). A first safety unloading valve (110) is provided on the first pressure relief pipe (109).

4. The application system of the gas purification device according to claim 3, characterized in that: A first check valve (111) is provided on the first pressure relief pipe (109), and the first check valve (111) is located at the rear end of the first safety unloading valve (110).

5. The application system of the gas purification device according to claim 1, characterized in that: A first flow controller (112) is also provided on the first feed pipe (101), and the first flow controller (112) is located at the rear end of the first filter (105).

6. The application system of the gas purification device according to claim 1, characterized in that: Each purifier body is provided with a first branch pipe (113), and each first branch pipe (113) is provided with a second one-way valve (114) and a first control valve (115).

7. The application system of the gas purification device according to claim 1, characterized in that: A second flow controller (116), a first pressure sensor (117), and a first temperature sensor (118) are respectively installed on the first discharge pipe (102).

8. The application system of the gas purification device according to claim 1, characterized in that: A second temperature sensor (119) is installed inside the heating furnace (103).

Images