Anhydrous and anaerobic reaction device

Abstract

The utility model discloses anhydrous oxygen -free reaction device mainly relates to chemical reaction device technical field, the utility model discloses anhydrous oxygen -free reaction device, including reation kettle, at least one feeding mechanism and vacuumizing mechanism, still can include tail gas treatment mechanism and controller, reation kettle is used to accommodate reaction material, feeding mechanism includes: feeding chamber, buffer chamber and feeding container, vacuumizing mechanism is used to provide anhydrous oxygen -free environment for material reaction and feeding process, through the vacuumizing mechanism work, the air in reation kettle and buffer chamber is separated, and fills in inert gas, on one hand can guarantee reation kettle for anhydrous oxygen -free environment, on one hand guarantee that feeding mechanism is for anhydrous oxygen -free environment, prevents mixing in air when feeding, thereby can reach higher standard's anhydrous oxygen -free reaction environment in reaction device, is favorable to improve the chemical reaction effect of material in reation kettle, improves reaction efficiency, can reduce use dangerous nature.

Description

Technical Field

[0001] This utility model relates to the field of chemical reaction device technology, and in particular to an anhydrous and oxygen-free reaction device. Background Technology

[0002] In chemical engineering and industrial production, reaction equipment is the core equipment used to realize chemical reactions between substances to produce new chemicals, materials, or energy. It provides the necessary space, conditions, and control for the chemical reaction, ensuring that the reaction proceeds in the expected direction, rate, and extent, ultimately obtaining the target product safely, efficiently, and economically. There are many types of reaction equipment, such as batch reactors, tubular reactors, and tower reactors.

[0003] In some industrial production processes, it is often necessary to ensure that materials react in an anhydrous and oxygen-free environment, such as chemical reactions involving oxalyl chloride, titanium tetrachloride, thionyl chloride, or n-butyllithium solutions. However, some existing anhydrous and oxygen-free reaction devices are prone to introducing air during material feeding, making it difficult to achieve a high standard of anhydrous and oxygen-free environment within the reaction device. This results in incomplete chemical reactions, low efficiency, or even certain dangers. Utility Model Content

[0004] The purpose of this invention is to provide an anhydrous and oxygen-free reaction device to achieve a higher standard of anhydrous and oxygen-free environment within the reaction device, thereby improving the chemical reaction effect.

[0005] The objective of this utility model is achieved through the following technical solution:

[0006] An anhydrous and oxygen-free reaction apparatus, comprising:

[0007] A reaction vessel is used to contain reactants;

[0008] At least one feeding mechanism, the feeding mechanism comprising: a feeding chamber, a buffer chamber, and a feeding container, the feeding chamber being disposed at the inlet of the reactor, the buffer chamber being disposed on the feeding chamber, and the inlet of the buffer chamber being provided with a first feeding valve, the outlet of the buffer chamber being provided with a second feeding valve, and the feeding container being detachably disposed at the inlet of the buffer chamber;

[0009] A vacuuming mechanism is connected to the feeding chamber of the feeding mechanism to evacuate and fill the reaction vessel, feeding chamber and buffer chamber with inert gas, so as to provide an anhydrous and oxygen-free environment for the material reaction and feeding process.

[0010] Furthermore, the reaction vessel includes:

[0011] The vessel body is used to contain the reaction materials, and the vessel body is provided with a feed inlet, a sampling port, a gas outlet, and a discharge port;

[0012] A stirring assembly, at least a portion of which extends into the vessel body, is used to stir the materials inside the vessel body;

[0013] A temperature sensing component, at least a portion of which extends into the vessel body, is used to detect the temperature inside the vessel body;

[0014] A pressure measuring component, at least a portion of which extends into the vessel body, is used to detect the pressure inside the vessel body.

[0015] Furthermore, the inlet of the vessel is equipped with a feed valve, the sampling port is equipped with a sampling valve, the outlet is equipped with an exhaust valve, and the discharge port is equipped with a discharge valve.

[0016] Furthermore, when the reaction device is provided with two feeding mechanisms, the vessel body is provided with two feed ports, and each feed port is provided with a feeding mechanism. The feeding chambers of the two feeding mechanisms are connected, and the two feeding mechanisms are used to alternately feed materials into the vessel body.

[0017] Furthermore, the feed inlet, sampling port, and air outlet are located at the top of the vessel body, and the discharge port is located at the bottom of the vessel body.

[0018] Furthermore, the vacuum pumping mechanism includes:

[0019] A filter buffer tank is connected to the feeding chamber via a first pipe, and a first pipe valve is provided on the first pipe;

[0020] A vacuum pump is used to remove air from the feeding mechanism and the reactor. The vacuum pump is connected to the filter buffer tank through a second pipe, and a second pipe valve is provided on the second pipe.

[0021] An inert gas filling tank is used to fill the feeding chamber, buffer chamber and reaction vessel of the feeding mechanism with inert gas. The inert gas filling tank is connected to the filter buffer tank through a third pipe, and a third pipe valve is provided on the third pipe.

[0022] Furthermore, the reaction apparatus also includes:

[0023] The exhaust gas treatment mechanism is connected to the gas outlet of the reactor body and is used to treat the exhaust gas generated by the material reaction.

[0024] Furthermore, the exhaust gas treatment mechanism includes:

[0025] The first buffer tank has its air inlet connected to the air outlet of the vessel body via a connecting pipe.

[0026] A gas-liquid separator is used to separate the gas and liquid in the exhaust gas. The inlet of the gas-liquid separator is connected to the outlet of the first buffer tank through a connecting pipe.

[0027] The second buffer tank has its inlet connected to the outlet of the gas-liquid separator via a connecting pipe.

[0028] An absorption tank is used to treat residual exhaust gas, and the outlet of the second buffer tank is connected to a conveying pipe extending into the absorption tank.

[0029] Furthermore, the gas-liquid separator is provided with a labyrinth structure, and the inlet and outlet of the gas-liquid separator are located at opposite ends of the labyrinth structure to increase the residence time of the exhaust gas in the gas-liquid separator.

[0030] Furthermore, the reaction apparatus also includes a controller, which is connected to the reaction vessel, the feeding mechanism, the vacuuming mechanism, and the tail gas treatment mechanism, and is used to control the operation of the reaction vessel, the feeding mechanism, the vacuuming mechanism, and the tail gas treatment mechanism.

[0031] Compared with the prior art, the beneficial effects of this utility model include at least the following:

[0032] This utility model provides an anhydrous and oxygen-free reaction device, which is equipped with at least one feeding mechanism on the reactor. The vacuum mechanism is connected to the feeding chamber of the feeding mechanism, and the feeding chamber is connected to the feed inlet of the reactor. When the vacuum mechanism is working, it can remove the air from the reactor and buffer chamber through the feeding chamber and fill it with inert gas. This ensures that the reactor and the feeding mechanism are both anhydrous and oxygen-free environments, preventing air from being mixed in during feeding. This allows the reaction device to achieve a high standard of anhydrous and oxygen-free reaction environment, which is beneficial to improving the chemical reaction effect of the materials in the reactor and increasing the reaction efficiency. For certain hazardous chemical reagents, it can reduce the danger of using the device. Attached Figure Description

[0033] Figure 1 This is a schematic diagram of the structure of the anhydrous and oxygen-free reaction device with a feeding mechanism in an embodiment of this utility model;

[0034] Figure 2 This is a schematic diagram of the structure of the anhydrous and oxygen-free reaction device with two feeding mechanisms in an embodiment of this utility model;

[0035] Figure 3 This is a schematic diagram of the structure of an anhydrous and oxygen-free reaction device according to an embodiment of the present invention.

[0036] In the diagram: 101, feeding chamber; 102, buffer chamber; 103, feeding container; 201, vessel body; 202, stirring assembly; 203, temperature measuring assembly; 204, pressure measuring assembly; 301, filter buffer tank; 302, vacuum pump; 303, gas filling tank; 304, first pipeline valve; 305, second pipeline valve; 306, third pipeline valve; 401, first buffer tank; 402, gas-liquid separator; 403, second buffer tank; 404, absorption tank. Detailed Implementation

[0037] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make the present invention more comprehensive and complete, and to fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore repeated descriptions of them will be omitted.

[0038] The terms used to describe position and direction in this utility model are illustrated with the accompanying drawings, but changes can be made as needed, and all such changes are included within the scope of protection of this utility model.

[0039] refer to Figures 1 to 3 The anhydrous and oxygen-free reaction device provided in this embodiment includes a reaction vessel, at least one feeding mechanism and a vacuuming mechanism, and may also include an exhaust gas treatment mechanism and a controller.

[0040] The reaction vessel is used to contain the reaction materials. The reaction vessel can be a ceramic reaction vessel or a glass reaction vessel, and the volume of the reaction vessel can be 20L, 50L or 100L.

[0041] The feeding mechanism includes a feeding chamber 101, a buffer chamber 102, and a feeding container 103. The feeding chamber 101 is located at the inlet of the reactor. The buffer chamber 102 is located on the feeding chamber 101, and the inlet of the buffer chamber 102 is equipped with a first feeding valve. When the first feeding valve is opened, material can be added into the buffer chamber 102. When the first feeding valve is closed, it can prevent outside air and water vapor from entering the buffer chamber 102. The outlet of the buffer chamber 102 is equipped with a second feeding valve. When the second feeding valve is opened, the material in the buffer chamber 102 can enter the feeding chamber 101 through the inlet. The feeding container 103 is detachably located at the inlet of the buffer chamber 102. The type of material added can be changed by replacing the feeding container 103. It can also be fed multiple times. The operation is convenient and will not damage the anhydrous and oxygen-free environment inside the reactor.

[0042] The vacuuming mechanism is connected to the feeding chamber 101 of the feeding mechanism to evacuate the reactor, the feeding chamber 101 and the buffer chamber 102 and fill them with inert gas, so as to provide an anhydrous and oxygen-free environment for the material reaction and feeding process.

[0043] Specifically, a vacuuming operation is first performed. The feeding container 103 is installed at the inlet of the buffer chamber 102. The sampling port, gas outlet, and discharge port on the reactor are closed. The first feeding valve at the inlet of the buffer chamber 102 is closed, while the valve at the inlet of the reactor and the second feeding valve at the outlet of the buffer chamber 102 are opened. A vacuuming operation is then performed on the reactor, feeding chamber 101, and buffer chamber 102 using a vacuuming mechanism. Then, inert gas is introduced. The above operations are repeated to create an anhydrous and oxygen-free environment in the reactor, feeding chamber 101, and buffer chamber 102.

[0044] This utility model provides an anhydrous and oxygen-free reaction apparatus. At least one feeding mechanism is installed on the reactor, and a vacuum mechanism is connected to the feeding chamber 101 within the feeding mechanism. The feeding chamber 101 is connected to the reactor's inlet. When the vacuum mechanism operates, it can extract air from the reactor and buffer chamber 102 through the feeding chamber 101 and fill it with inert gas. This ensures both an anhydrous and oxygen-free environment inside the reactor and the feeding mechanism, preventing air from being mixed in during feeding. This allows the reaction apparatus to achieve a high standard of anhydrous and oxygen-free reaction environment, which is beneficial for improving the reaction environment within the reactor. The chemical reaction effect of materials can be improved to enhance reaction efficiency. For certain water- and oxygen-sensitive chemical reagents, it can prevent the deactivation of chemical reagents and reduce the danger during the reaction. Water- and oxygen-sensitive chemical reagents such as oxalyl chloride, titanium tetrachloride, thionyl chloride, some organometallic reagents (such as Grignard reagents and organolithium reagents), catalysts (such as Ziegler-Natta catalysts), and certain intermediates can rapidly decompose, deactivate, or even burn and explode when exposed to air or moisture. Improving the standard of anhydrous and oxygen-free reaction environment can effectively reduce the possibility of danger from such chemical reagents, thereby improving the safety of the reaction equipment and the reaction yield.

[0045] In a preferred embodiment, the reactor includes a vessel body 201, a stirring assembly 202, a temperature measuring assembly 203, and a pressure measuring assembly 204.

[0046] The vessel body 201 is used to contain the reaction materials. The vessel body 201 is equipped with a feed inlet, a sampling port, a gas outlet, and a discharge port. The feed inlet is used to add the reaction materials into the vessel body 201. The sampling port is used to sample and test the materials in the vessel body 201 to check the reaction progress. The gas outlet is used to discharge the exhaust gas generated by the reaction and maintain the internal and external pressure balance. The discharge port is used to discharge the materials in the vessel body 201 after the reaction is completed. The feed inlet of the vessel body 201 is equipped with a feed valve, the sampling port is equipped with a sampling valve, the gas outlet is equipped with an exhaust valve, and the discharge port is equipped with a discharge valve. Each valve can be a solenoid valve. The feed inlet, sampling port, and gas outlet are located at the top of the vessel body 201, and the discharge port is located at the bottom of the vessel body 201.

[0047] At least a portion of the stirring assembly 202 extends into the vessel body 201 for stirring the materials within the vessel body 201. The stirring assembly 202 includes a driving structure and a stirring structure. The driving structure can be a stirring motor, and the stirring structure can be a stirring paddle. The stirring structure is located within the vessel body 201 and is driven by the driving structure to stir the materials. This is prior art and will not be described in detail here.

[0048] At least a portion of the temperature measuring component 203 extends into the vessel body 201 to detect the temperature inside the vessel body 201. The probe portion of the temperature measuring component 203 extends into the vessel body 201 to detect the material temperature inside the vessel body 201, so as to control the reaction temperature inside the vessel body 201 based on the detection results.

[0049] At least a portion of the pressure measuring component 204 extends into the vessel body 201 to detect the pressure inside the vessel body 201. The probe portion of the pressure measuring component 204 extends into the vessel body 201 to detect the internal pressure of the vessel body 201, so as to control the internal pressure of the vessel body 201 based on the detection result.

[0050] As a preferred embodiment, when the reaction apparatus is equipped with two feeding mechanisms, refer to... Figure 2 The reactor body 201 is equipped with two feed inlets, each with a feeding mechanism. The feeding chambers 101 of the two feeding mechanisms are connected, and the two feeding mechanisms are used to alternately add materials into the reactor body 201. Compared with disassembling and replacing the feeding container 103 to add reactants, adding the same type of material through two feeding mechanisms can ensure the continuity of feeding and is applicable to materials that need to be added in large quantities. Alternatively, adding different types of materials through two feeding mechanisms can prevent the materials from reacting in the feeding chamber 101 or the buffer chamber 102, ensuring that the materials undergo chemical reactions in the reactor, preventing damage to the buffer chamber 102 or the feeding chamber 101, improving safety, meeting the needs of more reaction raw materials, and saving time in disassembling and replacing the feeding container 103, thus improving work efficiency.

[0051] When the reaction apparatus is equipped with two feeding mechanisms, the feeding chambers 101 of the two feeding mechanisms are connected by pipelines. When performing a vacuuming operation, the vacuuming mechanism can simultaneously evacuate the two feeding mechanisms and the reaction vessel and fill them with inert gas.

[0052] In a preferred embodiment, the vacuuming mechanism includes a filter buffer tank 301, a vacuum pump 302, and an inflation tank 303.

[0053] The filter buffer tank 301 is connected to the feeding chamber 101 through a first pipe, and a first pipe valve 304 is provided on the first pipe. The filter buffer tank 301 is filled with filter material. The filter buffer tank 301 can prevent impurities from being carried into the vessel body 201 when the gas filling tank 303 is filled with inert gas, and prevent impurities in the vessel body 201 and the feeding mechanism from being drawn into the vacuum pump 302 when vacuuming, thereby isolating impurities in the filter buffer tank 301.

[0054] The vacuum pump 302 is used to remove air from the feeding mechanism and the reactor. The vacuum pump 302 can be a Roots pump. The vacuum pump 302 is connected to the filter buffer tank 301 through a second pipe, and a second pipe valve 305 is provided on the second pipe.

[0055] The gas filling tank 303 is used to fill the feeding chamber 101, buffer chamber 102, and reaction vessel of the feeding mechanism with inert gas. The gas filling tank 303 can be a nitrogen cylinder. The gas filling tank 303 is connected to the filter buffer tank 301 through a third pipeline, and a third pipeline valve 306 is installed on the third pipeline. During the reaction, the gas filling tank 303 can continuously and slowly introduce inert gas into the reaction vessel to maintain an anhydrous and oxygen-free environment.

[0056] In use, first open the feed valve at the inlet of the vessel body 201 and the second feed valve at the outlet of the buffer chamber 102. Then open the first pipeline valve 304 and the second pipeline valve 305, start the vacuum pump 302 to remove the air from the buffer chamber 102, the feeding chamber 101 and the vessel body 201. Then close the vacuum pump 302 and the second pipeline valve 305, and open the third pipeline valve 306 to allow the inert gas in the gas filling tank 303 to enter the buffer chamber 102, the feeding chamber 101 and the vessel body 201. Finally, close the first valve and the third valve to make the buffer chamber 102, the feeding chamber 101 and the vessel body 201 an anhydrous and oxygen-free environment. The above evacuation steps can be repeated to achieve a higher standard of anhydrous and oxygen-free environment in the buffer chamber 102, the feeding chamber 101 and the vessel body 201 before filling with inert gas.

[0057] For reactions involving water- and oxygen-sensitive and volatile materials such as oxalyl chloride, titanium tetrachloride, and thionyl chloride, as a preferred implementation method, refer to... Figure 3The anhydrous and oxygen-free reaction apparatus of this embodiment also includes a tail gas treatment mechanism, which is connected to the gas outlet of the reactor body 201 and is used to treat the tail gas generated by the material reaction. The tail gas treatment mechanism includes a first buffer tank 401, a gas-liquid separator 402, a second buffer tank 403, and an absorption tank 404. The first buffer tank 401 can prevent untreated tail gas from flowing back into the reactor. The second buffer tank 403 can prevent liquid in the absorption tank 404 from flowing back into the gas-liquid separator 402. A desiccant can also be further placed in the second buffer tank 403 to prevent water vapor from entering the gas-liquid separator 402 and the reactor through the second buffer tank 403.

[0058] The air inlet of the first buffer tank 401 is connected to the air outlet of the vessel body 201 via a connecting pipe.

[0059] The gas-liquid separator 402 is used to separate the gas and liquid in the exhaust gas. For example, unreacted volatile oxalyl chloride, titanium tetrachloride, and thionyl chloride are converted into liquids within the gas-liquid separator 402, thereby recovering raw materials and reducing harmful exhaust gas emissions. The inlet of the gas-liquid separator 402 is connected to the outlet of the first buffer tank 401 via a connecting pipe. The gas-liquid separator 402 is equipped with a labyrinth structure, with the inlet and outlet located at opposite ends of the labyrinth structure to increase the residence time of the exhaust gas within the gas-liquid separator 402, thereby improving the recovery efficiency of raw materials in the exhaust gas. Figure 3 As shown, one type of labyrinth structure involves setting several partition plates between the air inlet and outlet of the gas-liquid separator 402. These partition plates are arranged at varying heights to separate the internal space of the tank, extending the transport distance of the exhaust gas from the air inlet to the outlet, thereby extending the residence time of the exhaust gas in the tank. When the exhaust gas collides with the partition plates, it easily adheres to the partition plates and turns into liquid before flowing into the recovery tank below the gas-liquid separator 402, thus improving the exhaust gas recovery and treatment effect.

[0060] The air inlet of the second buffer tank 403 is connected to the air outlet of the gas-liquid separator 402 through a connecting pipe. A desiccant layer for gas to pass through can be provided inside the second buffer tank 403.

[0061] The absorption tank 404 is used to treat residual exhaust gas. The outlet of the second buffer tank 403 is connected to a conveying pipe that extends into the absorption tank 404. The absorption tank 404 contains an absorbent liquid, which can be an alkaline solution, such as an aqueous solution of sodium hydroxide, which can absorb harmful substances in the residual exhaust gas. The end of the conveying pipe away from the second buffer tank 403 extends to the surface of the absorbent liquid so that the residual exhaust gas can fully contact the absorbent liquid.

[0062] In a preferred embodiment, a controller (not shown) is connected to the reactor, feeding mechanism, vacuuming mechanism, and tail gas treatment mechanism to control the operation of the reactor, feeding mechanism, vacuuming mechanism, and tail gas treatment mechanism. During operation, the controller first controls the vacuuming mechanism to evacuate the reactor and feeding mechanism and fill them with inert gas. Then, it controls the feeding mechanism to add the reactants into the reactor. Subsequently, it controls the reactor to operate so that the reactants react inside the reactor. During the reaction, the controller controls the tail gas treatment mechanism to treat the generated tail gas. After the reaction is completed, the discharge valve of the reactor is opened to discharge the material from the reactor body 201.

[0063] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and alterations to the above embodiments within the scope of the present invention without departing from the principles and spirit of the present invention, and all such changes should fall within the protection scope of the claims of the present invention.

Claims

1. An anhydrous and oxygen-free reaction apparatus, characterized in that, include: A reaction vessel is used to contain reactants; At least one feeding mechanism, the feeding mechanism comprising: a feeding chamber (101), a buffer chamber (102), and a feeding container (103), the feeding chamber (101) being disposed at the inlet of the reactor, the buffer chamber (102) being disposed on the feeding chamber (101), and the inlet of the buffer chamber (102) being provided with a first feeding valve, the outlet of the buffer chamber (102) being provided with a second feeding valve, and the feeding container (103) being detachably disposed at the inlet of the buffer chamber (102); A vacuuming mechanism is connected to the feeding chamber (101) of the feeding mechanism to evacuate and fill the reactor, feeding chamber (101) and buffer chamber (102) with inert gas, so as to provide an anhydrous and oxygen-free environment for the material reaction and feeding process.

2. The anhydrous and oxygen-free reaction apparatus as described in claim 1, characterized in that, The reaction vessel includes: The vessel body (201) is used to contain the reaction materials, and the vessel body (201) is provided with a feed inlet, a sampling port, a gas outlet and a discharge port; A stirring assembly (202) extends at least partly into the vessel body (201) for stirring the materials inside the vessel body (201); A temperature measuring component (203) extends at least partly into the vessel body (201) for detecting the temperature inside the vessel body (201); A pressure measuring component (204) extends at least partly into the vessel body (201) for detecting the pressure inside the vessel body (201).

3. The anhydrous and oxygen-free reaction apparatus as described in claim 2, characterized in that, The inlet of the vessel body (201) is equipped with an inlet valve, the sampling port is equipped with a sampling valve, the outlet is equipped with an exhaust valve, and the discharge port is equipped with a discharge valve.

4. The anhydrous and oxygen-free reaction apparatus as described in claim 2, characterized in that, When the reaction device is provided with two feeding mechanisms, the vessel body (201) is provided with two feed ports, and each feed port is provided with a feeding mechanism. The feeding chambers (101) of the two feeding mechanisms are connected, and the two feeding mechanisms are used to alternately feed materials into the vessel body (201).

5. The anhydrous and oxygen-free reaction apparatus as described in claim 2, characterized in that, The feed inlet, sampling port, and air outlet are located at the top of the reactor body (201), and the discharge port is located at the bottom of the reactor body (201).

6. The anhydrous and oxygen-free reaction apparatus as described in claim 1, characterized in that, The vacuum pumping mechanism includes: The filter buffer tank (301) is connected to the feeding chamber (101) through a first pipe, and a first pipe valve (304) is provided on the first pipe; A vacuum pump (302) is used to remove air from the feeding mechanism and the reactor. The vacuum pump (302) is connected to the filter buffer tank (301) through a second pipe, and a second pipe valve (305) is provided on the second pipe. An inert gas filling tank (303) is used to fill the feeding chamber (101), buffer chamber (102) and reaction vessel of the feeding mechanism with inert gas. The inert gas filling tank (303) is connected to the filter buffer tank (301) through a third pipe, and a third pipe valve (306) is provided on the third pipe.

7. The anhydrous and oxygen-free reaction apparatus as described in claim 2, characterized in that, The reaction apparatus further includes: The exhaust gas treatment mechanism is connected to the outlet of the reactor body (201) and is used to treat the exhaust gas generated by the material reaction.

8. The anhydrous and oxygen-free reaction apparatus as described in claim 7, characterized in that, The exhaust gas treatment mechanism includes: The first buffer tank (401) has its air inlet connected to the air outlet of the vessel body (201) via a connecting pipe. A gas-liquid separator (402) is used to separate the gas and liquid in the exhaust gas. The inlet of the gas-liquid separator (402) is connected to the outlet of the first buffer tank (401) through a connecting pipe. The second buffer tank (403) has its air inlet connected to the air outlet of the gas-liquid separator (402) via a connecting pipe. An absorption tank (404) is used to treat residual exhaust gas, and the outlet of the second buffer tank (403) is connected to a conveying pipe extending into the absorption tank (404).

9. The anhydrous and oxygen-free reaction apparatus as described in claim 8, characterized in that, The gas-liquid separator (402) is provided with a labyrinth structure. The inlet and outlet of the gas-liquid separator (402) are located at the two ends of the labyrinth structure to increase the residence time of the exhaust gas in the gas-liquid separator (402).

10. The anhydrous and oxygen-free reaction apparatus as described in claim 8, characterized in that, The reaction apparatus also includes a controller, which is connected to the reaction vessel, feeding mechanism, vacuuming mechanism and tail gas treatment mechanism, and is used to control the operation of the reaction vessel, feeding mechanism, vacuuming mechanism and tail gas treatment mechanism.

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