Photolithography dense array microlens fusion soft light myopia prevention lens

Abstract

The utility model discloses a kind of photolithography dense array microlens fusion soft light myopia prevention lens, it includes lens main body, the lens main body inside is equipped with functional area, the functional area includes inside and is equipped with central optical correction area and photolithography supermicro multifunctional structure area, the photolithography supermicro multifunctional structure area is located central optical correction area outside setting, the photolithography supermicro multifunctional structure area outside is equipped with annular blank area, the photolithography supermicro multifunctional structure area includes inside annular microstructure area, middle arrangement spoke-like microstructure area and outside dense array microstructure array area, in the gap of photolithography supermicro lens, through nanometer grade photolithography process production dot matrix soft light structure area.The utility model has the advantages compared with prior art in that: 1, reduce the significant attenuation that appears with time elapsing to prevention and control effect;2, almost no outstanding comfort;3, multiple mechanism synergy, prevention and control effect maximization.

Description

Technical Field

[0001] This utility model relates to the field of composite microstructure lens technology, specifically to a photolithographically dense array microlens fusion soft light myopia prevention lens. Background Technology

[0002] Composite microstructure lenses are a new type of eyeglass lens that uses tiny structures added to the lens to alter the path of light, thereby improving vision and slowing the progression of myopia.

[0003] However, existing composite microstructure lenses have the following drawbacks:

[0004] The effectiveness of static intervention in myopia control diminishes: The optical parameters of existing products are fixed static modes. After long-term wear, the brain and visual nerves will gradually adapt and "learn" to ignore this constant stimulation, resulting in a significant decline in the control effect over time.

[0005] Limited functionality and inability to meet complex needs: Most products focus only on optical defocus itself. For people with rapidly increasing myopia and axial length, multiple prevention and control designs or combined application of low-concentration atropine are needed to address photophobia symptoms, resulting in a lack of integrated solutions. Utility Model Content

[0006] The technical problem to be solved by this utility model is to provide a photolithographically dense array microlens fusion soft light myopia prevention lens, which addresses the shortcomings mentioned in the background art.

[0007] To solve the above-mentioned technical problems, the technical solution provided by this utility model is: a photolithographic dense array microlens fusion soft light myopia prevention lens, which includes a lens body, and the lens body has a functional area inside. The functional area includes a central optical correction area and a photolithographic ultra-micro multifunctional structure area on the inner side. The photolithographic ultra-micro multifunctional structure area is located outside the central optical correction area, and an annular blank area is provided outside the photolithographic ultra-micro multifunctional structure area.

[0008] The photolithographic ultra-micro multifunctional structure region includes an inner annular microstructure region, a middle radial microstructure region, and an outer densely arranged microstructure array region.

[0009] The main lens has a total diameter of 60mm to 80mm, the functional area has a diameter of 40mm to 60mm, the central optical correction area has a diameter of 1mm to 5mm, the photometric range is +2.00 to -15.00DS and 0 to -6.00DC, and the photometric step interval is 0.01D to 0.25D. The photolithographic ultra-micro multifunctional structure area is composed of multiple ultra-microlenses with a diameter of 0.05 to 0.3mm, and the photometric range of the ultra-microlenses is +15.00D to -15.00D. In the gaps between the photolithographic ultra-microlenses, a dot matrix soft light structure area is fabricated using nanoscale photolithography. The dot matrix soft light structure area is distributed with multiple micro-nano structures with a diameter of 0.01 to 0.05mm.

[0010] The annular microstructure area is located 1-2 mm wide outside the central optical correction area, the radial microstructure area is located 1-2 mm wide outside the annular microstructure area, and the annular blank area is located 5 mm-20 mm wide outside the photolithographic ultra-micro multifunctional structure area.

[0011] Furthermore, the microstructure of the photolithographic ultra-micro multifunctional structure region is dynamically negatively defocused, and the photometric intensity of the microstructure decreases sequentially from the inside to the outside. The photometric intensity change value of each circle of the microstructure is 0.01D to 0.02D, and the total photometric intensity range of the microstructure is 0.00D to -15.00D.

[0012] Furthermore, the microstructure of the photolithographic ultra-micro multifunctional structure region is dynamically defocused, and the photometric intensity of the microstructure decreases sequentially from the inside to the outside. The photometric intensity change value of each circle of the microstructure is 0.01D to 0.02D, and the total photometric intensity range of the microstructure is 0.00D to +15.00D.

[0013] Furthermore, the microstructure of the photolithographic ultra-micro multifunctional structure region is statically negatively defocused, and all microstructures have uniform photometric intensity, with a photometric intensity range of 0.00D to -15.00D.

[0014] Furthermore, the microstructure of the photolithographic ultra-micro multifunctional structure region is statically defocused, and all microstructures have uniform photometric intensity, with a photometric intensity range of 0.00D to +15.00D.

[0015] Furthermore, the microstructure of the photolithographic ultra-micro multifunctional structure region is arranged in alternating positive and negative defocus single rings. The microstructure is arranged from the inside out in an alternating pattern of "positive photometric ring-negative photometric ring" or "negative photometric ring-positive photometric ring", and the photometric range of the microstructure is +15.00D to -15.00D.

[0016] Furthermore, the microstructure of the photolithographic ultra-micro multifunctional structure region is arranged in an alternating pattern of positive and negative defocus rings. The microstructure is arranged from the inside out in an alternating pattern of "2 or more positive photometric rings - 2 or more negative photometric rings" or "2 or more negative photometric rings - 2 or more positive photometric rings". The photometric range of the microstructure is +15.00D to -15.00D.

[0017] Furthermore, a dot matrix soft light structure is fabricated in the gap of the photolithographic microlens using a nanoscale photolithography process. This region contains multiple micro- and nanostructures with diameters of 0.01 to 0.05 mm.

[0018] Furthermore, the outer side of the lens body is covered with a film structure containing photochromic material, wherein the film structure is a spiropyran compound film structure.

[0019] After adopting the above structure, the present invention has the following advantages: 1. A buffer area can be formed between the central optical correction area and the densely arranged microstructure array area through the inner annular microstructure area and the middle arranged radial microstructure area, which reduces the significant decay of the prevention and control effect over time.

[0020] 2. Nearly imperceptible superior comfort: Through the dot matrix soft light structure area of ​​photolithographic micro-nano structure, the microstructure breaks through the visual resolution limit of the human eye, and the brain can hardly perceive its existence. It fundamentally eliminates the shaking and discomfort caused by traditional defocus lenses, and achieves the unity of comfort and high fill rate.

[0021] 3. Multi-mechanism synergy for maximum prevention and control effect: The two technologies of "ultra-micro dynamic defocus" and "precision soft light" achieve deep integration and synergistic effect on a single lens. The former continuously provides a "stop" signal to inhibit the growth of the axial length of the eye, while the latter optimizes the contrast of light entering the eye and reduces light stimulation to the peripheral retina. Together, they build an efficient myopia prevention and control barrier. At the same time, the composite color-changing technology can alleviate the photophobia symptoms caused by the combined use of low concentration atropine. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of a photolithographically lithographically dense array of microlenses fused with a soft-light myopia prevention lens.

[0023] Figure 2 This is a schematic diagram of a photolithographically lithographically dense array of microlenses fused with a soft-light myopia prevention lens.

[0024] As shown in the figure: 1. Lens body; 2. Functional area; 3. Annular blank area; 4. Central optical correction area; 5. Photolithographic ultra-micro multifunctional structure area; 6. Annular microstructure area; 7. Arranged spoke-shaped microstructure area; 8. Densely arranged microstructure array area; 9. Dot matrix soft light structure area. Detailed Implementation

[0025] The present invention will now be described in further detail with reference to the accompanying drawings.

[0026] Combined with appendix Figure 1-2 A photolithographic dense array microlens fusion soft light myopia prevention lens includes a lens body 1. The lens body 1 has a functional area 2 inside. The functional area 2 includes a central optical correction area 4 and a photolithographic ultra-micro multifunctional structure area 5 on the inner side. The photolithographic ultra-micro multifunctional structure area 5 is located outside the central optical correction area 2. The photolithographic ultra-micro multifunctional structure area 5 has an annular blank area 3 on the outer side.

[0027] The lens body 1 has a total diameter of 60mm to 80mm, the functional area has a diameter of 40mm to 60mm, the central optical correction area 4 has a diameter of 1mm to 5mm, the photometric range is +2.00 to -15.00DS and 0 to -6.00DC, and the photometric step interval is 0.01D to 0.25D. The photolithographic ultra-micro multifunctional structure area 5 is composed of multiple microlenses with a diameter of 0.05 to 0.3mm, and the photometric range of the microlenses is +15.00D to -15.00D.

[0028] Within the gaps of the photolithographic microlens, a lattice-type soft-light structure region 9 is fabricated using nanoscale photolithography. This lattice-type soft-light structure region 9 is distributed with multiple micro- and nanostructures with diameters of 0.01–0.05 mm, which can decompose incident light into multiple weak light spots, forming a uniform soft-light effect. These soft-light microstructures create a softer but wider-ranging light signal distribution around the retina, further weakening the intensity of the negative defocus signal reaching the peripheral retina, while simultaneously reducing the excitability of retinal photoreceptor cells and inhibiting the tendency for excessive posterior elongation of the eye axis.

[0029] The photolithographic ultra-micro multifunctional structure region 5 includes an inner annular microstructure region 6, a middle radial microstructure region 7, and an outer densely arranged microstructure array region 8. The annular microstructure region 6 is composed of relatively sparse annular microlenses, and the radial microstructure region 7 is composed of multiple microlenses forming multiple strip structures. This can reduce the size of the central optical correction zone 4. When the eye moves, a buffer area can be formed by the inner annular microstructure region 6 and the middle radial microstructure region 7, reducing the significant attenuation of the control effect over time.

[0030] The annular microstructure region 6 is located 1-2 mm wide outside the central optical correction region 4, the radial microstructure region 7 is located 1-2 mm wide outside the annular microstructure region 6, and the annular blank region 3 is located 5 mm-20 mm wide outside the photolithographic ultra-micro multifunctional structure region 5.

[0031] The outer side of the lens body 1 is covered with a film structure containing photochromic material. The film structure is a spiropyran compound film layer. Specifically, a film layer containing photochromic material is coated by vacuum coating technology. Under ultraviolet light and strong light irradiation, the molecular structure of the lens film layer will rapidly change, causing the film layer to change from a transparent state to a light-blocking state such as light gray or brown, reducing light transmittance, protecting the eyes, and relieving photophobia. When the light weakens, the molecular structure automatically recovers, and the film layer returns to transparency. The sensitivity of the color-changing reaction and the degree of light blocking can be precisely controlled by adjusting the material formula to ensure that while effectively relieving photophobia, normal visual clarity is not affected. The color selection range includes, but is not limited to: gray, brown, pink, green, blue, purple, etc., and the color distribution mode includes, but is not limited to, solid color, gradient, etc.

[0032] The specific implementation method is as follows:

[0033] Example 1: Photolithographic microlens with dynamic negative defocus provides better wearing results for people with exophoria.

[0034] The microstructure of the photolithographic ultra-micro multifunctional structure region 5 is dynamically negative defocused, and the photometric intensity of the microstructure decreases sequentially from the inside to the outside. The photometric intensity change value of each circle of the microstructure is 0.01D to 0.02D, and the total photometric intensity range of the microstructure is 0.00D to -15.00D.

[0035] For example, the light intensity decreases from the inside out to enhance the control effect in the central area. The light intensity of the first microlens in the innermost ring is -10.00D, the second ring is -9.98D, and so on, with each ring changing by 0.01~0.01~0.02D.

[0036] Example 2: Photolithographic microlens with dynamic positive defocus, providing better wearing results for people with esophoria.

[0037] The microstructure of the photolithographic ultra-micro multifunctional structure region 5 is dynamically defocused, and the photometric intensity of the microstructure decreases sequentially from the inside to the outside. The photometric intensity change value of each circle of the microstructure is 0.01D to 0.02D, and the total photometric intensity range of the microstructure is 0.00D to +15.00D.

[0038] For example, the light intensity decreases from the inside out to enhance the control effect in the central area. The light intensity of the first ring of microlenses in the innermost circle is +10.00D, the second ring is +9.98D, and so on, with each ring changing by 0.01 to 0.02D.

[0039] Example 3: Static negative defocusing of photolithographic microlenses

[0040] The microstructure of the photolithographic ultra-micro multifunctional structure region 5 is set with static negative defocus, and the photometric intensity of all microstructures is uniform, with a microstructure photometric intensity range of 0.00D to -15.00D.

[0041] For example: the microlenses have a uniform photometric value of -10.00D and are densely arrayed;

[0042] Example 4: Static positive defocusing of photolithographic microlenses

[0043] The microstructure of the photolithographic ultra-micro multifunctional structure region 5 is statically defocused, and all microstructures have uniform photometric intensity, with a photometric intensity range of 0.00D to +15.00D.

[0044] For example: the microlenses have a uniform photometric value of +10.00D and are densely arrayed;

[0045] Example 5: Alternating positive and negative defocusing single rings of photolithographic microlenses enhance dynamic control effect.

[0046] The microstructure of the photolithographic ultra-micro multifunctional structure region 5 is arranged in alternating positive and negative defocus single rings. The microstructure is arranged from the inside out in an alternating single ring pattern of "positive photometric ring-negative photometric ring" or "negative photometric ring-positive photometric ring". The photometric range of the microstructure is +15.00D to -15.00D.

[0047] For example, the first innermost ring of microlenses has a photometric power of +10.00D, the second ring has -10.00D, the third ring has +10.00D, and so on, alternating between the two.

[0048] Similarly, the values ​​can be negative first and then positive. The first innermost circle of microlenses has a photometric value of -10.00D, the second circle has a photometric value of +10.00D, the third circle has a photometric value of -8.00D, and so on, alternating between the two.

[0049] Example 6: Photolithographic microlenses with alternating positive and negative defocus rings enhance dynamic control effect.

[0050] The microstructure of the photolithographic ultra-micro multifunctional structure region 5 is arranged in an alternating pattern of positive and negative defocus rings. The microstructure is arranged from the inside out in an alternating pattern of "2 or more positive light intensity rings - 2 or more negative light intensity rings" or "2 or more negative light intensity rings - 2 or more positive light intensity rings". The light intensity range of the microstructure is +15.00D to -15.00D.

[0051] For example, the photoluminescence of the innermost rings 1-2 is +10.00D, the photoluminescence of the rings 3-4 is -10.00D, the photoluminescence of the rings 5-6 is +10.00D, and so on, alternating between the two.

[0052] Similarly, the values ​​can be negative first and then positive. The innermost rings of microlenses, the first and second rings, have a photometric value of -10.00D, the third and fourth rings have a photometric value of +10.00D, the fifth and sixth rings have a photometric value of -10.00D, and so on, alternating between the two.

[0053] It can also be arranged in three or more alternating rings. The photometric range of the microlens is +15.00D to -15.00D.

[0054] All of the above embodiments can integrate the dot matrix soft light structure region 9 and the film layer structure of the color-changing material into a composite design.

[0055] For example, in Example 1, the composite dot matrix soft light structure area 9 forms double the protection and enhances the myopia prevention and control effect.

[0056] For example, in Example 1, the composite dot matrix soft light structure region 9 and the film structure of the color-changing material not only provide dual-effect strong control, but also improve the photophobia symptoms caused by the application of low-concentration atropine to control myopia in adolescents.

[0057] The present invention and its embodiments have been described above. This description is not restrictive, and the actual structure is not limited thereto. In conclusion, if those skilled in the art are inspired by this description and design similar structures and embodiments without departing from the inventive spirit of the present invention, such designs should fall within the protection scope of the present invention.

Claims

1. A photolithographically lithographically dense array microlens fusion soft light myopia prevention lens, comprising a lens body (1), wherein the lens body (1) has a functional area (2) inside, the functional area (2) including a central optical correction area (4) and a photolithographically lithographically lithographically ultra-micro multifunctional structure area (5) on its inner side, characterized in that: The photolithographic ultra-micro multifunctional structure region (5) is located outside the central optical correction region (4), and an annular blank region (3) is provided outside the photolithographic ultra-micro multifunctional structure region (5); The photolithographic ultra-micro multifunctional structure region (5) includes an inner annular microstructure region (6), a middle radial microstructure region (7), and an outer densely arranged microstructure array region (8). The lens body (1) has a total diameter of 60mm to 80mm, the functional area has a diameter of 40mm to 60mm, the central optical correction area (4) has a diameter of 1mm to 5mm, the photometric range is +2.00 to -15.00DS and 0 to -6.00DC, and the photometric step interval is 0.01D to 0.25D. The photolithographic ultra-micro multifunctional structure area (5) is composed of multiple ultra-micro lenses with a diameter of 0.05 to 0.3mm. The photometric range of the ultra-micro lenses is +15.00D to -15.00D. In the gap between the photolithographic ultra-micro lenses, a dot matrix soft light structure area (9) is fabricated by nanoscale photolithography. The dot matrix soft light structure area (9) is provided with multiple micro-nano structures with a diameter of 0.01 to 0.05mm. The annular microstructure area (6) is located 1-2 mm wide outside the central optical correction area (4), the radial microstructure area (7) is located 1-2 mm wide outside the annular microstructure area (6), and the annular blank area (3) is located 5 mm-20 mm wide outside the photolithographic ultra-micro multifunctional structure area (5).

2. The photolithographically lithographically dense array microlens fusion soft light myopia prevention lens according to claim 1, characterized in that: The microstructure of the photolithographic ultra-micro multifunctional structure region (5) is dynamically negative defocused. The photometric intensity of the microstructure decreases sequentially from the inside to the outside. The photometric intensity change value of each circle of the microstructure is 0.01D to 0.02D, and the total photometric intensity range of the microstructure is 0.00D to -15.00D.

3. The photolithographically lithographically dense array microlens fusion soft light myopia prevention lens according to claim 1, characterized in that: The microstructure of the photolithographic ultra-micro multifunctional structure region (5) is dynamically defocused, and the photometric intensity of the microstructure decreases sequentially from the inside to the outside. The photometric intensity change value of each circle of the microstructure is 0.01D to 0.02D, and the total photometric intensity range of the microstructure is 0.00D to +15.00D.

4. The photolithographically lithographically dense array microlens fusion soft-light myopia prevention lens according to claim 1, characterized in that: The microstructure of the photolithographic ultra-micro multifunctional structure region (5) is set as a static negative defocus, and the photometric intensity of all microstructures is uniform, with the photometric intensity range of microstructures being 0.00D to -15.00D.

5. The photolithographically lithographically dense array microlens fusion soft light myopia prevention lens according to claim 1, characterized in that: The microstructure of the photolithographic ultra-micro multifunctional structure region (5) is set with static positive defocus, and the photometric intensity of all microstructures is uniform, with the photometric intensity range of microstructures being 0.00D to +15.00D.

6. The photolithographically lithographically dense array microlens fusion soft-light myopia prevention lens according to claim 1, characterized in that: The microstructure of the photolithographic ultra-micro multifunctional structure region (5) is arranged in alternating positive and negative defocus single rings. The microstructure is arranged from the inside out in an alternating single ring pattern of "positive photometric ring-negative photometric ring" or "negative photometric ring-positive photometric ring". The photometric range of the microstructure is +15.00D to -15.00D.

7. The photolithographically lithographically dense array microlens fusion soft light myopia prevention lens according to claim 1, characterized in that: The microstructure of the photolithographic ultra-micro multifunctional structure region (5) is arranged in alternating positive and negative defocus rings. The microstructure is arranged from the inside out in an alternating pattern of "2 or more positive light intensity rings - 2 or more negative light intensity rings" or "2 or more negative light intensity rings - 2 or more positive light intensity rings". The light intensity range of the microstructure is +15.00D to -15.00D.

8. The photolithographically lithographically dense array microlens fusion soft-light myopia prevention lens according to any one of claims 1-7, characterized in that: The outer side of the lens body (1) is covered with a film structure containing photochromic material, and the film structure is a film structure containing spiropyran compounds.

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