Wafer box moving system for wafer cleaning and transfer mechanism

CN224698273UActive Publication Date: 2026-08-28TRONWAY CHANGZHOU CO LTD
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Patent Information

Application Number
CN202521820278.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-08-26
Publication Date
2026-08-28
Estimated Expiration
2035-08-26

AI Technical Summary

Technical Problem

[0002]在半导体生产制造过程中,在半导体制造过程中,清洗刻蚀是其核心工艺之一,能够直接决定芯片的良率与性能,目前常见的晶圆清洗刻蚀设备包括单片设备与批式设备,其中批式设备中,晶圆存放在晶圆盒内后传输进入后续清洗作业,一般采用人工推送晶圆盒的方式,该方式自动化程度低,极大的影响了晶圆的清洗效率

Benefits of technology

[0014]本实用新型的有益效果是,本系统通过设置有转运机构、升降机构以及驱动机构,利用转运机构抓取晶圆盒放置位内的晶圆盒,随后利用升降机构与驱动机构,带动晶圆盒进行竖直、水平方向的移动,最终将晶圆盒送入后续清洗作业,此过程中仅需人工将晶圆盒放置在晶圆盒放置位内,后续晶圆盒的转运实现自动化控制,减少人力使用,提高后续晶圆清洗的效率。

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Abstract

The utility model belongs to wafer cleaning technical field, concretely relates to a wafer cleaning is with wafer box removal system and transfer mechanism, and the system includes: control module, transfer frame is provided with at least one wafer box placement position on it, transfer mechanism is suitable for driving wafer box placement position in the wafer box removal to clean the position, lifting mechanism is connected with transfer mechanism, is suitable for driving transfer mechanism and removes to the side of wafer box along vertical direction, and drive mechanism is set up on transfer frame, wherein drive mechanism is connected with lifting mechanism to be suitable for driving lifting mechanism and removes to the side of wafer box.
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Claims

1. A wafer cassette moving system for wafer cleaning, characterized in that, include: Control module; A transfer rack (1) is provided with at least one wafer cassette placement position (100). The transfer mechanism (5) is adapted to move the wafer cassette (2) in the wafer cassette placement position (100) to the cleaning position; A lifting mechanism (4), connected to the transfer mechanism (5), is adapted to drive the transfer mechanism (5) to move vertically to one side of the wafer cassette (2); and The drive mechanism (3) is mounted on the transfer frame (1); wherein The drive mechanism (3) is connected to the lifting mechanism (4) to drive the lifting mechanism (4) to move horizontally to one side of the wafer box (2).

2. The wafer cassette moving system for wafer cleaning as described in claim 1, characterized in that, The transfer mechanism (5) includes: The first rocker arm (51), the second rocker arm (52), and the third rocker arm (53); among which One end of the second rocker arm (52) is connected to the first rocker arm (51) via a short shaft (58), and the other end of the second rocker arm (52) is connected to the third rocker arm (53) via a rotating shaft (56); The connector (57) is connected to the third rocker arm (53), and the connector (57) is disposed on the lifting belt (42) in the lifting mechanism (4).

3. The wafer cassette moving system for wafer cleaning as described in claim 2, characterized in that, A transfer motor (55) is provided on the lower end face of the connector (57); The output end of the transfer motor (55) is connected to the rotating shaft (56) via a drive belt; The short shaft (58) is connected to the rotating shaft (56) via a transfer belt (59).

4. The wafer cassette moving system for wafer cleaning as described in claim 3, characterized in that, The upper end face of the first rocker arm (51) is provided with a transfer claw (54). The upper end face of the transfer claw (54) is provided with several snap-fit ​​parts (540); wherein Each snap-fit ​​component (540) is adapted to a plurality of snap-fit ​​holes (20) opened on the lower end face of the wafer box (2).

5. The wafer cassette moving system for wafer cleaning as described in claim 4, characterized in that, The lifting mechanism (4) includes: The lower end face of the lifting frame (40) is connected to the upper end face of the movable base plate (31) in the drive mechanism (3); The slide rail (43) is vertically mounted on the lifting frame (40) and slidably connected to the connecting piece (57); A lifting motor (41) is installed at the bottom of the lifting frame (40); A support shaft (44) is connected to the top of the lifting frame (40) by a bearing; wherein The lifting belt (42) is sleeved on the outer wall of the output end of the lifting motor (41) and the outer wall of the support shaft (44).

6. The wafer cassette moving system for wafer cleaning as described in claim 5, characterized in that, The drive mechanism (3) includes: A drive cylinder (30) is mounted on the transfer frame (1); wherein The output end of the drive cylinder (30) is connected to the movable base plate (31).

7. A transfer mechanism, characterized in that, include: First rocker arm (51), second rocker arm (52) and third rocker arm (53); in One end of the second rocker arm (52) is connected to the first rocker arm (51) via a short shaft (58), and the other end of the second rocker arm (52) is connected to the third rocker arm (53) via a rotating shaft (56); The connector (57) is connected to the third rocker arm (53), and the connector (57) is disposed on the lifting belt (42) in the lifting mechanism (4).

8. The transfer mechanism as described in claim 7, characterized in that, A transfer motor (55) is provided on the lower end face of the connector (57); The output end of the transfer motor (55) is connected to the rotating shaft (56) via a drive belt; The short shaft (58) is connected to the rotating shaft (56) via a transfer belt (58).

9. The transfer mechanism as described in claim 8, characterized in that, The upper end face of the first rocker arm (51) is provided with a transfer claw (54). The upper end face of the transfer claw (54) is provided with several snap-fit ​​parts (540); wherein Each snap-fit ​​component (540) is adapted to a plurality of snap-fit ​​holes (20) opened on the lower end face of the wafer box (2).