Uniform gas structure

Abstract

The application relates to the field of photovoltaic and semiconductor technologies, in particular to a gas uniformizing structure applied to a coating equipment, which comprises an upper door plate comprising opposite first and second surfaces, the first surface being provided with an air inlet pipeline, and the upper door plate being suitable for being capped on a reaction cavity of the coating equipment; and a gas uniformizing plate body comprising opposite third and fourth surfaces, the third surface comprising a first part and a second part arranged around the first part, the first part being inwardly recessed to form a gas uniformizing groove, a plurality of first gas uniformizing holes being arranged at intervals in a geometric center area of the gas uniformizing groove, a plurality of second gas uniformizing holes being arranged at intervals in an outer edge area between the geometric center area and the edge of the gas uniformizing plate body, and the diameter of the first gas uniformizing holes being smaller than that of the second gas uniformizing holes; wherein the second part of the third surface abuts against the second surface of the upper door plate, and the second surface of the upper door plate and the gas uniformizing groove form a gas uniformizing cavity.

Description

Technical Field

[0001] This application relates to the fields of photovoltaic and semiconductor technology, and in particular to a gas uniformity structure. Background Technology

[0002] In the photovoltaic cell production process, coating equipment enables silicon wafers to undergo coating processes within a furnace, and is widely used in industries such as integrated circuits, power electronics, and solar cell production. In semiconductor and solar cell manufacturing equipment, coating process equipment is included in various systems such as oxidation equipment, PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment, cross-section passivation equipment, LPCVD (Low-Pressure Chemical Vapor Deposition) equipment, ALD (Atomic Layer Deposition) equipment, and semiconductor equipment.

[0003] Currently, coating equipment uses different reactive gases sequentially for reaction coating. Taking the ALD (Alternating Current) process for solar cells as an example, the process gases are introduced sequentially to coat the surface of the photovoltaic cell. A gas distribution plate directs either the process gas or an inert gas into the reaction chamber. A persistent problem in vacuum coating processes is the poor uniformity of the gas field, leading to uneven substrate coating and affecting product yield. Utility Model Content

[0004] In view of this, the embodiments of this application provide a gas uniformity structure, which is suitable for coating equipment and can improve the uniformity of the gas field and the yield of products.

[0005] According to one aspect of the inventive concept of this utility model, a gas equalization structure is provided for use in a coating equipment, comprising: an upper door panel, including a first surface and a second surface opposite to each other, wherein an air inlet pipe is provided on the first surface, and the upper door panel is suitable for sealing the reaction chamber of the coating equipment; a gas equalization plate body, including a third surface and a fourth surface opposite to each other, wherein the third surface includes a first part and a second part disposed around the first part, the first part being recessed inward to form a gas equalization groove, wherein a plurality of first gas equalization holes are spaced apart in the geometric center region of the gas equalization groove, and a plurality of second gas equalization holes are spaced apart in the outer edge region between the geometric center region and the edge of the gas equalization plate body, wherein the diameter of the first gas equalization holes is smaller than the diameter of the second gas equalization holes; wherein the second part abuts against the second surface of the upper door panel, and the second surface of the upper door panel and the gas equalization groove form a gas equalization cavity.

[0006] According to some embodiments of the present invention, the diameter of the first air distribution hole is greater than or equal to 0.1 mm and less than or equal to 0.7 mm, and the diameter of the second air distribution hole is greater than or equal to 0.5 mm and less than or equal to 1.0 mm.

[0007] According to some embodiments of the present invention, the orthographic projection of the air intake pipe on the air distribution plate body is located within the area where the first air distribution hole is located.

[0008] According to some embodiments of this utility model, there are multiple air intake pipes, and the multiple air intake pipes are arranged in a ring around the geometric center of the upper door panel.

[0009] According to some embodiments of the present invention, a plurality of the first air-regulating holes are arranged in a ring array, and a plurality of the second air-regulating holes are arranged in a ring array.

[0010] According to some embodiments of the present invention, the outer edge region is provided with a plurality of sub-regions along the radial direction of the gas equalization plate, and a plurality of second gas equalization holes are provided at intervals in the plurality of sub-regions, wherein the diameter of the second gas equalization holes in the plurality of sub-regions gradually decreases along the radial direction.

[0011] According to some embodiments of the present invention, the second side of the upper door panel and the third side of the gas equalization plate body are respectively provided with matching sealing grooves, and the gas equalization structure also includes a sealing ring, which is embedded in the sealing groove.

[0012] According to some embodiments of the present invention, the cross-sectional shape of the upper door panel and the gas equalization plate body is circular or polygonal, and the gas equalization structure further includes a vortex thermal field, which is disposed on the first surface of the upper door panel and is configured to heat the gas input into the air intake pipe.

[0013] According to some embodiments of the present invention, the uniform gas structure further includes a heat insulation cover, which is disposed on the first surface of the upper door panel and covers the vortex thermal field.

[0014] According to some embodiments of the present invention, the air distribution structure further includes a handle, which is disposed on the first surface of the upper door panel.

[0015] According to the gas equalization structure of this utility model embodiment, a gas equalization cavity is formed by the gas equalization groove on the upper door panel and the gas equalization plate body. With the addition of multiple first gas equalization holes and multiple second gas equalization holes of different diameters at the bottom of the gas equalization groove, the gas input into the gas equalization cavity from the air inlet pipe can be evenly distributed to the surface of the workpiece to be coated, thereby improving the uniformity of the coating and increasing the product yield. Attached Figure Description

[0016] The above and other objects, features, and advantages of this application will become more apparent from the more detailed description of the embodiments of this application in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same components or steps.

[0017] Figure 1 The image shown is a perspective view of a gas-uniform structure provided in an embodiment of this application.

[0018] Figure 2 The image shown is a bottom view of a gas-uniform structure provided in an embodiment of this application.

[0019] Figure 3 The image shown is a front view of a gas-uniform structure provided in an embodiment of this application.

[0020] Figure 4 The image shown is a top view of a uniform air structure provided in an embodiment of this application.

[0021] Figure 5 The image shown is a cross-sectional view of a gas-uniform structure provided in an embodiment of this application.

[0022] Figure 6 The image shown is a top view of a uniform air structure provided in one embodiment of this application from another perspective.

[0023] Figure label:

[0024] 1. Upper door panel; 101. First side; 102. Second side; 2. Air intake pipe; 3. Air distribution plate body; 301. Third side; 3011. First part; 3012. Second part; 302. Fourth side; 4. Air distribution chamber; 5. First air distribution hole; 6. Second air distribution hole; 7. Vortex thermal field; 8. Insulation cover; 9. Handle; 10. Screw; CTR, Geometric center area; EDG, Outer edge area. Detailed Implementation

[0025] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0026] In related technologies, coating equipment introduces different reaction gases in a time sequence for reaction coating. Different precursor gases are introduced into the reaction chamber one after another. During this process, inert gas is introduced to purge the pipes and reaction chamber to remove the residual first precursor gas in the pipes and reaction chamber, leaving only the first precursor gas adsorbed on the silicon wafer surface. This allows the two precursor gases to react only on the silicon wafer surface to form the desired film layer.

[0027] When introducing precursor gas or inert gas into the reaction chamber, an air inlet is usually opened at the top of the reaction chamber to introduce the precursor gas or inert gas. A gas distribution plate is set in the reaction chamber, and the precursor gas / inert gas is transported to the surface of the workpiece to be coated by the uniform dispersion effect of the gas distribution plate. However, the above process still has some problems, mainly that the uniform dispersion effect of the gas distribution plate is not good, resulting in poor uniformity of the gas field in the reaction chamber, which in turn leads to uneven coating on the workpiece.

[0028] Figure 1 The image shown is a perspective view of a gas-uniform structure provided in an embodiment of this application. Figure 2 The image shown is a bottom view of a gas-uniform structure provided in an embodiment of this application. Figure 3 The image shown is a front view of a gas-uniform structure provided in an embodiment of this application. Figure 4 The image shown is a top view of a gas-uniform structure provided in an embodiment of this application. Figure 5 The figure shown is a cross-sectional view of a gas-uniform structure provided in an embodiment of this application. Figure 6 The image shown is a top view of a uniform air structure provided in one embodiment of this application from another perspective.

[0029] To solve the above-mentioned technical problems, according to one aspect of the inventive concept of this utility model, such as... Figures 1 to 6 As shown, a gas equalization structure is provided, including: an upper door panel 1, including a first surface 101 and a second surface 102 opposite to each other, an air inlet pipe 2 is provided on the first surface 101, and the upper door panel 1 is suitable for sealing the reaction chamber of the coating equipment; a gas equalization plate body 3, including a third surface 301 and a fourth surface 302 opposite to each other, the third surface 301 including a first part and a second part disposed around the first part, the first part 3011 is recessed inward to form a gas equalization groove, and the geometric center region CTR of the gas equalization groove (e.g., Figure 2 As shown, the area within the dashed line is provided with multiple first air-regulating holes 5 at intervals, and the outer edge area EDG (such as the geometric center region CTR and the edge of the air-regulating plate body) between the geometric center region CTR and the edge of the air-regulating plate body is provided with multiple first air-regulating holes 5 at intervals. Figure 2 As shown, multiple second air equalization holes 6 are arranged at intervals in the area outside the dotted line. The diameter of the first air equalization hole 5 is smaller than the diameter of the second air equalization hole 6. The second part 3012 abuts against the second surface 102 of the upper door panel 1, and the second surface 102 of the upper door panel 1 and the air equalization groove form an air equalization cavity 4.

[0030] In this embodiment, a gas equalization chamber 4 is formed by the gas equalization grooves on the upper door panel 1 and the gas equalization plate body 3. Multiple first gas equalization holes 5 and multiple second gas equalization holes 6 of different diameters are formed at the bottom of the gas equalization grooves. This allows the gas input from the air inlet pipe 2 into the gas equalization chamber 4 to be evenly distributed onto the surface of the workpiece to be coated, thereby improving the uniformity of the coating and increasing the product yield. Optionally, the workpiece to be coated can be a silicon wafer of a solar panel, a semiconductor wafer, etc.

[0031] According to some embodiments of the present invention, the gas uniformity structure proposed in this application is suitable for coating equipment, such as time-type coating equipment.

[0032] According to some embodiments of this utility model, during the coating process, the smaller first uniform air hole 5 can generate a finer airflow, which is suitable for forming a dense and uniform gas distribution in the central area of ​​the uniform air tank, while the larger second uniform air hole 6 is used in the peripheral area to ensure that the gas can quickly diffuse to the entire reaction chamber. The first uniform air hole 5 and the second uniform air hole 6 make the gas form a stable laminar flow in the chamber, avoiding turbulence and dead zones, thereby improving the uniformity of the coating. The uniformity of the gas when it reaches the surface of the workpiece is ensured by the staged and regional diffusion method.

[0033] According to some embodiments of this utility model, the upper door panel 1 is designed with a first surface 101 and a second surface 102 facing each other. The first surface 101 is the side facing the outside of the coating equipment and has an air inlet pipe 2, which is responsible for introducing the reaction gas into the coating equipment. The second surface 102 of the upper door panel 1 is the side facing the inside of the coating equipment. The upper door panel 1 is tightly fitted to the gas equalization plate body 3 through the second surface 102 (for example, the connection and fixation between the two is completed by mounting holes provided on the gas equalization plate body 3 and screws 10), forming a closed gas equalization chamber 4 with the gas equalization groove. In addition, the upper door panel 1 also serves to seal the reaction chamber, ensuring the sealing and stability of the gas during the coating process.

[0034] According to some embodiments of this utility model, the gas equalization plate body 3 is designed with opposing third surfaces 301 and fourth surfaces. The third surface 301 is the surface facing the upper door panel 1, and it is recessed inward to form a gas equalization groove. The third surface 301 of the gas equalization plate body 3 closely abuts against the second surface 102 of the upper door panel 1, together forming a closed gas equalization cavity 4. This gas equalization cavity 4 serves as the final mixing and homogenization treatment area before the gas enters the coating cavity, and plays a key role in improving the uniformity of the coating.

[0035] According to some embodiments of this utility model, a plurality of first gas equalization holes 5 are densely arranged in the geometric center region of the gas equalization groove. These smaller-diameter gas equalization holes mainly control the gas flow rate and velocity, ensuring that the gas enters the central region of the gas equalization groove at a relatively stable speed. Outside the plurality of first gas equalization holes 5, a plurality of second gas equalization holes 6 are evenly arranged. These larger-diameter gas equalization holes diffuse the gas, guiding it from the central region to the edge region, ensuring a uniform distribution of the gas throughout the gas equalization groove.

[0036] Specifically, the reactant gas enters the gas equalization chamber 4 through the air inlet pipe 2 on the upper door panel 1. Inside the equalization chamber 4, the gas first encounters densely arranged first equalization holes 5. These small holes provide initial regulation of the gas flow rate and velocity, ensuring the gas enters the central region of the equalization tank in a relatively stable and uniform manner. Subsequently, the gas diffuses within the equalization tank and encounters evenly distributed second equalization holes 6. These larger holes guide the gas from the central region to the edge region, further promoting gas mixing and uniform distribution. Finally, the uniformly distributed gas contacts the surface of the workpiece to be coated through the equalization plate body 3, completing the coating process.

[0037] According to some embodiments of the present invention, the diameter of the first air distribution hole 5 is greater than or equal to 0.1 mm and less than or equal to 0.7 mm, and the diameter of the second air distribution hole 6 is greater than or equal to 0.5 mm and less than or equal to 1.0 mm.

[0038] In this embodiment, considering gas flow characteristics and coating uniformity, the diameter of the first gas equalization hole 5 is controlled between 0.1 mm and 0.7 mm. The smaller hole diameter helps to precisely control the gas flow rate and velocity, ensuring that the gas enters the central region of the equalization tank in a stable and uniform manner, providing a foundation for subsequent uniform diffusion. The diameter of the second gas equalization hole 6 is limited to between 0.5 mm and 1.0 mm. The relatively larger hole diameter range facilitates rapid diffusion and uniform distribution of gas within the equalization tank, effectively guiding the gas from the central region to the edge region, ensuring a more uniform gas pressure and velocity distribution throughout the entire equalization tank. In this embodiment, by precisely controlling the diameters of the first and second gas equalization holes 5 and 6, orderly flow and uniform distribution of gas within the equalization tank are achieved, thereby significantly improving the uniformity and quality of the coating.

[0039] According to some embodiments of the present invention, the orthographic projection of the air intake pipe 2 on the air distribution plate body 3 is located within the area where the first air distribution hole 5 is located.

[0040] In this embodiment, by designing the orthographic projection of the air inlet pipe 2 within the area where the first air distribution hole 5 is located, rapid and precise control of the gas after it enters the air distribution chamber 4 can be achieved, laying the foundation for subsequent uniform diffusion processing. Based on the gas flow path and control requirements, designing the orthographic projection of the air inlet pipe 2 on the air distribution plate body 3 within the area where multiple first air distribution holes 5 are located ensures that the gas can smoothly and efficiently enter the air distribution chamber 4, and firstly, through the first air distribution holes 5, the flow rate and velocity are initially controlled to form a stable and uniform airflow center.

[0041] According to some embodiments of the present invention, there are multiple air intake pipes 2, and the multiple air intake pipes 2 are arranged in a ring around the geometric center of the upper door panel 1.

[0042] In this embodiment, multiple air intake pipes 2 are arranged in a ring around the geometric center of the upper door panel 1, which can further improve the gas introduction efficiency and distribution uniformity. The introduction of precursor gas or inert gas through multiple sources ensures that gas can enter the gas equalization chamber 4 simultaneously from multiple directions, forming multiple stable airflow centers. Furthermore, the design of multiple air intake pipes 2 can increase the gas introduction volume, meeting the needs of large-scale coating production.

[0043] Specifically, when gas simultaneously enters the uniform gas distribution chamber 4 through multiple inlet pipes 2, multiple stable airflow centers are formed within the chamber. These airflow centers intertwine and mix, ultimately forming a uniform and stable gas field. This design helps eliminate dead zones and eddies during gas introduction, improving the uniformity and quality of the coating.

[0044] According to some embodiments of the present invention, a plurality of first air-regulating holes 5 are arranged in a ring array, and a plurality of second air-regulating holes 6 are arranged in a ring array.

[0045] In this embodiment, by using the annularly arranged first and second uniformly arranged air distribution holes 5 and 6, the present invention achieves orderly flow and uniform distribution of gas within the uniformly arranged air distribution groove, significantly improving the uniformity and quality of the coating. Simultaneously, this design also enhances the stability and durability of the uniformly arranged air distribution structure. When the gas enters the uniformly arranged air distribution chamber 4, it is first precisely regulated by the annularly arranged first uniformly arranged air distribution holes 5, forming a stable and uniform airflow center. Subsequently, these airflows are further mixed and diffused within the uniformly arranged air distribution groove, and then uniformly distributed into the coating cavity through the annularly arranged second uniformly arranged air distribution holes 6. This design helps eliminate dead zones and eddies in the gas flow within the uniformly arranged air distribution groove, improving the uniformity and quality of the coating.

[0046] According to some embodiments of this utility model, the outer edge region EDG is provided with multiple sub-regions along the radial direction of the gas equalization plate body. Multiple second gas equalization holes are spaced apart within each sub-region, and the diameter of the second gas equalization holes within the multiple sub-regions gradually decreases in the radial direction. In this embodiment, the gradually changing diameter design of the second gas equalization holes can further regulate the gas within the gas equalization chamber 4, eliminating the influence of gas flow path, distance, and other factors on gas uniformity. This results in a more uniform gas concentration passing through the gas equalization plate body 3, improving the consistency of the workpiece coating and increasing product yield.

[0047] According to some embodiments of the present invention, matching sealing grooves are respectively provided on the second surface 102 of the upper door panel 1 and the third surface 301 of the air distribution plate body 3. The air distribution structure also includes a sealing ring, which is embedded in the sealing groove.

[0048] In this embodiment, by creating matching sealing grooves on the upper door panel 1 and the gas equalization plate body 3, and embedding sealing rings, a tight seal can be formed to prevent gas leakage during transmission, thereby ensuring the stability and reliability of the coating process. When assembling the gas equalization structure, the sealing rings are embedded in the sealing grooves of the upper door panel 1 and the gas equalization plate body 3, forming a sealing barrier. When the upper door panel 1 is placed over the reaction chamber, the sealing rings are compressed, creating a tight seal. This sealing structure can withstand a certain pressure, ensuring that gas does not leak.

[0049] According to some embodiments of the present invention, the cross-sectional shape of the upper door panel 1 and the air distribution plate body 3 is circular or polygonal. The air distribution structure also includes a vortex heat field 7, which is disposed on the first surface 101 of the upper door panel 1. The vortex heat field 7 is configured to heat the gas input into the air intake pipe 2.

[0050] In this embodiment, the cross-sectional shapes of the upper door panel 1 and the gas equalization plate body 3 are designed as circular or polygonal, which can adapt to the diversity of coating equipment and the complexity of coating cavities. This ensures that the gas equalization structure can adapt to coating cavities of various shapes and achieve the best gas distribution effect, meeting the needs of different coating equipment and adapting to coating cavities of different shapes. The design of the vortex thermal field 7 enables uniform heating of the gas input from the air inlet pipe 2, improving the consistency of gas temperature and thus optimizing the coating process conditions. Uniform gas temperature helps to improve the uniformity and quality of coating. The vortex thermal field 7 adopts the vortex heating principle, generating rotating airflow and heat distribution to ensure that the gas is uniformly heated as it passes through. This heating method can avoid local overheating or undercooling, ensuring that the gas temperature remains consistent throughout the reaction chamber.

[0051] According to some embodiments of the present invention, the uniform air structure also includes a heat insulation cover 8, which is disposed on the first surface 101 of the upper door panel 1 and covers the vortex thermal field 7.

[0052] In this embodiment, heat insulation reduces heat loss from the vortex thermal field 7, improves energy efficiency, and ensures a stable gas temperature during heating. The heat insulation cover 8 is made of heat-insulating material, effectively preventing heat loss. When the vortex thermal field 7 heats the gas, the heat insulation cover 8 traps the heat inside, ensuring continuous heating as the gas passes through. Simultaneously, the heat insulation cover 8 also prevents cold air from entering and affecting the gas temperature stability.

[0053] According to some embodiments of the present invention, the air distribution structure also includes a handle 9, which is disposed on the first surface 101 of the upper door panel 1.

[0054] In this embodiment, the handle 9 is designed to facilitate the installation, disassembly, and maintenance of the air-coating structure by the operator. In coating equipment, the air-coating structure may require frequent replacement and cleaning; the handle 9 significantly improves operational efficiency. The handle 9 is typically made of durable materials such as stainless steel or aluminum alloy. It is fixed to the first surface 101 of the upper panel 1 by bolts or welding, providing the operator with a stable grip point. When installing or disassembling the air-coating structure, the operator can easily lift or lower it using the handle 9.

[0055] In the embodiments of this disclosure, unless otherwise specified, the connection can be a detachable connection using bolts, nuts, screws, clips, magnets, etc. In some connections where there is no particular requirement for a detachable fit, a non-detachable connection can be achieved through welding, bonding, etc.

[0056] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.

[0057] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.

[0058] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.

[0059] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.

[0060] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.

Claims

1. A gas-uniform structure, characterized in that, include: The upper door panel includes a first side and a second side facing each other. An air inlet pipe is provided on the first side. The upper door panel is suitable for sealing the reaction chamber of the coating equipment. The gas equalization plate body includes a third surface and a fourth surface opposite to each other. The third surface includes a first part and a second part disposed around the first part. The first part is recessed inward to form a gas equalization groove. A plurality of first gas equalization holes are arranged at intervals in the geometric center region of the gas equalization groove. A plurality of second gas equalization holes are arranged at intervals in the outer edge region between the geometric center region and the edge of the gas equalization plate body. The diameter of the first gas equalization holes is smaller than the diameter of the second gas equalization holes. The second part abuts against the second side of the upper door panel, and the second side of the upper door panel forms an air-equalizing cavity with the air-equalizing groove.

2. The gas-uniform structure according to claim 1, characterized in that, The diameter of the first air distribution hole is greater than or equal to 0.1 mm and less than or equal to 0.7 mm, and the diameter of the second air distribution hole is greater than or equal to 0.5 mm and less than or equal to 1.0 mm.

3. The gas-uniform structure according to claim 1, characterized in that, The orthographic projection of the air intake pipe onto the air distribution plate body is located within the area where the first air distribution hole is located.

4. The gas-uniform structure according to claim 1, characterized in that, There are multiple air intake pipes, which are arranged in a ring around the geometric center of the upper door panel.

5. The gas-uniform structure according to claim 1, characterized in that, The first air distribution holes are arranged in a ring array, and the second air distribution holes are arranged in a ring array.

6. The gas-uniform structure according to claim 1, characterized in that, The outer edge region is provided with a plurality of sub-regions along the radial direction of the gas equalization plate body, and a plurality of second gas equalization holes are provided at intervals in the plurality of sub-regions. The diameter of the second gas equalization holes in the plurality of sub-regions gradually decreases along the radial direction.

7. The gas-uniform structure according to claim 1, characterized in that, The second side of the upper door panel and the third side of the air distribution plate body are respectively provided with matching sealing grooves. The air distribution structure also includes a sealing ring, which is embedded in the sealing groove.

8. The gas-uniform structure according to claim 1, characterized in that, The cross-sectional shape of the upper door panel and the air-regulating plate body is circular or polygonal, and the air-regulating structure further includes: A vortex thermal field is disposed on the first surface of the upper door panel, and the vortex thermal field is configured to heat the gas input into the intake pipe.

9. The gas-uniform structure according to claim 8, characterized in that, The gas-uniform structure further includes: A heat insulation cover is installed on the first surface of the upper door panel, and the heat insulation cover is placed over the vortex thermal field.

10. The gas-uniform structure according to claim 1, characterized in that, The gas-uniform structure further includes: The handle is located on the first surface of the upper door panel.

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