Mask (anti-high beam)
CN309031297SActive Publication Date: 2024-12-27谢柏军
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- CN202430124144.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-12
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2039-03-12
Smart Images

Figure 000003_ABST
Abstract
1. The name of this design product: mask (anti-high beam). 2. Purpose of this design product: a mask used to prevent glare from high beams, etc. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1. 5. If it has been reflected in other views, the left view will be omitted; if it has been reflected in other views, the right view will be omitted; if it has been reflected in other views, the top view will be omitted; if it has been reflected in other views, the bottom view will be omitted.
Need to check novelty before this filing date? Find Prior Art