Mask (anti-high beam)

CN309031297SActive Publication Date: 2024-12-27谢柏军
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202430124144.2
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-03-12
Publication Date
2024-12-27
Estimated Expiration
2039-03-12

Smart Images

  • Figure 000003_ABST
    Figure 000003_ABST
Patent Text Reader

Abstract

1. The name of this design product: mask (anti-high beam). 2. Purpose of this design product: a mask used to prevent glare from high beams, etc. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1. 5. If it has been reflected in other views, the left view will be omitted; if it has been reflected in other views, the right view will be omitted; if it has been reflected in other views, the top view will be omitted; if it has been reflected in other views, the bottom view will be omitted.
Need to check novelty before this filing date? Find Prior Art