Sputtering target and main body of sputtering target

CN309057484SActive Publication Date: 2025-01-07TOSOH SMD INC
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Patent Information

Application Number
CN202430011031.1
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Priority Date
2023-07-07
Filing Date
2024-01-08
Publication Date
2025-01-07
Estimated Expiration
2039-01-08

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Abstract

1. The name of the product of this design: sputtering target and the main body of the sputtering target. 2. Purpose of the product with this design: The entire product with this design is used as the material deposited on the substrate in the PVD chamber when the target is bombarded by plasma, and the part to be protected is used to fix the sputtering target. 3. The key design point of this appearance design product lies in the shape of the product expressed by non-dotted lines. 4. The picture or photo that best illustrates the key points of the design: Design 1 Stereoscopic drawing 1. 5. Designate Design 1 as the base design. 6. Other situations that require explanation: The portion shown by the dotted line in the design does not require protection. In this design 1‑2, the rear view, left view and right view are symmetrical with the front view, so the rear view, left view and right view are omitted.
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