Sputtering target and main body of sputtering target
CN309057484SActive Publication Date: 2025-01-07TOSOH SMD INC
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Patent Information
- Application Number
- CN202430011031.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2023-07-07
- Filing Date
- 2024-01-08
- Publication Date
- 2025-01-07
- Estimated Expiration
- 2039-01-08
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Figure 000006_ABST
Abstract
1. The name of the product of this design: sputtering target and the main body of the sputtering target. 2. Purpose of the product with this design: The entire product with this design is used as the material deposited on the substrate in the PVD chamber when the target is bombarded by plasma, and the part to be protected is used to fix the sputtering target. 3. The key design point of this appearance design product lies in the shape of the product expressed by non-dotted lines. 4. The picture or photo that best illustrates the key points of the design: Design 1 Stereoscopic drawing 1. 5. Designate Design 1 as the base design. 6. Other situations that require explanation: The portion shown by the dotted line in the design does not require protection. In this design 1‑2, the rear view, left view and right view are symmetrical with the front view, so the rear view, left view and right view are omitted.
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