Photon Beauty Mask
CN309059371SActive Publication Date: 2025-01-07NINGBO DECHANG ELECTRICAL MACHINERY MFG CO LTD
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Patent Information
- Application Number
- CN202430241401.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-26
- Publication Date
- 2025-01-07
- Estimated Expiration
- 2039-04-26
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Figure 000022_ABST
Abstract
1. The name of the product of this design: Photon Beauty Mask. 2. Purpose of the product with this appearance design: The product with this appearance design is used for facial beauty and care. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: reference diagram of the combined state.
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