Wet etching fully automated machine
CN309071679SActive Publication Date: 2025-01-14HONG KONG UNIV OF SCI & TECH (GUANGZHOU)
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Patent Information
- Application Number
- CN202430376277.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-19
- Publication Date
- 2025-01-14
- Estimated Expiration
- 2039-06-19
Smart Images
Figure 000007_ABST
Abstract
1. The name of the product of this design: fully automatic wet etching machine. 2. Purpose of this design product: used for cleaning and etching the wafer surface. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
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