Fabric (hand-woven diamond pattern with regular thickness ratio)
CN309144728SActive Publication Date: 2025-03-04王身向
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Patent Information
- Application Number
- CN202430432763.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-11
- Publication Date
- 2025-03-04
- Estimated Expiration
- 2039-07-11
Smart Images
Figure 000002_ABST
Abstract
1. Name of the product of this design: fabric (hand-woven diamond pattern with regular thickness ratio). 2. Purpose of the product of this design: used for making clothes, bags, etc. 3. The design key point of this appearance design product lies in the pattern. 4. The picture or photo that best illustrates the design points: use the status reference diagram. 5. This design product is a thin product, and other views are omitted. 6. The product of this appearance design is a flat product with four continuous sides and no limited boundaries.
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