Mask base fabric (with raised pattern on the surface)
CN309242886SActive Publication Date: 2025-04-18GUANGZHOU MOIS BIOMEDICAL TECHNOLOGY GROUP CO LTD
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Patent Information
- Application Number
- CN202430571419.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-06
- Publication Date
- 2025-04-18
- Estimated Expiration
- 2039-09-06
Smart Images
Figure 000001_ABST
Abstract
1. The name of the product under this design: facial mask base fabric (with raised patterns on the surface). 2. Purpose of the product of this design: to be used for making facial masks for skin care. 3. The design key point of this appearance design product lies in the combination of shape and pattern. 4. The picture or photo that best illustrates the key points of the design: main view. 5. This design product is a thin product, and other views are omitted.
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