Barrel-shaped vacuum reaction chamber
CN309385942SActive Publication Date: 2025-07-15JIANGSU FEYNMAN SEMICON TECH CO LTD
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Patent Information
- Application Number
- CN202430730978.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-19
- Publication Date
- 2025-07-15
- Estimated Expiration
- 2039-11-19
Smart Images
Figure 000007_ABST
Abstract
1. Name of the design product: Barrel-shaped vacuum reaction chamber. 2. Use of the design product: For the vapor deposition preparation of two-dimensional materials, especially suitable for the efficient synthesis of nanostructures such as graphene and carbon nanotubes, and commonly used in the production of advanced electronic devices and functional materials. 3. Design key points of the design product: Lies in the shape. 4. Picture or photo that best shows the design key points: Perspective view 1.
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