Photon skin rejuvenation mask

CN309538017SActive Publication Date: 2025-10-10何晓锋
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Patent Information

Application Number
CN202530095793.9
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2025-03-03
Publication Date
2025-10-10
Estimated Expiration
2040-03-03

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Abstract

1. The name of the design product: Photon skin rejuvenation mask. 2. The use of the design product: cosmetic instrument for skin care. 3. The design points of the design product: the overall shape of the product. 4. The picture or photo that best indicates the design points: Design 1 perspective view 1. 5. Design 1 is designated as the basic design.
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