Coating and developing apparatus
CN309568448SActive Publication Date: 2025-10-28TOKYO ELECTRON LTD
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Patent Information
- Application Number
- CN202530022414.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Priority Date
- 2024-07-22
- Filing Date
- 2025-01-14
- Publication Date
- 2025-10-28
- Estimated Expiration
- 2040-01-14
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Figure 000006_ABST
Abstract
1. The name of the product under this design: coating and developing device. 2. Purpose of the product of this design: This product is a coating and developing device used to perform coating, developing, heat treatment and other processes on substrates such as semiconductor wafers. 3. The key design feature of this product is its shape. 4. The picture or photo that best illustrates the design points: Stereoscopic drawing 1. 5. The bottom surface of this product is a part that is not easily seen or cannot be seen during use, so the bottom view is omitted. 6. Other Situations That Require Explanation Other explanations: In reference FIG2 , the gray portion is semi-transparent.
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