frame
CN309785602SActive Publication Date: 2026-02-10ADVANCED MATERIALS TECH & ENG INC +1
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Patent Information
- Application Number
- CN202530328922.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-09
- Publication Date
- 2026-02-10
- Estimated Expiration
- 2040-06-09
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Figure 000007_ABST
Abstract
1. The name of the design product: frame. 2. The use of the design product: used for protecting, supporting parts of plasma chemical vapor deposition equipment, used for semiconductor device manufacturing equipment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: design 1 perspective view 1. 5. Design 1 is designated as the basic design.
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