Full-automatic black light machine for wet etching
CN309868917SActive Publication Date: 2026-03-24HONG KONG UNIV OF SCI & TECH (GUANGZHOU)
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-25
- Publication Date
- 2026-03-24
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: full-automatic black lamp machine for wet etching. 2. The use of the design product: used for cleaning and etching the surface of wafer fragments. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view 1.
Need to check novelty before this filing date? Find Prior Art