Excimer laser (LL20)

CN309909803SActive Publication Date: 2026-04-10HEFEI YIKESAI LASER TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
HEFEI YIKESAI LASER TECH CO LTD
Filing Date
2025-09-11
Publication Date
2026-04-10

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Abstract

1. Name of the designed product: excimer laser (LL20). 2. Use of the designed product: used in film processing, wafer processing, pulse laser deposition, etc. 3. Design points of the designed product: combination of shape and pattern. 4. Picture or photo best indicating the design points: perspective view 1.
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