Etching machine (ICP-Alpha)
CN310008695SActive Publication Date: 2026-05-29RUIXINWEI (NANJING) SEMICONDUCTOR TECHNOLOGY CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- RUIXINWEI (NANJING) SEMICONDUCTOR TECHNOLOGY CO LTD
- Filing Date
- 2025-11-20
- Publication Date
- 2026-05-29
Smart Images
Figure 000001_ABST
Abstract
1. Name of the design product: etching machine (ICP-Alpha). 2. Use of the design product: used for wafer etching process. 3. Design points of the design product: in shape. 4. Picture or photo best indicating the design points: perspective view.
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