Mask base fabric testing machine

CN310044601SActive Publication Date: 2026-06-23SHANGHAI STRATOSPHERE INFORMATION TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
SHANGHAI STRATOSPHERE INFORMATION TECH CO LTD
Filing Date
2026-02-25
Publication Date
2026-06-23

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Abstract

1. Name of the product in this design: Mask base fabric testing machine. 2. Purpose of this design: For the detection of defects in the base fabric of face masks. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1.
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