Atomic layer deposition coating machine
CN310063041SActive Publication Date: 2026-06-30SHENZHEN YUANSU OPTOELECTRONICS TECH CO LTD
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Patent Information
- Application Number
- CN202530669474.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-13
- Publication Date
- 2026-06-30
- Estimated Expiration
- 2040-11-13
Smart Images
Figure 000007_ABST
Abstract
1. Name of the product in this design: Atomic Layer Deposition Coating Machine. 2. Application of this design: This design is used for vacuum atomic layer deposition coating. 3. The key design features of this product are the relative positions of its structure. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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