Atomic layer deposition coating machine

CN310063041SActive Publication Date: 2026-06-30SHENZHEN YUANSU OPTOELECTRONICS TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
SHENZHEN YUANSU OPTOELECTRONICS TECH CO LTD
Filing Date
2025-11-13
Publication Date
2026-06-30

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Abstract

1. Name of the product in this design: Atomic Layer Deposition Coating Machine. 2. Application of this design: This design is used for vacuum atomic layer deposition coating. 3. The key design features of this product are the relative positions of its structure. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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