PECVD equipment

CN310072235SActive Publication Date: 2026-07-03KUNSHAN PLAUX ELECTRONICS TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
KUNSHAN PLAUX ELECTRONICS TECH CO LTD
Filing Date
2025-10-14
Publication Date
2026-07-03

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Abstract

1. Name of the product in this design: PECVD equipment. 2. Application of this design: for plasma-enhanced chemical vapor deposition. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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