Remote plasma source cavity (45L)
CN310113673SActive Publication Date: 2026-07-24DONGGUAN SHENGDING PRECISION INSTR CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- DONGGUAN SHENGDING PRECISION INSTR CO LTD
- Filing Date
- 2025-12-05
- Publication Date
- 2026-07-24
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Figure 000007_ABST
Abstract
1. The name of the design product: remote plasma source cavity (45L). 2. The use of the design product: used for dissociating nitrogen trifluoride gas into fluoride ion pairs for chamber cleaning, surface treatment, material modification, film deposition and other processes in a vacuum environment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view.
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