Device for receiving a working gas and method for operating a device in which a working gas is supplied to a chamber

Abstract

The invention relates to a device for receiving a working gas, comprising an arrangement (1) with a first chamber (10), a second chamber (12), and at least one partition (14) arranged between the first chamber (10) and the second chamber (12) for spatial separation, wherein the partition (14) has at least one opening (16) with a first opening surface (162) arranged adjacent to the first chamber (10), a second opening surface (164) arranged adjacent to the second chamber (12), and a channel (166) extending between them along a longitudinal axis (L) over a thickness (d) of the partition (14), wherein the thickness (d) of the partition (14) is a maximum of 1000 nm. Advantageous effects can be investigated and / or exploited by making the first opening surface larger than the second opening surface.

Description

[0001] The invention relates to a device for receiving a working gas, comprising an arrangement with a first chamber, a second chamber and at least one partition wall arranged between the first chamber and the second chamber for spatial separation of them, wherein the partition wall has at least one opening with a first opening surface arranged adjacent to the first chamber, a second opening surface arranged adjacent to the second chamber and a channel extending along a longitudinal axis over a thickness of the partition wall, wherein the thickness of the partition wall is a maximum of 1000 nm.

[0002] Molecular behavior can be used technically by means of suitably designed micro- and / or nanostructures. For example, in osmotic systems, the tendency of a pure liquid solvent to migrate through a semipermeable membrane into a solution is exploited, for example in water treatment.

[0003] The invention is based on the objective of providing a device and a method by which the behavior of a working gas can be investigated at the molecular level, optimized for an effect and / or used technically.

[0004] The problem is solved for the device with the features of claim 1 and for the method with the features of claim 14. Advantageous embodiments are specified in the dependent claims.

[0005] The device is designed so that the first opening area is larger than the second opening area. The first and second opening areas each form a "clear area" within the partition. The openings allow gas exchange between the first and second chambers. Preferably, a plurality of openings are provided, which are preferably of a similar design (particularly with regard to shape, size, and orientation) and / or are evenly distributed within the partition. The longitudinal axis L preferably runs perpendicular to the partition.

[0006] The working gas can be a pure gas, for example nitrogen, or a gas mixture, for example air.

[0007] Based on theoretical considerations, the molecules of the working gas move within the chambers according to the laws of kinetic gas theory. Initial computer-aided preliminary investigations by the inventor, applying these laws, show that the ratio of the surface areas of the first and second openings influences the resulting densities of the working gas in the chambers, with different gas densities occurring in the first and second chambers. The device according to the invention allows for a more detailed experimental investigation of this effect and, if necessary, optimization and technical application, for example, for gas compression in micro- and / or nanostructures.

[0008] In preliminary investigations, it has proven particularly advantageous to generate the highest possible gas density ratio between the chambers if the first opening area is larger than the second opening area by a factor of between 1.1 and 4, preferably by a factor of between 1.4 and 2.

[0009] Preferably, the characteristic width of the first opening surface is less than 1000 nm, e.g., between 20 nm and 150 nm, and the characteristic width of the second opening surface is less than 100 nm, e.g., between 15 nm and 90 nm. The "characteristic width" is defined here as a characteristic dimension that can be used depending on the shape of the opening surfaces or the cross-section of the channel (orthogonal to the longitudinal axis). In the case of a polygonal, particularly slit-shaped, shape, the width of the polygon or slit represents the characteristic width; in the case of a round shape, the diameter; and in the case of an oval, preferably elliptical, shape, the smallest diameter. The opening surfaces and partition surfaces (top and bottom) each lie in a non-curved plane and / or parallel to each other.

[0010] Preferably, the thickness is smaller than the characteristic width of the first opening area and preferably larger than the characteristic width of the second opening area, with the thickness being, for example, between 20 nm and 500 nm.

[0011] Advantageously, it can further be provided that a wall surrounding the channel and extending between the first opening surface and the second opening surface has an angle α to the longitudinal axis of the channel of a maximum of 45°, preferably a maximum of 30°, and particularly preferably a maximum of 15°. In particular, the constriction is designed such that the angle α is constant along the length of the channel and / or at every point on the wall. The angle results in a conical and / or funnel-shaped constriction of the channel between the first opening surface and the second opening surface.

[0012] It may be advantageous, for example, for the channel to have a circular, oval, or polygonal cross-sectional shape perpendicular to its longitudinal axis. The polygonal shape includes, for instance, a slotted design, where several elongated slots can run parallel to each other within the partition.

[0013] For the gas supply and / or gas removal of the arrangement, it is preferably provided that a first line with a first valve for supplying / removing the working gas is in flow communication with the first chamber, and / or that a second line with a second valve for supplying / removing the working gas is in flow communication with the second chamber. The chambers can each be brought into flow communication with, or are brought into connection with, the surroundings of the arrangement by means of the valves. The surroundings preferably constitute another pressure and / or flow system and can be formed by a region surrounding the arrangement and / or, preferably, comprise, for example, a working gas source that can be fluidically coupled to, or is coupled with, one chamber, and / or a working gas sink that can be fluidically coupled to, or is coupled with, the other chamber.

[0014] Preferably, the surface area of ​​the partition between (100 nm) can be provided. 2and (10000 nm) 2 This is particularly relevant given the size of the arrangement.

[0015] Preferably, the number of openings, possibly per arrangement, may be between 1 and 10000.

[0016] Preferably, the height of the first chamber and / or the height of the second chamber perpendicular to the partition plane may be a maximum of 5000 nm, preferably a maximum of 500 nm. For example, a circumferential wall, which seals the chambers against the environment in a pressure-tight manner, may have a corresponding height and a boundary surface on its upper and lower sides, respectively, arranged parallel to the partition. In this way, for example, a cuboid or cylindrical shape is formed for the arrangement. The heights of the chambers or their volumes may differ.

[0017] To scale the density difference between the working gas supplied to and discharged from the device, it is preferably provided that several arrangements are fluidically connected in series, wherein, in particular, the second chamber of the upstream arrangement comprises or forms the first chamber of the immediately downstream arrangement. The characteristic width(s) of the first opening area(s) and / or the characteristic width(s) of the second opening area(s) of the upstream arrangement is / are preferably different, e.g., larger, than the characteristic width(s) of the first opening area(s) and / or the second opening area(s) of the downstream arrangement.

[0018] It is preferably provided that the characteristic width(s) of the first opening area(s) and / or the characteristic width(s) of the second opening area(s) of the (in particular immediately) upstream arrangement is / are, if applicable, larger than the characteristic width(s) of the first opening area(s) and / or the characteristic width(s) of the second opening area(s) of the (in particular immediately) downstream arrangement.

[0019] To scale the compressible volume of working gas using the device, it is preferably provided that several arrangements are arranged parallel to each other in terms of flow characteristics, wherein, in particular, the arrangements have an identical design with respect to the respective partition and / or the first chamber and / or the second chamber. For example, the partition has identical openings (of the same design and arrangement) and / or the chambers have a comparable volume or geometry.

[0020] The method according to the invention relates to a method for operating a device according to one of the preceding claims, wherein - a working gas is supplied to a first chamber and / or to a second chamber of an arrangement, wherein the chambers are spatially separated from each other by at least one intermediate partition wall with a thickness of at most 1000 nm and have at least one opening, and are in fluid communication, wherein the opening has a first opening area adjacent to the first chamber and a second opening area adjacent to the second chamber, wherein the first opening area is larger than the second opening area, - wherein, preferably after supply of the working gas, the arrangement is pressure-decoupled from the environment, - wherein the working gas remains within the arrangement for at least a certain residence time, moving at least partially through the opening from one of the chambers to the other chamber, and - wherein the working gas is discharged from at least one of the chambers after at least the residence time, and the arrangement is brought into flow contact with an environment.

[0021] The movement of the working gas occurs particularly without external driving force (e.g. pump), solely due to spontaneous molecular motion according to the laws of the kinetic theory of gases.

[0022] The residence time corresponds to the duration within which an equilibrium state is reached, i.e., no further change in gas density occurs within the chambers, and can be a maximum of 1 second, e.g., a maximum of 100 ms. The chamber from which the working gas is discharged is specifically the chamber in which a higher density of the working gas is established. The arrangement does not need to be completely evacuated of the working gas. Due to the short timescale (in the millisecond range) within which equilibrium is reached, the process of adding and removing working gas can be carried out quasi-continuously compared to longer timescales (in the second range).

[0023] The invention will now be explained in more detail using exemplary embodiments and with reference to the drawings. The drawings show: Fig. 1A, B a device according to the invention for receiving a working gas, with an arrangement comprising a first chamber, a second chamber and at least one intermediate partition wall with an opening, in schematic sectional view ( Fig. 1A) and an enlarged view of an opening ( Fig. 1B) and Fig. 2 a part of a further variant of the device, with several conically tapered openings in cross-section, circular in cross-section, in perspective view.

[0024] Fig. Figure 1A shows a schematic sectional view of a device according to the invention with an arrangement 1 comprising a first chamber 10, a second chamber 12 and a partition 14 arranged between the first chamber 10 and the second chamber 12. The partition 14 serves to spatially separate the first chamber 10 and the second chamber 14.

[0025] In addition to the partition 14, the two chambers 10, 12 are each separated from the environment (pressure-tight) by a gas-tight wall 26. In the illustrated embodiment, a boundary surface of the wall 26, spaced apart from the partition 14 (e.g., upper and lower), provides access for the supply and / or...

[0026] Discharge of a working gas via a first or second line 18, 24 with a first or second valve 20, 24 is provided.

[0027] The device serves to investigate the movement behavior of the working gas located within the arrangement 1 at the molecular level and / or its targeted influence by means of the geometric design of the arrangement 1. The working gas can be a pure gas, for example nitrogen, or a gas mixture, for example air.

[0028] For this purpose, the dimensions of the arrangement 1 are kept small, whereby the laws of kinetic gas theory are applicable to the behavior of the working gas. The thickness d of the partition 14 is a maximum of 1000 nm, for example between 10 nm and 500 nm. The surface area of ​​the partition 14 is, for example, between (100 nm) 2 and (10000 nm) 2 The height of the first chamber 10 and / or the second chamber 12 perpendicular to the partition plane is, for example, a maximum of up to 5000 nm, preferably up to 500 nm. The heights of the first chamber 10 and the second chamber 12 can be different.

[0029] In partition wall 14 there is in Fig. 1 For example, an opening 16 (preferably a plurality of openings 16) adjoins the first chamber 10 with a first opening surface 162 and the second chamber 12 with a second opening surface 164. A channel 166 runs between the first opening surface 162 and the second opening surface 164 along and / or symmetrically to a longitudinal axis L. The longitudinal axis L of the channel 166 is, in particular, arranged orthogonally to the plane of the partition 14 in the region of the opening 16. The partition 14 is designed to be passable by the working gas via the at least one opening 16, so that at least a portion of the working gas can move from one of the chambers 10, 12 to the other.

[0030] The opening surfaces 162, 164 and the channel 166 (in cross-section orthogonal to the longitudinal axis L) preferably have the same (cross-sectional) shape, for example polygonal, in particular slit-shaped, round or oval, in particular elliptical.

[0031] Fig. Figure 2 shows in perspective a part of a variant of the device in which the partition 14 has a plurality of openings 16 with a round cross-section (orthogonal to the respective longitudinal axis L), wherein the channel 166 tapers continuously, e.g. conically, from the first opening surface 162 to the second opening surface 164.

[0032] The at least one opening 16 is designed in a specific way to influence the gas movement and the associated gas density in the first chamber 10 and in the second chamber 12. In this case, the first opening area 162 is larger than the second opening area 164, e.g., by a factor between 1.1 and 4, preferably between 1.4 and 2.

[0033] Based on theoretical considerations, the molecules of the working gas in chambers 10 and 12 move according to the laws of kinetic gas theory. According to initial simulations by the inventor applying these laws, the ratio of the surface areas influences the resulting densities of the working gas, with different gas densities occurring in the first and second chambers as a function of the ratio of the first and second opening areas A1 and A2, and also being influenced by the shape of the opening wall.

[0034] According to initial preliminary investigations simulating gas behavior, different gas densities are established in the first chamber 10 and the second chamber 12 after the addition of the working gas, the density ratio depending on the ratio of the surface areas of the first opening 162 and the second opening 164. For example, the preliminary investigations have shown it to be particularly advantageous if the first opening 162 is larger than the second opening 164 by a factor between 1.1 and 4, preferably between 1.4 and 2.

[0035] Furthermore, preliminary investigations have shown that it is advantageous for the characteristic width of the first aperture area 162 to be less than 1000 nm, in particular between 20 nm and 150 nm. Advantageously, the characteristic width of the second aperture area 164 is less than 100 nm, e.g., between 15 nm and 90 nm.

[0036] Furthermore, it has proven advantageous if the thickness d of the partition 14 is smaller than the characteristic width, for example slot width or diameter, of the first opening surface 162 and in particular is larger than the characteristic width, for example slot width or diameter, of the second opening surface 164.

[0037] How Fig. As shown in Figure 1B in a detailed representation of the opening 16, a wall 166, which delimits the channel 166 and extends between the first opening surface 162 and the second opening surface 164, is inclined at an angle α with respect to the longitudinal axis L of the channel 166. The angle α is, for example, a maximum of 45°, preferably a maximum of 30°, and particularly preferably a maximum of 15°. The constriction is designed such that, for example, the angle α is constant over the length of the channel and / or at every point on the wall. Fig. As illustrated in Figure 1B, the angle results in a kind of “conical” and / or “funnel-shaped” narrowing of the channel 166 between the first opening surface 162 and the second opening surface 164, or a “trapezoidal” cross-section in a longitudinal plane along the longitudinal axis L.

[0038] Structures of such a size as the partition 14 with at least one opening 16, preferably several openings 16, can be produced, for example, by nanolithographic methods. Suitable materials include, for example, ceramics and / or crystalline structures.

[0039] How Fig.As shown in Figure 1A, the first chamber 10 is connected to the first line 18 for the supply and / or discharge of the working gas. The second chamber 12 is connected to the second line 22 for this purpose. The first valve 20 is located within the first line 18. The second valve 24 is located within the second line 22. The flow of working gas supplied to or discharged from the arrangement 1 can be controlled and / or regulated by means of the valves 20 and 24.

[0040] The operation of the arrangement 1 was initially investigated in a computer simulation. In the arrangement 1, which is filled with working gas, the gas molecules move within the first chamber 10 according to the laws of kinetic gas theory, being elastically reflected, for example, by the walls 26 and / or the partition 14. Gas molecules enter the second chamber 12 through at least one, preferably several, opening(s) 16. Due to the different surface areas of the first opening 162 and the second opening 164, an equilibrium state is established after a (very short) time interval, whereby the density within the first chamber 10 differs from the density within the second chamber 12.

[0041] The device according to the invention allows for an experimental investigation of this behavior and, if necessary, optimization for the development of a technical application by means of which the working gas can be compressed on a nanoscale in the manner of a “nano-compressor”.

[0042] To scale the compressible volume of working gas using the device according to the invention, several arrangements 1 can preferably be arranged parallel to one another in terms of flow characteristics, wherein, for example, the arrangements 1 have a similar design with respect to the respective partition 14 and / or the first chamber 10 and / or the second chamber 12 (not shown here). For example, the partition 14 can each have the same area and / or thickness d and / or density of openings 16 or arrangement of openings 16 and / or the walls 26 of the chambers 10, 12 can have the same height. The first chambers 10 can each be in fluid communication with each other and have only one common first line 18. The second chambers 12 can each be in fluid communication with each other and have only one common second line 22.

[0043] To scale the density difference between the working gas supplied to and discharged from the device, several arrangements 1 can in particular be arranged in series in terms of flow technology, wherein the second chamber 12 of the upstream arrangement 1 comprises or forms the first chamber 10 of the immediately downstream arrangement 1 (not shown here).

[0044] The first line 18 is preferably connected only to the first chamber 10 of the first arrangement 1 and the second line 22 only to the second chamber 12 of the last arrangement 1.

[0045] During operation, the working gas is supplied to one of the chambers 10, 12, e.g., the first chamber 10 or several first chambers 10, via the first line 18. After reaching equilibrium, which occurs within a few milliseconds, compressed working gas can be drawn from the chamber 10, 12 with the higher gas density, for example, the second chamber 12. Due to the high speeds and short timescales, the process can run quasi-continuously.

[0046] The device serves, firstly, to investigate the functionality of the compressor principle and (further) develop advantageous geometries to increase its efficiency.

[0047] Should the device prove to function as expected after examination, it can be used particularly advantageously for gas compression within microscopic structures. One application example is microprocessor technology, where the device can be used, for instance, inside processors directly at the point of heat generation for coolant delivery. Another potential application is vacuum technology, where the device can be used to selectively generate local vacuum conditions for technical processes that take place under vacuum, without the need for large vacuum chambers for complex apparatus. Reference symbol list 1. Arrangement 10 first chamber 12 second chamber 14 Partition wall 16 Opening 162 first opening area 164 second opening area Channel 166 168 wall 18 first line 20 first valve 22 second line 24 second valve 26 wall α angle d thickness L Longitudinal axis

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