Nanomanipulator, device and method for processing a sample

The nanomanipulator addresses the challenge of removing small contaminants from microlithography masks and wafers by using a compact positioning device with a force-sensing tip for precise particle removal, ensuring high spatial resolution and stable operation.

DE102026105993A1Inactive Publication Date: 2026-04-23CARL ZEISS SMT GMBH
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Patent Information

Authority / Receiving Office
DE · DE
Patent Type
Applications
Current Assignee / Owner
Filing Date
2026-02-13
Publication Date
2026-04-23
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

Existing microlithography processes face challenges in removing extremely small contaminants and defects from lithography masks and semiconductor wafers due to their size and weak bonding, requiring devices with high spatial resolution and precise manipulation.

Method used

A nanomanipulator with a compact positioning device and a tip designed for precise movement in three dimensions, allowing for the selective removal of particles from the sample surface by overcoming attractive forces and monitoring interactions using a force-sensing device.

Benefits of technology

Enables efficient and precise removal of particles from samples with high spatial resolution, minimizing damage and contamination, and optimizing the nanomanipulator's natural resonance for stable operation.

✦ Generated by Eureka AI based on patent content.

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Abstract

A nanomanipulator (104) for processing a sample (102), comprising a tip (106) and a positioning device (108) for moving the tip (106), wherein the tip (106) is configured to process a sample (102) arranged below the positioning device (108), the positioning device (108) comprises a base element (122) and a bridge element (124) which is movably attached to the base element (122) at two attachment points (126), the base element (122) and / or the bridge element (124) having a recess (130) and the tip (106) being attached to the bridge element (124) and arranged below the recess (130).
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Description

[0001] The present invention relates to a nanomanipulator for processing a sample, a device with such a nanomanipulator and a method for processing a sample.

[0002] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system, which includes an illumination system and a projection system. The image of a mask (reticule) illuminated by the illumination system is projected by the projection system onto a substrate, such as a silicon wafer, coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection system. This transfers the mask structure onto the photosensitive coating of the substrate.

[0003] Driven by the pursuit of ever smaller structures in the manufacture of integrated circuits, EUV lithography systems are currently being developed which use light with a wavelength in the range of 0.1 nm to 30 nm, in particular 13.5 nm.

[0004] In microlithography, a single mask (i.e., a lithography mask) is used for numerous exposures, making it crucial that the mask is free of defects and contaminants. Therefore, lithography masks undergo rigorous inspection for defects and contaminants. Attempts are then made to repair any identified defects or remove contaminants. These defects and contaminants can be extremely small, ranging in size from a few nanometers. Consequently, their removal requires devices with very high spatial resolution.

[0005] The contaminants are, for example, minute particles that have settled on the mask from the environment. Such contaminants occur, for instance, during mask use or when the mask is transferred between different processing devices. The particles are of various types and have different sizes and / or shapes. They can be, for example, metal particles, especially tin, but ceramic particles, polymer particles, and other carbon compounds can also be present. The particles are typically adsorbed onto the mask surface, meaning that there are no strong chemical bonds, such as atomic bonds, between the particle material and the mask surface.

[0006] A particle will leave the mask surface if the attractive forces applied to remove the particle (e.g., Coulomb forces and van der Waals forces) are greater than the attractive forces (e.g., Coulomb forces and van der Waals forces) on the mask surface. Depending on the type of interaction between the particle and the mask surface, activation energy may be required to break the existing bond with the mask surface.

[0007] Besides lithography masks, there are other types of samples (e.g. wafers, semiconductor wafers, such as wafers with semiconductor components produced in the described microlithography process) which require that they be free of impurities and defects.

[0008] Processing devices are known for selectively removing individual particles from the surface of a mask. Nanomanipulators and / or atomic force microscopes are used for this purpose. A particle is picked up by the tip (measuring and manipulator tip) of the nanomanipulator and removed from the mask surface, adhering to the tip. Particle removal is typically supported by imaging techniques (for example, by taking images with a microscope, such as an optical microscope, scanning microscope, scanning electron microscope, and / or scanning ion microscope).

[0009] Against this background, one object of the present invention is to improve the processing of a sample with a nanomanipulator.

[0010] According to a first aspect, a nanomanipulator for processing a sample is proposed. The nanomanipulator has a tip and a positioning device for moving the tip, wherein the tip is configured for processing a sample arranged below the positioning device, the positioning device has a base element and a bridge element movably attached to the base element at two attachment points, the base element and / or the bridge element has a recess, and the tip is attached to the bridge element and arranged below the recess.

[0011] This allows the positioning device for moving the tip to be designed very compactly. For example, the positioning device can be arranged below an image generation unit for producing microscopic images of the sample. In particular, this allows the image generation unit to produce one or more images, each showing the (actual) apex of the tip and at least a portion of the sample.

[0012] The nanomanipulator is set up to manipulate a sample. The sample is, for example, a flat, extended object. The sample can have, for example, a rectangular, square, and / or circular shape in its principal plane of extension.

[0013] The sample includes, for example, a substrate, a photomask, and / or a wafer. In particular, the sample includes, for example, a microlithographic photomask, a substrate for a microlithographic photomask, and / or a mask blank for a microlithographic photomask. The sample may also include, for example, a substrate (e.g., a wafer substrate), a wafer, a silicon wafer, a semiconductor wafer, a single wafer, a portion of such a wafer, a die, and / or a semiconductor die.

[0014] The photomask for microlithography, as an example of a sample, features structures (e.g., absorber structures). These structures have a feature size in the range of 10 nm to 10 µm. The structures are arranged, for example, in a pattern for manufacturing a specific type of semiconductor chip. The sample could be, for example, a transmissive lithography mask for DUV lithography (DUV: "deep ultraviolet," working light wavelengths in the range of 30–250 nm) or a reflective lithography mask for EUV lithography (EUV: "extreme ultraviolet," working light wavelengths in the range of 1–30 nm, especially 13.5 nm).

[0015] Instead of a photomask, the sample can also be, for example, a (semiconductor) wafer, a scattered wafer, and / or a (semiconductor) die. The wafer, scattered wafers, and / or the die may contain, for example, semiconductor structures and / or semiconductor components. These semiconductor structures and / or components may include, for example, electronic components, photonic components, integrated circuits (e.g., electronic integrated circuits and / or photonic integrated circuits), and / or electronic and / or photonic (intermediate) connections and / or interposers. The wafer, scattered wafers, and / or the die may, for example, contain multiple layers of semiconductor structures and / or semiconductor components printed on a substrate of the wafer. The sample may also include, for example, a wafer, scattered wafers, and / or a die during a manufacturing process.The sample includes, for example, a partially fabricated wafer, a singulated wafer, and / or a prefabricated portion of a wafer. The sample includes, for example, a wafer on which one or more of a number of planned layers of semiconductor structures have been placed (e.g., printed). The sample includes, for example, a wafer before singulation into multiple dies. The sample includes, for example, a die before encapsulation into a package.

[0016] The tip (e.g., manipulator tip or manipulator and measuring tip) for processing the sample has, for example, a length in the range of 0.5 µm to 1 mm and a diameter in the range of 1 nm to 1 µm. In particular, the tip may taper towards its free end. The tip may be made of a material including, for example, carbon, silicon, one or more precious metals, tungsten, platinum, iridium, and / or a platinum-iridium alloy. The tip allows for the targeted manipulation of specific positions on the sample surface, especially when the sample has structures with a high aspect ratio. The aspect ratio can be defined, for example, as the ratio of the width to the height of a structure. An example of a structure with a high aspect ratio of 1:10 is a narrow, deep trench that is, for example, 1 µm wide and 10 µm deep or 10 nm wide and 100 nm deep.In the case of a photomask, for example, the sample structures have dimensions of 50 nm to 100 nm in height and 10 nm to 100 nm in width. In the case of a wafer and / or semiconductor die, for example, the sample structures can also have a smaller width than 10 nm to 100 nm and / or a greater height than 50 nm to 100 nm.

[0017] The tip can be moved in three spatial directions relative to the base element of the positioning device (translational movement in the three spatial directions). These three spatial directions define a three-dimensional space. For example, the three spatial directions include a vertical direction Z and two lateral directions X and Y, each perpendicular to the vertical direction and to each other. For example, the X and Y directions are parallel to and / or in the main plane of extension of the sample, and the Z direction is perpendicular to the main plane of extension of the sample. This allows the tip to be precisely positioned at specific predetermined locations on the sample surface.

[0018] Using the nanomanipulator, individual particles can be selectively removed from the surface of a sample. To do this, a particle is approached with the tip of the nanomanipulator, picked up, and removed from the sample surface while adhering to the tip.

[0019] The particle is, in particular, a foreign body, such as dust or dirt, that has settled on the sample surface. It can also be said that the particle adheres to and / or is adsorbed on the sample surface. Particles adhering to / adsorbed on the sample surface can have different properties, for example, different geometric characteristics (e.g., different shapes, sizes, and / or volumes) and / or different material properties (e.g., different material compositions, different degrees of hardness). The size (e.g., width, height, diameter, etc.) of the particles can, for example, take on values ​​in the range of 3 nm - 1 µm, 3 nm - 50 µm, and / or 3 nm - 100 µm.

[0020] Such a particle can be located on the sample surface using optical analysis methods and precisely targeted with the tip of the nanomanipulator. To pick up the particle with the tip, it must first be detached from the sample surface. This means that the forces acting between the sample surface and the particle must be overcome. The strength of the particle's bond to the sample surface depends on both the particle's properties (e.g., its geometric shape, size, material, etc.) and the properties of the sample surface (e.g., its surface energy). The higher the surface energy, the stronger the particle's bond to the surface.

[0021] To pick up the particle with the tip, the tip is brought into contact with the particle. If the attractive forces of the tip are greater than the attractive forces of the sample surface, the particle will detach from the sample surface and can be picked up by the tip.

[0022] It can be helpful to first move the particle with the tip on the sample surface to break existing bonds between the particle and the sample surface. This can, for example, reduce the binding energy of the particle with respect to its attachment to the surface. Furthermore, this can increase the contact area between the tip and the particle. A larger contact area increases the likelihood that the particle will adhere to the tip and detach from the sample surface.

[0023] After the particle has been picked up by the tip, it must be removed from the tip in order to continue using the tip. The particle should be placed in a position on the sample surface where it will not interfere, or on a separate storage unit (e.g., a wiper unit).

[0024] The tip is attached to the bridge element of the nanomanipulator's positioning device. Since the bridge element is movably attached to the base element of the positioning device, the nanomanipulator is specifically designed to move the bridge element, together with the tip attached to it, relative to the base element of the positioning device.

[0025] Since the bridge element (and optionally a force-sensing device) moves simultaneously with the tip for scanning the sample surface and removing particles, a rigid design of the nanomanipulator is necessary. Specifically, the nanomanipulator is designed such that its natural resonance in the Z-direction (vertical direction) is 300 Hz or higher (i.e., not below 300 Hz). This is achieved through a compact form of the base element, into which the actuators for moving the bridge element are integrated, as this optimizes the overall vibration modes.

[0026] The tip is particularly firmly attached to the bridge element of the positioning device, i.e., it is not movable relative to the bridge element.

[0027] The nanomanipulator features, in particular, a cantilever to which the tip is connected. For example, the tip and the cantilever may be two separate parts, with the tip rigidly attached to a free end of the cantilever. However, the cantilever and tip can also be monolithic. The cantilever may also be referred to as a "cantilever".

[0028] The tip is attached to the bridge element, in particular by means of the boom. The boom has an elongated shape with a longitudinal axis. Furthermore, the boom is attached to the bridge element at one end with respect to its longitudinal axis. Using the positioning device, the position of the first end of the boom (also called the base or end of the boom) can be adjusted in three spatial directions. Additionally, the boom has a tip at its second end with respect to its longitudinal axis (free end).

[0029] When the tip approaches the sample surface, an interaction occurs between the tip and the sample surface. This interaction can be based on direct contact, van der Waals interaction, or other physical interactions, as well as combinations thereof. Forces acting between the tip and the sample cause a deflection of the free end of the probe in the Z-direction. This deflection is also proportional to the probe's spring constant. Specifically, the probe bends to varying degrees during the scanning process, depending on the forces acting between the tip and the sample. The extent of this deflection, or deflection, of the free end of the probe in the Z-direction is therefore a measure of the forces acting on the tip.The deflection of the free end of the boom in the Z-direction can be detected, for example, using a light pointer device. This allows the forces acting on the tip to be monitored.

[0030] The foot end of the boom can be fixed directly to the bridge element or can be fixed to the bridge element using one or more support elements.

[0031] The bridge element is movably attached to the base element of the positioning device at (at least) two points. Moving the bridge element relative to the base element moves the tip, allowing it to be positioned relative to the sample surface.

[0032] The movable attachment of the bridge element to the base element is designed for movement with micrometer and / or nanometer accuracy in the X, Y, and / or Z directions (e.g., movement of the bridge element relative to the base element with a resolution of 0.1 nm in the X, Y, and / or Z directions; reproducibility of the movement of the bridge element relative to the base element with 1 nm in the X, Y, and / or Z directions; absolute accuracy of the movement of the bridge element relative to the base element of 10 nm in the X, Y, and / or Z directions). Furthermore, the movable attachment of the bridge element to the base element is designed for movement with adjustment ranges from 10 µm to 100 µm in the X, Y, and / or Z directions and at high speed (e.g., 1 µm per second to 100 µm per second).

[0033] The bridge element is movably attached to the (at least) two mounting points of the base element of the positioning device, in particular by means of one or more actuators. The actuators at the (at least) two mounting points of the base element are, in particular, parallel and / or synchronized actuators configured for synchronous movement of the bridge element by synchronous activation at the (at least) two mounting points. The bridge element is movably attached to the (at least) two mounting points of the base element in the X, Y, and Z directions. The respective actuators are configured for fine movement in the X, Y, and Z directions (e.g., movement with the aforementioned accuracy, adjustment ranges, and / or speed).

[0034] The bridge element bridges, i.e. spans, in particular an area between the (at least) two attachment points where it is attached to the base element.

[0035] The base element of the positioning device is attached, for example, by means of one or more further base elements or directly, to a housing (e.g. vacuum housing) of a higher-level device which includes the nanomanipulator.

[0036] The base element and / or the bridge element has / have a recess. This includes the case where only one of the base element and / or the bridge element has the recess. It also includes the case where both the base element and the bridge element each have a recess. A recess in the base element extends, in particular, from an upper side of the base element to a lower side of the base element. If the base element has the recess, then the base element has, for example, a horseshoe shape and / or a U-shape. In this case, the base element can also have a V-shape. Furthermore, a recess in the bridge element extends from an upper side of the bridge element to a lower side of the bridge element. If the bridge element has the recess, then the bridge element has, for example, a horseshoe shape and / or a U-shape. In this case, the bridge element can also have a V-shape.

[0037] The (respective) recess is, for example, bounded by two legs. That is, the (respective) recess is bounded on two sides by the two legs accordingly.

[0038] The base element and / or the bridge element can, for example, have an O-shape and / or ring shape instead of a horseshoe, U-shape, and / or V-shape. In other words, the recess of the base element and / or the bridge element can, in this case, be bounded by a closed edge and / or a ring instead of, for example, two legs. In this case, more than two attachment points can also be provided where the bridge element is movably attached to the base element of the positioning device.

[0039] The tip is positioned below the recess. Therefore, the tip is visible through the recess. For example, the tip is visible through the recess from above the positioning device.

[0040] The tip can, for example, be attached inside the recess on the bridge element.

[0041] The terms “below”, “above”, “down”, “above”, etc. used herein refer in particular to an upward direction (i.e. Z-direction) of the nanomanipulator and / or the higher-level device which includes the nanomanipulator.

[0042] The tip is directed downwards, particularly in the upward direction, in order to process the sample located below the tip and below the positioning device.

[0043] The tip protrudes downwards from the recess in particular to allow manipulation of the sample surface with the tip, without other elements of the positioning device, such as the bridge element, coming too close to the sample surface.

[0044] The nanomanipulator, for example, is a modified atomic force microscope.

[0045] According to one embodiment, the recess is configured to at least partially accommodate an end section of an image generation device for producing microscopic images of the sample, and / or the recess is configured to at least partially allow rays to pass through for producing microscopic images of the sample.

[0046] The positioning unit of the nanomanipulator is thus designed so that it can be arranged (e.g., directly) above and / or partially overlapping the image generation unit in the vertical direction. This allows the small installation space between the image generation unit and a sample stage (and thus the sample) to be used for positioning the nanomanipulator's positioning unit. Furthermore, this allows the image generation unit to be positioned very close to the tip of the nanomanipulator. For illustrative purposes only, the distance between the image generation unit (i.e., the distance from the end of the image generation unit facing the sample stage and the sample) and the tip of the nanomanipulator could be a few millimeters (e.g., 1 mm to 5 mm and / or 3 mm).

[0047] The image generation device is designed to produce microscopic images of the tip and at least part of the sample. The image generation device is used in particular to monitor the processing of the sample with the tip.

[0048] The imaging system includes, for example, a microscopic imaging device, such as a scanning microscope, in which the sample surface is scanned by a particle beam, a light beam, and / or a probe tip, thus capturing it as a temporal sequence of individual signals (e.g., based on secondary electrons and / or light reflections). These individual signals are then computer-aidedly combined to form a two-dimensional image. For example, the imaging system includes a scanning electron microscope and / or a scanning ion microscope.

[0049] The image generation device includes, for example, a housing. The housing of the image generation device is, for example, at least partially arranged within a vacuum housing of a higher-level device which includes the nanomanipulator and the image generation device.

[0050] For illustrative purposes only, a particle beam column for generating a particle beam is arranged within the housing of the image generation device. Furthermore, for illustrative purposes only, the end section of the image generation device has an opening in the housing for allowing the generated particle beam to pass through towards the sample. The end section is, in particular, an end section of the image generation device facing a sample stage for holding the sample. The end section is, in particular, a lower end section of the image generation device.

[0051] In a first variant, the end section of the image generation device is at least partially enclosed within the recess of the nanomanipulator's positioning device. In this case, the end section of the image generation device is, for example, the end section of the image generation device's housing. If the end section of the image generation device has an opening in the housing for allowing a particle beam to pass through towards the sample, then the particle beam released from the image generation device's housing is released within the recess of the nanomanipulator's positioning device.

[0052] In addition to or instead of the first variant, the recess of the nanomanipulator's positioning device is configured in a second variant to at least partially allow beams to pass through for generating microscopic images of the sample. These beams for generating microscopic images of the sample include, for example, beams emitted from the imaging device towards the sample (e.g., a particle beam, a light beam, etc.) and / or beams emitted from the sample towards the imaging device (e.g., a secondary particle beam, a beam of backscattered particles, light beams, etc.).

[0053] According to another embodiment, the recess is limited by two legs, and the tip is arranged below a space between the two legs.

[0054] The recess is specifically limited on two sides of the recess by the two legs.

[0055] If the base element has the recess, then the recess is specifically bounded by two legs of the base element. If the bridge element has the recess, then the recess is specifically bounded by two legs of the bridge element.

[0056] According to another embodiment, the base element has the recess, the recess is limited by two legs and / or a ring, and the bridge element is movably attached to the two legs and / or the ring in such a way that it bridges the recess.

[0057] The bridge element is, for example, movably attached to the corresponding free ends of the two legs in such a way that it bridges the recess.

[0058] The bridge element is, for example, movably attached to ring sections of the ring in such a way that it bridges the recess.

[0059] This allows for a recess in the base element of the positioning device into which an end section of an image generation device can be at least partially inserted and / or through which beams can pass to generate microscopic images of the sample. Simultaneously, the tip of the bridge spanning the recess can be positioned so that it lies within the field of view of the image generation device.

[0060] According to another embodiment, the bridge element has: a first end section, at which it is movably attached to one of the first of the two attachment points of the base element, a second end section, to which it is movably attached at a second of the two attachment points of the base element, and a middle section arranged between the first end section and the second end section, to which the tip is attached.

[0061] This allows the tip to be attached essentially in the center of the bridge element.

[0062] According to another embodiment, the nanomanipulator has a force detection device attached to the bridge element for detecting a force acting on the tip.

[0063] This allows monitoring of the force exerted on the tip when moving it relative to the sample surface. Consequently, it can be ensured that a predetermined maximum force on the tip is not exceeded and / or that a predetermined minimum distance between the tip and the sample surface is maintained. This reduces the risk of damage to the sample surface and / or the tip due to unwanted contact between the tip and the sample surface.

[0064] Because the force-sensing device is attached to the bridge element, the force-sensing device moves along with the tip when the bridge element is moved. This means that when the tip is moved using the positioning device, it is not necessary to move the force-sensing device separately.

[0065] The nanomanipulator may include a control unit for evaluating the data acquired by the force detection device (e.g., light pointer device).

[0066] The force detection device includes, for example, an optical force detection device (e.g., a light pointer device). The operation of an optical force detection device is advantageously not electromagnetically disturbed by a particle beam column of an image generation device.

[0067] According to another embodiment: The nanomanipulator has a boom with a foot end attached to the bridge element and a free end where the tip is located. The force detection device includes a light pointer device for detecting a deflection of the free end of the boom, and The light pointer device features: a light source attached to the bridge element for emitting a beam of light towards the free end of the boom, and a position-sensitive photodetector attached to the bridge element to detect a light beam reflected from the free end of the boom.

[0068] Because the light pointer device is attached to the bridge element, the light pointer device moves along with the tip when the bridge element is moved. This means that when the tip is moved using the positioning device, it is not necessary to move the light pointer device separately and adjust its beam direction (e.g., the beam direction of the light source). This allows for constant beam guidance by the light pointer device. Therefore, complex and error-prone beam tracking of the light pointer device and / or the calibration / compensation of measurement errors are unnecessary.

[0069] The light pointer device can detect the degree of bending or deflection of the free end of the boom in the Z-direction (vertical direction). The photodetector is, for example, a position-sensitive photodetector.

[0070] A light beam emitted from the light source is directed onto the free end of the boom and, in an unflexed position of the boom, reflected to the center of the position-sensitive photodetector. The photodetector is divided into four sections, for example, "top left," "top right," "bottom left," and "bottom right." If the deflection (displacement) of the boom changes, the reflected light spot moves across the photodetector like a pointer. By measuring the intensities in the four sections of the photodetector, vertical and horizontal deflection signals can be determined, which are proportional to the normal force and lateral forces, respectively.

[0071] Forces acting between the tip and the sample can also cause a twisting of the free end of the boom around the X-direction. This can also be detected using the light pointer device.

[0072] The light source could be, for example, a laser source for emitting a laser beam, with the photodetector designed to detect a reflected laser beam. However, the light source could also be any other type of light source (e.g., a light-emitting diode and / or another fiber-coupled light source).

[0073] According to another embodiment: The bridge element has a first end section at which it is movably attached to a first of the two attachment points of the base element, and a second end section at which it is movably attached to a second of the two attachment points of the base element. The light source is attached to and / or adjacent to the first end section of the bridge element, and The photodetector is attached to the second end section and / or adjacent to the bridge element.

[0074] This allows the light source and the photodetector to be appropriately attached to and / or adjacent to the bridge element in order to emit a light beam towards the free end of the boom and to detect a light beam reflected from the free end of the boom.

[0075] According to another embodiment, the light source and / or the photodetector are each movably attached to the bridge element by means of one or more actuators.

[0076] The light pointer device can be adjusted using one or more actuators. Specifically, the position and / or orientation of the light source and / or photodetector can be set using one or more actuators. This allows for adjustment of the light source's focus and the orientation of the photodetector (e.g., a photodiode).

[0077] For example, the light source is movably attached to the bridge element in the X, Y, and Z directions by means of one or more actuators. For example, the photodetector is movably attached to the bridge element in one X' and Y' direction by means of one or more actuators.

[0078] For example, the light pointer device defines a further coordinate system X'Y'Z' (in addition to the XYZ coordinate system of the specimen). Specifically, this further coordinate system is oriented to the light beam of the light pointer device, which is emitted from the light source towards the free end of the boom. The Z' axis of the further coordinate system coincides with the direction of the light beam emitted by the light source. The Z' axis of the further coordinate system is, for example, arranged at an angle of approximately 45° relative to the Z-axis of the XYZ coordinate system of the specimen. Furthermore, the X' and Y' axes of the further coordinate system are arranged perpendicular to the light beam emitted by the light source.

[0079] According to another embodiment, the positioning device has a further base element to which the base element is movably attached.

[0080] By moving the base element relative to the other base element and thus setting a position of the base element relative to the other base element, a manufacturing tolerance of nanomanipulators used in the device can be compensated for.

[0081] For example, the base element is movably attached (e.g., only) in the vertical direction (Z-direction) to the other base element. However, the base element can also be movably attached to the other base element in the X, Y, and Z directions.

[0082] The movement of the base element relative to the other base element is, for example, a coarse movement, e.g. with an accuracy of 10 nm and / or adjustment ranges of 1 mm and / or in the range of 1 mm to 2 mm in the respective direction.

[0083] According to a further embodiment, the positioning device has one or more motors for moving the base element relative to the other base element. Furthermore, the one or more motors have one or more pairs of friction elements, each pair of friction elements comprising a first friction element with a first friction surface of a first hardness and a second friction element with a second friction surface of a second hardness, the first hardness being different from the second hardness.

[0084] By selecting friction pairs in the motor consisting of a friction element with a soft friction surface and a friction element with a hard friction surface, particle abrasion within the motor is reduced. This means that only a very small number of particles are generated. In particular, the friction element with the soft friction surface exhibits high resistance to abrasion and wear, which especially reduces the formation of critical, nanometer-sized particles.

[0085] This prevents the motor itself from being damaged by generated particles, thus extending the motor's lifespan. It also reduces the number of particles that can be released (e.g., fall) onto the sample during motor operation, thereby lowering the risk of sample contamination.

[0086] One or more motors may, for example, feature a walking drive (e.g., a single-axis walking drive and / or a piezoelectric walking drive).

[0087] The one or more pairs of friction elements of the motor(s) each feature, for example, piezoelectric drive elements as the first friction element and a propulsion element (a so-called rotor) as the second friction element. The propulsion element converts the microscopic movement of the piezoelectric drive elements into a macroscopic movement.

[0088] To reduce particle abrasion, in a pair of friction elements, one of the friction elements (either the first or the second) is made of a ceramic material, for example. The other friction element in the pair is made of a softer material (with lower hardness). The hardness of the softer material is low enough (i.e., the friction surface of the corresponding friction element is soft enough) to ensure reduced particle abrasion. At the same time, the hardness of the softer material is still sufficient to provide the necessary strength for the piezoelectric drive elements to lift off. Lifting off the piezoelectric drive elements is essential for the walking drive's operating principle, enabling the propulsion of the drive element (runner) under load.

[0089] The described friction pairing of the motor(s), consisting of a friction element with a soft friction surface and a friction element with a hard friction surface, results in significantly less abrasive wear and thus less particle release. Furthermore, detached particles can be pressed back into the surface (e.g., of a friction element) during operation by the piezoelectric drive elements. The resulting particles also adhere to the surface of the softer friction partner and therefore do not negatively affect the application. Another advantage is that chipping does not occur on / in the friction surfaces, as the forces in the frictional contact can be distributed through the alignment of the friction partners. The softer material of one friction partner also provides improved tolerance to geometric deviations of the friction elements.Furthermore, due to the deformability of the softer surface of one friction partner, the friction gap between the friction elements of a friction pair does not become clogged, thus significantly extending the service life of the motor(s).

[0090] According to another embodiment, the positioning device has one or more motors for moving the base element relative to the other base element and one or more motor housings for enclosing the respective motor.

[0091] This makes it even easier to prevent contamination of the sample by particles generated in the engine.

[0092] The one or more motor housings for encapsulating the respective motor are made of, for example, plastic, polymer, Kapton or another suitable material.

[0093] The one or more motor housings can be sealed, for example, with labyrinth seals.

[0094] In addition to or instead of the engine housings, one or more particle shields and / or trays for collecting particles may also be provided.

[0095] According to a second aspect, a device for processing a sample is proposed. The device includes a nanomanipulator as described above.

[0096] The device includes, for example, a sample stage assembly with a holder, a sample stage movably mounted on the holder for arranging the sample, and a further positioning device for moving the sample stage relative to the holder. The sample stage can be moved, for example, in the X and Y directions (i.e., laterally) and / or in the Z direction (vertically) using the further positioning device. The sample stage can also be rotatably mounted on the holder, for example, so that it can be rotated about the X, Y, and / or Z directions using the further positioning device. The sample stage particularly includes a surface for arranging the sample.

[0097] The device also includes, for example, a control unit for controlling the nanomanipulator, the nanomanipulator's positioning unit, one, several, or all of the actuators and / or motors described herein, the sample stage, the image generation unit, and / or a process gas supply unit of the device. The control unit may also be configured to evaluate data from the nanomanipulator, the positioning unit, and / or the image generation unit.

[0098] According to one embodiment, the device has an image generation device for producing microscopic images of the sample and a sample stage for arranging the sample, wherein an end section of the image generation device facing the sample stage is at least partially enclosed within the recess of the positioning device of the nanomanipulator, and / or the device is configured to allow beams for producing microscopic images of the sample using the image generation device to pass at least partially through the recess.

[0099] According to another embodiment, the image generation device has a particle beam column and is configured to direct a particle beam through the recess of the positioning device onto the sample.

[0100] The particle beam column includes, for example, an electron beam column, an ion beam column, and / or a positron beam column. Similarly, the particle beam includes, for example, an electron beam, an ion beam, and / or a positron beam.

[0101] According to another embodiment, the image generation device is configured to generate one or more images in which an apex of the tip of the nanomanipulator and at least a part of the sample are depicted.

[0102] This allows the imaging device to simultaneously image the apex of the tip (e.g., the actual apex and not the apparent apex) and a region of the sample. This enables very good monitoring of the sample processing with the tip using the imaging device.

[0103] The image generation unit, for example, has an image field of approximately 1 mm x 1 mm. The tip of the nanomanipulator is imaged within this field. The tip can be moved by the positioning unit, for example, within a range of approximately 50 µm × 50 µm in the X and Y directions (additionally, the tip can also be moved by the positioning unit, for example, in the Z direction within a range of approximately 50 µm). This allows the tip to be monitored throughout its entire range of motion using the image generation unit.

[0104] According to another embodiment, the device has a vacuum housing, wherein the positioning device is attached to the vacuum housing.

[0105] The positioning device is attached, in particular, to an inner wall of the vacuum housing. The positioning device is therefore located, in particular, in a vacuum atmosphere prevailing within the vacuum housing.

[0106] By attaching the positioning device to the vacuum housing (and not, for example, to the sample stage), the positioning of the tip relative to the sample can be made even easier.

[0107] For example, the positioning device is attached to the top of the vacuum housing. Alternatively, the positioning device can be attached to the vacuum housing (e.g., the top of the vacuum housing) using centering elements (e.g., centering pins). These centering elements allow the positioning device to be positioned very precisely relative to the vacuum housing.

[0108] For example, the image generation device is also attached to the vacuum housing (e.g., the lid of the vacuum housing). This allows the positioning device to be positioned very precisely relative to the vacuum housing and the image generation device using the centering elements.

[0109] According to a third aspect, a method for processing a sample with a nanomanipulator according to the first aspect and / or a device according to the second aspect is proposed. The method comprises the step: a) Moving the bridge element together with the attached tip relative to the base element to approach a predetermined position on the sample with the tip.

[0110] According to one embodiment of the method, in step a) the bridge element together with the tip and the force detection device is moved relative to the base element in order to approach the predetermined position on the specimen with the tip and to detect a force acting on the tip by means of the force detection device.

[0111] According to another embodiment, the method comprises the step: b) Producing one or more microscopic images in which an apex of the tip and at least a part of the sample is shown.

[0112] Step b) is preferably performed simultaneously with step a).

[0113] The respective unit, for example, the control device, can be implemented in hardware and / or software. In a hardware implementation, the respective unit can be designed as a device or as part of a device, for example, as a computer or a microprocessor. In a software implementation, the respective unit can be designed as a computer program product, as a function, as a routine, as part of program code, or as an executable object. Furthermore, the corresponding unit can also be designed as part of a higher-level control system.

[0114] The term "one" here is not necessarily to be understood as restricting the number to exactly one element. Rather, it can also refer to multiple elements, such as two, three, or more. Similarly, every other counter used here should not be interpreted as restricting the number to the exact number stated. Instead, numerical deviations, both higher and lower, are possible unless otherwise specified.

[0115] The embodiments and features described for the nanomanipulator and the device apply accordingly to the proposed method and vice versa.

[0116] Other possible implementations of the invention also include combinations of features or embodiments described previously or subsequently with regard to the exemplary embodiments, even if not explicitly mentioned. In such cases, a person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

[0117] Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the exemplary embodiments of the invention described below. The invention will now be explained in more detail with reference to preferred embodiments and the accompanying figures. Fig. Figure 1 shows a cross-section of a device for processing a sample according to one embodiment, wherein the cross-section is shown along line II. Fig. 3 has been undertaken; Fig. 2 shows a view similar to Fig. 2, wherein the cross-section along line II-II in Fig. 3 is carried out and a force detection device according to one embodiment is illustrated; Fig. Figure 3 shows a top view of a nanomanipulator of the device. Fig. 2 according to one embodiment; Fig. Figure 4 shows an extension and a tip of the nanomanipulator made of Fig. 3 according to one embodiment; Fig. Figure 5 shows a motor of the nanomanipulator. Fig. 1 according to one embodiment; Fig. Figure 6 shows a top view of a nanomanipulator of the device. Fig. 2 according to a further embodiment; and Fig. Figure 7 shows a flowchart to illustrate a method for processing a sample according to one embodiment.

[0118] In the figures, identical or functionally equivalent elements have been labelled with the same reference symbols, unless otherwise indicated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

[0119] Fig. Figure 1 shows a cross-sectional view of a device 100 for processing a sample 102 according to one embodiment. The sample 102 is, for example, a photomask for microlithography or a wafer.

[0120] The device 100 comprises a nanomanipulator 104 for processing the sample 102. The nanomanipulator 104 includes a tip 106 for processing the sample 102. The nanomanipulator 104 also includes a positioning device 108 for moving the tip 106. Using the positioning device 108, the tip 106 can be moved in three spatial directions X, Y and Z (translational movement in the X, Y and Z directions).

[0121] It is noted that the tip 106 is attached to a bridge element 124 of the positioning device 108 ( Fig. 3), which is shown in the cross-sectional view of Fig. 1 is not visible.

[0122] The device 100 also includes a housing 110, which can be pressurized, for example by means of a vacuum pump (not shown), to a residual gas pressure of 1 - 10 -10 mBar, e.g. 10 -5 - 10 -9 mBar, evacuatable. The nanomanipulator 104 is arranged in the housing 110. Furthermore, a sample stage 112 is provided for holding the sample 102. The sample stage 112 comprises a holder 114. Furthermore, the sample stage 112 is preferably movable relative to the holder 114 in the three spatial directions X, Y and Z and, for example, about at least one axis (e.g., the Z-axis). Fig. 1) rotatable.

[0123] The device 100 also includes, for example, an image generation unit 116 for generating microscopic images of the sample 102 and the tip 106. The image generation unit 116 comprises, for example, a particle beam column 117 (e.g., an electron beam column) for generating a particle beam 118 (e.g., an electron beam). The image generation unit 116 also includes, for example, a housing 119, which is, for example, at least partially located within the vacuum housing 110. The housing 119 has, for example, an opening 121 at a lower end section 120 for allowing the generated particle beam 118 to pass through towards the sample 102. The image generation unit 116 can, by way of example, be a scanning electron microscope.

[0124] As can be seen in the top view of Fig. 3, the positioning device 108 of the nanomanipulator 103 comprises a base element 122. The positioning device 108 also comprises a bridge element 124, which is movably attached to the base element 122 in the X, Y, and Z directions. The bridge element 124 is movably attached to the base element 122 at two attachment points 126. The bridge element 124 also bridges a gap between the two attachment points 126. For the movable attachment of the bridge element 124 to the two attachment points 126 of the base element 122, one or more actuators 128 (e.g., piezoelectric actuators or the like) are provided at each attachment point 126.

[0125] In the example of Fig. 3. The base element 122 has a recess 130. Furthermore, the bridge element 124 is arranged on the base element 122 such that it bridges the recess 130. In particular, the base element 122 has two legs 132 which define the recess 130 on two sides. The bridge element 124 is also movably attached to the free ends 134 of the two legs 132 such that it bridges the recess 130.

[0126] One can say that the basic element 122 in the example of Fig. 3 has a horseshoe shape 136 and / or a U-shape.

[0127] Although not shown in the figures and not described in detail below, the basic element 122 can also have an O-shape and / or ring shape instead of a horseshoe shape 136 and / or U-shape with two legs 132, which limits the recess 130.

[0128] The recess 130 of the base element 122 is for generating images of the tip 106 and at least part of the sample 102 using the image generation device 116 ( Fig. 1) set up. In particular, the tip 106 is arranged below the recess 130 and is thus visible to the image generation device 116, as shown in the Fig. 1 and Fig. 3 can be seen. For example, the tip 106 is arranged below a space 133 between the two legs 132 of the base element 122, which define the recess 130. In Fig. Figure 3 shows an example of an image field 137 of the image generating device 116. The image field 137 has, for example, a size of 1 mm × 1 mm. Furthermore, in Fig. Figure 3 shows an example field 138 within which the tip 106 can be moved using the positioning device 108. The field 138 is completely contained within the image field 137 of the image generation device 116, so that the tip 106 can be monitored at any position using the image generation device 116. The field 138 has, for example, a size of 50 µm × 50 µm.

[0129] The recess 130 is designed, for example, to at least partially accommodate the end section 120 of the image-generating device 116, as shown in Fig. Figure 1 illustrates this. In addition, the recess 130 is also designed to allow the particle beam 118 exiting from the opening 121 of the housing 119 to pass through in the direction of the sample 102 and to allow a secondary beam coming from the sample 102 (e.g. secondary particles, backscattered particles) to pass through in the direction of the image generation device 116.

[0130] As in Fig. As can be seen in Figure 3, the tip 106 of the nanomanipulator 104 is attached to the bridge element 124 of the positioning device 108 of the nanomanipulator 104.

[0131] For example, the bridge element 124 has a first end section 139 to which the bridge element 124 is movably attached to a first of the two attachment points 126 of the base element 122. The bridge element 124 also has a second end section 140 to which it is movably attached to a second of the two attachment points 126 of the base element 122. Furthermore, the bridge element 124 has a first leg 141 that adjoins the first end section 139 and is thus, for example, continuous. In addition, the bridge element 124 has a second leg 142 that adjoins the second end section 140 and is thus, for example, continuous. Between the first end section 139 and the second end section 140, in particular between the first leg 141 and the second leg 142, the bridge element 124 has a central section 143 to which the tip 106 is attached.The middle section 143, for example, is continuously formed with the first leg 141 and the second leg 142.

[0132] The nanomanipulator 104 comprises, in particular, a cantilever 144 on which the tip 106 is arranged (e.g., attached to it or formed monolithically with the cantilever), as shown in the top view of Fig. 3 to see. Fig. Figure 4 shows an enlarged side view of the boom 144 and the tip 106. The boom 144 has, with respect to its longitudinal direction (parallel to the Y-direction in Fig. 4) a first end 146 (foot end 146) to which the boom 144 is attached to the bridge element 124. Furthermore, the boom 144 has a second end 148 (free end 148) with respect to its longitudinal direction, to which the tip 106 is arranged. The reference numeral 150 in Fig. 4 denotes an actual apex of the peak 106.

[0133] In the example of Fig. In the first support element 152, the boom 144 with the tip 106 is attached to a second support element 154. The second support element 154 is attached to the bridge element 124 of the positioning device 108 (specifically the central section 142 of the bridge element 124). That is, in this example, the tip 106 is attached to the first support element 152. Fig. 3. The first support element 152 and the second support element 154 are attached to the bridge element 124 via the boom 144. In other examples, the tip 106 together with the boom 144 can also be attached directly to the bridge element 124 or can be attached to the bridge element 124 only via one of the support elements 152, 154.

[0134] Furthermore, bridge element 124 in the example of Fig. 3 a further recess 156, which is formed between the two legs 141, 142 of the bridge element 124. Furthermore, the tip 106 is also arranged below the further recess 156. The further recess 156 is also designed to accommodate rays 118 ( Fig. 1) to allow images of the tip 106 and at least part of the sample 102 to pass through. Optionally, the end section 120 of the image generation device 116 ( Fig. 1) at least partially in further exemption 156 ( Fig. 3) be arranged.

[0135] It is noted that the cross-sectional view of Fig. 1 a cut along line II in Fig. 3 is. Thus, in Fig. Only the tip 106 is visible, but not the boom 144 and the support elements 152, 154. Furthermore, the cross-sectional view of Fig. 2 a cut along line II-II in Fig. 3. Thus, in Fig. 2 only the boom 144 is visible, but not the tip 106 and the support elements 152, 154. For illustration purposes, in Fig. 3 the peak 106 nevertheless drawn with dashed lines.

[0136] As in Fig. 2 and Fig. As shown in Figure 3, the nanomanipulator 104 can also include a force sensing device 158 for detecting a force acting on the tip 106. The force sensing device 158 is, in particular, attached to the bridge element 124. That is, the force sensing device 158 is moved together with the bridge element 124 and the tip 106 by means of the positioning device 108.

[0137] The force detection device 158 includes, for example, a light pointer device 160 for detecting a deflection of the free end 148 ( Fig. 4) of the boom 144. The light pointer device 160 comprises a light source 162 for emitting a light beam 164 in the direction of the free end 148 of the boom 144. In the following, the light source 162 is described as the laser source 162, the light beam 164 as the laser beam, and a reflected light beam 168 as the reflected laser beam 168. In other examples, however, the light source 162 may also be any other type of light source instead of a laser source (e.g., a light-emitting diode and / or another fiber-coupled light source). Furthermore, the light pointer device 160 includes a position-sensitive photodetector 166 for detecting a laser beam 168 reflected from the free end 148 of the boom 144. The laser source 162 is attached to the bridge element 124, in particular to and / or adjacent to the first end section 139 of the bridge element 124.Furthermore, the photodetector 166 is attached to the bridge element 124, in particular to and / or adjacent to the second end section 140 of the bridge element 124.

[0138] Optionally, the laser source 162 and / or the photodetector 166 can each be controlled by means of one or more actuators 169, 170 ( Fig. 2) be movably attached to the bridge element 124. This allows the light pointer device 160 to be adjusted.

[0139] As in Fig. As shown in Figure 1, the positioning device 108 can have a further base element 172 to which the base element 122 is movably attached (e.g., in the Z direction or in the X, Y, and Z directions). For example, the positioning device 108 has one or more motors 174 for moving the base element 122 relative to the further base element 172.

[0140] As in Fig. As illustrated in Figure 5, each motor 174, for example, has one or more pairs 176 of friction elements 178, 180. Furthermore, each pair 176 of friction elements 178, 180 has, for example, a first friction element 178 with a first friction surface 182 having a first hardness H1 and a second friction element 180 with a second friction surface 184 having a second hardness H2, where the first hardness H1 differs from the second hardness H2. By selecting the friction pairs 176, particle abrasion can be reduced. This prevents or reduces damage to the respective motor 174 caused by abrasion particles and contamination of the sample 102 by abrasion particles.

[0141] Optionally, the nanomanipulator 104 includes one or more motor housings 186 ( Fig. 5) for enclosing the respective motor 174. This further reduces contamination of sample 102 by abraded particles.

[0142] The positioning device 108 is, for example, attached to the vacuum housing 110 of the device 100, as shown in Fig. Figure 1 illustrates this. For example, the base element 122 of the positioning device 108 is attached to an inner wall of the vacuum housing 110. If the additional base element 172 is provided, then the base element 122 of the positioning device 108 is attached to the inner wall of the vacuum housing 110 by means of the additional base element 172 (e.g., movably by means of the motor(s) 174).

[0143] In Fig. Figure 6 shows a nanomanipulator 204 according to a further embodiment. The following essentially only highlights the differences compared to the nanomanipulator 104 in Figure 6. Fig. 3 described.

[0144] The nanomanipulator 204, similar to the nanomanipulator in Fig. 3, a tip 206 and a positioning device 208 for moving the tip 206. The positioning device 208 comprises a base element 222 and a bridge element 224, which is movably attached to the base element 222 in the X, Y and Z directions, similar to the positioning device 108 in Fig. 3. The base element 222, like the base element 124, is movably attached to the base element 222 at two mounting points 226, so that it bridges a gap between the two mounting points 226. Furthermore, the base element 222, similar to the base element 122, has one or more actuators 228 (e.g., piezo actuators or the like) at each of the two mounting points 226.

[0145] In the embodiment of Fig. 3. The mounting points 126 have, for example, a main extension plane arranged parallel to the XY plane. This means that the actuators 128 in Fig. For example, 3 have a principal extension plane arranged parallel to the XY plane. In contrast, the attachment points 226 in Fig. Figure 6 shows, for example, a main extension plane arranged parallel to the XZ plane. That is, the actuators 228 in Fig. For example, 6 also have a principal extent plane arranged parallel to the XZ plane.

[0146] The basic element 222 in Fig. 6 shows, similar to the basic element 122 in Fig. 3, a recess 230. Also the base element 222 in Fig. 6 has two legs 232, which accordingly define the recess 230 on two sides. The base element 222 in Fig. 6, for example, has a horseshoe shape 236 and / or a U-shape. Unlike Fig. 3, are the thighs 232 in Fig. 6 shorter than in Fig. 3, so that also the exception 230 in Fig. 6 is smaller than in Fig. 3.

[0147] Bridge element 224 in Fig. 6 is arranged on the base element 222 such that it bridges the recess 230. In particular, the bridge element 224, similar to the bridge element 124 in Fig. 3, a first end section 239 to which the bridge element 224 is movably attached to a first of the two attachment points 226 of the base element 222. The bridge element 224 also has a second end section 240 to which it is movably attached to a second of the two attachment points 226 of the base element 222. Furthermore, the bridge element 224 has a first leg 241 that adjoins the first end section 239 and is thus, for example, continuous. In addition, the bridge element 224 has a second leg 242 that adjoins the second end section 240 and is thus, for example, continuous. Furthermore, the bridge element 224, similar to the bridge element 124 in Fig. 3, between the first end section 239 and the second end section 240, in particular between the first leg 241 and the second leg 242, a middle section 243 to which the tip 206 is attached. The middle section 243 is, for example, formed continuously with the first leg 241 and the second leg 242.

[0148] Unlike in Fig. 3, is bridge element 224 in Fig. 6. The legs 232 of the base element 222 are movably attached to the end faces 225. The end sections 239, 240 of the bridge element 224 form, in the example of Fig. 6. Thus, the legs 232 of the base element 222 are extensions. Furthermore, the bridge element 224 partially projects into the recess 230 of the base element 222. In particular, the legs 241, 242 of the bridge element 242 partially project into the recess 230 of the base element 222. Furthermore, the central section 243 of the bridge element 242 is received in the recess 230 of the base element 222, i.e., arranged therein.

[0149] Bridge element 224 in Fig. 6 also has a further recess 256, which is formed between the two legs 241, 242 of the bridge element 224. The tip 206 is arranged below the further recess 256 of the bridge element 224. The recess 256 is for generating images of the tip 206 and at least part of the sample 102 using the image generation device 116 ( Fig. 1) set up. In particular, the tip 206 is arranged below the recess 256 and is thus visible to the image generation device 116, as shown in the Fig. 1 and Fig. 6 to be seen. In Fig. 6 are, similar to in Fig. 3, for example, an image field 137 of the image generation device 116 and a field 138, within which the tip 206 can be moved by means of the positioning device 208, are indicated. Optionally, the end section 120 of the image generation device 116 ( Fig. 1) be arranged at least partially in the further exemption 256.

[0150] The Nanomanipulator 204, similar to the Nanomanipulator 104, can Fig. 2, Fig. 3, comprising a force detection device 158 for detecting a force acting on the tip 206. The force detection device 158 is, in particular, attached to the bridge element 224. That is, the force detection device 158 is moved together with the bridge element 224 and the tip 206 by means of the positioning device 208. The force detection device 158 in Fig. 6 is similarly designed and installed as the force detection device 158 in Fig. 2, Fig. 3. In particular, the force detection device 158 is in Fig. 6 e.g. a light pointer device 160 for detecting a deflection of the free end 148 ( Fig. 4) of the boom 144. The light pointer device 160 comprises a laser source 162, which is attached to the bridge element 224, in particular to the first end section 239 of the bridge element 224. Furthermore, the light pointer device 160 comprises a position-sensitive photodetector 166, which is attached to the bridge element 224, in particular to the second end section 240 of the bridge element 224. Optionally, the laser source 162 and / or the photodetector 166 can each be controlled by means of one or more actuators 169, 170 ( Fig. 2) be movably attached to the bridge element 224 in order to adjust the light pointer device 160.

[0151] The attachment of the tip 206 to the bridge element 242 in Fig. 6, in particular the central section 243 of bridge element 242, is realized similarly to in Fig. 3. In particular, the nanomanipulator 204 comprises a cantilever 244, at the free end 148 of which the tip 206 is arranged (e.g., attached to it or formed monolithically with the cantilever 244). A foot end 146 of the cantilever 244 is attached to the bridge element 224. Also in the example of Fig. In Figure 6, the boom 244 with the tip 206 is attached to an optional first support element 252. Furthermore, the first support element 252 is attached to an optional second support element 254. The second support element 254 is attached to the bridge element 224 (specifically its central section 242). That is, the tip 206 is also attached in the example of Fig. 6 via the boom 244, the optional first support element 252 and the optional second support element 254 attached to the bridge element 224.

[0152] The following refers to Fig.7 a method for processing a sample 102 with a nanomanipulator 104 and / or a device 100 is described.

[0153] In a first step S1 of the procedure, the bridge element 124 together with the tip 106 attached to it is moved relative to the base element 122 in order to approach a predetermined position on the specimen 102 with the tip 106.

[0154] For example, in step S1, the bridge element 124, together with the tip 102 and the force detection device 158, is moved relative to the base element 122. This allows the tip 106 to reach the predetermined position on the specimen 102. Simultaneously, the force applied to the tip 106 can be detected by means of the force detection device 158.

[0155] In a second step S2 of the procedure, one or more microscopic images are generated, in which an apex 150 of the tip 106 and at least a part of the sample 102 are depicted.

[0156] Step S2 is preferably executed simultaneously with step S1.

[0157] Although the present invention has been described using exemplary embodiments, it can be modified in many ways. REFERENCE MARK LIST 100 Device 102 Sample 104 Nanomanipulator 106 top 108 Positioning device 110 cases 112 Sample table 114 bracket 116 Image generating unit 117 Particle beam column 118 particle beam 119 cases 120 End section 121 Opening 122 Basic element 124 bridge elements 126 Mounting point 128 Actuator 130 Exclusion 132 thighs 133 space 134 End 136 horseshoe shape 137 image field 138 Field 139 Final section 140 End section 141 thighs 142 thighs 143 Middle section 144 outriggers 146 foot end 148 Free end 150 Apex 152 Support element 154 Support element 156 Exclusion 158 Force detection device 160 Light pointer device 162 Light source 164 Light beam 166 Photodetector 168 Light beam 169 Actuator 170 actuator 172 Basic element 174 engine 176 pairs 178 Friction element 180 friction element 182 friction surface 184 friction surface 186 Engine casing 204 Nanomanipulator 206 top 208 Positioning device 222 Basic element 224 bridge element 225 Front 226 Placement point 228 Actuator 230 Exclusion 232 thighs 236 horseshoe shape 239 Final section 240 End section 241 thighs 242 thighs 243 Middle section 244 booms 252 Support element 254 Support element 256 Exclusion H1, H2 hardness S1, S2 Process step X, Y, Z direction

Claims

[1] Nanomanipulator (104) for processing a sample (102), comprising a tip (106) and a positioning device (108) for moving the tip (106), wherein the tip (106) is configured to process a sample (102) arranged below the positioning device (108), the positioning device (108) comprises a base element (122) and a bridge element (124) which is movably attached to the base element (122) at two attachment points (126), the base element (122) and / or the bridge element (124) having a recess (130) and the tip (106) being attached to the bridge element (124) and arranged below the recess (130). [2] Nanomanipulator according to claim 1, wherein the recess (130) is configured to at least partially accommodate an end section (120) of an image generation device (116) for generating microscopic images of the sample (102), and / or the recess (130) is configured to at least partially allow beams (118) to pass through for generating microscopic images of the sample (102). [3] Nanomanipulator according to claim 1 or 2, wherein the recess (130) is bounded by two legs (132) and the tip (106) is arranged below a space (133) between the two legs (132). [4] Nanomanipulator according to one of claims 1 to 3, wherein the base element (122) has the recess (130), the recess (130) is bounded by two legs (132) and / or a ring, and the bridge element (124) is movably attached to the two legs (132) and / or the ring in such a way that it bridges the recess (130). [5] Nanomanipulator according to any one of claims 1 to 4, wherein the bridge element (124) comprises: a first end section (139) to which it is movably attached to a first of the two attachment points (126) of the base element (122), a second end section (140) to which it is movably attached to a second of the two attachment points (126) of the base element (122), and a middle section (143) arranged between the first end section (139) and the second end section (140), to which the tip (106) is attached. [6] Nanomanipulator according to any one of claims 1 to 5, comprising a force detection device (158) attached to the bridge element (124) for detecting a force acting on the tip (106). [7] Nanomanipulator according to claim 6, comprising: a boom (144) with a foot end (146) attached to the bridge element (124) and a free end (148) at which the tip (106) is arranged, wherein the force detection device (158) has a light pointer device (160) for detecting a deflection of the free end (148) of the boom (144), and the light pointer device (160) has: a light source (162) attached to the bridge element (124) for emitting a beam of light (164) towards the free end (148) of the boom (144), and a position-sensitive photodetector (166) attached to the bridge element (124) for detecting a light beam (168) reflected from the free end (148) of the boom (144). [8] Nanomanipulator according to claim 7, wherein the bridge element (124) has a first end section (139) to which it is movably attached to a first of the two attachment points (126) of the base element (122), and a second end section (140) to which it is movably attached to a second of the two attachment points (126) of the base element (122), the light source (162) is attached to and / or adjacent to the first end section (139) of the bridge element (124), and the photodetector (166) is attached to and / or adjacent to the second end section (140) of the bridge element (124). [9] Nanomanipulator according to claim 7 or 8, wherein the light source (162) and / or the photodetector (166) is / are movably attached to the bridge element (124) by means of one or more actuators (168, 170). [10] Nanomanipulator according to any one of claims 1 to 9, wherein the positioning device (108) has a further base element (172) to which the base element (122) is movably attached. [11] Device (100) for processing a sample (102) comprising a nanomanipulator (104) according to any one of claims 1 to 10. [12] Device according to claim 11, comprising an image generation device (116) for generating microscopic images of the sample (102) and a sample stage (112) for arranging the sample (102), wherein an end section (120) of the image generation device (116) facing the sample stage 112 is at least partially accommodated within the recess (130, 156, 256) of the positioning device (108, 208) of the nanomanipulator (104, 204), and / or the device (100) is configured to allow beams (118) for generating microscopic images of the sample (102) using the image generation device (116) to pass at least partially through the recess (130, 156, 256). [13] Device according to claim 12, wherein the image generation device (116) has a particle beam column (117) and is configured to direct a particle beam (118) through the recess (130) of the positioning device (108) onto the sample (102). [14] Device according to claim 12 or 13, wherein the image generation device (116) is configured to generate one or more images in which an apex (150) of the tip (106) of the nanomanipulator (104) and at least a part of the sample (102) are depicted. [15] Device according to one of claims 11 to 14, comprising a vacuum housing (110), wherein the positioning device (108) is attached to the vacuum housing (110). [16] Method for processing a sample (102) with a nanomanipulator (104) according to any one of claims 2 to 10 and / or a device (100) according to any one of claims 11 to 15, wherein the method comprises: a) Moving (S1) the bridge element (124) together with the tip (106) attached to it relative to the base element (122) to approach a predetermined position on the specimen (102) with the tip (106). [17] Method according to claim 16, wherein in step a) the bridge element (124) together with the tip (106) and the force detection device (158) is moved relative to the base element (122) in order to approach the predetermined position on the specimen (102) with the tip (106) and to detect a force acting on the tip (106) by means of the force detection device (158). [18] Method according to claim 16 or 17, comprising: b) Generating (S2) one or more microscopic images in which an apex (150) of the tip (106) and at least a part of the sample (102) are depicted.