METHOD FOR CALCULATING THE POSE OF A MEASURING DEVICE IN THE REFERENCE SYSTEM OF A GEOMETRY MODEL

Description

[0001] The invention relates to a method for calculating the pose of a measuring instrument in the reference system of a geometric model. Stand der Technik

[0002] Total stations are measuring instruments equipped with angle and distance measuring units that perform angle and distance measurements. The angle and distance measurements are taken within the total station's reference system and must be linked to an external reference system for absolute position determination.

[0003] In known methods for calculating the pose of a measuring instrument in an external reference frame, target objects are positioned at known control points, and the coordinates of the control points are measured in the reference frame of the measuring instrument. Since the coordinates of the control points in the external reference frame are known, the position and orientation (pose) of the measuring instrument can be calculated using the coordinates of the control points in the external reference frame and in the reference frame of the measuring instrument.

[0004] Calculating the pose of a measuring device using known control points has the disadvantage that target objects must be positioned at the control points.

[0005] Document EP 3867600 A1 discloses a method for calculating the pose of a measuring device that is set up in a measuring environment with several boundary surfaces and that has a distance measuring device with a measuring beam and at least one angle measuring device, in the reference system of a geometric model that maps at least the boundary surfaces of the measuring environment, by means of a microcontroller that is communicatively connected to the measuring device and that has an algorithm for calculating the pose. Darstellung der Erfindung

[0006] The object of the present invention is to simplify the calculation of the pose of a measuring instrument in the reference system of a geometric model in such a way that the calculation of the pose is possible without control points.

[0007] This problem is solved according to the invention in the aforementioned method by the features of independent claim 1. Advantageous embodiments are specified in the dependent claims.

[0008] The method for calculating the pose of a measuring device, which is set up in a measuring environment with several boundary surfaces and which has a distance measuring device with a measuring beam and an angle measuring device, in the reference system of a geometric model which maps at least the boundary surfaces of the measuring environment, by means of a microcontroller which is communicatively connected to the measuring device and which has an algorithm for calculating the pose, comprises the following steps according to the invention: ▪ Creating a polyline from the geometry model, wherein the polyline represents the horizontal course of the boundary surfaces perpendicular to the direction of gravity and comprises at least three line segments, ▪ Performing N, N ≥ 4 measurements with the measuring device in N different orientations of the measuring device, wherein the measuring beam of the distance measuring device strikes at least two different boundary surfaces in the N different orientations and defines N measurement points, and in each of the N orientations of the measuring device, a horizontal angle and a horizontal distance between the respective measurement point and the measuring device are determined as measured values, and ▪ Executing the algorithm to calculate the pose, wherein the algorithm comprises the following steps: (1) in the first step, selecting three measurement points of the N measurement points and three line segments of the polyline, and in the case,that no assignment between measurement points and line segments was carried out before the start of the algorithm, the selected three measurement points and the selected three line segments are assigned to each other, (2) in the second step, using the measured values ​​of the selected three measurement points and the coordinates of the selected three line segments, the number of possible solutions for the pose of the measuring device is determined, and if one or two solutions exist, the measurement coordinates of at least two of the selected three measurement points are determined in the reference system of the geometry model, (3) in the third step, if no solution was determined in the second step of the sequence, the procedure is continued with the sixth step of the sequence, if a solution was determined in the second step of the sequence, an intermediate pose for the measuring device is calculated from the measurement coordinates and measured values, those measurement points of the N measurement points,(4) In the fourth step, the first test pose and the second test pose are determined as qualified measurement points, provided that the measurement points meet a given quality criterion and the procedure is continued with the fifth step of the sequence. If two solutions were determined in the second step of the sequence, a first test pose and a second test pose are calculated from the measurement coordinates and measured values. For the first test pose and the second test pose, those measurement points of the N measurement points that meet a given quality criterion are determined as the first qualified measurement points and the second qualified measurement points, respectively, and the procedure is continued with the fourth step of the sequence. (4) In the fourth step, the first test pose and the second test pose are compared with regard to their suitability based on a given comparison criterion, whereby if one of the first test poses and the second test pose is rated as more suitable,this test pose is defined as an intermediate pose and the procedure continues with the fifth step of the sequence, and in the event that neither the first test pose nor the second test pose is judged to be more suitable, the procedure continues with the sixth step of the sequence, (5) in the fifth step, it is checked whether a pose is stored for the measuring device, wherein, in the event that no pose is stored for the measuring device, the intermediate pose determined in the third or fourth step of the sequence is defined as the pose for the measuring device, or an updated pose is calculated using the qualified measurement points and defined as the pose for the measuring device, and the procedure continues with the sixth step of the sequence, and in the event that a pose is stored for the measuring device, the intermediate pose determined in the third or fourth step of the sequence,(6) is compared with the stored pose based on a predetermined further comparison criterion, wherein if the intermediate pose is assessed as more suitable, the intermediate pose is defined as the pose or an updated pose is calculated using the qualified measurement points and defined as the pose for the measuring device and the procedure continues with the sixth step of the sequence, and if the intermediate pose is assessed as not more suitable, the procedure continues with the sixth step of the sequence, and (6) in the sixth step, a decision is made based on a predetermined termination criterion as to whether a further sequence is carried out, wherein if a further sequence is carried out, the procedure continues with the first step of the sequence, if no further sequence is carried out and a pose for the measuring device is defined, the procedure is terminated, and if,that no further sequence is performed and no pose is defined for the measuring device, the procedure is aborted without a pose for the measuring device having been calculated.

[0009] The execution of the inventive method for calculating the pose of the measuring device in the reference system of the geometric model is controlled by the microcontroller. The microcontroller is communicatively connected to the measuring device via a communication link and includes an algorithm for calculating the pose of the measuring device. The measuring device is positioned in a measuring environment that has several boundary surfaces and comprises a distance measuring device with a measuring beam and at least one angle measuring device.

[0010] At the beginning of the inventive method, a polyline is created from the geometry model, which represents the horizontal course of the boundary surfaces perpendicular to the direction of gravity and which comprises at least three line segments.

[0011] In a further step of the method according to the invention, at least four different measurements are performed with the measuring device in different orientations, wherein the measuring beam strikes at least two different boundary surfaces of the measurement environment and defines a measuring point in each orientation. For each measuring point, a horizontal angle and a horizontal distance between the measuring point and the measuring device are determined as measured values. The accuracy or quality with which the pose of the measuring device can be determined can be increased with an increasing number of measuring points and with an increasing number of boundary surfaces used for the measurements.

[0012] In the next step of the method according to the invention, the algorithm for calculating the pose of the measuring device is executed. The algorithm comprises a sequence of steps that can be executed once or multiple times.

[0013] In the first step of the sequence, three measurement points of the N measurement points and three line segments of the polyline are selected, and if no assignment between measurement points and line segments has been carried out before the start of the algorithm, the selected three measurement points and selected three line segments are assigned to each other.

[0014] In the second step of the sequence, the number of possible solutions for the position of the measuring device is determined using the measured values ​​of the selected three measuring points and the coordinates of the selected three line segments. If one or two solutions exist, the measurement coordinates of at least two of the selected three measuring points are determined in the reference system of the geometric model.

[0015] In the third step of the sequence, depending on the number of solutions determined in the second step of the sequence, a distinction is made between three cases: No solution (zero), one solution (one), or two solutions (two): ▪ If no solution is determined in the second step of the sequence, the method according to the invention is continued with the sixth step of the sequence. ▪ If a solution is determined in the second step of the sequence, an intermediate pose for the measuring device is calculated from the measurement coordinates and measured values. Those measurement points of the N measurement points that meet a predetermined quality criterion are determined as qualified measurement points, and the method according to the invention is continued with the fifth step of the sequence. ▪ If two solutions are determined in the second step of the sequence, a first test pose (first solution) and a second test pose (second solution) are calculated from the measurement coordinates and measured values. For the first test pose and second test pose, those measurement points of the N measurement points that meet a predetermined quality criterion are determined as first qualified measurement points, respectively.The second qualified measuring points are determined, and the inventive method is continued with the fourth step in the sequence.

[0016] The fourth step of the sequence is only performed if two solutions were determined in the second step. These two solutions, designated as the first and second test poses, must be compared. In the fourth step, the microcontroller compares the suitability of the first and second test poses based on a predefined comparison criterion, distinguishing between two cases. If one of the first and second test poses is deemed more suitable, this test pose is defined as an intermediate pose, and the inventive method continues with the fifth step. If neither the first nor the second test pose is deemed more suitable, the inventive method continues with the sixth step.

[0017] The fifth step of the sequence serves to further develop the intermediate pose determined in the third or fourth step. In the fifth step, two cases are distinguished: • If no pose is stored for the measuring device within the scope of the method according to the invention, the intermediate pose is defined as the pose for the measuring device, or an updated pose is calculated using the qualified measurement points and defined as the pose for the measuring device. • If a pose is stored for the measuring device within the scope of the method according to the invention, the intermediate pose is compared with the stored pose using a predetermined further comparison criterion. If the intermediate pose is deemed more suitable, the intermediate pose is defined as the pose, or an updated pose is calculated using the qualified measurement points and defined as the pose for the measuring device; the method according to the invention continues with the sixth step of the sequence. If the intermediate pose is deemed not more suitable, the method according to the invention continues with the sixth step of the sequence.

[0018] In the sixth step of the sequence, a predetermined termination criterion determines whether a further sequence of steps one through six is ​​performed, distinguishing three cases. If a further sequence is performed, the method according to the invention continues with the first step of the sequence. If no further sequence is performed and a pose for the measuring device is defined, the method according to the invention is terminated. If no further sequence is performed and no pose for the measuring device is defined, the method according to the invention is terminated without a pose for the measuring device being determined.

[0019] Preferably, in the third step of the sequence, at least one of the following criteria is used as a quality criterion: maximum distance of the measuring point to the polyline, unique assignment of the measuring point to a line segment of the polyline, and maximum angle of incidence of the measuring beam to the line segment of the polyline. In the third step, a measuring point is considered a qualified measuring point if the distance to the polyline is less than a maximum distance and / or the measuring point can be uniquely assigned to a line segment of the polyline and / or the angle of incidence of the measuring beam to the assigned line segment is less than a maximum angle of incidence, where the angle of incidence is measured with respect to the normal vector of the assigned boundary surface.

[0020] Preferably, in the fourth step of the sequence, at least one of the following criteria is used as a comparison criterion: number of qualified measurement points, distribution of the qualified measurement points along the polyline, area of ​​the region spanned by the qualified measurement points, and estimated accuracy of a test pose. A test pose is considered more suitable in the fourth step if it has a greater number of qualified measurement points, and / or its qualified measurement points are distributed over more line segments of the polyline, and / or the area of ​​the region spanned by its qualified measurement points is larger, and / or its estimated accuracy is higher.

[0021] Preferably, in the fifth step of the sequence, at least one of the following criteria is used as a further comparison criterion: number of qualified measurement points, distribution of the qualified measurement points along the polyline, area of ​​the region spanned by the qualified measurement points, and estimated accuracy of a pose. The intermediate pose is considered more suitable in the fifth step if it has a greater number of qualified measurement points, and / or its qualified measurement points are distributed over more line segments of the polyline, and / or the area of ​​the region spanned by its qualified measurement points is larger, and / or its estimated accuracy is higher.

[0022] Preferably, in the sixth step of the sequence, at least one of the following criteria is used as a termination criterion: minimum number M of sequences, minimum number of qualified measurement points, minimum percentage value of the number of qualified measurement points to the number of measurement points, absolute minimum value for the area spanned by the qualified measurement points, and a minimum percentage value of the area spanned by the qualified measurement points to the area of ​​the polygon enclosed by the polygon line.

[0023] The sequence is terminated when a minimum number M of sequences is reached and / or the number of qualified measurement points is greater than a minimum number and / or the ratio between the number of qualified measurement points and the number of measurement points is greater than a minimum percentage value and / or the area of ​​the area spanned by the qualified measurement points is greater than an absolute minimum value and / or the ratio between the area of ​​the area spanned by the qualified measurement points and the area of ​​the polygon is greater than a minimum percentage value.

[0024] Preferably, when creating the polyline, impermissible measurement areas are defined, whereby the line segments of the polyline assigned to the impermissible measurement areas are defined as impermissible line segments and excluded from the selection of the three line segments in the first step of the sequence.

[0025] Particularly preferably, at least one of the following measurement areas is defined as an impermissible measurement area: window opening, door opening, glass pane, area in which the geometry model deviates from the measurement environment, and area that is inaccessible or unsuitable for measurement.

[0026] In the third step of the sequence, the assignment to a line segment that differs from an unauthorized line segment is particularly preferred as a quality criterion.

[0027] In a first preferred variant, the N measurements are performed manually by an operator using the measuring device, and the operator assigns the measurement points to the line segments of the polyline. This first variant is referred to as the manual variant, in which the measurements and the assignment are performed by the operator.

[0028] In a second preferred variant, the N measurements are performed by the microcontroller using the measuring device, and the operator assigns the measurement points to the line segments of the polyline. This second variant is referred to as the semi-manual variant, in which the measurements are performed automatically and the assignment is carried out by the operator.

[0029] In a third preferred variant, the N measurements are performed manually by an operator using the measuring device, and the assignment to be made in the first step of the sequence is carried out randomly by the microcontroller or using a selection criterion. This third variant is referred to as the semi-automatic variant, in which the measurements are performed by the operator and the assignment is carried out by the microcontroller.

[0030] In a fourth preferred variant, the N measurements are performed by the microcontroller using the measuring device, and the assignment to be made in the first step of the sequence is carried out by the microcontroller either randomly or using a selection criterion. This fourth variant is referred to as the fully automatic variant, in which the measurements and the assignment are performed by the microcontroller.

[0031] Particularly preferred as a selection criterion is at least one of the following criteria: sequence of the line segments in the direction of rotation of the measuring device, length of the line segments and distances of the measuring points to the polyline, whereby the distances are calculated using the measured values ​​and a starting pose for the measuring device.

[0032] Particularly preferably, the measuring device has a camera device and in each of the N orientations of the measuring device a camera image is created by the camera device, wherein the camera image is assigned to the respective orientation of the measuring device. Ausführungsbeispiele

[0033] Exemplary embodiments of the invention are described below with reference to the drawing. The drawing is not necessarily intended to represent the exemplary embodiments to scale; rather, where helpful for clarification, it is presented in a schematic and / or slightly distorted form. It should be noted that numerous modifications and changes concerning the shape and detail of an embodiment can be made without deviating from the claimed subject matter. The invention is not limited to the exact shape or detail of the preferred embodiment shown and described below, nor is it limited to a subject matter that would be restricted compared to the subject matter claimed in the claims. For given dimensioning ranges, values ​​lying within the stated limits are also disclosed as limit values ​​and may be used and claimed as desired.For the sake of simplicity, the same reference symbols are used below for identical or similar parts or parts with identical or similar functions.

[0034] They show: FIG. 1 a measuring instrument installed in a measurement environment and connected to an operating controller via a communication link; FIG. 2A, B the measuring instrument of the FIG. 1 in a 3D view ( FIG. 2A ) and a schematic diagram of the measuring device in a block diagram ( FIG. 2B ); FIGN. 3A, Bden operating controller of the FIG. 1 in a top view of a front side ( FIG. 3A ) and a schematic diagram of the control controller in a block diagram ( FIG. 3B ); FIG. 4 the performance of several measurements with the measuring device on different boundary surfaces of the measuring environment; FIG. 5 a screenshot of the operator controller showing how a polyline is created from the geometry model of the measuring environment; FIG. 6A, a method according to the invention for calculating the pose of a measuring device in the form of a flowchart; and FIG. 7 a screenshot of the operator controller showing how a polyline with an unauthorized measuring area is created from the geometry model.

[0035] FIG. 1 a measuring device shows 11, whose position and orientation (pose) in a measurement environment 12 to be determined using a method according to the invention, and an operating controller 13.The term "measuring instrument" encompasses all devices designed for performing measurement tasks. The measuring instrument 11, which in this embodiment is configured as a total station, can be connected via a communication link. 14 to be connected to the operating controller 13.

[0036] The measurement environment 12 is represented in a geometric model. A CAD-supported construction model of the measurement environment 12 can be used as the geometric model. Alternatively, the measurement environment 12 can be scanned using a laser scanner, and a geometric model of the measurement environment 12 can be created from the scan data. The geometric model can represent the measurement environment 12 completely or only partially. For the purposes of this application, the surfaces of the measurement environment 12 that are used as reflection or scattering surfaces for distance measurement are relevant.

[0037] The position of the measuring device 11 is calculated in the reference system of the geometric model using a method according to the invention. The method according to the invention uses the measured values ​​of at least four measuring points, which are determined using the measuring device 11, and the horizontal course of the boundary surfaces, which is referred to as a polyline.

[0038] FIGN. 2A , B The measuring device 11 of the FIG. 1 in a 3D view ( FIG. 2A ) and in a schematic structure in the form of a block diagram ( FIG. 2B ).

[0039] The measuring instrument 11 is designed as a total station and has a measuring head 21, a main case 22 and a rechargeable battery 23 The measuring head 21 comprises a housing 24 with an exit window 25 and a distance measuring device arranged in housing 24, which emits a measuring beam 26emits. The measuring beam 26 leaves the housing 24 through the exit window 25 and can generate measuring points on a boundary surface of the measuring environment.

[0040] The main housing 22 is U-shaped and comprises a base housing 27, a first side panel 28 and a second side panel 29. The measuring head 21 is arranged between the first side part 28 and the second side part 29 and is pivoted about a pivot axis. 30 The main housing 22 is designed to swivel. It is positioned opposite a rotating platform. 31 around an axis of rotation 32 rotatable design.

[0041] The base housing 27 contains an azimuth motor unit and a first angle measuring unit; the azimuth motor unit enables the main housing 22 to be moved about the axis of rotation 32, and the first angle measuring unit enables the direction of the measuring beam 26 to be determined in a horizontal plane. The first side section 28 contains an elevation motor unit and a second angle measuring unit; the elevation motor unit enables the measuring head 21 to be moved about the pivot axis 30, and the second angle measuring unit enables the direction of the measuring beam 26 to be determined in a vertical plane. To make the measuring instrument 11 fully automatic, a leveling device can be provided in the base housing 27, which enables the measuring instrument 11 to be leveled so that the axis of rotation 32 is parallel to a gravitational direction. 33 proceeds.

[0042] FIG. 2B Figure 11 shows the schematic structure of the measuring device 11 as a block diagram. The measuring device 11 has an electronic component. 41, a distance measuring device 42, a first angle measuring device 43 for measuring an azimuth angle, an azimuth motor device 44, a second angle measuring device 45 for measuring an elevation angle, an elevation motor device 46 and a camera setup 47 on.

[0043] The electronic device 41 includes a microcontroller 48, a memory circuit 49, which can have a direct access memory (RAM) and a read-only memory (ROM), a communication circuit 50 and an I / O interface 51. The microcontroller 48 can communicate with the memory circuit 49 and the communication circuit 50 and is designed for the control and regulation of the measuring device 11.

[0044] The communication circuit 50 has a transmitter 52 and a recipient 53 The communication circuit 50 is designed for communication and the exchange of data information, e.g., distance measurements, azimuth angle values, and elevation angle values, with the operating controller 13, typically using a wireless signal. In a preferred embodiment, the communication link 14 is wireless, although a cable could be connected between the communication circuit 50 and the operating controller 13. The I / O interface 51 is an interface between the microcontroller 48 and the various types of drivers and sensors.

[0045] The distance measuring device 42 includes a laser transmitter 56, which generates the measuring beam 26, a laser driver 57, which supplies power to the laser transmitter 56, a photosensor 58 and a receiver interface 59.The photosensor 58 receives at least part of the measuring beam 26, which is reflected at a boundary surface, and the current signal output by the photosensor 58 is routed to the receiver interface 59. After amplification and demodulation, the signal is sent from the receiver interface 59 to the microcontroller 48 via the I / O interface 51.

[0046] The first angle measuring device 43 comprises a first angle encoder. 61, which determines the direction of the laser transmitter 56 in the horizontal plane (azimuth angle) and converts it into an electrical output signal that is sent to the microcontroller 48 via the I / O interface 51. The azimuth motor assembly 44 comprises an azimuth motor 62, which moves the main housing 22 of the measuring instrument 11 about the axis of rotation 32, and an azimuth motor driver. 63, which converts the commands of the microcontroller 48 into the required currents of the azimuth motor 62.

[0047] The second angle measuring device 45 includes a second angle encoder. 64, The elevation motor 46 determines the direction of the laser transmitter 56 in the vertical plane (elevation angle) and converts it into an electrical output signal, which is sent to the microcontroller 48 via the I / O interface 51. The elevation motor assembly 46 includes an elevation motor. 65, which moves the measuring head 21 around the swivel axis 30, and an elevation motor driver 66, which converts the commands of the microcontroller 48 into the required current levels of the elevation motor 65.

[0048] The camera unit 47 includes an image sensor 67 and a graphics processing unit (GPU) 68, who is responsible for calculating image information.

[0049] FIGN. 3A , B show the control controller 13 of the FIG. 1 in a top view of a front side ( FIG. 3A ) and a schematic diagram of the operating controller 13 in a block diagram ( FIG. 3B ).

[0050] The operating controller 13 is designed as a tablet computer and includes a housing 71, a touchscreen 72, a battery 73, several keys 74, e.g. volume control button, on / off button and display control button, multiple displays 75, e.g. for operating status, data storage status and battery status, multiple connections 76, e.g. for docking, data storage and USB, and a card slot 77.

[0051] FIG. 3B The schematic structure of the operating controller 13 is shown as a block diagram. The operating controller 13 comprises an electronic unit. 81, a display device 82 and a user-operated input device 83.

[0052] The electronic device 81 includes a microcontroller 84,a memory circuit 85, which may include a direct access memory (RAM), a read-only memory (ROM) and a bulk storage (BULK), a communication circuit 86 and an I / O interface 87. The microcontroller 84 can communicate with the memory circuit 85 and the communication circuit 86 and is designed for controlling and regulating the operator controller 13. The mass storage device could be an SD card that can be inserted into the card slot 77, or an external storage device that can be connected to the operator controller 13 via one of the ports 76, e.g., a USB port.

[0053] The communication circuit 86 has a transmitter 88 and a recipient 89The device is designed for communication with the measuring instrument 11, typically using a wireless signal. The measuring instrument 11 transmits distance measurements, azimuth angle values, and elevation angle values ​​to the operating controller 13 via the communication link 14.

[0054] The display unit 82 includes a display 91 and a display driver circuit 92, which is connected to the I / O interface 87 and provides the correct interface and data signals for the display 91. The user-controlled input device 83 includes a keyboard. 93 and a keyboard driver 94, which is connected to the I / O interface 87 and provides the correct interface and data signals for the keyboard 93.

[0055] FIG. 4 Figure 1 schematically illustrates the execution of multiple measurements with the measuring device 11 on different boundary surfaces of the measurement environment 12. The measurement environment 12 has four walls, the four boundary surfaces of which F-1, F-2, F-3, F-3 form.

[0056] The measuring device 11 is aligned in a first orientation and the measuring beam 26 generates a first measuring point. MP-1 on the first boundary surface F-1. For the first measuring point MP-1, distance and angle values ​​are determined by means of distance and angle measurements. The method according to the invention requires the distance and angle values ​​in a horizontal plane perpendicular to the direction of gravity 33, which are hereinafter referred to as horizontal distance and horizontal angle.

[0057] To obtain the horizontal angle and horizontal distance, the measuring instrument 11 can be leveled using the leveling device 47 before the start of the measurement, so that the measured distance and angle values ​​correspond to the horizontal angle and horizontal distance, or the measuring instrument 11 measures three-dimensional values ​​and derives the horizontal angle and horizontal distance from them. For the first measuring point MP-1, a first horizontal angle is determined. HPhi-1 and a first horizontal distance HD-1 as the first measured values.

[0058] The measuring device 11 is moved from the first orientation to a second orientation and the measuring beam 26 is moved to a second measuring point. MP-2 aligned for which a second horizontal angle HPhi-2 and a second horizontal distance HD-2 as second measured values. The measuring device 11 is moved from the second orientation to a third orientation and the measuring beam 26 is directed to a third measuring point. MP-3 aligned, for which a third horizontal angle HPhi-3 and a third horizontal distance HD-3 as third measured values. The measuring device 11 is moved from the third orientation to a fourth orientation and the measuring beam 26 is directed to a fourth measuring point. MP-4 aligned, for which a fourth horizontal angle HPhi-4 and a fourth horizontal distance HD-4 as the fourth measured value.

[0059] For the method according to the invention, the measuring points must be arranged on at least two different boundary surfaces. In the exemplary embodiment, the first and second measuring points MP-1, MP-2 are located on the first boundary surface F-1, the third measuring point MP-3 on the second boundary surface F-2, and the fourth measuring point MP-4 on the third boundary surface F-3, so that the four measuring points, MP-1, MP-2, MP-3, MP-4, are arranged on three different boundary surfaces.

[0060] To increase the accuracy with which the pose of the measuring instrument 11 can be calculated, it is advantageous to align the measuring points with as many boundary surfaces of the measuring environment 12 as possible and to distribute them as evenly as possible over the solid angle. For this purpose, the measuring instrument 11 can be moved into a fifth orientation and the measuring beam 26 directed to a fifth measuring point. MP-5 to be aligned, which lies on the fourth boundary surface F-4 and for which a fifth horizontal angle HPhi-5 and a fifth horizontal distance HD-5 as the fifth measured value.

[0061] FIG. 5 Figure 1 shows a screenshot of the control controller 13, demonstrating how a polyline is created from the geometry model. The geometry model, which represents the measurement environment 12, is loaded by the microcontroller 84, and a 2D view is displayed on the display 91.

[0062] The operator determines a first point LP1, a second point LP2, a third point LP3 and a fourth point LP4, which represent the corner points. The microcontroller 84 defines a line between the first point LP1 and the second point LP2 as the first line segment. L1, a line between the second point LP2 and the third point LP3 as the second line segment L2,a line between the third point LP3 and the fourth point LP4 as the third line segment L3 and a line between the fourth point LP4 and the first point LP1 as the fourth line segment L4. The polyline is formed from the first line segment L1, the second line segment L2, the third line segment L3 and the fourth line segment L4.

[0063] The first line segment L1 represents the horizontal course of the first boundary surface F-1, the second line segment L2 the horizontal course of the second boundary surface F-2, the third line segment L3 the horizontal course of the third boundary surface F-3 and the fourth line segment L4 the horizontal course of the fourth boundary surface F-4.

[0064] FIGN. 6A , BFigure 1 shows the inventive method for calculating the pose of the measuring device in the form of a flowchart. The execution of the inventive method for calculating the pose of the measuring device 11 in the reference system of the geometry model is controlled by the microcontroller 84 of the operating controller 13.

[0065] The microcontroller 84 is connected to the measuring device 11 via the communication circuit 86 and the communication link 14 and includes an algorithm for calculating the pose of the measuring device 11. In order to calculate the pose of the measuring device 11 using the algorithm, a polyline must be created from the geometry model of the measuring environment 12 (see FIG. 5 ) and at least four different measurements must be carried out with the measuring device 11 (see FIG. 4 ).

[0066] The method according to the invention has the advantage that no fixed control points need to be used, but rather the measuring device 11 can be aligned with all boundary surfaces of the measuring environment 12. To improve the accuracy of the pose, it is advantageous to align the measuring points with as many boundary surfaces of the measuring environment 12 as possible and to distribute them as evenly as possible over the solid angle.

[0067] The operator creates a polyline from the geometric model that represents the horizontal course of the boundary surfaces perpendicular to the direction of gravity 33 and comprises at least three line segments (step S10). In the next step of the method according to the invention, N, N ≥ 4 different measurements are carried out with the measuring device 11 (step S20).

[0068] During the FIGN. 6A In the variant of the method according to the invention shown in Figure B, the polyline is first created and then at least four measurements are carried out with the measuring device 11. Alternatively, the measurements can be carried out first and then the polyline is created, or in the case of an automatic measurement, the two steps can also be carried out simultaneously.

[0069] The measurements can be performed manually by the user or the microcontroller 84 can initiate them. Each of the N measurements is performed with the measuring device 11 in a different orientation. The measuring beam 26 of the distance measuring device 42 defines a measuring point on one of the boundary surfaces of the measuring environment 12. The measuring device 11 determines a horizontal angle and a horizontal distance between the measuring point and the measuring device 11 as measured values ​​for each measuring point. The N different measuring points must be arranged such that measurements are taken on at least two different boundary surfaces of the measuring environment 12. FIG. 4 shows the five measuring points MP-1, MP-2, MP-3, MP-4 and MP-5, which are arranged on the four boundary surfaces F-1, F-2, F-3 and F-4.

[0070] The method according to the invention is continued by executing the algorithm for calculating the pose, wherein the algorithm comprises a sequence of steps that can be executed once or multiple times.

[0071] In the first step of the sequence, three measurement points from the N measurement points and three line segments of the polyline are selected, and if no assignment between measurement points and line segments has been carried out before the start of the algorithm, the selected three measurement points and selected three line segments are assigned to each other (step S30 ).

[0072] In the second step of the sequence, the number of possible solutions for the pose of measuring device 11 is determined using the measured values ​​of the selected three measuring points and the coordinates of the selected three line segments (step S40If one or two solutions exist, measurement coordinates of at least two of the selected three measurement points are determined in the reference system of the geometric model. These measurement coordinates are required later in the procedure to calculate an intermediate pose.

[0073] In the third step of the sequence, a distinction is made between three cases: no solution, one solution, and two solutions. If no solution was determined in the second step of the sequence (zero in S40), the method according to the invention continues with the sixth step of the sequence. If a solution was determined in the second step of the sequence (one in S40), an intermediate pose for the measuring device is calculated from the measurement coordinates and measured values, and those of the N measurement points that meet a predetermined quality criterion are determined as qualified measurement points (step S50); the inventive method is continued with the fifth step of the sequence. If two solutions were determined in the second step of the sequence (Two in S40), a first test pose and a second test pose are calculated from the measurement coordinates and measured values, and for the first test pose and second test pose, those measurement points of the N measurement points that meet a predetermined quality criterion are determined as the first qualified measurement points and second qualified measurement points, respectively (Step S60 ); the inventive method is continued with the fourth step of the sequence.

[0074] The intermediate pose determined in step S50 represents a pose (position and orientation) of the measuring device 11, which is evaluated in the further course of the method according to the invention. The first and second test poses determined in step S60 represent poses (position and orientation) of the measuring device 11, which are compared with each other in the further course of the method according to the invention. The use of the terms "intermediate pose", "first test pose", and "second test pose" allows for a linguistic distinction between the mathematical solutions.

[0075] As a quality criterion for determining the qualified measurement points in step S50 or step S60, at least one of the following criteria is used: maximum distance of the measurement point from the polyline, unique assignment of the measurement point to a line segment of the polyline, and maximum angle of incidence of the measuring beam to the line segment of the polyline. If the polyline contains at least one prohibited line segment, the assignment to a line segment that differs from a prohibited line segment can also be used.

[0076] The microcontroller 84 applies the predefined quality criterion to each of the N measurement points. A measurement point is considered qualified if its distance to the polyline is less than a maximum distance and / or the measurement point can be uniquely assigned to a line segment of the polyline and / or the angle of incidence of the measuring beam to the assigned line segment is less than a maximum angle of incidence. The angle of incidence is measured relative to the normal vector of the boundary surface.

[0077] The fourth step of the sequence is only performed if two solutions were determined in the second step and serves to compare these two solutions, referred to as the first and second test poses. In the fourth step, the microcontroller 84 compares the suitability of the first and second test poses based on a predefined comparison criterion (step 1). S70), where two cases are distinguished. If one of the first and second test poses is rated as more suitable (I in p70), this test pose is defined as an intermediate pose (step 70). S80 ) and the method according to the invention is continued with the fifth step of the sequence. If neither of the first test poses and second test poses is evaluated as more suitable (II in S70), the method according to the invention is continued with the sixth step of the sequence.

[0078] As a comparison criterion to compare the first test pose and second test pose in step S70, at least one of the following criteria is used: number of qualified measurement points, distribution of the qualified measurement points along the polyline, area of ​​the surface spanned by the qualified measurement points, and estimated accuracy of a pose.

[0079] The microcontroller 84 compares the first test pose (first solution in S50) and the second test pose (second solution in S50) based on the comparison criterion. A test pose is rated as more suitable if it has a greater number of qualified measurement points, and / or its qualified measurement points are distributed over more line segments of the polyline, and / or the area spanned by its qualified measurement points is larger, and / or its estimated accuracy is greater.

[0080] In the fifth step of the sequence, it is checked whether a pose is stored for the measuring device (step S90), where two cases are distinguished. If no pose is stored for the measuring device (No in S90), the intermediate pose determined in the third step (S50) or fourth step (S80) of the sequence is defined as the pose for the measuring device, or an updated pose is calculated using the qualified measurement points and defined as the pose for the measuring device (step S100 Calculating an updated pose using the qualified measurement points has the advantage that all qualified measurement points are taken into account, which can improve the accuracy of the pose.

[0081] If a pose is stored for the measuring device (yes in S90), the intermediate pose determined in the third step (S50) or fourth step (S80) of the sequence is compared by the microcontroller 84 with the stored pose using a predefined further comparison criterion (step S110), where two cases are distinguished. If the intermediate pose is assessed as more suitable (I in S110), the intermediate pose is defined as the pose, or an updated pose is calculated using the qualified measurement points and defined as the pose for measuring device 11 (step ). S120 The inventive method is continued with the sixth step of the sequence. If the intermediate pose is deemed not more suitable (II in S110), the inventive method is continued with the sixth step of the sequence. Calculating an updated pose using the qualified measurement points in step S120 has the advantage that all qualified measurement points are taken into account, thereby improving the accuracy of the pose.

[0082] As a further comparison criterion, with which the intermediate pose and a saved pose in step S90 can be compared, at least one of the following criteria is used: number of qualified measurement points, distribution of the qualified measurement points along the polyline, area of ​​the surface spanned by the qualified measurement points and estimated accuracy of a pose.

[0083] The microcontroller 84 compares the intermediate pose and a stored pose based on the following additional comparison criteria. The intermediate pose is considered more suitable if it has a greater number of qualified measurement points, and / or its qualified measurement points are distributed across more line segments of the polyline, and / or the area spanned by its qualified measurement points is larger, and / or its accuracy is greater.

[0084] In the sixth step of the sequence, a decision is made based on a predefined termination criterion as to whether a further sequence will be carried out (step S130 ), where three cases are distinguished. If a further sequence is performed (I in S130), the method according to the invention continues with the first step of the sequence (S30). If no further sequence is performed and a pose for the measuring device is defined (II in S130), the pose is displayed by the microcontroller 84 (step S140 ) and the inventive method is terminated. If no further sequence is performed and no pose is defined for the measuring device (III in S130), the microcontroller 84 displays the information that no pose has been determined for the measuring device (step S150 ), and the inventive method is terminated.

[0085] At least one of the following criteria is used as a termination criterion: minimum number M of sequences, minimum number of qualified measurement points, minimum percentage value of the number of qualified measurement points to the total number of measurement points, minimum absolute value for the area spanned by the qualified measurement points, and a minimum percentage value of the area spanned by the qualified measurement points to the area of ​​the polygon enclosed by the polygon line.

[0086] The microcontroller 84 applies the termination criterion and ends the execution of the sequences when a minimum number M of sequences is reached and / or the number of qualified measurement points is greater than a minimum number and / or the ratio between the number of qualified measurement points and the number of measurement points is greater than a minimum percentage value and / or the area of ​​the area spanned by the qualified measurement points is greater than an absolute minimum value and / or the ratio between the area of ​​the area spanned by the qualified measurement points and the area of ​​the polygon is greater than a minimum percentage value.

[0087] FIG. 7 shows another screenshot of control controller 13, which displays an alternative polyline. The polyline of FIG. 7 is derived from the same geometric model of the measurement environment as the polyline of the FIG. 5 and differs from the polyline of the FIG. 5 by defining an impermissible measurement range.

[0088] An impermissible measuring range is defined as an area where the geometric model deviates from the actual measurement environment and / or the area is inaccessible or unsuitable for measurement with the measuring device 11. Examples of impermissible measuring ranges include door openings, window openings, glass panes, and other inaccessible areas.

[0089] The operator determines the first point LP1, the second point LP2, the third point LP3 and the fourth point LP4; in addition, the operator determines a fifth point. LP5,which lies on the line between the third point LP3 and the fourth point LP4. The Microcontroller 84 defines the line between the first point LP1 and the second point LP2 as the first line segment L1, the line between the second point LP2 and the third point LP3 as the second line segment L2, and a line between the third point LP3 and the fifth point LP5 as the fourth line segment. L4; The line between the fourth point LP4 and the fifth point LP5 is defined as an unauthorized measurement area. The polyline is formed from the first line segment L1, the second line segment L2, the third line segment L3, and the fourth line segment L4.

Claims

1. Method for computing the pose of a measuring device (11), which is set up in a measuring environment (12) having multiple delimitation surfaces (F-1, F-2, F-3, F-4) and which includes a distance measuring unit (42) having a measuring beam (26) and at least one angle measuring unit (43, 45), in the reference system of a geometry model, which maps at least the delimitation surfaces (F-1, F-2, F-3, F-4) of the measuring environment (12), by means of a microcontroller (84), which has a communicating connection to the measuring device (11) and which includes an algorithm for computing the pose, having the following steps: ▪ creating a polyline from the geometry model, wherein the polyline represents the horizontal course of the delimitation surfaces (F-1, F-2, F-3, F-4) perpendicular to the direction of gravity (33) and comprises at least three line sections (LP1, LP2, LP3, LP4) (S10), ▪ executing N, N ≥ 4 measurements using the measuring device (11) in N different orientations of the measuring device (11), wherein the measuring beam (26) of the distance measuring unit (42) is incident in the N different orientations on at least two different delimitation surfaces (F-1, F-2, F-3, F-4) and defines N different measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) and, in each of the N orientations of the measuring device (11), a horizontal angle (HPhi-1, HPhi-2, HPhi-3, HPhi-4, HPhi-5) and a horizontal distance (HD-1, HD-2, HD-3, HD-4, HD-5) are determined between the respective measurement point and the measuring device (11) as measured values (S20), and ▪ executing the algorithm for computing the pose, wherein the algorithm comprises a sequence of the following steps that can be executed one or more times, wherein: (1) in the first step three measurement points of the N measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) and three line sections of the polyline are selected and, for the case in which no assignment between the measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) and line sections (LP1, LP2, LP3, LP4) was carried out before the start of the algorithm, the selected three measurement points and selected three line sections are assigned to one another (S30), (2) in the second step by means of the measured values of the selected three measurement points and the coordinates of the selected three line sections, the number of possible solutions for the pose of the measuring device (11) is determined (S40) and, for the case that one solution or two solutions exist(s), measurement coordinates of at least two of the selected three measurement points are determined in the reference system of the geometry model, (3) in the third step - for the case that in the second step of the sequence no solution was determined (zero in S40), the method is continued with the sixth step of the sequence, - for the case that in the second step of the sequence a solution was determined (one in S40), an intermediate pose for the measuring device is computed from the measurement coordinates and measured values, those measurement points of the N measurement points which meet a specified quality criterion are determined as qualified measurement points (S50), and the method is continued with the fifth step of the sequence, - for the case that in the second step of the sequence two solutions were determined (two in S40), a first test pose and second test pose are computed from the measurement coordinates and measured values, for the first test pose and second test pose in each case those measurement points of the N measurement points which meet a specified quality criterion are determined as first qualified measurement points or second qualified measurement points, respectively (S60), and the method is continued with the fourth step of the sequence, (4) in the fourth step the first test pose and second test pose are compared with respect to their suitability on the basis of a specified comparison criterion (S70), wherein - for the case that one of the first test pose and second test pose is assessed as better suitable (I in S70), this test pose is defined as the intermediate pose (S80) and the method is continued with the fifth step of the sequence, and - for the case that neither the first test pose nor second test pose is assessed as better suitable (II in S70), the method is continued with the sixth step of the sequence, (5) it is checked in the fifth step whether a pose is stored for the measuring device (S90), wherein - for the case that no pose is stored for the measuring device (no in S90), the intermediate pose which was determined in the third step (S50) or fourth step (S80) of the sequence is defined as the pose for the measuring device or an updated pose is computed with the aid of the qualified measurement points and defined as the pose for the measuring device (S100) and the method is continued with the sixth step of the sequence, and - for the case that a pose is stored for the measuring device (yes in S90), the intermediate pose which was determined in the third step (S50) or fourth step (S60) of the sequence is compared with the stored pose on the basis of a specified further comparison criterion (S110), wherein, for the case that the intermediate pose is assessed as better suitable (I in S110), the intermediate pose is defined as the pose or an updated pose is computed with the aid of the qualified measurement points and defined as the pose for the measuring device (S120) and the method is continued with the sixth step of the sequence, and, for the case that the intermediate pose is assessed as not better suitable (II in S110), the method is continued with the sixth step of the sequence, and (6) in the sixth step it is decided on the basis of a specified termination criterion whether a further sequence is carried out (S130), wherein - for the case that a further sequence is carried out (I in S130), the method is continued with the first step of the sequence, - for the case that no further sequence is carried out and a pose is defined for the measuring device (II in S130), the method is ended, and - for the case that no further sequence is carried out and no pose is defined for the measuring device (III in S130), the method is terminated without a pose having been computed for the measuring device.

2. Method according to Claim 1, characterized in that at least one of the following criteria is used as the quality criterion in the third step of the sequence: maximum distance of the measurement point to the polyline, unique assignment of the measurement point to a line section of the polyline, and maximum angle of incidence of the measuring beam to the line section of the polyline.

3. Method according to Claim 1, characterized in that at least one of the following criteria is used as the comparison criterion in the fourth step of the sequence: number of qualified measurement points, distribution of the qualified measurement points along the polyline, surface area of the surface spanned by the qualified measurement points, and an estimated accuracy of a test pose.

4. Method according to Claim 1, characterized in that at least one of the following criteria is used as the further comparison criterion in the fifth step of the sequence: number of qualified measurement points, distribution of the qualified measurement points along the polyline, surface area of the surface spanned by the qualified measurement points, and estimated accuracy of a pose.

5. Method according to Claim 1, characterized in that at least one of the following criteria is used as the termination criterion in the sixth step of the sequence: minimum number M of sequences, minimum number of qualified measurement points, percentage minimum value of the number of qualified measurement points in relation to the number of measurement points, absolute minimum value for the surface area of the surface spanned by the qualified measurement points, and a percentage minimum value of the surface area of the surface spanned by the qualified measurement points in relation to the surface area of the polygon which is enclosed by the polygon line.

6. Method according to Claim 1, characterized in that, during the creation of the polyline, impermissible measuring areas are defined, wherein the line sections of the polyline assigned to the impermissible measuring areas are defined as impermissible line sections and are excluded from the selection of the three line sections in the first step of the sequence.

7. Method according to Claim 6, characterized in that at least one of the following measuring areas is defined as an impermissible measuring area: window opening, door opening, glass pane, area in which the geometry model deviates from the measuring environment (12), and area which is inaccessible or unsuitable for the measurement.

8. Method according to one of Claims 6 to 7, characterized in that the assignment to a line section which is different from an impermissible line section is used as a quality criterion in the third step of the sequence.

9. Method according to Claim 1, characterized in that the N measurements are executed manually by an operator using the measuring device (11) and the measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) are assigned by the operator to the line sections of the polyline.

10. Method according to Claim 1, characterized in that the N measurements are executed by the microcontroller (84) using the measuring device (11) and the measurement points (MP-1, MP-2, MP-3, MP-4, MP-5) are assigned by the operator to the line sections of the polyline.

11. Method according to Claim 1, characterized in that the N measurements are executed manually by an operator using the measuring device (11) and the assignment to be performed in the first step of the sequence is performed by the microcontroller (84) randomly or with the aid of a selection criterion.

12. Method according to Claim 1, characterized in that the N measurements are executed by the microcontroller (84) using the measuring device (11) and the assignment to be performed in the first step of the sequence is performed by the microcontroller (84) randomly or with the aid of a selection criterion.

13. Method according to one of Claims 11 to 12, characterized in that at least one of the following criteria is used as the selection criterion: sequence of the line sections in the rotational direction of the measuring device (11), length of the line sections, and distances of the measurement points to the polyline, wherein the distances are computed with the aid of the measured values and a starting pose for the measuring device.

14. Method according to one of Claims 1 to 13, characterized in that the measuring device (11) includes a camera unit (47) and a camera image is created by the camera unit (47) in each of the N orientations of the measuring device (11), wherein the camera image is assigned to the respective orientation of the measuring device (11).