Cleaning apparatus, treatment apparatus and method for respectively cleaning and treating pot-shaped hollow bodies, in particular transporting containers for semiconductor wafers or for lithography masks
Patent Information
- Application Number
- EP2023798121
- Authority / Receiving Office
- EP · EP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-11-17
- Filing Date
- 2023-10-19
- Publication Date
- 2025-09-24
AI Technical Summary
Current cleaning devices for cup-shaped transport containers, such as FOUPs for semiconductor wafers and lithography masks, require excessive cleaning fluid and time to achieve satisfactory results, leading to high production costs and contamination risks due to the need to separate the lid and position the containers precisely for effective cleaning of the outer surface.
A cleaning device that allows for the cleaning of the outer surface of cup-shaped hollow bodies with the lid closed, using a gripping and movement device to introduce the container into a cleaning space and supply cleaning fluid through outlet nozzles, enabling effective cleaning without the need to separate the lid or position the container precisely, and optionally using a storage device for efficient fluid application and particle removal.
This approach reduces equipment expenditure and cleaning time, allowing for thorough and efficient cleaning of the outer surface while maintaining the integrity of the container, thereby minimizing contamination risks and production costs.
Smart Images
Figure 1.1
Abstract
Description
[0001] Cleaning device, treatment device and method for cleaning or treating pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks
[0002] The present invention relates to a cleaning device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks. Furthermore, the present invention relates to a treatment device and a method for treating pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks.
[0003] The production of highly integrated electronic circuits and other sensitive semiconductor components takes place today in factories where semiconductor wafers undergo numerous processing steps. A large portion of these processing steps takes place in clean rooms, which are kept free of contaminants, especially particles, at great expense. Such complex processing is necessary because particles that come into contact with the semiconductor wafer material can influence the material properties of the semiconductor wafers to such an extent that an entire production batch becomes defective and unusable and must be rejected.
[0004] Since cleanliness becomes more and more important with the increasing integration density of semiconductor circuits and the effort required for cleanliness increases exponentially with the size of cleanrooms, the semiconductor wafers are not transported "openly" from one processing station to the next. Instead, special transport containers (so-called FOUPs, Front Opening Unified Pods) are used. These are box-shaped transport containers into which a large number of semiconductor wafers are inserted. The FOUPs are usually closed with a removable lid. Without the lid, the FOUPs have a pot-shaped basic shape with a rectangular base. When the FOUPs are closed with their lid, the inserted semiconductor wafers can be transported from one cleanroom to another, protected from the environment.Once the FOUPs reach a processing station, they are opened, the semiconductor wafers are removed, and processed accordingly. After processing, the semiconductor wafers are transported back to the FOUPs and then forwarded to the next processing station.
[0005] Due to the high production downtime caused by contamination of semiconductor wafers, it is necessary to clean the FOUPs from time to time. The FOUPs are particularly contaminated by abrasion of the semiconductor wafers during insertion into and removal from the FOUPs.
[0006] The same applies to transport containers for lithography masks, for example for EUV lithography masks ("extreme ultra-violet radiation"). EUV lithography masks are used to manufacture very small integrated circuits. Like semiconductors, the lithography masks also have to be transported, which creates a similar situation. When reference is made to FOUPs in the following, the relevant statements apply equally to transport containers for lithography masks.
[0007] Devices for cleaning FOUPs are known, for example, from US 5 238 703 A, WO 2005 / 001888 A2, DE 10 2020 129 469 A1 and EP 1 899 084 B1. In such devices, the FOUPs are cleaned both on their
[0008] The FOUPs are cleaned on both their inner and outer surfaces. The outer surface of the FOUPs is usually much more contaminated than the inner surface. As a result, the cleaning fluid becomes enriched during the cleaning process with particles from both the outer and inner surfaces. The particles can therefore be transported from the outer surface to the inner surface. However, a satisfactory cleaning result is only achieved when the number of particles has fallen below a certain value. Because of the particles originating from the outer surface, the cleaning process must be carried out for a sufficiently long time in order to remove a sufficient proportion of the particles.This is disadvantageous in that, on the one hand, the amount of cleaning fluid required is comparatively high, and, on the other hand, the FOUPs cannot be used to transport the semiconductor wafers during the cleaning process. This increases the cost of semiconductor wafer production.
[0009] In the already mentioned DE 10 2020 129 469 A1, both the outer surface and the inner surface can be cleaned in the same cleaning device. A first cleaning head is used to clean the inner surface and a second cleaning head is used to clean the outer surface. The cover is separated from the rest of the FOUP and the FOUP is placed on a support wall of the cleaning device in such a way that the FOUP is sealed off from the support wall. The first cleaning head projects into the interior of the FOUP. The second cleaning head is U-shaped and is mounted in the side wall of the cleaning device so that it can rotate about an axis of rotation. While the cleaning fluid used to clean the inner surface can be guided in a defined manner, this is not directly the case with the cleaning fluid used to clean the outer surface.In order to prevent uncontrolled distribution of the cleaning fluid used to clean the outer surface, a cover is provided which encloses the FOUR and the second cleaning head after the FOUR has been placed on the support wall. The cover and the mechanism for opening and closing the cover require a relatively high level of equipment expenditure. As mentioned, the outer surface of a FOUP is usually more heavily contaminated than the inner surface. However, since the FOUR is usually closed with the lid, the requirements for cleaning the inner surface are significantly higher than those placed on the outer surface. In this respect, in some applications the equipment expenditure for cleaning the outer surface of the FOUP is disproportionate to the requirements. In some applications, therefore, cleaning of the outer surface is dispensed with.However, since this increases the risk of producing defective and unusable batches of semiconductor wafers, omitting to clean the outer surface is not optimal.
[0010] The object of one embodiment of the present invention is to propose a cleaning device and a treatment device with which it is possible to remedy the above-mentioned disadvantages using simple and cost-effective means and, in particular, to clean the outer surface of the hollow body with little equipment expenditure. Furthermore, one embodiment of the present invention is based on the object of providing a corresponding method for cleaning the outer surface of the hollow body. This object is achieved with the features specified in claims 1, 12 and 16. Advantageous embodiments are the subject of the dependent claims.
[0011] One embodiment of the invention relates to a cleaning device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks, wherein
[0012] - the hollow body has a hollow body wall which o forms a hollow body opening which can be closed or is closed by a lid, and o forms a hollow body outer surface, wherein
[0013] - the cleaning device o at least one side wall which delimits a cleaning space, wherein o the side wall forms at least one device opening through which the hollow body closed with the lid can be introduced into the cleaning space by means of a gripping and moving device for cleaning the hollow body outer surface, and o at least one supply device for supplying a cleaning fluid to the hollow body outer surface of the hollow body closed with the lid, wherein
[0014] - the device opening is designed in such a way that the gripping and moving device protrudes at least partially into the cleaning chamber or is flush with the device opening, at least during the supply of the cleaning fluid, and / or
[0015] - a storage device is arranged in the cleaning chamber, on which the gripping and moving device can place the hollow body closed with the lid for supplying the cleaning fluid. An important aspect of the proposed cleaning device is that the outer surface of the hollow body can be cleaned when the hollow body is closed with the lid. This eliminates the need to separate the lid from the rest of the hollow body, which saves time. In addition, the outer surface of the hollow body can be cleaned when the gripping and moving device is connected to the hollow body. It is therefore not necessary to place the body in a defined position.The gripping and moving device can move the hollow body translationally and / or rotationally within certain limits during cleaning of the hollow body's outer surface, so that the cleaning fluid used can also reach hard-to-reach places.
[0016] If desired, the cleaning device can be equipped with a storage device onto which the hollow body, closed with the lid, can be placed. Once placed, the connection between the hollow body and the gripping and moving device can be released. While the cleaning fluid is being supplied to the outer surface of the hollow body, the gripping and moving device can move other hollow bodies. Particularly when cleaning in the cleaning device takes a long time, the gripping and moving device can perform other tasks and thus be used more effectively.
[0017] The cleaning fluid can be nitrogen or compressed air, and especially preferably extremely clean dried air, also known as XCDA. However, water can also be used.
[0018] According to a further embodiment, the supply device can comprise a number of outlet nozzles pointing toward or opening into the cleaning chamber. The use of outlet nozzles makes it possible to impose a specific flow direction on the cleaning fluid, thereby ensuring that the entire outer surface of the hollow body is exposed to the cleaning fluid. This enables effective and thorough cleaning of the outer surface of the hollow body.
[0019] In a further developed embodiment, the outlet nozzles arranged in the side wall can include or be formed by through holes. This minimizes the required installation space. Furthermore, the through holes can be distributed across the entire side wall, allowing the cleaning fluid to be introduced evenly into the cleaning chamber.
[0020] In a further developed version,
[0021] - the feeding device has through holes arranged in the side wall and
[0022] - the outlet nozzles are fixed to the side wall in fluid communication with the through holes and open into the cleaning chamber.
[0023] In this embodiment, the outlet nozzles are arranged in the cleaning chamber and are in fluid communication with the through-holes. Consequently, the cleaning fluid first flows through the through-holes and then through the outlet nozzles. The outlet nozzles can be positioned relatively close to the hollow body. This allows the cleaning fluid to be directed very precisely at specific sections of the hollow body's outer surface, for example, sections that experience has shown to be more heavily contaminated and / or more difficult to access than other sections. This can also contribute to the thorough cleaning of the hollow body's outer surface.
[0024] In a further embodiment, the supply device can comprise a number of supply channels communicating with the outlet nozzles, through which the cleaning fluid can be guided to the outlet nozzles. In principle, each outlet nozzle can be connected to its own supply channel, but this involves a correspondingly high level of equipment complexity. In this embodiment, one supply channel can be connected to several outlet nozzles, thus reducing the equipment complexity.
[0025] A further developed embodiment can be characterized by the feed channels being attached to the side wall and communicating with the through holes. Since the side wall is required anyway to define the cleaning space, it can also be used to accommodate the feed channels in this embodiment. Additional fastening or support for the feed channels can be omitted, which means that the installation space and equipment costs can be kept to a minimum.
[0026] According to a further embodiment, the feed device can have a number of first outlet nozzles for feeding a first cleaning fluid and a number of second outlet nozzles for feeding a second cleaning fluid into the cleaning chamber. In this embodiment, the outer surface of the hollow body can, for example, first be cleaned with a first cleaning fluid, in particular with water, and subsequently with a second cleaning fluid, in particular with air. The air then also has a drying effect. This can improve the cleaning result. However, it is also possible to use only the first cleaning fluid or only the second cleaning fluid, depending on the hollow body to be cleaned, without the cleaning device having to be converted for this purpose.
[0027] In a further embodiment, it may be advisable for the cleaning device to have a number of guide vanes arranged in the cleaning chamber or interacting with the guide vanes for directing the cleaning fluid within the cleaning chamber. As explained with the outlet nozzles, it is also possible to use the guide vanes to impose a specific flow on the cleaning fluid within the cleaning chamber. The guide vanes can also ensure that the cleaning fluid reaches the entire outer surface of the hollow body and / or is directed more intensively towards typically more heavily contaminated or difficult-to-access sections.
[0028] In a further developed embodiment, the guide vanes can be adjusted by means of a drive unit. Due to the adjustability of the guide vanes, the flow of the cleaning fluid can be adapted to differently shaped hollow bodies. Furthermore, the flow of the cleaning fluid through the cleaning chamber can be given a certain dynamic, which can also improve the cleaning effect.
[0029] In a further embodiment, the cleaning device has a closure unit with which the device opening can be at least partially closed. The device opening is closed in particular when the cleaning fluid is applied to the outer surface of the hollow body. The closure unit can prevent or limit the uncontrolled escape of the cleaning fluid, in particular when a gaseous fluid such as nitrogen or compressed air is used. The closure unit can be designed in the manner of a cover which closes the device opening. The cover can be designed such that it at least largely closes the device opening even when the gripping and moving device projects into the cleaning space during the supply of the cleaning fluid.For this purpose, the cover can, for example, have several movable parts that can be moved very close to the gripping and moving device when the latter, with the hollow body attached to it, extends into the cleaning chamber. If the cleaning device has a storage device onto which the hollow body can be placed, the gripping and moving device can be separated from the hollow body when the cleaning fluid is applied to the outer surface of the hollow body. The closure unit can then close the entire device opening.
[0030] In a further embodiment, the cleaning device has at least one outlet opening communicating with the cleaning chamber, through which outlet opening the cleaning fluid or the first cleaning fluid and the second cleaning fluid can be discharged from the cleaning chamber. This makes it possible to generate a controlled flow within the cleaning chamber without causing major turbulence and the formation of dead spaces on the outer surface of the hollow body, in which dead spaces the cleaning fluid cannot or can only insufficiently act on the outer surface of the hollow body. In addition, the cleaning fluid laden with particles is discharged from the cleaning device in a controlled manner, so that these particles cannot deposit again on the outer surface of the hollow body.An embodiment of the invention relates to a treatment device for treating pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks, comprising.
[0031] - a boundary wall which encloses an interior space,
[0032] - a gripping and moving device arranged in the interior for moving the hollow body within the interior, and
[0033] - a wall opening formed by the boundary wall through which the interior is accessible,
[0034] - at least one treatment unit for treating the hollow body, and
[0035] - a cleaning device according to one of the previous embodiments, wherein
[0036] - the hollow body closed with the lid is connected to the gripping and moving device during the supply of the cleaning fluid and is o brought into the cleaning chamber, o removed from the cleaning chamber and o held in the cleaning chamber by the gripping and moving device during the supply of the cleaning fluid.
[0037] The technical effects and advantages that can be achieved with the proposed treatment device correspond to those discussed for the present cleaning device. In summary, it should be noted that the outer surface of the hollow body can be cleaned without the lid having to be separated from the rest of the hollow body, thus saving time. Furthermore, the outer surface of the hollow body can be cleaned when the gripping and moving device is connected to the hollow body ("on the fly"). Placing it in a defined position is therefore not necessary. The gripping and moving device can move the hollow body within certain limits during cleaning of the outer surface of the hollow body, for example, pivoting and / or rotating it, so that the cleaning fluid used can also reach hard-to-reach areas.
[0038] If desired, the cleaning device can be equipped with a storage device onto which the hollow body, closed with the lid, can be placed. Once placed, the connection between the hollow body and the gripping and moving device can be released. While the cleaning fluid is being supplied to the outer surface of the hollow body, the gripping and moving device can move other hollow bodies. Particularly when cleaning in the cleaning device takes a long time, the gripping and moving device can perform other tasks and thus be used more effectively.
[0039] In a further embodiment, it can be provided that the gripping and moving device has a cover unit for at least partially covering the device opening while the cleaning fluid is being supplied. The cover unit can, for example, have movable or foldable metal sheets which cover the device opening when the cleaning fluid is applied to the outer surface of the hollow body. This can prevent the uncontrolled escape of the cleaning fluid from the cleaning space. This in particular reduces the probability that the particles detached from the outer surface of the hollow body with the cleaning fluid will enter the interior in an uncontrolled manner and there redeposit themselves on the outer surface of the hollow body or on the inner surface of the hollow body.
[0040] A further development may stipulate that the treatment device has a discharge channel for discharging the cleaning fluid or the first cleaning fluid and the second cleaning fluid, wherein the discharge channel communicates with the outlet opening. In this development, the cleaning fluid loaded with the particles detached from the hollow body's outer surface is discharged from the treatment device, so that these particles cannot redeposit on the hollow body's outer surface or the hollow body's inner surface.
[0041] According to a further development, a particle measuring device can be arranged in the discharge channel for determining the number of particles in the discharged cleaning fluid, in the first cleaning fluid discharged and / or in the second cleaning fluid discharged. The particle measuring device can be used to determine the number of particles contained in the discharged cleaning fluid, which allows a statement to be made about the progress of the cleaning process. The number of particles usually decreases as the cleaning time increases. A limit value can be defined for the number of particles. As soon as the number falls below this limit value, the cleaning process of the outer surface of the hollow body can be interrupted. This makes it possible to specify a certain degree of cleaning for the outer surface of the hollow body. Excessively long cleaning processes can be avoided.
[0042] A further embodiment stipulates that the cleaning device has a temperature control unit for temperature control of the cleaning fluid applied to the outer surface of the hollow body. The temperature control unit can be integrated into the feed device so that the cleaning fluid is heated or cooled accordingly on its way to the cleaning chamber. Due to the temperature changes, the hollow body and the particles adhering to the outer surface of the hollow body expand and contract. However, since the particles usually have a different coefficient of linear expansion than the hollow body, relative movements occur between the particles and the outer surface of the hollow body, which promotes the detachment of the particles from the outer surface of the hollow body. This promotes the cleaning process.
[0043] According to a further embodiment, the depositing device is mounted so as to be rotatable about a rotational axis and can be rotated by means of a drive motor. The rotational speed at which the hollow body deposited on the depositing device can be rotated can be selected to be high enough that any residues of the cleaning fluid still adhering to the outer surface of the hollow body are flung outwards due to the centrifugal force then acting. This is particularly helpful when water or another liquid is used as the cleaning fluid. This assists in removing the cleaning fluid from the outer surface of the hollow body.
[0044] One embodiment of the invention relates to a method for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for lithography masks, with a treatment device according to one of the previously discussed embodiments, comprising the following steps:
[0045] - Inserting the hollow body closed with the lid into the cleaning room with the gripping and moving device, and
[0046] - Supplying a cleaning fluid to the outer surface of the hollow body closed with the lid by means of the supply device, wherein the hollow body is o connected to the gripping and moving device during the supply of the cleaning fluid and is held by this in the cleaning space or o placed on the depositing device with the gripping and moving device and then separated from the gripping and moving device.
[0047] The technical effects and advantages that can be achieved with the present method correspond to those that have been discussed for the present cleaning device. In summary, it should be pointed out that the outer surface of the hollow body can be cleaned with the lid attached to the hollow body. This eliminates the need to separate the lid from the rest of the hollow body, which saves time. Furthermore, the outer surface of the hollow body can be cleaned when the gripping and moving device is connected to the hollow body ("on the fly"). It is therefore not necessary to place it in a defined position. The gripping and moving device can move the hollow body within certain limits while the outer surface of the hollow body is being cleaned, so that the cleaning fluid used can also reach hard-to-reach areas.Depending on the design, it is nevertheless possible to place the hollow body on the depositing device, which is particularly useful if the gripping and moving device is to be used to move other hollow bodies located in the treatment device while the outer surface of the hollow body is being cleaned. Placing the hollow body on the depositing device is also advisable if the hollow body is to be rotated around its own axis at high speed to throw away residues of the cleaning fluid used. Exemplary embodiments of the invention are explained in more detail below with reference to the attached drawings. They show:
[0048] Figure 1A is a schematic side view of a treatment device as known from the prior art,
[0049] Figure 1B a separate, principle representation of a hollow body to be treated,
[0050] Figure 2A is a highly simplified, basic side view of a proposed treatment device, which comprises a first embodiment of a cleaning device according to the invention,
[0051] Figure 2B is a separate schematic representation of the first embodiment of the cleaning device shown in Figure 2A along the section plane XX defined in Figure 2A,
[0052] Figure 3 is a schematic plan view of a second embodiment of the cleaning device according to the invention, analogous to the representation chosen in Figure 2B, and
[0053] Figure 4 is a schematic side view of a third embodiment of the cleaning device, analogous to the view chosen in Figure 2A.
[0054] Figure 1A shows a simplified representation of a treatment device 10 known from the prior art for treating pot-shaped hollow bodies 12. Figure 1B shows a separate representation of the hollow body 12. The treatment device 10 comprises a boundary wall 14 which encloses an interior space 16. Provided in the interior space 16 is a gripping and moving device 18 with which the hollow bodies 12 to be treated can be moved within the interior space 16. In addition, the interior space 16 contains a number of treatment units 20 which may be designed, for example, in the form of a washing device 22 and / or an evacuation device 24.
[0055] The boundary wall 14 forms a wall opening 26 which can be closed in a manner not shown in detail and through which the interior space 16 is accessible.
[0056] The treatment device 10 is operated in the following way: A hollow body 12 to be treated, which has a hollow body wall 28 which forms a hollow body opening 29 which can be closed by a cover 30, as well as a hollow body outer surface 32 and a hollow body inner surface 34 (see Figure 1B), is transported in a manner not shown in detail to the wall opening 26 and positioned such that the gripping and moving device 18 can grip the hollow body 12 using a correspondingly designed interface 36 and move it within the interior 16. The gripping and moving device 18 feeds the hollow body 12 to the washing device 22. Figure 1A shows a cover handling unit 38 with which the cover 30 can be connected to and separated from the rest of the hollow body 12. The lid handling unit 38 is then moved together with the lid 30 by approx.Rotated by 90° and consequently closes a process chamber opening 40 of the washing device 22. The hollow body 12, separated from the cover 30, is introduced into the washing device 22 through a further process chamber opening (not shown here). In the washing device 22, a washing fluid, in particular water, is applied to the hollow body inner surface 34 and the cover 30. Depending on the design of the washing device 22, it is also possible to apply the washing fluid to the hollow body outer surface 32.
[0057] After completion of the washing process, the hollow body 12 is removed from the washing device 22 using the gripping and moving device 18, the lid handling unit 38 is rotated into the position shown in Figure 1A and the hollow body 12 is reconnected to the lid 30.
[0058] The hollow body 12, together with the lid 30, is then fed to the evacuation device 24. This is largely carried out in the same way as for the washing device 22. In particular, the lid 30 is first separated from the hollow body 12. In the evacuation device 24, a negative pressure acting on the lid 30 and the hollow body 12 is applied, which leads to the evaporation of residues of the washing fluid used in the washing device 22.
[0059] After this process is completed, the lid 30 is reconnected to the hollow body 12 and moved to the wall opening 26 by the gripping and moving device 18. The cleaned hollow body 12, together with the lid 30, is removed from the interior 16 of the treatment device 10 and transported further. The hollow body 12 removed from the interior 16 can now be used for the transport and storage of semiconductor wafers (not shown here).
[0060] Figure 2A shows a treatment device 42 according to the present invention in a schematic side view. The essential structure of the treatment device 42 according to the invention is similar to that of the prior art treatment device 10 shown in Figure 1A, which is why only the essential differences will be discussed below.
[0061] The treatment device 42 according to the invention is equipped with a cleaning device 44 according to a first exemplary embodiment, which cleaning device is used to clean the outer surface 32 of the hollow body 12 (see Figure 1B). The cleaning device 44x is shown separately in Figure 2B using a basic sectional view along the sectional plane XX defined in Figure 2A, but without the hollow body 12 and without claim to graphic completeness or accuracy to scale. The cleaning device 44 comprises a side wall 46 which delimits a cleaning chamber 50 and which has a quadrangular cross-section in plan view. Consequently, the side wall 46 is closed in the sectional plane XX selected in Figure 2B.
[0062] The side wall 46 forms at least one device opening 48 through which the hollow body 12 closed by the cover 30 can be introduced into the cleaning chamber 50 by means of the gripping and moving device 18 for cleaning the hollow body outer surface 32. Furthermore, the cleaning device 44 is equipped with a feed device 52 with which a cleaning fluid can be introduced into the cleaning chamber 50. According to the first exemplary embodiment of the cleaning device 44x, the feed device 52 comprises a number of first outlet nozzles 54 for supplying a first cleaning fluid and a number of second outlet nozzles 56 for supplying a second cleaning fluid into the cleaning chamber 50. Consequently, two different cleaning fluids can be conveyed into the cleaning chamber 50, wherein the first cleaning fluid can be water, for example, and the second cleaning fluid can be air, for example.Both the first outlet nozzles 54 and the second outlet nozzles 56 communicate with through holes 58 penetrating the side wall 46, which in turn are connected to feed channels 60 which are also attached to the side wall 46.
[0063] As can be seen from Figure 2B, a total of four guide plates 62 are arranged in the cleaning chamber 50, which can be moved by means of a drive unit 64. The guide plates 62 can, for example, be raised and lowered and / or rotated by the drive unit 64.
[0064] The cleaning device 44 further has a bottom wall 66 in which an outlet opening 67 is arranged. The bottom wall 66 is placed on a bottom 68 of the treatment device 42. The bottom 68 has a number of openings 70 which open into a discharge channel 72 arranged underneath (see also Figure 1A). The cleaning device 44 is arranged such that the outlet opening 67 communicates with the openings 70. The cleaning fluid introduced into the cleaning chamber 50 through the outlet nozzles 54, 56 can be discharged from the treatment device 42 through the outlet opening 67, the openings 70 and the discharge channel 72.
[0065] A particle measuring device 74 is arranged in the discharge channel 72, with which the number of particles contained in the cleaning fluid can be determined.
[0066] The cleaning device 44 is operated in the following way: As already described with reference to Figure 1A, the hollow body 12 to be treated is gripped by the gripping and moving device 18 so that the hollow body 12 can be moved in the interior 16. Before the hollow body 12 is fed to the washing device 22 by means of the gripping and moving device 18, the hollow body 12 is introduced through the device opening 48 into the cleaning chamber 50 of the cleaning device 44, as shown in Figure 2A. The connection between the hollow body 12 and the gripping and moving device 18 is maintained. The cover 30 is also not separated from the hollow body 12. Figure 2A also shows that the gripping and moving device 18 dips slightly into the cleaning space 50 to ensure that the entire hollow body 12 is introduced into the cleaning space 50.Depending on the application, it may also be advantageous to only partially insert the hollow body 12 into the cleaning chamber 50. Then, the gripping and moving device 18 does not enter the cleaning chamber 50.
[0067] As can be seen from a comparison of Figures 1 and 2A, the gripping and moving device 18 of the treatment device 42 according to the invention is equipped with a cover unit 76 with which the device opening 48 can be at least partially covered. The cover unit 76 can, for example, have movable or foldable sheets 78. The sheets 78 can also serve as a stop and strike the side wall 46 from above, whereby an end position of the hollow body 12 in the cleaning chamber 50 can be defined and collisions of the hollow body 12, in particular with the bottom wall 66, can be avoided.
[0068] When the position shown in Figure 2A is reached, the first cleaning fluid is conveyed through the first outlet nozzles 54 as a result of the activation of conveying units (not shown) and applied to the hollow body outer surface 32, as indicated by the arrows in Figure 2A. The cover unit 76 prevents the first cleaning fluid from entering the interior 16 in an uncontrolled manner through the device opening 48. The hollow body 12 can be moved by the gripping and moving device 18 in the cleaning space 50 while the first cleaning fluid is applied to the hollow body outer surface 32. An up and down movement, a rotary movement, a sideways movement and / or a combination of these movements can be carried out. The movement can be selected largely freely, as long as there is no collision between the hollow body 12 and the cleaning device 44x.
[0069] The first cleaning fluid sweeps over the hollow body outer surface 32 and carries away particles deposited thereon. The outlet nozzles 54, the cover unit 76 and the guide plates 62 impose a flow on the first cleaning fluid towards the outlet opening 67, as a result of which the first cleaning fluid laden with the particles is discharged from the cleaning device 44x and the treatment device 42 through the outlet opening 67, the openings 70 and the discharge channel 72. In this case, a given volume unit of the cleaning fluid passes through the particle measuring device 74, with which the number of particles contained in the relevant volume unit is determined. This determination is continued with subsequent volume units. As soon as a certain limit value for the determined number of particles is undershot, the supply of the first cleaning fluid can be stopped.The second cleaning fluid can then be applied to the outer surface 32 of the hollow body through the second outlet nozzles 56. This is done in a similar way to the first cleaning fluid. After the supply of the second cleaning fluid has ended, the hollow body 12 is removed from the cleaning device 44x and fed to the washing device 22 and the evacuation device 24 as described for Figure 1A. After the treatment steps carried out there have been completed, the hollow body 12 is moved by the gripping and moving device 18 to the wall opening 26, from where the cleaned hollow body 12 together with the lid 30 is discharged from the interior 16 of the cleaning device 44 and transported further.
[0070] Alternatively, the hollow body 12 closed by the lid 30 can only be fed to the cleaning device 44 after the treatment steps performed in the washing device 22 and the evacuation device 24 have been completed. It is also possible to feed the hollow body 12 closed by the lid 30 to the cleaning device 442 both before and after the treatment steps performed in the washing device 22 and the evacuation device 24.
[0071] Figure 3 shows a second exemplary embodiment of the cleaning device 442 using a basic plan view. The essential structure of the cleaning device 442 according to the second exemplary embodiment corresponds to that of the cleaning device 442 of the first exemplary embodiment, so that only the differences will be discussed below. While the cleaning device 442 according to the first exemplary embodiment has a closed side wall 46 with four sections, the cleaning device 442 according to the second exemplary embodiment comprises a first side wall 462 and a second side wall 462, which run parallel and are arranged at a distance from one another on the base 68 of the treatment device 42. Consequently, the device opening 48 extends not only within the drawing plane of Figure 3, but also perpendicular thereto.It is therefore possible to introduce the hollow body 12 into the cleaning chamber 50 not only from above, but also from the side. The movement of the gripping and moving device 18 required for this purpose can be simplified. The cleaning device 442 according to the second embodiment does not have a bottom wall 66.
[0072] In addition, the cleaning device 442 according to the second embodiment has a number of outlet nozzles 80 through which only one cleaning fluid, for example air, can be introduced into the cleaning chamber 50. In the second embodiment shown, the outlet nozzles 80 of the first side wall 462 are again connected to a common supply channel 60 using the through holes 58. The same applies to the outlet nozzles 80 of the second side wall 462. A temperature control unit 81 is arranged in the common supply channel 60, with which the temperature of the cleaning fluid can be changed.
[0073] The volume flow through each outlet nozzle 54, 56 can be individually adjusted in the cleaning device 442 according to the first exemplary embodiment and, in particular, switched on or off earlier or later than with other outlet nozzles 54, 56. In addition, the cleaning device 442 according to the first exemplary embodiment can also be equipped with the temperature control unit 81, so that the cleaning fluid can be individually temperature-controlled on the way to each outlet nozzle 54, 56. The individual adjustment of the cleaning fluid with regard to the aforementioned variables at each of the outlet nozzles 54, 56 is not provided for in the cleaning device 442 according to the second exemplary embodiment. However, the equipment complexity is simplified due to the common feed channel 60 in the second exemplary embodiment. Figure 4 shows a third exemplary embodiment of the cleaning device 443 according to the invention, analogous to the representation selected in Figure 2A.For reasons of clarity, components of the treatment device 42, in particular the gripping and moving device 18, are not shown. The cleaning device 443 according to the third exemplary embodiment largely corresponds to the cleaning devices 443, 442 according to the first and second exemplary embodiments, which is why only the essential differences will be discussed below.
[0074] The cleaning device 443 according to the third embodiment is equipped with a storage device 82 on which the hollow body 12 can be placed. For this purpose, the hollow body 12 is introduced into the cleaning chamber 50 by the gripping and moving device 18 until the hollow body 12 comes into contact with the storage device 82. Subsequently, the contact between the gripping and moving device 18 and the hollow body 12 is broken.
[0075] In the illustrated embodiment of the cleaning device 443, the hollow body 12 with the cover 30 is placed on the depositing device 82, wherein it is also possible to place the hollow body 12 with the hollow body wall 28 (see Figure 1B) on the depositing device 82. The depositing device 82 is arranged adjacent to the base wall 66 and has a frame structure with rod- or beam-like supports, which is designed such that it impedes the flow of the cleaning fluid as little as possible. In particular, it is ensured that the cover 30 can be easily supplied with the cleaning fluid. It may be advisable for the frame structure to provide at least three circular support points on which the hollow body 12 can be placed. The depositing device 82 can be fastened in the cleaning chamber 50.In the illustrated embodiment of the treatment device 42, however, the storage device 82 is rotatably mounted in the base 68 of the treatment device 42 and can be rotated about a rotation axis D by means of a drive motor 84. As a result of this rotation, the hollow body 12 deposited on the storage device 82 can be rotated, whereby the supply of the cleaning fluid to hard-to-reach areas of the hollow body outer surface 32 can be improved.
[0076] Not shown is an embodiment in which the already mentioned temperature control unit 81 (see Figure 3) is provided in order to change the temperature of the supplied cleaning fluid.
[0077] In the illustrated embodiment of the treatment device 42, the support points are formed by hold-down devices 88 designed as suction cups 86, which serve to fix the hollow body 12 during application of the cleaning fluid. The hold-down devices 88 can also be designed in a different way, for example in the form of clamps. Thus, fixing arms or the like, which can engage the hollow body 12 from above or from the side, can ensure the fixation of the hollow body 12 during application of the cleaning fluid (not shown).
[0078] As mentioned, the storage device 82 can be rotated about the rotation axis D by the motor 84. In order to prevent the hollow body 12 from slipping on the storage device 82 due to imbalance or other reasons during rotation, holding rods 96 are provided which come into contact with, or almost into contact with, the hollow body wall 28 when the hollow body 12 is placed on the storage device 82. The holding rods 96 can also be connected in a basket-like manner to a net (not shown here).
[0079] Furthermore, the cleaning device 443 according to the third exemplary embodiment has a closure unit 90 with which the cleaning chamber 50 can be closed, in particular when the hollow body 12 has been introduced into the cleaning chamber 50 and is to be subjected to the cleaning fluid. The closure unit 90 shown here has a closure body 92 which is rotatably fastened to the side wall 46 of the cleaning device 443 by means of a fastening means 94 (not shown in detail). The fastening means 94 can comprise a hinge. Furthermore, an adjusting device (not shown) can be provided with which the closure unit 90 can be moved to open and close the device opening 48.
[0080] The hollow body 12 is introduced into the cleaning chamber 50 with the gripping and moving device 18 and placed on the depositing device 82 when the closure unit 90 is in an open position (not shown). The hold-down devices 88 are then activated and the gripping and moving device 18 is separated from the hollow body 12. As soon as the gripping and moving device 18 has left the cleaning device 443, the closure unit 90 can be moved into the closed position, as shown in Figure 4. The cleaning fluid can now be applied to the hollow body outer surface 32. As mentioned, a first cleaning fluid, for example water, can be introduced into the cleaning chamber 50 through the first outlet nozzles 54 and a second cleaning fluid, for example air, can be introduced through the second outlet nozzles 56.The hollow body 12 can be rotated by the depositing device 82 before or during the supply of the second cleaning fluid so rapidly that water residues are thrown away from the hollow body's outer surface 32. The retaining rods prevent the hollow body 12 from slipping during the rotation.
[0081] After cleaning of the hollow body's outer surface 32 is completed, the closure unit 90 is moved into the open position. The hollow body 12 is removed from the cleaning chamber 50 with the gripping and moving device 18 and forwarded for further treatment.
[0082] Not shown is an embodiment of the closure unit 90 which can be placed in the closed position even when the gripping and movement device 18 is still connected to the hollow body 12 (see Figure 2A). The closure body 92 can have corresponding cutouts for this purpose and can be pushed toward the gripping and movement device 18.
[0083] The closure unit 90 ensures that at least part of the cleaning fluid cannot escape uncontrollably through the device opening 48 from the cleaning chamber 50 of the cleaning device 443.
[0084] While a change in the temperature of the supplied cleaning fluid can be provided in all of the illustrated embodiments of the cleaning device 44, the rotation of the hollow body 12 about its own axis to expel residues of the cleaning fluid from the hollow body outer surface 32 is only possible in the embodiment shown in Figure 4. Although the hollow body 12 can also be rotated about its own axis with the gripping and moving device 18, that is to say when the hollow body is connected to the gripping and moving device 18, the achievable rotational speed is too low to be able to remove residues of the cleaning fluid to any appreciable extent from the hollow body outer surface 32.
[0085] Reference symbol list
[0086] 10 Treatment device according to the state of the art
[0087] 12 hollow bodies
[0088] 14 Boundary wall
[0089] 16 Interior
[0090] 18 Gripping and movement device
[0091] 20 treatment units
[0092] 22 Washing facility
[0093] 24 evacuation facility
[0094] 26 Wall opening
[0095] 28 Hollow body wall
[0096] 29 Hollow body opening
[0097] 30 lids
[0098] 32 Hollow body outer surface
[0099] 34 Hollow body inner surface
[0100] 36 Interface
[0101] 38 Lid handling unit
[0102] 40 Process room opening
[0103] 42 Treatment device
[0104] 44 Cleaning device
[0105] 442Cleaning device
[0106] 442Cleaning device
[0107] 443 Cleaning device
[0108] 46 side wall
[0109] 462first side wall
[0110] 462second side wall
[0111] 48 Device opening
[0112] 50 Cleaning chamber 2 Feeding device 4 First outlet nozzle 6 Second outlet nozzle 8 Through hole
[0113] 60 feed channel
[0114] 62 guide plate
[0115] 64 drive unit
[0116] 66 floor wall
[0117] 67 Exit opening
[0118] 68 Floor
[0119] 70 Breakthrough
[0120] 72 discharge channel
[0121] 74 Particle measuring device
[0122] 76 Cover unit
[0123] 78 sheet metal
[0124] 80 outlet nozzle
[0125] 81 Temperature control unit
[0126] 82 Storage device
[0127] 84 Drive motor
[0128] 86 suction cup
[0129] 88 hold-down clamps
[0130] 90 locking unit
[0131] 92 locking bodies
[0132] 94 fasteners
[0133] 96 support rods
[0134] D axis of rotation
Claims
Patent claims 1. Cleaning device (44) for cleaning pot-shaped hollow bodies (12), in particular transport containers for semiconductor wafers or for lithography masks, wherein - the hollow body (12) has a hollow body wall (28) which o forms a hollow body opening (29) which can be closed or is closed by a cover (30), and o forms a hollow body outer surface (32), wherein - the cleaning device (44) o at least one side wall (46) which delimits a cleaning chamber (50), wherein o the side wall (46) forms at least one device opening (48) through which the hollow body (12) closed with the lid (30) can be introduced into the cleaning chamber (50) by means of a gripping and moving device (18) for cleaning the hollow body outer surface (32), and o at least one supply device (52) for supplying a cleaning fluid to the hollow body outer surface (32) of the hollow body (12) closed with the lid (30), wherein - the device opening (48) is designed such that the gripping and moving device (18) at least partially projects into the cleaning chamber (50) or is flush with the device opening (48) at least during the supply of the cleaning fluid and / or - a storage device (82) is arranged in the cleaning chamber (50), on which the gripping and moving device (18) places the Hollow body (12) for supplying the cleaning fluid. Cleaning device (44) according to claim 1, characterized in that the supply device (52) comprises a number of outlet nozzles (54, 56, 80) pointing towards the cleaning chamber (50) or opening into the cleaning chamber (50). Cleaning device (44) according to claim 2, characterized in that the outlet nozzles (54, 56, 80) arranged in the side wall (46) comprise through holes (58) or are formed by them. Cleaning device (44) according to claim 2, characterized in that - the feed device (52) has through holes (58) arranged in the side wall (46) and - the outlet nozzles (54, 56, 80) are attached to the side wall (46) in fluid communication with the through holes (58) and open into the cleaning chamber (50). Cleaning device (44) according to one of claims 2 to 4, characterized in that the supply device (52) comprises a number of supply channels (60) communicating with the outlet nozzles (54, 56, 80), with which the cleaning fluid can be guided to the outlet nozzles (54, 56, 80). Cleaning device (44) according to claims 3 and 5 or 4 and 5, characterized in that the feed channels (60) are attached to the side wall (46) and communicate with the through holes (58). Cleaning device (44) according to one of claims 2 to 6, characterized in that the supply device (52) has a number of first outlet nozzles (54) for supplying a first cleaning fluid and a number of second outlet nozzles (56) for supplying a second cleaning fluid into the cleaning chamber (50). Cleaning device (44) according to one of the preceding claims, characterized in that the cleaning device (44) has a number of guide plates (62) arranged in the cleaning chamber (50) or cooperating with the guide plates for guiding the cleaning fluid within the cleaning chamber (50). Cleaning device (44) according to claim 8, characterized in that the guide plates (62) are adjustable by means of a drive unit (64). Cleaning device (44) according to one of the preceding claims, characterized in that the cleaning device (44) has a closure unit (90) with which the device opening (48) can be at least partially closed.Cleaning device (44) according to one of the preceding claims. characterized in that the cleaning device (44) has at least one outlet opening (67) communicating with the cleaning chamber (50), through which outlet opening the cleaning fluid or the first cleaning fluid and the second cleaning fluid can be discharged from the cleaning chamber (50). Cleaning device (44) according to one of the preceding claims, characterized in that the cleaning device (44) has a temperature control unit (81) for temperature control of the cleaning fluid applied to the hollow body outer surface (32). Cleaning device (44) according to one of the preceding claims, characterized in that the storage device (82) is rotatably mounted about an axis of rotation (D) and is rotatable by means of a drive motor (84).Treatment device (42) for treating pot-shaped hollow bodies (12), in particular transport containers for semiconductor wafers or for lithography masks, comprising a boundary wall (14) which encloses an interior space (16), a gripping and moving device (18) arranged in the interior space (16) for moving the hollow body (12) within the interior space (16), and a wall opening (26) formed by the boundary wall (14), through which the interior space (16) is accessible, at least one treatment unit (20) for treating the hollow body (12), and. a cleaning device (44) according to one of the preceding claims, wherein the hollow body (12) closed by the cover (30) is connected to the gripping and moving device (18) during the supply of the cleaning fluid and is introduced into the cleaning chamber (50) by the gripping and moving device (18), removed from the cleaning chamber (50) and held in the cleaning chamber (50) by the gripping and moving device (18) during the supply of the cleaning fluid, wherein - the device opening (48) is designed such that the gripping and moving device (18) at least partially projects into the cleaning chamber (50) or is flush with the device opening (48), at least during the supply of the cleaning fluid. Treatment device (42) according to claim 14, characterized in that the gripping and moving device (18) has a covering unit (76) for at least partially covering the device opening (48) during the supply of the cleaning fluid. Treatment device (42) according to one of claims 14 or 15, characterized in that the treatment device (42) has a discharge channel (72) for discharging the cleaning fluid or the first cleaning fluid and the second cleaning fluid, wherein the discharge channel (72) communicates with the outlet opening (67).Treatment device (42) according to claim 16, characterized in that in the discharge channel (72) a particle measuring device (74) for determining the number of im. discharged cleaning fluid, in the discharged first cleaning fluid and / or in the discharged second cleaning fluid.
18. A method for cleaning pot-shaped hollow bodies (12), in particular transport containers for semiconductor wafers or for lithography masks, with a treatment device (42) according to one of claims 11 to 14, comprising the following steps: - introducing the hollow body (12) closed with the lid (30) into the cleaning chamber (50) with the gripping and moving device (18), and - feeding a cleaning fluid onto the hollow body outer surface (32) of the hollow body (12) closed with the lid (30) by means of the feeding device (52), wherein the hollow body (12) during the feeding of the cleaning fluid o is connected to the gripping and moving device (18) and is held by this in the cleaning space (50) or o is held with the gripping and moving device (18) on the depositing device (82) and then separated from the gripping and moving device (18).