Photovoltaic module and manufacturing process

Abstract

Photovoltaic Module and Manufacturing Process A photovoltaic module (M) comprising a front face (41) and a rear face (42), the photovoltaic module comprising a multilayer stack including at least: - a first transparent glass protective layer (3), - an encapsulant (2) made of polymer material, for example a transparent elastomer, in which at least one photovoltaic cell (20), or even several photovoltaic cells (20), is encapsulated or coated, - a second protective layer (1), and - at least one barrier layer (30), disposed between the transparent glass protective layer (3) and the encapsulant (2), the barrier layer (30) comprising at least 95% by mass of SiOxNy, with x + y = 2. Figure for the abbreviation: Fig. 3

Description

Title of the invention: Photovoltaic module and manufacturing process. Technical field

[0001] The present invention relates to a photovoltaic module and a method for manufacturing such a module. The photovoltaic module comprises at least one photovoltaic cell embedded in an encapsulant comprising a polymer material. Prior art

[0002] A photovoltaic module comprises one or more photovoltaic cells designed to convert solar energy into electrical energy. Such a photovoltaic module containing one or more photovoltaic cells, for example silicon heterojunction (SHJ) cells, is sensitive to humidity. Humidity can cause the migration of certain salts, ions, or soluble substances present in the glass to the photovoltaic cell(s).

[0003] It is known to use a layer of SiOx deposited on the front and back faces of the SHJ photovoltaic cell to prevent contamination by sodium from the glass. However, this solution requires that the SiOx deposits be made on both faces of the SHJ photovoltaic cells to obtain complete protection of the cell in a glass-on-glass configuration.

[0004] US patent application 2011 / 0094781 teaches how to prevent the diffusion of sodium from glass to electronic devices in contact with glass by means of a film. The film is deposited by a hydrolysis-condensation reaction of a mixture of methyltrialkoxysilane and tetraalkoxysilane at a temperature of 400 °C or less. The resulting film is placed between the glass and the device to be protected, in contact with both.

[0005] However, there is a need to further improve and facilitate the protection of a photovoltaic module, and to improve its durability, particularly in a humid environment, for example, a hot and humid environment. Description of the invention

[0006] The present invention meets all or part of this need and thus relates to a photovoltaic module, comprising a front face and a rear face, the photovoltaic module comprising a multilayer stack including at least: - a first transparent protective layer of glass, in particular arranged on the front face, - an encapsulant made of polymer material, for example of the transparent elastomer type, in which at least one photovoltaic cell, or even several photovoltaic cells, are encapsulated or coated. - a second protective layer, notably located on the rear face of the module, particularly made of glass or multilayer polymers defining a rear face known as the "backsheet", and - at least one barrier layer, arranged between the transparent glass protective layer and the encapsulant, the barrier layer comprising at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y.

[0007] Certain salts, ions, or soluble substances present in the glass layer(s) may migrate toward the photovoltaic cells, particularly under humid conditions, and cause degradation of the photovoltaic cells. The mechanism by which ions are released from the glass is called leaching. The use of the barrier layer according to the invention advantageously prevents such contamination, especially when the photovoltaic module is placed in a humid environment. In particular, the barrier layer blocks the diffusion of moisture and the migration of salts, ions, or soluble substances, especially sodium ions, from the glass toward the photovoltaic cells.Thus, the invention makes it possible to improve the durability of the photovoltaic module against DH (damp-heat) degradation and possibly against PID (Potential Induced Degradation) which can be responsible for the migration of sodium ions towards the photovoltaic cell. Summary of the invention Photovoltaic module

[0008] The photovoltaic module thus comprises one or more photovoltaic cells arranged between a front face and a rear face separated by a slice of the photovoltaic module, and which are electrically connected to each other by connecting conductors and immersed in a layer of encapsulant or between two front and rear layers of encapsulant material both forming the encapsulant.

[0009] The first transparent protective glass layer can be positioned on the front face of the module. Alternatively, the first transparent protective glass layer can be positioned on the rear face of the module.

[0010] The second protective layer can be arranged on the rear face of the module, in particular being made of glass or based on multilayer polymers defining a rear face.

[0011] The protective layer forming the front face can be made of one or more transparent materials chosen from the following list, which is not limiting: glass, composite material, plastic material, polymer.

[0012] The protective layer forming the back face can be made of one or more materials chosen from the following, which is not exhaustive: glass, composite material, plastic, polymer, metals. If both protective layers are made of glass, it is called a double-glass module.

[0013] At least one of the two protective layers may be made of glass. The glass protective layer may be located on the front face. The glass protective layer may be located on the rear face. In one embodiment, both protective layers are made of glass.

[0014] The rear face can be transparent or non-transparent.

[0015] The barrier layer may comprise at least 96% by mass of SiOxNy, or even at least 97%, or even at least 98%, or preferably at least 99% by mass of SiOxNy. The barrier layer may, in particular, be made of SiOxNy.

[0016] The values ​​of x and y can vary respectively within the intervals [0; 2] and [0; 2]. The values ​​of x and y can be 0 and 2, or 1 and 1, or 2 and 0, respectively. The values ​​of x and y can be non-integers. The values ​​of x and y can be decimal numbers.

[0017] The barrier layer may consist solely of SiOx, in particular with x=2. Alternatively, the barrier layer may consist solely of SiNy, in particular with y=2.

[0018] In one embodiment, x may be non-zero, x > y, and x + y = 2. The values ​​of x and y may vary respectively in the intervals ]0; 2] and [0; 2[. The values ​​of x and y may be 1 and 1, or 2 and 0, respectively. The values ​​of x and y may not be integers. The values ​​of x and y may be decimal numbers.

[0019] The barrier layer may not consist solely of SiN2.

[0020] The barrier layer may comprise at least 96% by mass of SiO2, or even at least 97%, or even at least 98%, or better yet at least 99% by mass of SiO2. The barrier layer may consist solely of SiO2.

[0021] In one embodiment, the barrier layer may comprise 57% of O2, 39% of Si and 4% of N.

[0022] The barrier layer may be continuous. The barrier layer may have a substantially uniform thickness. The barrier layer may be conforming, completely covering the transparent protective glass layer without leaving any portion of the transparent protective glass layer uncovered.

[0023] The thickness of the barrier layer can be greater than 50 nm, or even greater than 70 nm, or even greater than 80 nm, or even greater than 90 nm, better than greater than 100 nm, being for example in the order of 110 to 150 nm.

[0024] The thickness can thus be sufficient to constitute a barrier to the migration of certain species, in particular sodium ions, from the protective glass layer to the encapsulant and the photovoltaic cell(s).

[0025] The thickness can also be chosen so as not to affect the transparency of the multilayer stack.

[0026] The thickness of the barrier layer can be less than 250 nm, or even less than 200 nm, or even less than 180 nm, better less than 160 nm, or even less than 150 nm.

[0027] The thickness can be uniform or substantially uniform over the entire coated surface.

[0028] The transparency of the barrier layer may be sufficient. In one embodiment, the transmittance of the barrier layer deposited on the protective glass layer, by measuring the transmittance of glass+SiO, can be on the order of 92% above 400 nm. Encapsulating

[0029] The encapsulant can be formed from at least one front film and / or one back film. It can comprise a single film on one side of the photovoltaic cell(s), or alternatively, two films on either side thereof. The films can be similar or different, in particular with respect to their material and / or thickness.

[0030] The encapsulant can completely surround the photovoltaic cell(s).

[0031] Alternatively, the encapsulant can cover the photovoltaic cell(s) on only one side thereof.

[0032] By the term "encapsulating" or "encapsulated", it is to be understood that the photovoltaic cell(s) are arranged in a volume, for example hermetically sealed with respect to liquids and gases, at least partly formed by at least two films of encapsulating material(s), joined together after lamination to form the encapsulating assembly.

[0033] Indeed, initially, that is to say before any lamination operation, the encapsulant consists of at least two films of encapsulating material(s), between which the plurality of photovoltaic cells is encapsulated.

[0034] However, during the film lamination operation, the encapsulation material films melt to form, after the lamination operation, only one solidified assembly in which the photovoltaic cells are embedded or coated.

[0035] The encapsulant may comprise at least one polymer-type encapsulating material selected from: acid copolymers, ionomers, poly(ethylene- vinyl acetate) (EVA), vinyl acetals, such as polyvinyl butyrals (PVB), polyurethanes, polyethylenes, such as linear low-density polyethylenes, polyolefin copolymer elastomers, α-olefin copolymers and α-,[3-ethylenic carboxylic acid esters, such as ethylene-methyl acrylate copolymers and ethylene-butyl acrylate copolymers, silicone elastomers and / or crosslinked thermoplastic polyolefin based elastomers.

[0036] In one embodiment, the encapsulant can be chosen from the following list, which is not exhaustive: EVA, POE.

[0037] The encapsulant may, for example, be different from EVA.

[0038] The thickness of the encapsulant can be greater than 200 nm, or even greater than 250 nm, or even greater than 300 nm, better greater than 350 nm, being for example in the order of 400 to 500 nm. Barrier diapers

[0039] In one embodiment, the photovoltaic module may comprise a single barrier layer as described above.

[0040] The barrier layer can be arranged between the transparent glass protective layer on the front face and the encapsulant. Alternatively, it can be arranged between the glass protective layer on the rear face and the encapsulant.

[0041] Alternatively, in particular where the photovoltaic module has a transparent glass protective layer on the front face and a glass protective layer on the rear face, the photovoltaic module may have at least two barrier layers, each disposed between one of the protective layers and the encapsulating layer, each of the barrier layers having at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y, and in particular with x non-zero, x>yetx + y = 2, in particular for the barrier layer disposed on the front face side.

[0042] In one embodiment, the photovoltaic module may comprise two barrier layers. The two barrier layers may be similar or different, in particular with regard to their composition and / or thickness.

[0043] One or both barrier layers may include one or more of the characteristics mentioned above with reference to the barrier layer.

[0044] The barrier layer on the rear face of the photovoltaic module may be thicker and / or contain a higher proportion of nitrogen. Such a barrier layer may be more resistant.

[0045] The barrier layer on the rear side of the photovoltaic module may comprise at least 95% by mass of SiOxNy, with x + y = 2, and in particular y > x. The barrier layer on the rear side of the photovoltaic module may comprise at least 96% by mass of SiN2, or even at least 97%, or even at least 98%, preferably at least 99% by mass of SiN2. The barrier layer may consist solely of SiN2.

[0046] The barrier layer on the front face of the photovoltaic module may be thinner and / or contain a lower proportion of nitrogen. Such a barrier layer may be more transparent.

[0047] The barrier layer on the front face of the photovoltaic module may comprise at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y. The barrier layer on the front face of the photovoltaic module may comprise at least 96% by mass of SiO2, or even at least 97%, or even at least 98%, or preferably at least 99% by mass of SiO2. The barrier layer may consist solely of SiO2.

[0048] At least one, or even all, photovoltaic cells may be silicon and / or perovskite cells. In one embodiment, at least one, or even all, photovoltaic cells are silicon heterojunction cells, known as SHJ cells. Such cells may be sensitive to humidity. The use of the barrier layer according to the invention prevents these SHJ cells from being contaminated by degradation due to humidity, particularly from the transparent glass protective layer(s).

[0049] In one embodiment, the transparent protective glass layer(s) containing sodium. The sodium present in the glass layer(s) may migrate towards the photovoltaic cells, particularly under humid conditions, and cause cell degradation. The use of the barrier layer according to the invention advantageously prevents such contamination.

[0050] The transparent protective glass layer(s) may be textured, for example featuring micro-reliefs. Manufacturing process

[0051] The invention also relates, independently or in combination with the above, to a method of manufacturing a photovoltaic module as described above.

[0052] Alternatively, the invention relates, independently or in combination with the foregoing, to a method for manufacturing a photovoltaic module, comprising a front face and a rear face, the photovoltaic module comprising a multilayer stack including at least: - a first protective transparent layer of glass, notably positioned on the front face, - an encapsulant made of polymer material, for example of the transparent elastomer type, in which at least one photovoltaic cell, or even several photovoltaic cells, are encapsulated or coated, and - a second protective layer, in particular arranged on the rear face of the module, in particular made of glass or based on multilayer polymers defining a rear face, transparent or non-transparent, process in which a barrier layer is deposited on the transparent glass protective layer, arranged between the transparent glass protective layer and the encapsulant, the barrier layer comprising at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y, and in particular with x non-zero, x>yetx + y = 2, then the transparent glass protective layer is stacked on the encapsulant.

[0053] The photovoltaic module may include one or more of the characteristics mentioned above with reference to the photovoltaic module and the barrier layer.

[0054] The stack can be laminated with the photovoltaic cell(s), for example at 160°C for a period of 18 min.

[0055] The barrier layer according to the invention can be put in place during the manufacture of the photovoltaic device.

[0056] The stacking is carried out by placing the barrier layer between the transparent glass protective layer and the encapsulant. The glass protective layer is oriented in the stack so that the barrier layer is positioned towards the encapsulant of the photovoltaic cell(s).

[0057] In the invention, the barrier layer is deposited on the transparent glass protective layer(s), and not on the photovoltaic cell(s).

[0058] The barrier layer is deposited before the multilayer stacking of the photovoltaic module. Thus, the transparent glass protective layer(s) incorporate a barrier layer from the manufacturing stage, thereby improving the durability of the photovoltaic module.

[0059] The deposition of the barrier layer can be carried out for a period of between 5 and 45 minutes, or even between 7 and 40 minutes, or even between 9 and 30 minutes, better between 10 and 25 minutes, being for example in the order of 12 to 20 minutes.

[0060] The choice of the deposition time may depend on the desired layer thickness, as well as the chosen pressure.

[0061] The deposition time may be sufficient to allow the deposition of a barrier layer of sufficient thickness, with a sufficient quantity of material deposited to obtain satisfactory protection.

[0062] The deposition time may not be too long in order to avoid limiting the transparency of the barrier layer, and also to avoid the manufacturing process being too long.

[0063] The barrier layer can be deposited using a deposition technique chosen from the following, which is not exhaustive: physical vapor deposition (in PVD (physical vapor deposition), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD), atmospheric pressure chemical vapor deposition (APCVD).

[0064] The barrier layer can be deposited by chemical vapor deposition of N2O and SiH4 gases. The ratio of the N2O flow rate to the SiH4 flow rate can be between 8 and 30, for example, on the order of 13 to 14. The flow rate can be measured in standard cubic centimeters per minute (sccm). The N2O flow rate can be between 200 sccm and 10,000 sccm, for example, on the order of 6,000 sccm. The SiH4 flow rate can be between 200 sccm and 2,000 sccm, for example, on the order of 450 sccm.

[0065] The pressure can be between 66 Pa and 267 Pa, for example being on the order of 120 Pa.

[0066] The temperature can be between 100°C and 500°C, for example being around 450°C. Brief description of the drawings

[0067] The invention will be better understood upon reading the detailed description that follows, the non-limiting examples of embodiments thereof, and upon examination of the accompanying drawing, on which:

[0068] [Fig-1] Fig. 1 is a schematic and partial perspective view of a module photovoltaics.

[0069] [Fig.2] Fig.2 is a schematic and partial cross-sectional view of the module photovoltaic of the [Fig.l].

[0070] [Fig. 3] [Fig. 3] is a schematic and partial cross-sectional view of the module photovoltaic of the [Fig.l].

[0071] [Fig.4] Fig.4 is a schematic and partial cross-sectional view of a variant of realization.

[0072] [Fig. 5] Fig. 5 is a schematic and partial cross-sectional view of a variant of realization.

[0073] [Fig.6] Fig.6 illustrates, schematically and partially, the deposition of the layer barrier.

[0074] [Fig.7] Figure [Fig.7] illustrates the evolution of the maximum power Pmax as a function of the aging time and depending on the thickness of the barrier layer deposit. Detailed description

[0075] Figures 1 to 3 illustrate a photovoltaic module M comprising a front face 41 and a rear face 42, the photovoltaic module comprising a stack multilayer comprising several superimposed layers assembled together, as follows: - A first protective layer 3 on the front; this first protective layer 3 being made of glass, for example tempered transparent glass approximately 2 to 3 mm thick, - A second protective layer 1 (commonly called "backsheet") on the back face; this second protective layer 1 is usually made of glass or multi-layer polymers; it can be opaque or transparent, single-layer or multi-layer; - A third encapsulant layer 2, called the intermediate layer, intercalated between the first layer and the third layer, described below, allowing the assembly of one side of the first protective layer 3 and the other side of the second protective layer 1; this intermediate layer comprising one or more photovoltaic cells 20, the electrical connector 22 and an encapsulant 21 arranged around the photovoltaic cells.

[0076] It should be noted that in the accompanying figures, the photovoltaic module M is shown upside down, so that its rear face is on top and its front face is on the bottom. For the sake of clarity in the figures, the different layers of the module are not shown to scale. For example, the second protective layer 1 may be a few hundred micrometers thick, for example about 350 µm, the third layer 2 may be up to 1 mm thick, and the first protective layer 3 may be about 3 to 4 mm thick.

[0077] In the following description, the front face of the photovoltaic module M corresponds to a face of the module receiving light rays, and the rear face corresponds to the face opposite the front face. The two protective layers 1 and 3 may have a stiffening function and / or a surface protection function.

[0078] The second protective layer 1 can, in particular, provide gas and water impermeability, electrical protection / insulation, and mechanical protection. This second protective layer 1 can be made of glass or a fluoropolymer. It could be polyvinyl fluoride (PVF), for example, marketed under the name TEDLAR (registered trademark) by DuPont (registered trademark). Without limitation, the second layer 1 can itself be composed of a stack of several layers: a PVF layer, a PET (polyethylene terephthalate) layer, and another PVF layer.

[0079] In the intermediate layer 2, the encapsulant 21 is, for example, of the transparent elastomer type, being, for example, made of a polymer such as EVA (Ethylene-Vinyl Acetate) or POE, forming a material to which the second protective layer 1 on one side and first protective layer 3 on the other side and allow the assembly of the three layers together.

[0080] The three layers can be assembled together by hot rolling, so that the first layer and the second layer adhere to the encapsulating material 21, thus forming a monobloc stack.

[0081] In the intermediate encapsulating layer 2, the photovoltaic cells 20 are connected to each other in series / parallel, forming several strings of cells. Electrical connection elements 22, for example made of copper or silver, provide the electrical connections between the cells 20 in each string.

[0082] The photovoltaic module M may include a frame (not shown), for example made of aluminium, arranged around the periphery of the stack to stiffen the module M.

[0083] The photovoltaic module M further comprises at least one barrier layer 30, disposed between the transparent glass protective layer and the encapsulant, the barrier layer 30 comprising at least 95% by mass of SiOxNy, with x + y = 2.

[0084] In a particular case, we can have x non-zero, x>yetx + y = 2. The values ​​of x and y can vary respectively in the intervals ]0 ;2] and [0 ;2[. The values ​​of x and y can be respectively 1 and 1 or 2 and 0. The values ​​of x and y can be decimal numbers.

[0085] As can be seen schematically in [Fig.3], the barrier layer 30 is substantially continuous and has a substantially uniform thickness e, which can be on the order of 110 to 150 nm.

[0086] In addition, the thickness h of the encapsulant can be, for example, on the order of 400 to 500 nm.

[0087] In the embodiment of [Fig.3], the photovoltaic module comprises a single barrier layer, which is disposed between the transparent glass protective layer 3 located on the front face and the encapsulant 2.

[0088] In a variant illustrated in [Fig. 4], the photovoltaic module comprises a transparent glass protective layer 3 on the front face and a glass protective layer 1 on the rear face. The photovoltaic module M then comprises two barrier layers 30, each disposed between one of the glass protective layers 1, 3 and the encapsulating layer 2, each barrier layer comprising at least 95% by mass of SiOxNy, with x + y = 2, and in a particular case with non-zero x, x > y and x + y = 2. The two barrier layers 30 may be similar or different, in particular with respect to their composition and / or thickness.

[0089] In the embodiments just described, the encapsulant 2 completely surrounds the photovoltaic cell(s) 20.

[0090] Alternatively, as illustrated in [Fig. 5], the encapsulant 2 covers the photovoltaic cell(s) 20 on only one side thereof. The photovoltaic module M of [Fig. 5] also comprises two barrier layers 30, each disposed between one of the protective glass layers 1, 3 and the encapsulant 2.

[0091] In the embodiments just described, the photovoltaic cell(s) 20 may be cells containing silicon and / or a perovskite, for example, silicon heterojunction cells, known as SHJ cells. In addition, the protective glass layer(s) 30 contain sodium.

[0092] We will now describe a manufacturing process for a photovoltaic module M, for example, as described previously.

[0093] In a first step, a barrier layer 30 is deposited on the transparent glass protective layer 3, positioned between the transparent glass protective layer 3 and the encapsulant 2, the barrier layer 30 being as described previously.

[0094] In this example, the deposition is carried out by plasma-enhanced chemical vapor deposition (PECVD), as illustrated in [Fig. 6], using N2O and SiH4 gases, with a flow rate ratio of N2O to SiH4 of, for example, approximately 12 to 13. The flow rate is measured in standard cubic centimeters per minute (sccm). The N2O flow rate is, for example, approximately 6000 sccm. The SiH4 flow rate is, for example, approximately 450 sccm.

[0095] The barrier layer is deposited for a period of time which is, for example, on the order of 12 to 20 minutes. The pressure is, for example, on the order of 900 mT. The temperature is, for example, on the order of 450°C.

[0096] In a second step, the transparent glass protective layer 3 is stacked on the encapsulant 2.

[0097] The stacking is carried out by placing the barrier layer 30 between the transparent glass protective layer 3 and the encapsulant. The glass protective layer 3 is oriented in the stack so that the barrier layer 30 is positioned towards the encapsulant of the photovoltaic cell(s).

[0098] The stack is then laminated, for example at 160°C for a period of 18 min. Examples

[0099] The process is implemented with the following parameters: the ratio of the N2O flow rate to the SiH4 flow rate is on the order of 12 to 13. The barrier layer is deposited for a duration of approximately 12 to 20 minutes. The N2O flow rate is approximately 6000 sccm. The SiH4 flow rate is approximately 450 sccm. The pressure is approximately 900 mT. The temperature is approximately 450°C. The power is approximately 8000 W.

[0100] The module is then stacked as shown in [Fig. 4] with the barrier layer faces placed on the photovoltaic cell side towards the inside of the photovoltaic module. The materials used are as follows: - 2 soda-lime glass plates, 20 x 20 cm², with a barrier layer deposited, - 2 sheets of TPO type encapsulant 20 x 20 cm2, - 2 half-cells of silicon heterojunction technology interconnected by ECA stringing (in English, stringing ECA).

[0101] The lamination of the photovoltaic module is then carried out at 160 °C during a cycle of 18 min.

[0102] The deposition of barrier layers of 70, 100, 150 and 200 nm makes it possible to test the influence of the thickness of the barrier layer on the quality of the protection.

[0103] Table 1 presents the initial Isc performance of the photovoltaic modules and shows that the thickness of the deposit has no influence on the transparency and therefore the initial performance of the photovoltaic modules.

[0104] [Tables 1] Initial performance 0 nm 70 nm 100 nm 150 nm 200 nm Isc 4.68 ± 0.02 4.67 ± 0.02 4.73 ± 0.04 4.72 ± 0.03 4.73 ± 0.00

[0105] Table 1: Initial performance (Isc) of photovoltaic modules

[0106] The module then undergoes 1500 h of aging under humid heat (damp heat = DH), according to IEC 61215 (85 °C / 85% RH). The aging tests are carried out in an ESPEC chamber. The results obtained are shown in [Fig. 7], in comparison with identical photovoltaic modules but without the barrier layer on the glass. [Fig. 7] shows the evolution of the maximum power Pmax of the different configurations with different barrier layer thicknesses, as a function of the aging time in DH expressed in hours and as a function of the coating thickness expressed in nanometers.

[0107] We observe a significant difference in the degradation of electrical parameters for modules with and without a barrier layer. Photovoltaic modules with a SiOx barrier layer degrade considerably less than those without a barrier layer. The deposition of this barrier layer therefore provides protection against degradation for the entire photovoltaic module.

Claims

Demands

1. Photovoltaic module (M), comprising a front face (41) and a rear face (42), the photovoltaic module comprising a multilayer stack comprising at least: - a first protective layer (3) transparent of glass (41), - an encapsulant (2) of polymer material, for example of the transparent elastomer type, in which is encapsulated or coated at least one photovoltaic cell (20), or even photovoltaic cells (20), - a second protective layer (1), and - at least one barrier layer (30), disposed between the protective layer (3) transparent of glass and the encapsulant (2), the barrier layer (30) comprising at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y.

2. Module according to the preceding claim, the barrier layer (30) comprising 57% of O2, 39% of Si and 4% of N.

3. Module according to any one of the preceding claims, a thickness (e) of the barrier layer (30) being greater than 50 nm, or even greater than 70 nm, or even greater than 80 nm, or even greater than 90 nm, better greater than 100 nm, being for example in the order of 110 to 150 nm.

4. Module according to any one of the preceding claims, the first transparent glass protective layer (3) being disposed on the front face of the module.

5. Module according to any one of the preceding claims, the second protective layer (1) being arranged on the rear face (42) of the module, in particular being made of glass or based on multilayer polymers defining a rear face.

6. Module according to any one of the preceding claims, the encapsulant (2) completely surrounding the photovoltaic cell(s) (20).

7. Module according to any one of claims 1 to 3, encapsulating it (2) covering the photovoltaic cell(s) (20) on one side thereof.

8. Module according to any one of the preceding claims, the encapsulant comprising at least one polymer-type encapsulating material selected from: acid copolymers, ionomers, poly(ethylene-vinyl acetate) (EVA), vinyl acetals, such as polyvinyl butyrals (PVB), polyurethanes, polyethylenes, such as linear low-density polyethylenes, polyolefin elastomers of copolymers, α-olefin copolymers and α-,[3-ethylenic carboxylic acid esters, such as ethylene-methyl acrylate copolymers and ethylene-butyl acrylate copolymers, silicone elastomers and / or elastomers based on crosslinked thermoplastic polyolefin.

9. Module according to any one of the preceding claims, comprising at least two barrier layers (30), each disposed between one of the protection layers (1, 3) and the encapsulant (2), each of the barrier layers (30) comprising at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y.

10. Module according to any one of the preceding claims, at least one photovoltaic cell (20), or even all of the photovoltaic cells (20), being heterojunction silicon cells, referred to as SH J.

11. Module according to any one of the preceding claims, the transparent glass protective layer(s) (1,3) comprising sodium.

12. A method for manufacturing a photovoltaic module (M), comprising a front face (41) and a rear face (42), the photovoltaic module (M) comprising a multilayer stack including at least: - a first transparent glass protective layer (3), in particular disposed on the front face (41), - an encapsulant (2) made of polymer material, for example of the transparent elastomer type, in which at least one photovoltaic cell (20), or even photovoltaic cells (20), is encapsulated or coated, and - a second protective layer (1), in particular disposed on the rear face (42) of the module, in particular made of glass or based on multilayer polymers defining a rear face, a method in which a barrier layer (30) is deposited on the transparent glass protective layer (3), disposed between the transparent glass protective layer (3) and the encapsulant (2), the barrier layer comprising at least 95% by mass of SiOxNy, with x + y = 2, and in particular x > y, and in particular with x non-zero, x > y and x + y = 2, then we proceed to stack the transparent glass protective layer (3) on the encapsulant (2).

13. Method according to the preceding claim, the deposition of the barrier layer (30) being carried out for a period of between 5 and 45 minutes, or even between 7 and 40 min, or even between 9 and 30 min, better between 10 and 25 min, being for example of 12 to 20 min.

14. A method according to one of the two preceding claims, the deposition of the barrier layer being carried out by a deposition technique selected from the following list: physical vapor deposition (PVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD), atmospheric pressure chemical vapor deposition (APCVD).

15. A method according to any one of the three preceding claims, wherein the deposition of the barrier layer is carried out by chemical vapor deposition of N2O and SiH4 gases, a ratio of the N2O flow rate to the SiH4 flow rate being between 8 and 30, for example being in the order of 13 to 14.

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