Digital writing of large diffraction grating patterns

The use of a substrate with stepped linear diffraction features and a beam writing system addresses the limitations of near-eye displays by enhancing resolution and field of view, achieving compact and high-performance virtual reality displays.

HK40134601APending Publication Date: 2026-07-10VUZIX CORP
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Patent Information

Authority / Receiving Office
HK · HK
Patent Type
Applications
Current Assignee / Owner
VUZIX CORP
Filing Date
2026-05-11
Publication Date
2026-07-10

AI Technical Summary

Technical Problem

Existing near-eye display systems face challenges in achieving high-resolution, wide-field-of-view, and compact form factors, particularly in virtual reality applications, due to limitations in diffraction pattern design and beam manipulation.

Method used

A substrate with stepped linear diffraction features and a beam writing system capable of translational and rotational movements is employed to create complex diffraction patterns for improved light manipulation in a virtual graphics near-eye display system.

Benefits of technology

Enhances the resolution and field of view while maintaining a compact form factor by optimizing diffraction pattern design and beam control, thereby improving the overall display performance.

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Abstract

A substrate (40, 70, 90, 220) comprises a first planar surface (46, 92) and a second planar surface (46, 92). A first diffraction pattern is arranged along one of said first and second planar surfaces (46, 92), wherein said first diffraction pattern includes a first plurality of diffractive features (50). A second diffraction pattern is arranged along one of said first and second planar surfaces (46, 92), wherein said second diffraction pattern includes a second plurality of diffractive features (50). At least one of said first and second pluralities of diffractive features (50) comprise stepped line diffractive features (52). A virtual image near-eye display system comprises at least one planar waveguide including the substrate (40, 70, 90, 220). A beam writing system comprises a first platform operable to translate in x and y directions and a second platform operable to rotate about a perpendicular axis, wherein the substrate (40, 70, 90, 220) is coupled to the beam writing system.
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Description

Abstract A substrate (40, 70, 90, 220) includes a first planar surface (46, 92) and a second planar surface (46, 92). A first diffraction pattern is disposed along one of the first and second planar surfaces (46, 92), wherein the first diffraction pattern includes a first plurality of diffraction features (50). A second diffraction pattern is disposed along one of the first and second planar surfaces (46, 92), wherein the second diffraction pattern includes a second plurality of diffraction features (50). At least one of the first and second plurality of diffraction features (50) includes a stepped linear diffraction feature (52). A virtual graphics near-eye display system includes at least one planar waveguide, the planar waveguide including a substrate (40, 70, 90, 220). A beam writing system includes a first platform translatable in the x and y directions and a second platform rotatable about a vertical axis, wherein the substrate (40, 70, 90, 220) is coupled to the beam writing system.

Claims

1. A substrate (40, 70, 90, 220), comprising: a first planar surface (46, 92); a second planar surface (46, 92); a first diffraction pattern arranged along one of said first and second planar surfaces (46, 92), wherein said first diffraction pattern includes a first plurality of diffractive features (50); and a second diffraction pattern arranged along one of said first and second planar surfaces (46, 92), wherein said second diffraction pattern includes a second plurality of diffractive features (50); wherein at least one of said first and second pluralities of diffractive features (50) comprise stepped line diffractive features (52).

2. The substrate (40, 70, 90, 220) according to claim 1, further comprising a third diffraction pattern arranged along one of said first and second planar surfaces (46, 92), wherein said third diffraction pattern includes a third plurality of diffractive features.

3. The substrate (40, 70, 90, 220) according to claim 1 or 2, wherein said stepped line diffractive features (52) are operable to diffract incident light as if said stepped line diffractive features (52) were linear diffractive features.

4. The substrate (40, 70, 90, 220) according to any one of claims 1 to 3, wherein at least one of said first and second planar surfaces (46, 92) comprise a layer of a first material, and said substrate comprises a second material.

5. The substrate (40, 70, 90, 220) according to claim 4, wherein said second material comprises quartz.

6. The substrate (40, 70, 90, 220) according to claim 4 or 5, wherein said first material comprises chrome.

7. The substrate (40, 70, 90, 220) according to any one of claims 2 to 6, wherein said third diffraction pattern is located optically between said first and second diffraction patterns, said first and second diffraction patterns comprising a symmetric orientation about said third diffraction pattern.

8. The substrate (40, 70, 90, 220) according to claim 7, wherein one of said first and second pluralities of diffractive features (50) is disposed at an angle between zero and ninety degrees relative to said third plurality of diffractive features (50).

9. The substrate (40, 70, 90, 220) according to any one of claims 2 to 8, wherein said first and second pluralities of diffractive features (50) each comprise said stepped line diffractive features (52), and wherein said third plurality of diffractive features (50) comprise linear diffractive features.

10. The substrate (40, 70, 90, 220) according to any one of claims 1 to 9, wherein at least one of said first and second diffraction patterns comprises a pitch of less than 1000 nm.

11. The substrate (40, 70, 90, 220) according to any one of claims 1 to 10, wherein said first and second diffraction patterns are arranged along said first planar surface (46, 92), and a combined area of said first and second diffraction patterns is between 200 mm2 and a total area of said first planar surface (46, 92).

12. The substrate (40, 70, 90, 220) according to any one of claims 1 to 11, wherein said stepped line diffractive features (52) comprise a first portion and a second portion, wherein said second portion is arranged perpendicular to said first portion.

13. A virtual image near-eye display system (34), comprising: a first planar waveguide (160) including a substrate (40, 70, 90, 220) according to any one of claims 1 to 12; a second planar waveguide (162) including a substrate (40, 70, 90, 220) according to any one of claims 1 to 12, wherein said second planar waveguide (162) is arranged adjacent to said first planar waveguide (160); wherein each of said diffraction patterns comprises a grating vector.

14. The virtual image near-eye display system (34) according to claim 13, wherein each of said first and second planar waveguides comprises a third diffraction pattern, and said first and third diffraction patterns of each of said first and second planar waveguides (160, 162) are arranged in bilateral symmetric orientation about said second diffraction grating.

15. A beam writing system (200), comprising: a first platform operable to translate in an x-axis direction and a y-axis direction; and a second platform operable to rotate about a z-axis perpendicular to said first platform, wherein said second platform is mounted to said first platform; wherein a substrate (40, 70, 90, 220) according to any one of claims 1 to 12 is selectively coupled with said second platform whereby a diffractive feature (50) is always oriented in one of said first platform x-axis and y-axis directions during fabrication.