Fluid Pressure Cylinder

JP1791219SActive Publication Date: 2025-02-14SMC CORP
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Patent Information

Application Number
JP2024016803D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2024-08-13
Publication Date
2025-02-14
Estimated Expiration
2049-08-13

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Abstract

The present article is, for example, a fluid pressure cylinder for supplying an inert gas to the inside of a wafer storage container placed on a load port of a semiconductor manufacturing device. This fluid pressure cylinder is composed of a first body, a piston housed in the first body, a second body connected to one end of the piston, a rotation stop guide for suppressing rotation of the piston and the second body, and a set screw for fixing the rotation stop guide to the first body. When using the fluid pressure cylinder, the first body is first fixed to a load port (not shown). When a pressurized fluid is supplied to the operating port of the first body, the piston is pushed upward by the differential pressure in the pressure chamber, and the tip of the piston abuts against a bottom port of the wafer storage container (not shown). At this time, when an inert gas is supplied to the gas supply port of the second body, the inert gas is discharged from the gas exhaust port, and the inert gas is supplied to the inside of the wafer storage container.
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