Exposure apparatus, control method of the same, and method for manufacturing article
Patent Information
- Application Number
- JP2021199456
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2021-12-08
- Publication Date
- 2024-12-25
- Estimated Expiration
- 2041-12-08
AI Technical Summary
【0008】 本発明によれば、例えば、露光装置におけるスループットの向上の点で有利な技術を提供することができる。
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Abstract
Claims
1. An exposure apparatus for performing scanning exposure of a substrate, comprising: a stage for holding the substrate; a control unit that controls driving of the stage in accordance with a driving profile that defines the magnitude of the velocity of the stage for each of a plurality of processes involving movement of the stage; Equipped with the drive profile includes an acceleration section in which the stage is accelerated, a constant velocity section in which the stage is moved at a constant velocity after the acceleration section, and a deceleration section in which the stage is decelerated after the constant velocity section, the plurality of processes include an exposure process in which the scanning exposure is performed in the constant speed section, and a non-exposure process in which the scanning exposure is not performed in the constant speed section, an exposure apparatus characterized in that the control unit changes an acceleration profile of the acceleration section in the drive profile between the exposure process and the non-exposure process so that the acceleration section is shorter in the non-exposure process than in the exposure process.
2. The exposure apparatus described in Claim 1, characterized in that the control unit changes the acceleration profile of the acceleration section in the drive profile between the exposure process and the non-exposure process so that the maximum acceleration of the acceleration section is the same between the exposure process and the non-exposure process.
3. the acceleration section includes a first section in which the acceleration of the stage is increased, and a second section in which the acceleration of the stage is decreased after the first section, 3. The exposure apparatus according to claim 1, wherein the control unit changes an acceleration profile of the acceleration section between the exposure process and the non-exposure process so that a peak position of the rate of change of acceleration in the second section is located closer to the constant velocity section in the non-exposure process than in the exposure process.
4. 4. The exposure apparatus according to claim 3, wherein the control unit determines the drive profile used in the non-exposure process such that a peak position of a rate of change of acceleration in the second section is located in the middle of the second section.
5. 5. The exposure apparatus according to claim 3, wherein the control unit changes the acceleration profile of the acceleration section between the exposure process and the non-exposure process so that the peak position of the rate of change of acceleration in the first section is located on the opposite side to the constant velocity section in the non-exposure process compared to the exposure process.
6. 6. The exposure apparatus according to claim 5, wherein the control unit determines the drive profile used in the non-exposure process such that a peak position of a rate of change of acceleration in the first section is located in the middle of the first section.
7. the acceleration section includes a third section between the first section and the second section, in which the acceleration of the stage is constant; 7. The exposure apparatus according to claim 3, wherein the control unit changes the length of the acceleration section by adjusting the length of the third section in accordance with a change in a peak position of a rate of change of acceleration between the exposure process and the non-exposure process.
8. the drive profile includes a stop section that maintains the stage stopped after the deceleration section, the plurality of processes include, as the non-exposure processes, a measurement process in which position measurement of the substrate is performed in the stop section, and a non-measurement process in which position measurement of the substrate is not performed in the stop section; 8. The exposure apparatus according to claim 1, wherein the control unit changes a deceleration profile of the deceleration section in the drive profile between the measurement process and the non-measurement process so that the maximum deceleration of the deceleration section is the same between the measurement process and the non-measurement process, and the deceleration section is shorter in the non-measurement process than in the measurement process.
9. the deceleration section includes a fourth section in which the deceleration of the stage is increased, and a fifth section after the fourth section in which the deceleration of the stage is decreased, The exposure apparatus according to claim 8, wherein the control unit changes the deceleration profile of the deceleration section between the measurement process and the non-measurement process so that the peak position of the rate of change of the deceleration in the fifth section is located closer to the stop section in the non-measurement process than in the measurement process.
10. 10. The exposure apparatus according to claim 9, wherein the control unit determines the drive profile used in the non-measurement process such that a peak position of a rate of change of the deceleration in the fifth section is located in the middle of the fifth section.
11. The exposure apparatus according to claim 9 or 10, characterized in that the control unit changes the deceleration profile of the deceleration section between the measurement process and the non-measurement process so that the peak position of the rate of change of the deceleration in the fourth section is located on the opposite side to the constant velocity section in the non-measurement process compared to the measurement process.
12. 12. The exposure apparatus according to claim 11, wherein the control unit determines the drive profile used in the non-measurement process such that a peak position of a rate of change of the deceleration in the fourth section is located in the middle of the fourth section.
13. the deceleration section includes a sixth section between the fourth section and the fifth section, in which the deceleration of the stage is constant; 13. The exposure apparatus according to claim 9, wherein the control unit changes the length of the deceleration section by adjusting the length of the sixth section in accordance with a change in a peak position of a rate of change of the deceleration between the measurement process and the non-measurement process.
14. 1. A control method for controlling driving of a stage that holds a substrate in an exposure apparatus that performs scanning exposure of the substrate, comprising: determining a drive profile that defines a magnitude of a velocity of the stage for each of a plurality of processes involving movement of the stage; a control step of controlling driving of the stage in each of the plurality of processes in accordance with the driving profile determined in the determination step; Including, the drive profile includes an acceleration section in which the stage is accelerated, a constant velocity section in which the stage is moved at a constant velocity after the acceleration section, and a deceleration section in which the stage is decelerated after the constant velocity section, the plurality of processes include an exposure process in which the scanning exposure is performed in the constant speed section, and a non-exposure process in which the scanning exposure is not performed in the constant speed section, A control method characterized in that, in the determination step, an acceleration profile of the acceleration section in the drive profile is changed between the exposure process and the non-exposure process so that the acceleration section is shorter in the non-exposure process than in the exposure process.
15. an exposure step of performing scanning exposure of a substrate; a processing step of processing the substrate exposed in the exposure step; a manufacturing process for manufacturing an article from the substrate processed in the processing process; Including, The method for manufacturing an article, wherein in the exposure step, driving of a stage that holds the substrate is controlled using the control method according to claim 14.
