Exposure system, photoetching machine and exposure control method
By detecting the light intensity sensor temperature in the exposure system of the lithography machine in real time and performing cooling control, the temperature drift problem caused by high-intensity irradiation of the light source is solved, and more accurate exposure dose calculation and higher exposure control accuracy are achieved.
Patent Information
- Application Number
- CN202411827191.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-12
- Publication Date
- 2025-02-14
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
In the exposure system of the lithography machine, high-intensity irradiation of the light source causes the temperature of the light intensity sensor to rise, causing the temperature drift phenomenon, affecting the accurate calculation of the exposure dose. The prior art relies on complex algorithms and semiconductor cooling sheets, but these methods have problems such as insufficient response speed and computational hysteresis.
An exposure system is designed, including a light intensity sensor, a temperature sensor, a temperature controller and a semiconductor cooling plate. The temperature sensor detects the temperature of the light intensity sensor in real time. The temperature controller determines the actual light intensity energy based on the correspondence between the preset temperature and the light intensity energy value, and controls the semiconductor cooling plate to cool.
通过硬件结构上的温度控制,精准地补偿了光强传感器温度变化导致的测量误差,提高了曝光剂量的计算精准性,减少了温度波动引起的曝光剂量变异,提升了光刻机的曝光控制精度 .
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Figure CN119439648A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of photolithography machines, and in particular to an exposure system, a photolithography machine and an exposure control method. Background Art
[0002] In the exposure system of a lithography machine, high-intensity irradiation from the light source will cause the temperature of the light intensity sensor to rise, thereby causing temperature drift and affecting the accurate calculation of the exposure dose.
[0003] Most current solutions rely on complex algorithms in the host computer to correct errors in dose calculation, but this method has certain limitations. Existing solutions usually add semiconductor cooling fins to try to maintain the temperature stability of the light intensity sensor through active cooling. However, the response speed of such semiconductor cooling fins is limited, and it is difficult to effectively reduce the instantaneous temperature rise caused by high-intensity light sources in a short period of time. In addition, the current main technical means is to rely on complex calculation models in the host computer to correct the dose calculation errors caused by temperature drift. Although this method can compensate for the impact of temperature changes to a certain extent, it cannot fundamentally solve the problem, especially when the shutter is frequently opened and closed, resulting in rapid temperature fluctuations. The lag of the software calculation will become more obvious, resulting in inaccurate calculation of the exposure dose. Summary of the invention
[0004] The purpose of the present invention is to address the deficiencies in the above-mentioned prior art and provide an exposure system, a photolithography machine and an exposure control method to solve the problems in the prior art such as the inaccurate calculation of exposure dose.
[0005] To achieve the above purpose, the technical solution adopted in the embodiment of the present application is as follows:
[0006] In a first aspect, an embodiment of the present application provides an exposure system, the exposure system comprising: an exposure control device and a dose calculation device, the exposure control device comprising: a light intensity sensor, a temperature sensor, a temperature controller and a semiconductor cooling fin arranged on an exposure control board, the temperature sensor being arranged at a first preset position of the light intensity sensor to detect a real-time temperature of the light intensity sensor, the semiconductor cooling fin being arranged at a second preset position of the light intensity sensor to cool the light intensity sensor;
[0007] The temperature sensor is connected to the temperature controller, and the temperature controller pre-stores: a correspondence between a pre-temperature and a light intensity energy value, so as to determine the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the correspondence, and the temperature controller is also connected to the semiconductor cooling plate, so as to control the semiconductor cooling plate to cool the light intensity sensor based on the real-time temperature;
[0008] The temperature controller is also connected to the dose calculation device so that the dose calculation device calculates the exposure dose based on the actual light intensity energy and performs exposure control based on the exposure dose.
[0009] Optionally, the temperature controller includes: a processor and a register;
[0010] The processor is connected to the register, the register stores the corresponding relationship, and the processor is connected to the temperature sensor to obtain the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the corresponding relationship;
[0011] The processor is connected to the semiconductor cooling plate to control the semiconductor cooling plate to cool the light intensity sensor based on the real-time temperature.
[0012] In a second aspect, an embodiment of the present application provides a lithography machine, which comprises at least: the exposure system described in the first aspect above.
[0013] In a third aspect, an embodiment of the present application provides an exposure control method of an exposure system, which is applied to the exposure system in the first aspect above; the method comprises:
[0014] The temperature sensor in the exposure control device of the exposure system detects the temperature of the light intensity sensor to obtain the real-time temperature of the light intensity sensor after the shutter is opened;
[0015] The temperature controller in the exposure control device obtains the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature according to the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value;
[0016] The temperature controller controls the semiconductor cooling plate in the exposure control device to cool the light intensity sensor based on the real-time temperature;
[0017] The dose calculation device acquires the actual light intensity energy, calculates the exposure dose based on the actual light intensity energy, and performs exposure control based on the exposure dose.
[0018] Optionally, the dose calculation device acquires the actual light intensity energy, and calculates the exposure dose based on the actual light intensity energy, including:
[0019] The dose calculation device obtains the actual light intensity energy at multiple moments;
[0020] The dose calculation device calculates the exposure dose according to the actual light intensity energy at the multiple moments and a preset sampling time interval.
[0021] Optionally, the corresponding relationship is a function of the relationship between temperature and actual light intensity energy; and determining that the real-time temperature corresponds to the actual light intensity energy according to the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value includes:
[0022] The actual light intensity energy is calculated according to the real-time temperature using the relationship function.
[0023] Optionally, before calculating the actual light intensity energy according to the real-time temperature using the relationship function, the method further includes:
[0024] In an offline calibration state, the temperature sensor detects the temperature of the light intensity sensor to obtain multiple actual temperatures of the light intensity sensor after the shutter is opened;
[0025] The temperature controller acquires and records the multiple actual temperatures and the actual light intensity energy at each actual temperature, and establishes the relationship function according to the multiple actual temperatures and the actual light intensity energy at each actual temperature.
[0026] Optionally, in the offline calibration state, after the temperature sensor detects the temperature of the light intensity sensor and obtains a plurality of actual temperatures of the light intensity sensor after the shutter is opened, the method further includes:
[0027] The semiconductor cooling fin is controlled based on the multiple actual temperatures to cool the light intensity sensor.
[0028] Optionally, establishing the relationship function according to the multiple actual temperatures and the actual light intensity energy at each actual temperature includes:
[0029] Determine actual temperatures and corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at each actual temperature;
[0030] According to the actual temperatures in the multiple temperature intervals and the corresponding actual light intensity energies, respectively establishing the relationship functions in the multiple temperature intervals;
[0031] The calculating the actual light intensity energy according to the real-time temperature by using the relational function comprises:
[0032] The actual light intensity energy is calculated according to the real-time temperature and using a relationship function of a target temperature interval in which the real-time temperature is located.
[0033] Optionally, before determining the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at the actual temperatures, the method further includes:
[0034] Performing temperature classification based on the resolution of the temperature sensor to obtain a temperature change value of a single temperature interval;
[0035] The determining the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at the respective actual temperatures comprises:
[0036] According to the temperature change value, the actual temperatures and the corresponding actual light intensity energies in the multiple temperature intervals are determined from the multiple actual temperatures and the actual light intensity energies at the respective actual temperatures.
[0037] Compared with the prior art, this application has the following beneficial effects:
[0038] The present application provides an exposure system, a photolithography machine and an exposure control method. In the exposure system, a temperature sensor in an exposure control device detects the temperature of a light intensity sensor to obtain the real-time temperature of the light intensity sensor after the shutter is opened; a temperature controller in the exposure control device obtains the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value; the temperature controller controls the semiconductor cooling plate in the exposure control device to cool the light intensity sensor based on the real-time temperature; a dose calculation device obtains the actual light intensity energy, and calculates the exposure dose based on the actual light intensity energy, and performs exposure control based on the exposure dose. Thus, through the corresponding relationship between the preset temperature and the light intensity energy value, the influence of the temperature drift caused by the rapid temperature rise on the measurement accuracy of the light intensity sensor is overcome from the hardware structure, and the accurate actual light intensity energy is obtained, which effectively compensates for the measurement error caused by the temperature change of the light intensity sensor; the exposure dose is calculated based on the actual light intensity energy at multiple moments, so that the calculation of the exposure dose is more accurate, the exposure dose variation caused by temperature fluctuation is reduced, and the exposure control accuracy of the entire product is improved. BRIEF DESCRIPTION OF THE DRAWINGS
[0039] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.
[0040] Figure 1 A schematic diagram of an exposure system provided in an embodiment of the present application;
[0041] Figure 2 A schematic diagram of another exposure system provided in an embodiment of the present application;
[0042] Figure 3A schematic flow chart of an exposure control method for an exposure system provided in an embodiment of the present application;
[0043] Figure 4 A schematic flow chart of a method for calculating exposure dose provided in an embodiment of the present application;
[0044] Figure 5 A flowchart of a method for establishing a relationship function provided in an embodiment of the present application;
[0045] Figure 6 A flowchart of another method for establishing a relationship function provided in an embodiment of the present application;
[0046] Figure 7 A flowchart of a method for establishing a relationship function according to temperature change values in a temperature range provided in an embodiment of the present application.
[0047] Icons: 1-exposure control device, 2-dose calculation device, 11-light intensity sensor, 12-temperature sensor, 13-temperature controller, 14-semiconductor cooling fin, 131-processor, 132-register. DETAILED DESCRIPTION
[0048] In order to make the purpose, technical scheme and advantages of the embodiments of the present invention clearer, the technical scheme in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.
[0049] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for protection, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present application.
[0050] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.
[0051] In addition, the terms “first”, “second”, etc., if used, are merely used to distinguish between the descriptions and should not be understood as indicating or implying relative importance.
[0052] It should be noted that, in the absence of conflict, the features in the embodiments of the present invention may be combined with each other.
[0053] Before explaining an exposure control method for an exposure system provided in an embodiment of the present application, an exposure system to which the exposure control method for an exposure system is applied is first explained. Figure 1 A schematic diagram of an exposure system provided in an embodiment of the present application.
[0054] like Figure 1 As shown, the exposure system includes: an exposure control device 1 and a dose calculation device 2. The exposure control device 1 includes: a light intensity sensor 11, a temperature sensor 12, a temperature controller 13 and a semiconductor cooling plate 14 arranged on the exposure control board. The temperature sensor 12 is arranged at a first preset position of the light intensity sensor 11 to detect the real-time temperature of the light intensity sensor 11. The semiconductor cooling plate 14 is arranged at a second preset position of the light intensity sensor 11 to cool the light intensity sensor 11.
[0055] The temperature sensor 12 is connected to the temperature controller 13, which pre-stores: the correspondence between the pre-temperature and the light intensity energy value, so as to determine the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the correspondence. The temperature controller 13 is also connected to the semiconductor cooling plate 14, so as to control the semiconductor cooling plate 14 to cool the light intensity sensor 11 based on the real-time temperature.
[0056] The temperature controller 13 is also connected to the dose calculation device 2 so that the dose calculation device 2 calculates the exposure dose based on the actual light intensity energy and performs exposure control based on the exposure dose.
[0057] For example, the first preset position may be the edge position of the surface of the light intensity sensor 11, and the temperature sensor 12 is disposed at the first preset position of the light intensity sensor 11, so that the temperature sensor 12 can accurately measure the actual temperature of the light intensity sensor 11 without affecting the light intensity energy measured by the light intensity sensor 11. The second preset position may be the edge position or the back position of the surface of the light intensity sensor 11, and the semiconductor cooling plate 14 is disposed at the second preset position of the light intensity sensor 11, so that the semiconductor cooling plate 14 can cool the light intensity sensor 11 without affecting the light intensity energy measured by the light intensity sensor 11.
[0058] In summary, in this embodiment, the exposure system includes: an exposure control device and a dose calculation device, the exposure control device includes: a light intensity sensor, a temperature sensor, a temperature controller and a semiconductor cooling plate arranged on the exposure control board, the temperature sensor is arranged at a first preset position of the light intensity sensor to detect the real-time temperature of the light intensity sensor, and the semiconductor cooling plate is arranged at a second preset position of the light intensity sensor to cool the light intensity sensor; the temperature sensor is connected to the temperature controller, and the temperature controller pre-stores: a correspondence between a preset temperature and a light intensity energy value, so as to determine the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the correspondence, the temperature controller is also connected to the semiconductor cooling plate, so as to control the semiconductor cooling plate to cool the light intensity sensor based on the real-time temperature; the temperature controller is also connected to the dose calculation device, so that the dose calculation device calculates the exposure dose based on the actual light intensity energy, and performs exposure control based on the exposure dose. Therefore, the influence of temperature drift caused by rapid temperature rise on the measurement accuracy of the light intensity sensor is overcome from the hardware structure, and accurate actual light intensity energy is obtained, which effectively compensates for the measurement error caused by temperature change of the light intensity sensor; the exposure dose is calculated based on the actual light intensity energy at multiple moments, which makes the calculation of exposure dose more accurate, reduces the exposure dose variation caused by temperature fluctuations, and improves the exposure control accuracy of the entire product.
[0059] In the above Figure 1 Based on the corresponding embodiment, the embodiment of the present application also provides another exposure system. Figure 2 A schematic diagram of another exposure system provided in an embodiment of the present application, such as Figure 2 As shown, the temperature controller 13 includes: a processor 131 and a register 132 .
[0060] The processor 131 is connected to the register 132, in which a corresponding relationship is stored. The processor 131 is connected to the temperature sensor 12 to obtain the real-time temperature, and based on the real-time temperature and the corresponding relationship, determines the actual light intensity energy corresponding to the real-time temperature.
[0061] The processor 131 is connected to the semiconductor cooling fin 14 to control the semiconductor cooling fin 14 to cool the light intensity sensor 11 based on real-time temperature.
[0062] Thus, the actual light intensity energy corresponding to the real-time temperature is accurately determined based on the real-time temperature and the corresponding relationship.
[0063] In summary, in this embodiment, the temperature controller includes: a processor and a register; the processor is connected to the register, the register stores a corresponding relationship, the processor is connected to the temperature sensor to obtain the real-time temperature, and based on the real-time temperature and the corresponding relationship, the actual light intensity energy corresponding to the real-time temperature is determined; the processor is connected to the semiconductor cooling plate to control the semiconductor cooling plate to cool the light intensity sensor based on the real-time temperature. Thus, the actual light intensity energy corresponding to the real-time temperature is accurately determined based on the real-time temperature and the corresponding relationship.
[0064] Based on the exposure system in the above embodiment, the embodiment of the present application also provides a lithography machine.
[0065] The lithography machine at least includes: any exposure system of the above-mentioned embodiments.
[0066] The following is an explanation of an exposure control method of an exposure system provided in an embodiment of the present application through a specific example. Figure 3 The following is a flow chart of an exposure control method for an exposure system provided in an embodiment of the present application, wherein the method is performed by the exposure system in the above embodiment. Figure 3 As shown, the method includes:
[0067] S101. A temperature sensor in an exposure control device in an exposure system detects the temperature of a light intensity sensor to obtain a real-time temperature of the light intensity sensor after a shutter is opened.
[0068] When performing an exposure operation, the exposure shutter is opened for exposure, and the real-time temperature of the light intensity sensor is detected at the moment of exposure. Since the speed of light is too fast, the transmission time of light is ignored.
[0069] S102: The temperature controller in the exposure control device obtains the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature according to the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value.
[0070] For example, the correspondence between the preset temperature and the light intensity energy value is a pre-obtained correspondence, and each temperature value corresponds to a unique light intensity energy value. That is, when the actual temperature of the light intensity sensor is a temperature value, the actual light intensity energy corresponding to the light intensity sensor at the temperature value is pre-recorded. Thus, through the correspondence between the preset temperature and the light intensity energy value, the influence of the temperature drift caused by the rapid temperature rise on the measurement accuracy of the light intensity sensor is overcome from the hardware structure, and the accurate actual light intensity energy is obtained, effectively compensating for the measurement error caused by the temperature change of the light intensity sensor.
[0071] It should be noted that the material structure of each light intensity sensor is different, so each light intensity sensor has a unique corresponding relationship between temperature and light intensity energy value.
[0072] S103, the temperature controller controls the semiconductor cooling plate in the exposure control device to cool the light intensity sensor based on the real-time temperature.
[0073] This embodiment mainly adopts the correspondence between temperature and light intensity energy value to determine the actual light intensity energy. Therefore, it is necessary to accurately detect the actual temperature of the light intensity sensor. After each exposure and measurement of the actual temperature, the semiconductor cooling plate is immediately controlled to cool the light intensity sensor so that the light intensity sensor returns to normal temperature, which is convenient for the subsequent detection of the actual temperature of the light intensity sensor.
[0074] For example, if the shutter is opened and closed frequently, the semiconductor cooling plate can be continuously controlled to cool the light intensity sensor.
[0075] S104. The dose calculation device obtains actual light intensity energy, calculates exposure dose based on the actual light intensity energy, and performs exposure control based on the exposure dose.
[0076] The exposure dose is calculated in real time based on the actual light intensity energy, and then exposure control is performed according to the exposure dose to achieve the preset exposure requirement dose.
[0077] Therefore, the exposure dose is calculated based on the actual light intensity energy at multiple moments, making the calculation of the exposure dose more accurate, reducing the exposure dose variation caused by temperature fluctuations, and improving the exposure control accuracy of the entire product.
[0078] In summary, in this embodiment, the temperature sensor in the exposure control device of the exposure system detects the temperature of the light intensity sensor to obtain the real-time temperature of the light intensity sensor after the shutter is opened; the temperature controller in the exposure control device obtains the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value; the temperature controller controls the semiconductor cooling plate in the exposure control device to cool the light intensity sensor based on the real-time temperature; the dose calculation device obtains the actual light intensity energy, and calculates the exposure dose based on the actual light intensity energy, and performs exposure control based on the exposure dose. Thus, through the corresponding relationship between the preset temperature and the light intensity energy value, the influence of the temperature drift caused by the rapid temperature rise on the measurement accuracy of the light intensity sensor is overcome from the hardware structure, and the accurate actual light intensity energy is obtained, which effectively compensates for the measurement error caused by the temperature change of the light intensity sensor; the exposure dose is calculated based on the actual light intensity energy at multiple moments, so that the calculation of the exposure dose is more accurate, the exposure dose variation caused by temperature fluctuation is reduced, and the exposure control accuracy of the entire product is improved.
[0079] In the above Figure 3 On the basis of the corresponding embodiments, a method for calculating exposure dose is also provided in the embodiments of the present application. Figure 4 A flow chart of a method for calculating exposure dose provided in an embodiment of the present application. Figure 4 As shown, the dose calculation device in S104 obtains the actual light intensity energy, and calculates the exposure dose based on the actual light intensity energy, including:
[0080] S201. A dose calculation device obtains actual light intensity energy at multiple moments.
[0081] For example, if the shutter is opened and closed frequently continuously, the multiple moments are multiple continuous moments; if the shutter is opened and closed frequently non-continuously, the multiple moments are multiple non-continuous moments.
[0082] S202: The dose calculation device calculates the exposure dose according to the actual light intensity energy at multiple moments and the preset sampling time interval.
[0083] The exposure dose is calculated as shown in the following formula (1):
[0084]
[0085] Where D is the exposure dose, α i P i is the actual light intensity energy at the i-th moment, and Δt is the preset sampling time interval.
[0086] Therefore, the exposure dose is calculated using the actual light intensity energy at multiple moments, making the calculation of the exposure dose more accurate.
[0087] In summary, in this embodiment, the dose calculation device obtains the actual light intensity energy at multiple moments; the dose calculation device calculates the exposure dose according to the actual light intensity energy at multiple moments and the preset sampling time interval. Thus, the exposure dose is calculated using the actual light intensity energy at multiple moments, making the calculation of the exposure dose more accurate.
[0088] Based on the above embodiment, in another embodiment of the present application, the corresponding relationship is: a function of the relationship between temperature and actual light intensity energy. In S102, according to the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value, determining the actual light intensity energy corresponding to the real-time temperature includes:
[0089] According to the real-time temperature, the relationship function is used to calculate the actual light intensity energy.
[0090] No matter which temperature value is measured, as long as the real-time temperature is input into the relationship function, a more accurate actual light intensity energy can be calculated.
[0091] In summary, in this embodiment, the corresponding relationship is: the relationship function between temperature and actual light intensity energy; according to the real-time temperature, the relationship function is used to calculate the actual light intensity energy. Therefore, no matter which temperature value is measured, as long as the real-time temperature is input into the relationship function, a more accurate actual light intensity energy can be calculated.
[0092] Based on the above embodiments, a method for establishing a relationship function is also provided in an embodiment of the present application. Figure 5 The following is a flow chart of a method for establishing a relationship function provided in an embodiment of the present application. Figure 5 As shown, before calculating the actual light intensity energy according to the real-time temperature by using the relationship function, the method further includes:
[0093] S301. In an offline calibration state, the temperature sensor detects the temperature of the light intensity sensor to obtain multiple actual temperatures of the light intensity sensor after the shutter is opened.
[0094] S302: The temperature controller acquires and records a plurality of actual temperatures and the actual light intensity energy at each actual temperature, and establishes a relationship function according to the plurality of actual temperatures and the actual light intensity energy at each actual temperature.
[0095] For example, the actual temperature can be used as an independent variable, and the actual light intensity energy can be used as a dependent variable. According to a plurality of actual temperatures and a scatter plot of the actual light intensity energy at each actual temperature, a mathematical method such as the least squares method can be used to establish a relationship function.
[0096] In summary, in this embodiment, in the offline calibration state, the temperature sensor detects the temperature of the light intensity sensor to obtain multiple actual temperatures of the light intensity sensor after the shutter is opened; the temperature controller obtains and records multiple actual temperatures and the actual light intensity energy at each actual temperature, and establishes a relationship function based on the multiple actual temperatures and the actual light intensity energy at each actual temperature. Thus, a relationship function is established to obtain a more accurate actual light intensity energy.
[0097] Based on the above embodiment, in another embodiment of the present application, in S301, in the offline calibration state, the temperature sensor detects the temperature of the light intensity sensor, and obtains multiple actual temperatures of the light intensity sensor after the shutter is opened, and further includes:
[0098] The light intensity sensor is cooled by controlling the semiconductor cooling plate based on a plurality of actual temperatures.
[0099] The embodiment of the present application requires accurate detection of the actual temperature of the light intensity sensor. Therefore, after each exposure and measurement of the actual temperature, the semiconductor cooling plate is immediately controlled to cool the light intensity sensor so that the light intensity sensor returns to normal temperature, thereby facilitating subsequent detection of the actual temperature of the light intensity sensor.
[0100] In summary, in this embodiment, the light intensity sensor is cooled by controlling the semiconductor cooling fins based on a plurality of actual temperatures, thereby facilitating subsequent detection of the actual temperature of the light intensity sensor.
[0101] In the above embodiment Figure 5On the corresponding basis, another method for establishing a relationship function is also provided in the embodiment of the present application. Figure 6 A flowchart of another method for establishing a relationship function provided in an embodiment of the present application. Figure 6 As shown, in S302, a relationship function is established according to a plurality of actual temperatures and the actual light intensity energy at each actual temperature, including:
[0102] S401 , determining actual temperatures and corresponding actual light intensity energies in multiple temperature intervals according to multiple actual temperatures and actual light intensity energies at each actual temperature.
[0103] According to multiple temperature ranges, multiple actual temperatures and actual light intensity energies at each actual temperature are sorted and classified.
[0104] S402: Establish relationship functions in multiple temperature intervals according to actual temperatures in multiple temperature intervals and corresponding actual light intensity energies.
[0105] It should be noted that there is not necessarily a strong correlation between the actual temperature and actual light intensity energy of different light intensity sensors. Therefore, relationship functions can be established for multiple temperature intervals to make the established relationship functions closer to the actual temperature and the actual light intensity energy at each actual temperature.
[0106] Furthermore, according to the real-time temperature, the actual light intensity energy is calculated using a relational function, including:
[0107] S403, calculating actual light intensity energy according to the real-time temperature using a relationship function of a target temperature range in which the real-time temperature is located.
[0108] In summary, in this embodiment, the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals are determined according to multiple actual temperatures and the actual light intensity energies at each actual temperature; the relationship functions in multiple temperature intervals are respectively established according to the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals; and the actual light intensity energy is calculated according to the real-time temperature using the relationship function of the target temperature interval where the real-time temperature is located. Thus, a more accurate relationship function is established, and then a more accurate actual light intensity energy is obtained.
[0109] In the above embodiment Figure 6 On a corresponding basis, an embodiment of the present application further provides a method for establishing a relationship function according to temperature change values in a temperature range. Figure 7 The present invention provides a flow chart of a method for establishing a relationship function according to the temperature change value of a temperature range. Figure 7As shown, before determining the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at each actual temperature in S401, the method further includes:
[0110] S501 , performing temperature classification based on the resolution of the temperature sensor to obtain a temperature change value of a single temperature interval.
[0111] For example, the temperature sensor with a resolution of PT1000 is a temperature sensor with a resolution of 0.01°C. The temperature can be graded into 0.05°C levels, that is, when the corresponding relationship between the actual temperature and the actual light intensity energy is determined in the register of the temperature controller, each 0.05°C change in temperature is a temperature interval. This is equivalent to converting the analog output of the temperature sensor into a digital quantity, which can better determine the corresponding relationship between the real-time temperature and the actual light intensity.
[0112] In S401, according to the multiple actual temperatures and the actual light intensity energy at each actual temperature, the actual temperatures and the corresponding actual light intensity energy in multiple temperature intervals are determined, including:
[0113] S502: Determine actual temperatures and corresponding actual light intensity energies in multiple temperature intervals from multiple actual temperatures and actual light intensity energies at each actual temperature according to the temperature change value.
[0114] In summary, in this embodiment, temperature classification is performed based on the resolution of the temperature sensor to obtain a temperature change value in a single temperature interval; based on the temperature change value, the actual temperatures and corresponding actual light intensity energies in multiple temperature intervals are determined from multiple actual temperatures and the actual light intensity energies at each actual temperature. Thus, more accurate actual light intensity energies are obtained.
[0115] It should be noted that each component and the connection method between the components in the present application are prior arts and are not described in detail to avoid confusion.
[0116] The above description is only the preferred embodiment of the present application, and is not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application. It should be noted that similar numbers and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. The above description is only the preferred embodiment of the present application, and is not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.
Claims
1. An exposure system, characterized in that: The exposure system comprises: an exposure control device and a dose calculation device, wherein the exposure control device comprises: a light intensity sensor, a temperature sensor, a temperature controller and a semiconductor cooling plate arranged on an exposure control board, wherein the temperature sensor is arranged at a first preset position of the light intensity sensor to detect the real-time temperature of the light intensity sensor, and the semiconductor cooling plate is arranged at a second preset position of the light intensity sensor to cool the light intensity sensor; The temperature sensor is connected to the temperature controller, and the temperature controller pre-stores: a correspondence between a pre-temperature and a light intensity energy value, so as to determine the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the correspondence, and the temperature controller is also connected to the semiconductor cooling plate, so as to control the semiconductor cooling plate to cool the light intensity sensor based on the real-time temperature; The temperature controller is also connected to the dose calculation device so that the dose calculation device calculates the exposure dose based on the actual light intensity energy and performs exposure control based on the exposure dose.
2. The exposure system according to claim 1, characterized in that: The temperature controller comprises: a processor and a register; The processor is connected to the register, the register stores the corresponding relationship, and the processor is connected to the temperature sensor to obtain the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature based on the real-time temperature and the corresponding relationship; The processor is connected to the semiconductor cooling plate to control the semiconductor cooling plate to cool the light intensity sensor based on the real-time temperature.
3. A photolithography machine, characterized in that: The photolithography machine at least comprises: the exposure system described in claim 1 or 2 above.
4. An exposure control method of an exposure system, characterized in that: The exposure system as claimed in claim 1 or 2; the method comprising: The temperature sensor in the exposure control device of the exposure system detects the temperature of the light intensity sensor to obtain the real-time temperature of the light intensity sensor after the shutter is opened; The temperature controller in the exposure control device obtains the real-time temperature, and determines the actual light intensity energy corresponding to the real-time temperature according to the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value; The temperature controller controls the semiconductor cooling plate in the exposure control device to cool the light intensity sensor based on the real-time temperature; The dose calculation device acquires the actual light intensity energy, calculates the exposure dose based on the actual light intensity energy, and performs exposure control based on the exposure dose.
5. The method according to claim 4, characterized in that The dose calculation device acquires the actual light intensity energy and calculates the exposure dose based on the actual light intensity energy, including: The dose calculation device obtains the actual light intensity energy at multiple moments; The dose calculation device calculates the exposure dose according to the actual light intensity energy at the multiple moments and a preset sampling time interval.
6. The method according to claim 4, characterized in that The corresponding relationship is a function of the relationship between temperature and actual light intensity energy; the method of determining the actual light intensity energy corresponding to the real-time temperature according to the real-time temperature and the corresponding relationship between the preset temperature and the light intensity energy value includes: The actual light intensity energy is calculated according to the real-time temperature using the relationship function.
7. The method according to claim 6, characterized in that Before calculating the actual light intensity energy according to the real-time temperature using the relationship function, the method further includes: In an offline calibration state, the temperature sensor detects the temperature of the light intensity sensor to obtain multiple actual temperatures of the light intensity sensor after the shutter is opened; The temperature controller acquires and records the multiple actual temperatures and the actual light intensity energy at each actual temperature, and establishes the relationship function according to the multiple actual temperatures and the actual light intensity energy at each actual temperature.
8. The method according to claim 7, characterized in that In the offline calibration state, after the temperature sensor detects the temperature of the light intensity sensor and obtains a plurality of actual temperatures of the light intensity sensor after the shutter is opened, the method further includes: The semiconductor cooling fin is controlled based on the multiple actual temperatures to cool the light intensity sensor.
9. The method according to claim 7, characterized in that: The establishing the relationship function according to the multiple actual temperatures and the actual light intensity energy at each actual temperature comprises: Determine actual temperatures and corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at each actual temperature; According to the actual temperatures in the multiple temperature intervals and the corresponding actual light intensity energies, respectively establishing the relationship functions in the multiple temperature intervals; The calculating the actual light intensity energy according to the real-time temperature by using the relational function comprises: The actual light intensity energy is calculated according to the real-time temperature and using a relationship function of a target temperature interval in which the real-time temperature is located.
10. The method according to claim 9, characterized in that Before determining the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at each actual temperature, the method further includes: Performing temperature classification based on the resolution of the temperature sensor to obtain a temperature change value of a single temperature interval; The determining the actual temperatures and the corresponding actual light intensity energies in multiple temperature intervals according to the multiple actual temperatures and the actual light intensity energies at the respective actual temperatures comprises: According to the temperature change value, the actual temperatures and the corresponding actual light intensity energies in the multiple temperature intervals are determined from the multiple actual temperatures and the actual light intensity energies at the respective actual temperatures.
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