Stage device, transfer device, and article manufacturing method
Patent Information
- Application Number
- JP2022075365
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2022-04-28
- Publication Date
- 2025-05-02
- Estimated Expiration
- 2042-04-28
AI Technical Summary
The moment acting on the fine movement stage during acceleration leads to increased heat generation and deformation, which reduces overlay accuracy in transfer devices.
A transfer device with a configuration that includes a coarse movement stage, a fine movement stage, and an electromagnetic actuator with a fixed core and movable core, where the distance between the end surfaces of these cores is optimized to minimize the moment and heat generation, using laminated electromagnetic steel plates with changing lamination directions to reduce eddy currents.
This configuration effectively reduces the moment and heat generation, maintaining overlay accuracy and improving positional control during substrate patterning.
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Abstract
Description
Technical field
[0001] The present invention relates to a transfer device and an article manufacturing method. [Background technology]
[0002] A transfer device that transfers a pattern of an original onto a substrate may include a coarse movement stage driven by a coarse movement actuator, and a fine movement stage disposed on the coarse movement stage and holding the substrate. A fine movement actuator may be disposed between the coarse movement stage and the fine movement stage to adjust the position and attitude of the fine movement stage with respect to the coarse movement stage. Furthermore, an electromagnetic actuator may be disposed between the coarse movement stage and the fine movement stage to transmit the thrust applied to the coarse movement stage by the coarse movement actuator to the fine movement stage in a non-contact manner. [Prior art documents] [Patent document]
[0003] [Patent Document 1] Japanese Patent Application Publication No. 2005-109522 [Patent Document 2] Japanese Patent Application Publication No. 8-130179 [Summary of the invention] [Problem to be solved by the invention]
[0004] When accelerating the fine stage, a moment may act on the fine stage. If the fine movement actuator is operated to offset such a moment, heat generation from the fine movement actuator may increase. This heat generation causes deformation of the fine movement stage, and this deformation can lead to a decrease in overlay accuracy.
[0005] The present invention aims to provide an advantageous technique for reducing the moment acting on a fine movement stage. [Means to solve the problem]
[0006] One aspect of the present invention relates to a transfer device that transfers a pattern of an original onto a substrate, and the transfer device includes a coarse movement stage, a coarse movement actuator that drives the coarse movement stage along a predetermined plane, and a coarse movement actuator that drives the coarse movement stage along a predetermined plane. a fine movement stage for holding a substrate; a fine movement actuator for adjusting the position and orientation of the fine movement stage with respect to the coarse movement stage; and a thrust force applied to the coarse movement stage by the coarse movement actuator to the fine movement stage in a non-contact manner. an electromagnetic actuator for transmitting the signal, the electromagnetic actuator includes a fixed core fixed to the coarse movement stage and having a first end surface, a coil wound around the fixed core, and a coil fixed to the fine movement stage and having a first end surface. a movable iron core having a second end face opposite to the first end face, the fine movement of the second end face from a first distance from the first end face to a position furthest from the substrate held by the fine movement stage; The maximum value of the difference obtained by subtracting the second distance from the substrate held by the stage to the farthest position is greater than a positive predetermined value.
Effect of the invention
[0007] According to the present invention, an advantageous technique is provided for reducing the moment acting on the fine movement stage. [Brief explanation of the drawing]
[0008]
Figure 1
Figure 2
[0009] Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the claimed invention, and not all combinations of features described in the embodiments are essential to the invention. Two or more features among the plurality of features described in the embodiments may be arbitrarily combined. In addition, the same or similar configurations are given the same reference numerals, and duplicate explanations will be omitted.
[0010] In the following description, directions are described according to the XYZ coordinate system. The XY plane defined by the X and Y axes is typically a horizontal plane, and the Z axis is typically parallel to the vertical direction. The XY direction is a direction parallel to the XY plane. The X-axis direction is a direction parallel to the X-axis, the Y-axis direction is a direction parallel to the Y-axis, and the Z-axis direction is a direction parallel to the Z-axis.
[0011] FIG. 1 exemplarily shows the configuration of an exposure apparatus according to an embodiment. The exposure device is an alignment device that relatively aligns a first object (e.g., a substrate) and a second object (e.g., an original), or a transfer device that transfers a pattern on an original (reticle) onto a substrate (wafer). It may be understood as an example of A stage base 692 is placed on the floor 691 via a mount, and the wafer stage device 500 can be placed on it. Further, a lens barrel base 696 can be placed on the floor 691 via a mount 698. A projection optical system 687 and a reticle base 694 can be supported by the lens barrel base 696. A reticle stage device 695 may be placed above the reticle surface plate 694. An illumination optical system 699 can be placed above the reticle surface plate 694. The illumination optical system 699 projects the image of the reticle placed on the reticle stage of the reticle stage device 695 onto the wafer placed on the wafer stage of the wafer stage device 500, so that the pattern of the reticle can be transferred to the wafer. . The exposure device may be configured as a scanning exposure device.
[0012] The wafer stage apparatus 500 can be understood as a first positioning mechanism that positions a substrate as a first object, and the reticle stage apparatus 695 can be understood as a second positioning mechanism that positions a reticle as a second object. can. At least one of the first positioning mechanism and the second positioning mechanism may include an electromagnetic device or an electromagnetic actuator as described below.
[0013] The exposure apparatus or transfer apparatus described above can be used in an article manufacturing method for manufacturing articles such as semiconductor devices. The article manufacturing method may include a transfer step of transferring a pattern of an original onto a substrate using the above exposure device or transfer device, and a step of obtaining an article by processing the substrate that has undergone the transfer step. Processing of the substrate may include, for example, etching, film formation, dicing, and the like.
[0014] FIG. 2 exemplarily shows the overall configuration of wafer stage device 500. An XY slider 104 can be arranged on the stage base 105 so as to be slidable in the XY directions. A force in the X-axis direction can be transmitted to the XY slider 104 by the X slider 102, and a force in the Y-axis direction can be transmitted by the Y slider 103. A fine movement stage device 101 can be mounted on the XY slider 104. Coarse movement linear motors 106 may be provided on both sides of each of the X slider 102 and the Y slider 103 to drive them in the X-axis direction and the Y-axis direction, respectively.
[0015] FIG. 3 exemplarily shows a state in which the fine movement stage (fine movement top plate) 101-1 of the fine movement stage apparatus 101 in the wafer stage apparatus 500 has been moved upward for convenience. Fine movement stage 101-1 holds a wafer. Fine movement stage 101-1 may be understood as having a chuck that holds a wafer. A fine movement base 101-2 may be fixed on top of the XY slider 104. On the fine movement base 101-2, four fine movement ZLMs (first fine movement actuators) 101-6 that perform precise positioning of Z tilt can be provided. Furthermore, two fine movement XLMs (second fine movement actuators) 101-4 that perform precision positioning around the X-axis and the Z-axis may be provided on the fine movement base 101-2. Furthermore, two fine movement YLMs (third fine movement actuators) 101-5 that perform precise positioning around the Y-axis and the Z-axis may be provided on the fine movement base 101-2. A fine movement electromagnet 101-3 may be provided at the center of the fine movement base 101-2, which functions to transmit acceleration forces in the X-axis and Y-axis directions applied to the XY slider 104 to the fine movement base 101-2.
[0016] Here, the fine movement base 101-2 can be understood as a coarse movement stage. Alternatively, the XY slider 104 and fine movement base 101-2 may be understood as a coarse movement stage. Further, the coarse movement linear motor 106 can be understood as a coarse movement actuator that drives the fine movement base 101-2 as a coarse movement stage along the XY plane, that is, a predetermined plane. In addition, fine movement ZLM101-6, fine movement XLM101-4, and Y fine movement YLM101-5 are understood as fine movement actuators for adjusting the position and attitude of fine movement stage 101-1 with respect to fine movement base 101-2, which is a coarse movement stage. It can be done. Further, the fine movement electromagnet 101-3 is an electromagnetic actuator for transmitting the thrust given to the fine movement base 101-2 as a coarse movement stage by the coarse movement linear motor 106 as a coarse movement actuator to the fine movement stage 101-1 in a non-contact manner. It is understood as
[0017] FIG. 4 shows a detailed configuration example of the fine movement stage device 101, particularly the fine movement YLM101-5 and the fine movement ZLM101-6. Note that FIG. 4 shows a state in which a portion of the yoke has been removed. Fine movement YLM101-5 may be configured with a linear motor. The fine movement YLM 101-5 may include a fine movement YLM coil base 101-52, a fine movement YLM coil 101-51, a fine movement YLM magnet 101-53, a fine movement YLM yoke 101-54, and a fine movement LM spacer 101-70. A fine movement YLM coil base 101-52 can be fixed on the fine movement base 101-2, and a fine movement YLM coil 101-51 can be fixed thereon. The fine movement YLM coil 101-51 may be an elliptical coil having a straight portion extending in the vertical direction, and four fine movement YLM magnets 101-53 may be arranged with gaps in between so as to face this straight portion. Two YLM yokes 101-54 for passing magnetic flux can be arranged so as to sandwich these magnets. The magnetization direction of the magnets may be in the X-axis direction, magnets adjacent in the Y-axis direction may have opposite polarities, and magnets arranged in the X-axis direction may have the same polarity. The fine movement LM spacer 101-70 can be used to hold the pair of magnets and the yoke in position against the attractive force acting on them. The magnet, yoke, and spacer can be fixed to the fine movement base 101-2. By passing a current through the YLM coil 101-51, it is possible to generate a force proportional to the current in a direction perpendicular to the straight section, that is, in the Y-axis direction. In addition, a moment around the Z-axis can be generated by passing current in opposite directions to the two fine motion YLM101-5.
[0018] The fine movement ZLM101-6 may be configured with a linear motor. The fine movement ZLM 101-6 may include a fine movement ZLM coil base 101-62, a fine movement ZLM coil 101-61, a fine movement ZLM magnet 101-63, a fine movement ZLM yoke 101-64, and a fine movement LM spacer 101-70. A fine movement ZLM coil base 101-62 can be fixed on the fine movement base 101-2, and a fine movement ZLM coil 101-61 can be fixed thereon. The fine movement ZLM coil 101-61 may be an elliptical coil having a straight line section extending in the horizontal direction, and four fine movement ZLM magnets 101-63 may be arranged with gaps in between so as to face this straight line part. Two ZLM yokes 101-64 for passing magnetic flux can be arranged so as to sandwich these magnets. The magnetization direction of the magnets may be in the X-axis direction, magnets adjacent in the Z-axis direction may have opposite polarities, and magnets arranged in the X-axis direction may have the same polarity. The fine movement LM spacer 101-70 can be used to hold the pair of magnets and the yoke in position against the attractive force acting on them. The magnet, yoke, and spacer can be fixed to the fine movement top plate 101. By passing a current through the ZLM coil 101-61, it is possible to generate a force proportional to the current in a direction perpendicular to the straight line, that is, in the Z-axis direction. In addition, by combining the directions of the currents flowing through the four micro-movement ZLM101-6, it is possible to generate a moment around the X-axis and a moment around the Y-axis.
[0019] The fine movement XLM101-4 has the same configuration as the fine movement YLM101-5, but is arranged by rotating the fine movement YLM101-5 by 90 degrees. This allows a force in the X-axis direction and a moment around the Z-axis to be generated.
[0020] Additionally, four pin units 101-39 may be provided, and these serve as temporary storage areas when collecting the wafer from above the fine movement stage 101 and when placing the wafer on the fine movement stage 101-1. It can function. Although it is desirable that the number of pin units 101-39 be three or more in order to stably temporarily place the wafer, transfer is possible with at least one pin unit. The pin unit 101-39 has an elevating mechanism for elevating and lowering pins on which wafers are temporarily placed or mounted. Pin unit 101-39 drives the pin so that the top end of the pin is in the first state protruding from the top surface of fine movement stage 101-1, and the top end of the pin is retracted below the top surface of fine movement stage 101-1. The pin may have a function of driving the pin to the second state. In the operation of placing the wafer on the fine movement stage 101-1, the pin unit 101-39 receives the wafer from the transport mechanism (not shown) in the first state, and then transfers the pin to the second state. Transfer the upper wafer to fine movement stage 101-1. In the operation of transferring the wafer placed on fine movement stage 101-1 to a transport mechanism (not shown), pin unit 101-39 moves the pins from the second state to the first state. During this process, the pin unit 101-39 receives the wafer placed on the fine movement stage 101-1 with its pins, and transfers it to a transport mechanism (not shown) in the first state.
[0021] The fine movement stage device 101 does not need to include the pin unit 101-39, and in this case, by driving the fine movement stage 101-1 to the upper position by the fine movement ZLM101-6, the fine movement stage 101-1 is moved between the transport mechanism (not shown) and the pin unit 101-39. Wafers can be delivered and delivered.
[0022] FIG. 5 exemplarily shows the detailed configuration of the coarse movement stage device, particularly the X slider 102, Y slider 103, and XY slider 104. The XY slider 104 may include a lower XY slider part 104-3, a middle XY slider part 104-2, and an upper XY slider part 104-1. The XY slider lower part 104-3 is supported on the stage base 105 so as to be slidable in the XY direction, the XY slider middle part 104-2 is placed on top of it, and the XY slider upper part 104-1 is placed above it. It can be done.
[0023] X slider 102 may include an X beam 102-1, two X feet 102-2, and two X yaw guides 102-3. The two X yaw guides 102-3 can be fixed to two sides of the stage base 105. Two X feet 102-2 may be connected by an X beam 102-1. One X foot 102-2 faces the side surface of one X yaw guide 102-3 and the upper surface of stage base 105 with a gap therebetween, and can be supported slidably in the X-axis direction. The other X foot 102-2 faces the side surface of the other X yaw guide 102-3 and the upper surface of the stage base 105 via a gap, and can be supported slidably in the X-axis direction. Thereby, the integrated body of the X beam 102-1 and the two X feet 102-2 can be arranged to be slidable in the X-axis direction. Furthermore, both side surfaces of the X beam 102-1 slidably face the inner surface of the XY slider middle part 104-2 via a microgap, and can restrain the XY slider 104 so as to be slidable in the XY direction.
[0024] The Y slider 103 may include a Y beam 103-1, a Y foot 103-2, and a Y yaw guide 103-3. The two Y yaw guides 103-3 may be fixed to two sides of the stage base 105, and the two Y feet 103-2 may be connected by a Y beam 103-1. One Y foot 103-2 faces the side surface of one Y yaw guide 103-3 and the upper surface of stage base 105 with a gap therebetween, and can be supported slidably in the Y-axis direction. The other Y foot 103-2 faces the side surface of the other Y yaw guide 103-3 and the upper surface of the stage base 105 via a gap, and can be supported slidably in the Y-axis direction. Thereby, the integrated body of the Y beam 103-1 and the two Y feet 103-2 can be arranged to be slidable in the X-axis direction. Furthermore, both side surfaces of the Y beam 103-1 slidably face the inner surface of the XY slider upper part 104-1 via a microgap, and can restrain the XY slider 104 so as to be slidable in the XY direction.
[0025] FIG. 6 exemplarily shows a detailed configuration of the coarse movement linear motor 106. The coarse motion linear motor 106 includes a plurality of linear motor coils 106-1, a coil support plate 106-2, a column 106-3, a coil base 106-4, two linear motor magnets 106-5, a yoke 106-6, and two It can include a spacer 106-7 and an arm 106-8.
[0026] The plurality of linear motor coils 106-1 may be two-phase coil units in which the phases of adjacent linear motor coils 106-1 differ from each other by 90 degrees. The plurality of linear motor coils 106-1 can be fixed to a coil support plate 106-2 and fixed to a coil base 106-4 via a support 106-3. The coil base 106-4 may be fixed to the stage base 692, or may be supported by the stage base 692 so as to be slidable in the coil arrangement direction. In a configuration in which the coil base 106-4 is slidably supported, the reaction of acceleration can be absorbed. The two linear motor magnets 106-5 may each be a four-pole magnet unit, and may be arranged to sandwich the linear motor coil 106-1 from above and below with an air gap in between.
[0027] A yoke 106-6 can be placed behind each linear motor magnet 106-5. Spacer 106-7 may be used to maintain a gap between two linear motor magnets 106-5 against attractive force. A structure composed of linear motor magnet 106-5, yoke 106-6, and spacer 106-7 can be fixed to X foot 102-2 or Y foot 103-2 via arm 106-8. The structure can give thrust in the X-axis direction and the Y-axis direction to an integral body of an X beam and two X feet, or to an integral body of a Y beam and two Y feet. In addition, in this configuration, force can be continuously generated by flowing a sinusoidal current depending on the position of the two-phase coils to the coil facing the magnet.
[0028] FIG. 7 exemplarily shows a shot layout diagram that is an arrangement of a plurality of shot areas on a wafer 700. On the wafer 700, shot areas 701 having sizes Sx and Sy in the X-axis direction and Y-axis direction, respectively, can be arranged. For example, scan exposure is performed on the plurality of shot areas 701 along a step-scan locus. During scan exposure, the fine movement stage 101-1 can be driven in synchronization with the reticle stage in the Y-axis direction by a scanning amount equal to 1 / projection magnification of the scanning amount of the reticle stage. Furthermore, when the scan exposure is completed, the fine movement stage 101-1 can make a U-turn in the Y-axis direction and step in the X-axis direction to scan and expose the next shot area. By using an electromagnet to accelerate the fine movement stage 101-1 and a linear motor to control the position, it is possible to achieve both high precision position control and low heat generation.
[0029] When accelerating fine movement stage 101-1, a moment may act on fine movement stage 101-1. If the fine movement ZLM 101-6 is operated to offset such a moment, heat generation from the fine movement ZLM 101-6 may increase. This heat generation causes deformation of fine movement stage 101-1, and this deformation can cause a decrease in overlay accuracy.
[0030] In order to suppress heat generation from fine movement ZLM 101-6, it is effective to reduce the moment that acts on fine movement stage 101-1 when accelerating fine movement stage 101-1. In order to reduce the moment acting on fine movement stage 101-1 when accelerating fine movement stage 101-1, it is necessary to It is effective to reduce the distance. For this purpose, it is advantageous to reduce the length of the movable core of the fine movement electromagnet 101-3 on the fine movement base 101-2 in the Z-axis direction.
[0031] 8, FIG. 9, and FIG. 10 exemplarily show the configuration of a fine movement electromagnet 101-3 incorporated in the exposure apparatus or wafer stage apparatus 500 of the first embodiment. Fine movement electromagnet 101-3 of the first embodiment has a structure advantageous for reducing the moment acting on fine movement stage 101-1 when accelerating fine movement stage 101-1. The fine movement electromagnet 101-3 includes a fixed core (first member) SC, a support member 101-30 that supports the fixed core SC, a movable core (second member) MC, and a support member 101- that supports the movable core MC. 31 and coils 101-36. Support member 101-30 fixes fixed core SC to fine movement base 101-2 as a coarse movement stage, and support member 101-31 fixes movable core MC to fine movement stage 101-1. Coil 101-36 is wound around fixed core SC. The central axis of the coil 101-36 may be parallel to the XY plane (the plane in which the fine movement base 101-2 as a coarse movement stage moves).
[0032] In the examples shown in FIGS. 8, 9, and 10, four support members 101-30 are fixed on the fine movement base 101-2, a fixed iron core SC is arranged on each of them, and a coil 101 is placed on each fixed iron core SC. -36 can be wound. The fixed core SC and the movable core MC face each other with a small gap interposed therebetween. It is preferable that the dimension Hi of the movable core MC in the Z-axis direction (the direction perpendicular to the XY plane in which the fine motion base 101-2 as a coarse motion stage moves) is smaller than the dimension He of the fixed core SC in the Z-axis direction. In other words, it is preferable to reduce the length of the movable core MC in the Z-axis direction. This is effective for reducing the moment acting on fine movement stage 101-1 when accelerating fine movement stage 101-1.
[0033] A preferred configuration and arrangement of the fixed core SC and the movable core MC will be described with reference to FIG. 11. A fixed iron core SC fixed to a fine movement base 101-2 as a coarse movement stage and around which a coil 101-36 is wound has a first end surface E1. Movable core MC fixed to fine movement stage 101-1 has a second end surface E2 that faces first end surface E1 with a gap interposed therebetween.
[0034] In FIG. 1, d1 is the first distance from the farthest position of the first end surface E1 from the wafer (substrate) 700 held by the fine movement stage 101-1. d2 is the second distance from the farthest position of the second end surface E2 from the wafer 700 held by the fine movement stage 101-1. In this definition, it is preferable that the maximum value of the difference (d1-d2) obtained by subtracting d2 from d1 is larger than a positive predetermined value PV.
[0035] Fine movement ZLM (first fine movement actuator) 101-6 can be configured and controlled to drive fine movement stage 101-1 so that the difference (d1-d2) is maintained in a range of 0 or more. The predetermined value PV may be understood as a stroke required of the fine movement ZLM (first fine movement actuator) 101-6.
[0036] In one example, the predetermined value PV is the difference dwu between the maximum thickness of a wafer (substrate) that can be handled and the standard thickness of the substrate. The standard thickness of the substrate is the distance between the chuck surface of the fine movement stage 101-1 and the image plane FP of the projection optical system 687 when the chuck surface of the fine movement stage 101-1 is placed at the reference height (reference position in the Z-axis direction). . If the chuck that holds the wafer is a pin chuck, the chuck surface of the fine movement stage 101-1 is a surface defined by the tips of a plurality of pins that support the wafer. The chuck surface of fine movement stage 101-1 may be understood as the lower surface of the wafer or the surface on the side of fine movement stage 101-1.
[0037] As another example, fine movement stage 101-1 may be provided with a calibration mark, and there may be a height difference hm between the surface of a substrate having a standard substrate thickness and the surface of the calibration mark. In such a case, the predetermined value PV may be the sum of the difference dwu between the maximum thickness of a handleable substrate and the standard substrate thickness, and the height difference hm.
[0038] Still another example is a configuration in which the wafer stage device 500 does not include a pin unit for wafer transfer, and the fine movement stage 101-1 is raised and lowered by a fine movement ZLM (first fine movement actuator) 101-6 for wafer transfer. may be adopted. In such a case, the predetermined value PV is determined by the difference dwu between the maximum thickness of the substrate that can be handled and the standard substrate thickness, the height difference hm, the drive amount hu of the fine movement stage 101-1 for transferring the substrate, and It can be sum.
[0039] In order to reduce the weight of the movable core MC, it is preferable that the dimension of the second end surface E2 in the direction perpendicular to the XY plane (for example, Hi) is smaller than the dimension of the first end surface E1 in the direction perpendicular to the XY plane (for example, He). . Reducing the weight of movable iron core MC functions to reduce the moment acting on fine movement stage 101-1 during acceleration of fine movement stage 101-1.
[0040] 12, 13, and 14 exemplarily show the configuration of a fine movement electromagnet 101-3 incorporated in the exposure apparatus or wafer stage apparatus 500 of the second embodiment. Matters not mentioned in the second embodiment may follow the first embodiment. Fine movement electromagnet 101-3 of the second embodiment has a structure that is more advantageous for reducing the moment acting on fine movement stage 101-1 when accelerating fine movement stage 101-1. The fine movement electromagnet 101-3 includes a fixed core (first member) SC, a support member 101-30 that supports the fixed core SC, a movable core (second member) MC, and a support member 101- that supports the movable core MC. 31 and coils 101-36. Support member 101-30 fixes fixed core SC to fine movement base 101-2 as a coarse movement stage, and support member 101-31 fixes movable core MC to fine movement stage 101-1. Coil 101-36 is wound around fixed core SC. The central axis of the coil 101-36 may be arranged at an angle perpendicular to the XY plane (the plane in which the fine movement base 101-2 as a coarse movement stage moves). Such a configuration is advantageous for reducing the height of the structure consisting of the fixed core SC and the coil 101-36, and is effective for reducing the dimension of the movable core MC in the Z-axis direction. In a cross section perpendicular to the XY plane and parallel to the central axis of the coil 101-36, the fixed core SC may include a portion having an L shape. The fine movement base 101-2 may have an opening, and a portion of the fine movement electromagnet 101a-3 may be disposed within the opening.
[0041] Here, the moment acting on fine movement stage 101-1 will be explained with reference to FIG. If the fine movement stage device 101 is modeled as shown in Fig. 15, the moment M that acts on the fine movement stage 101-1 when accelerating the fine movement stage 101-1 with mass m with acceleration a is M=m·a·(hg+ hu+he). hg is the center of gravity G of the structure consisting of fine movement stage 101-1 and components that move together with fine movement stage 101-1 (movable core MC, support member 101-31, etc.) and the lower surface of fine movement stage 101-1 (fine movement base 101). -2 side surface) in the Z-axis direction. hu is the distance in the Z-axis direction between the lower surface of fine movement stage 101-1 and the upper end of fine movement electromagnet 101-3 (the end on the fine movement stage 101-1 side). he is the distance in the Z-axis direction between the upper end of fixed core SC and the point of action of fine movement electromagnet 101-3 Such moments can be offset by micro-movement ZLM101-6. However, by operating the fine movement ZLM 101-6 to cancel the moment, the fine movement ZLM 101-6 generates heat, which deforms the fine movement stage 101-1, which may result in a decrease in overlay accuracy. Therefore, as described above, it is important to reduce the moment generated when accelerating fine movement stage 101-1.
[0042] Further, the deformation of fine movement stage 101-1 can also be caused by heat generated by fine movement electromagnet 101-3. The heat generated by the micro-tremor electromagnet 101-3 can be caused by eddy currents in the magnetic circuit. FIG. 31 schematically shows the configuration of a fixed core SC having a three-dimensional structure. In the example of FIG. 31, the fixed core SC is composed of a laminate of a plurality of electromagnetic steel plates, and the stacking method is the Z-axis direction. Each electromagnetic steel sheet is covered with an insulating film. In FIG. 31, the direction of magnetic flux in the magnetic circuit is shown by black arrows, and the magnetic flux flows through a three-dimensional path. The magnetic flux flowing in the Z-axis direction is indicated by a thick black arrow. Since the direction of the thick black arrow is parallel to the normal direction of the electromagnetic steel sheet, the eddy current generated by the change in current flows along the surface of the electromagnetic steel sheet, and there is nothing to suppress it. Therefore, large eddy currents can occur as shown by the thick white arrows. As a result, fixed core SC generates heat, and the heat is transmitted to fine movement stage 101-1, which deforms fine movement stage 101-1, which may reduce overlay accuracy. In addition, the magnetic flux in the Z-axis direction indicated by the thick black arrow has a direction parallel to the normal direction of the electromagnetic steel sheet, so there is a disadvantage that the magnetic resistance is large, the magnetic flux value decreases, and the attractive force decreases. can bring about
[0043] An improved example of the fine movement electromagnet 101-3 incorporated in the exposure apparatus or wafer stage apparatus 500 of the second embodiment will be described below. Matters not mentioned here may follow improvements to the first embodiment. 16 and 17 exemplarily show the configuration of an improved example of the fine movement electromagnet 101-3 of the second embodiment. Note that FIG. 17 exemplarily shows the configuration of the fine movement electromagnet 101-3 with the fine movement base 101-2 removed.
[0044] In this improved example, four openings 301-21 are provided for the fine movement base 101-2, and a portion of each fine movement electromagnet 101-3 can be placed in the corresponding opening 301-21. A portion of each of the four fine movement electromagnets 101-3 may be placed under the fine movement base 101-2. Each fine movement electromagnet 101-3 can be supported by the fine movement base 101-2 via a support member 301-30. Such a configuration is advantageous for reducing the height of the fine movement electromagnet 101-3 above the fine movement base 101-2 and for reducing the dimensions of the fine movement electromagnet 101-3 in the XY directions.
[0045] The fine movement electromagnet 101-3 includes a fixed core (first member) SC, a support member 301-30 that supports the fixed core SC, a movable core (second member) MC, and a support member 101- that supports the movable core MC. 31 and coils 301-36. The fixed core (first member) SC may include a first element 301-32, a second element 301-33, a third element 301-34, and a fourth element 301-35. The movable core (second member) MC may include the element 101-38, but may also include one or more other elements in addition to the element 101-38. The fixed core (first member) SC may have a first end surface E1, and the movable core (second member) MC may have a second end surface E2 facing the first end surface E1 via a gap. In this example, the first end surface E1 is provided on each of the second element 301-33, the third element 301-34, and the fourth element 301-35, and the second end surface E2 is provided on the element 101-38. There is.
[0046] The fixed core (first member) SC may be composed of a laminate of a plurality of electromagnetic steel plates. Each of the plurality of electrical steel sheets may be covered with an insulating film. In another aspect, each of the first element 301-32, second element 301-33, third element 301-34, and fourth element 301-35 constituting the fixed core (first member) SC has a plurality of electromagnetic It may be constructed from a laminate of steel plates. The movable iron core (second member) MC may be composed of a laminate of a plurality of electromagnetic steel plates. In another aspect, element 101-38, which is at least one element constituting the movable core (second member) MC, may be composed of a laminate of a plurality of electromagnetic steel sheets. Each of the plurality of electrical steel sheets may be covered with an insulating film.
[0047] A magnetic circuit composed of a fixed core (first member) SC, a movable core (second member) MC, and a gap (space between the first end surface E1 and the second end surface E2) is a laminate of multiple electromagnetic steel sheets. The stacking direction may include at least one changing portion CP in which the stacking direction changes perpendicularly. The changing part CP includes a first part (e.g., first element 301-32) whose lamination direction is a first direction (e.g., Y-axis direction) and a second part (e.g., X-axis direction) whose lamination direction is orthogonal to the first direction. axial direction) with the second portion (eg, third element 301-34). The changing part CP includes a first part (e.g., the first element 301-32) whose lamination direction is the first direction and a second part (e.g., the third element) whose lamination direction is the second direction perpendicular to the first direction. 301-34) facing each other via a solid member. The solid member may be, for example, an insulating film that covers each of a plurality of electromagnetic steel sheets.
[0048] In the examples shown in FIGS. 16 and 17, the changing portion CP is provided in the fixed core (first member) SC. Furthermore, in the examples of FIGS. 16 and 17, the changing portion CP includes a portion where a fixed core (first member) SC and a movable core (second member) MC face each other with a gap interposed therebetween. In the latter configuration, the first part of the first part and second part constituting the changing part CP is provided on the fixed core (first member) SC, and the second part is provided on the movable core (second member) MC. It may also be understood as a configuration that The changing portion CP may be additionally provided to the movable core (second member) MC, or may be provided only to the movable core (second member) MC. In the examples of FIGS. 16 and 17, the second element 301-33, the third element 301-34, and the fourth element 301-3 have an L-shape, and the first element 301-32 has a rectangular parallelepiped shape. have
[0049] FIG. 18 exemplarily shows the configuration of another improved example of the fine movement electromagnet 101-3 of the second embodiment. The fine movement electromagnet 101-3 includes a fixed core (first member) SC, a support member 201a-30 that supports the fixed core SC, a movable core (second member) MC, and a support member 101- that supports the movable core MC. 31 and coils 201a-36. The fixed core (first member) SC may include a first element 201a-32, a second element 201a-33, a third element 201a-34, and a fourth element 201a-35. The movable core (second member) MC may include the element 101-38, but may also include one or more other elements in addition to the element 101-38. The fixed core (first member) SC may have a first end surface E1, and the movable core (second member) MC may have a second end surface E2 facing the first end surface E1 via a gap. In this example, the first end surface E1 is provided on each of the second element 201a-33, the third element 201a-34, and the fourth element 201a-35, and the second end surface E2 is provided on the element 101-38. There is. In the improved example of FIG. 18, the first element 201a-32 has an E-shape, and the coil 201a-36 is wound around the central tooth of the first element 201a-32. Furthermore, in the improved example of FIG. 18, the second element 201a-33, the third element 201a-34, and the fourth element 201a-35 have a rectangular parallelepiped shape.
[0050] Hereinafter, a method for assembling or manufacturing the fine movement electromagnet 101-3 of another improved example of FIG. 24 will be explained with reference to FIGS. 24 to 28. FIG. 24 shows an exploded state of the fine movement electromagnet 101-3 of the improved example of FIG. 18. The first element 201a-32 and the support member 201a-30 may be coupled using an adhesive, a clamp, a fit, or the like. Further, the coil 201a-36 and the coil base 201a-42 may be coupled using an adhesive or the like. Further, the second element 201b-33, the third element 201b-34, and the fourth element 201b-35 can be coupled via the tip part spacer 201a-40 by adhesive, clamping, fitting, or the like.
[0051] As illustrated in FIG. 25, the first element 201a-32 is inserted into the opening 201a-21 of the fine movement base 101-2, and the combined body of the first element 201a-32 and the support member 201a-30 is attached to the fine movement base 101. -2 can be positioned. Then, the support member 201a-30 can be fixed to the fine movement base 101-2. The support member 201a-30 can be fixed to the fine movement base 101-2 by, for example, screwing, adhesive, clamping, fitting, or the like.
[0052] Next, as illustrated in FIG. 26, the combination of coil 201a-36 and coil base 201a-42 is positioned on fine movement base 101-2, and coil base 201a-42 is fixed on fine movement base 101-2. sell. The coil base 201a-42 can be fixed to the fine movement base 101-2 by, for example, screwing, adhesive, clamping, fitting, or the like.
[0053] Next, as illustrated in FIG. 27, the tip part base 201a-41 can be fixed to the fine movement base 101-2 by, for example, screwing, adhesive, clamping, fitting, or the like.
[0054] Next, as illustrated in FIG. A combination of 201b-35 may be secured to tip base 201a-41. This can be done by fixing the tip part spacer 201a-40 to the tip part base 201a-41 by screwing, adhesive, clamping, fitting, etc.
[0055] To replace the coil 201a-36, return to the state shown in FIG. 25 through the reverse procedure to the above, fix the new coil 201a-36 to the fine movement base 101-2 as illustrated in FIG. 21, and then , through the procedures illustrated in FIGS. 27 and 28.
[0056] When forming a fixed core SC by joining multiple elements, for example, at the boundary of two elements (for example, the boundary between the second element 201a-33 and the first element 201a-32), two There is a concern that small relative deviations between the two elements may generate particles. As a countermeasure against this, a coating may be applied to the interface to prevent particles, a collection pan may be provided near the interface, or a collection magnet may be provided near the interface. In addition, when fixing the tip part spacer 201a-40 to the tip part base 201a-41, a thin spacer is inserted between the two, and the first element 201a-32, the second element 201a-33, and the third element 201a- 34, the fourth element 201a-35 may be maintained in a non-contact state.
[0057] The exposure apparatus and fine movement electromagnet 101-3 of the third embodiment will be described below. Items not mentioned in the third embodiment may follow the first or second embodiment. FIG. 19 exemplarily shows the configuration of a fine movement electromagnet 101-3 of the third embodiment. The fine movement electromagnet 101-3 includes a fixed core (first member) SC, a support member 301a-30 that supports the fixed core SC, a movable core (second member) MC, and a support member 301a- that supports the movable core MC. 31 and coils 301a-36. The fixed core (first member) SC may include a first element 301a-32, a second element 301a-37, a third element 301a-33, a fourth element 301a-34, and a fifth element 301a-35. The movable core (second member) MC may include the element 301a-38, but may also include one or more other elements in addition to the element 301a-38. The fixed core (first member) SC may have a first end surface E1, and the movable core (second member) MC may have a second end surface E2 facing the first end surface E1 via a gap. In this example, the first end surface E1 is provided on each of the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35, and the second end surface E2 is provided on the element 301a-38. There is.
[0058] The fixed core (first member) SC may be composed of a laminate of a plurality of electromagnetic steel plates. Each of the plurality of electrical steel sheets may be covered with an insulating film. In another aspect, the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35, which constitute a part of the fixed core (first member) SC, are made by laminating a plurality of electromagnetic steel plates. It can be composed of stacked iron cores. In addition, the first element 301a-32 and the second element 301a-37, which constitute another part of the fixed core (first member) SC, may be composed of a wound core that can be formed by winding an electromagnetic steel plate. Note that when used as a component constituting the fixed core (first member) SC, the wound core has one form of structure in which a plurality of electromagnetic steel sheets are laminated. The movable core (second member) MC may be configured as a laminated core in which a plurality of electromagnetic steel sheets are laminated. In another aspect, element 301a-38, which is at least one element constituting the movable core (second member) MC, may be composed of a laminate of a plurality of electromagnetic steel plates. Each of the plurality of electrical steel sheets may be covered with an insulating film.
[0059] A magnetic circuit composed of a fixed core (first member) SC, a movable core (second member) MC, and a gap (space between the first end surface E1 and the second end surface E2) is a laminate of multiple electromagnetic steel plates. The layer may include changing portions CP and CP' in which the stacking direction changes at right angles. The changing portion CP includes a first portion (e.g., the fifth element 301a-38) whose lamination direction is a first direction (e.g., the Z-axis direction) and a second portion (e.g., the X-axis direction) whose lamination direction is orthogonal to the first direction. axial direction) with the second portion (eg, second element 301a-37). The changing part CP includes a first part (e.g., the fifth element 301a-38) whose lamination direction is the first direction and a second part (e.g., the second element) whose lamination direction is the second direction perpendicular to the first direction. 301a-37) facing each other via a solid member. The solid member may be, for example, an insulating film that covers each of a plurality of electromagnetic steel sheets. The changing portion CP' includes a portion where the stacking direction gradually changes from the first direction (for example, the X-axis direction) to the second direction (for example, the Z-axis direction) orthogonal to the first direction. The changing portion CP', which includes a portion where the lamination direction gradually changes, may be a part of the wound core. The fixed core (first member) SC includes a first portion P1 whose stacking direction is a first direction (for example, the X-axis direction) and a second portion P2 whose lamination direction is a second direction (for example, the Z-axis direction). The stacking direction changes gently between the first part P1 and the second part P2. The changing portion CP' is a portion between the first portion P1 and the second portion P2.
[0060] In the example of FIG. 19, the changing portions CP and CP' are provided in the fixed core (first member) SC. At least one of the changing parts CP and CP' may be additionally provided to the movable core (second member) MC, or may be provided only to the movable core (second member) MC. One of the fixed core (first member) SC and the movable core (second member) MC is composed of at least one stacked core, and the fixed core (first member) SC and the movable core (second member) MC are The other of the two may be configured with a wound core, and the changing portion may be configured with a wound core.
[0061] The first element 301a-32, the second element 301a-37, the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35 may be integrated using an adhesive, or may be integrated using a clamp. It may be integrated by being fastened using parts. In this example, the changing portions CP and CP' are provided on the fixed core (first member) SC, and the coil 301a-36 is wound around the fixed core (first member) SC. The coil 301a-36 may be wound around a portion of the fixed core (first member) SC that is different from the portion where the variable portions CP and CP' are arranged. By passing a current through the coil 301a-36, an attractive force is generated between the first end surface E1 and the second end surface E2. In the example of FIG. 19, the first element 301a-32 and the second element 301a-37 have a U-shaped shape, and the coil 301a-36 is connected to one tooth of the first element 301a-32 and the second element 301a -37 single teeth wrapped around an integrated part.
[0062] The changing parts CP and CP' are such that the magnetic flux passing through the magnetic circuit composed of the fixed core (first member) SC, the movable core (second member) MC, and the air gap is connected to the plurality of It is installed so that the electromagnetic steel sheets do not flow in the direction in which they are laminated. Alternatively, in the changing parts CP and CP', the fixed iron core (first member) SC and the movable iron core (second member) MC mean that the magnetic flux passing through the fixed iron core SC and the movable iron core MC flows along the surface direction of each electromagnetic steel sheet. It can be set up as follows. Alternatively, the changing parts CP and CP' are such that the magnetic resistance of the magnetic circuit composed of the fixed core (first member) SC, the movable core (second member) MC, and the air gap is greater than that without the changing parts CP and CP'. It can also be set so that it is small. Alternatively, the changing parts CP and CP' are such that the eddy current generated in the magnetic circuit composed of the fixed core (first member) SC, the movable core (second member) MC, and the air gap does not exist in the changing parts CP and CP'. It can be set to be smaller than the case.
[0063] In the example of FIG. 19, the stacking direction (Z-axis direction) of the third element 301a-33, fourth element 301a-34, and fifth element 301a-35 having the first end surface E1, and the element 301a having the second end surface E2 -38 stacking direction (Z-axis direction) is equal. This may contribute to reducing magnetic reluctance and increasing magnetic flux in the vicinity of the air gap.
[0064] Instead of the configuration example in FIG. 19, the stacking direction of the third element 301a-33, the fourth element 301a-34, and the fifth element 301a-35 may be in the X-axis direction. Such a configuration reduces the magnetic resistance near the boundaries between the third element 301a-33, fourth element 301a-34, and fifth element 301a-35 and the first element 301a-32 and second element 301a-37. It can contribute to reducing the magnetic flux and increasing the magnetic flux.
[0065] FIG. 20 exemplarily shows a configuration of a modification of the fine movement electromagnet 101-3 of the third embodiment. Items not mentioned as modifications may follow the configuration of the third embodiment shown in FIG. 19. The fine movement electromagnet 101-3 includes a fixed core (first member) SC, a support member 301b-30 that supports the fixed core SC, a movable core (second member) MC, and a support member 301b- that supports the movable core MC. 31 and coils 301b-36. The fixed core (first member) SC may include a first element 301b-32 and a second element 301b-33. The movable core (second member) MC may include a third element 301b-37 and a fourth element 301b-38. The fixed core (first member) SC may have a first end surface E1, and the movable core (second member) MC may have a second end surface E2 facing the first end surface E1 via a gap. In this example, the first end surface E1 is provided on each of the first element 301b-32 and the second element 301b-33, and the second end surface E2 is provided on each of the third element 301b-37 and the fourth element 301b-38. It is set in.
[0066] The fixed core (first member) SC may be composed of a laminate of a plurality of electromagnetic steel plates. Each of the plurality of electrical steel sheets may be covered with an insulating film. In another aspect, the first element 301b-32 and the second element 301b-33, which constitute a part of the fixed core (first member) SC, may be constituted by a laminate of a plurality of electromagnetic steel plates. Note that, when used as a component constituting the fixed core (first member) SC, the wound core also has one form of structure in which a plurality of electromagnetic steel sheets are laminated. The movable iron core (second member) MC may be composed of a laminate of a plurality of electromagnetic steel plates. In another aspect, the third element 301b-37 and the fourth element 301b-38 constituting the movable core (second member) MC may be composed of a laminate of a plurality of electromagnetic steel plates. Each of the plurality of electrical steel sheets may be covered with an insulating film.
[0067] A magnetic circuit composed of a fixed core (first member) SC, a movable core (second member) MC, and a gap (space between the first end surface E1 and the second end surface E2) is a laminate of multiple electromagnetic steel plates. In this example, the changing portion CP' is provided in the fixed core (first member) SC, and the changing portion CP'' is provided in the movable core ( 2nd member) is provided in the MC.
[0068] The changing portion CP' includes a portion where the stacking direction gradually changes from the first direction (for example, the X-axis direction) to the second direction (for example, the Z-axis direction) orthogonal to the first direction. The changing portion CP', which includes a portion where the lamination direction gradually changes, may be a part of the wound core. The fixed core (first member) SC includes a first portion P1 whose stacking direction is a first direction (for example, the X-axis direction) and a second portion P2 whose lamination direction is a second direction (for example, the Z-axis direction). The stacking direction changes gently between the first part P1 and the second part P2. The changing portion CP' is a portion between the first portion P1 and the second portion P2.
[0069] The movable core (second member) MC includes a third portion P3 whose stacking direction is a first direction (for example, the X-axis direction) and a fourth portion P4 whose lamination direction is a second direction (for example, the Y-axis direction). The stacking direction changes gently between the third portion P3 and the fourth portion P4. The changing portion CP'' is a portion between the third portion P3 and the fourth portion P4.
[0070] By passing a current through the coil 301b-36, an attractive force is generated between the first end surface E1 and the second end surface E2. In the example of FIG. 20, the first element 301b-32 and the second element 301b-33 have a U-shaped shape, and the coil 301b-36 is connected to one tooth of the first element 301a-32 and the second element 301a. -37 single teeth wrapped around an integrated part.
[0071] The changing parts CP' and CP'' are such that the magnetic flux passing through the magnetic circuit composed of the fixed core (first member) SC, the movable core (second member) MC, and the air gap is changed to The electromagnetic steel sheets are provided so that they do not flow in the stacking direction.Alternatively, the changing parts CP' and CP'' are fixed core (first member) SC, the movable core (second member) MC is fixed core SC, The movable iron core MC can be provided so that the magnetic flux passing through it flows along the surface direction of each electromagnetic steel plate. Alternatively, the magnetic resistance of the magnetic circuit composed of the fixed core (first member) SC, the movable core (second member) MC, and the air gap is different from the variable parts CP', CP''. It can be set to be smaller than the case. Alternatively, the changing parts CP', CP'' are caused by eddy currents generated in the magnetic circuit composed of the fixed core (first member) SC, the movable core (second member) MC, and the air gap. It can be provided so that it is smaller than without it.
[0072] In the example of FIG. 20, the lamination direction (X-axis direction) of the first element 301b-32 and the second element 301b-33 on the first end surface E1, and the third element 301b-37 and the fourth element 301b on the second end surface E2. -38 stacking direction (X-axis direction) is equal. This may contribute to reducing magnetic reluctance and increasing magnetic flux in the vicinity of the air gap. In addition, in the example shown in Figure 23, in the magnetic circuit formed by the fixed core (first member) SC, movable core (second member) MC, and the air gap, the stacking direction does not change abruptly, and this is due to magnetic resistance. It is advantageous to reduce the magnetic flux and increase the magnetic flux.
[0073] FIG. 21 exemplarily shows the structure of a support member 301b-31 that supports movable core MC. The support member 301b-31 may have a starwheel shape to support the movable core MC, which may be formed of a wound core.
[0074] Here, the wound core will be explained with reference to FIG. 29. FIG. 29(a) shows an example of a wound core. FIG. 29(b) shows a wound core obtained by cutting the wound core illustrated in FIG. 29(a) by wire cutting or the like, and such a wound core is also called a cut core. The wound core may be manufactured by winding a hoop material around a core (not shown). As illustrated in FIG. 30, the hoop material can be manufactured with a slitter illustrated in FIG. 25. A hoop material is obtained by feeding the raw coil roll in the sheet threading direction and cutting it into a desired width with a slitter including a round blade provided in the middle. This width is determined by the spacing between the round blades of the slitter.
[0075] As illustrated in FIG. 29(a), the wound core is a laminate of a plurality of electromagnetic steel plates, and one wound core has a plurality of lamination directions. In other words, the wound core can be used as a member constituting the aforementioned changing section. The lamination direction is a direction that penetrates the point of interest in the wound core in a direction perpendicular to the electromagnetic steel sheet. The width direction is the direction determined by the slitter and is also the axial direction. The axial direction is a direction parallel to any part of the widest surface of each electromagnetic steel sheet.
[0076] In one aspect, the electromagnetic device of the present invention can include a plurality of core members configured of stacked cores or wound cores, and a coil that generates magnetic flux in the core members. Here, the lamination direction of a certain stacked core is orthogonal to the width direction of a certain wound core, or the lamination direction of one stacked core and another stacked core is orthogonal, or the width direction of one wound core and another wound core is orthogonal. can be orthogonal.
[0077] The control system of wafer stage apparatus 500 will be described below. FIG. 22 exemplarily shows the configuration of the control system of wafer stage device 500. The moving target providing unit 5101 provides moving targets. Position profile generator 5102 generates a position profile indicating the relationship between time and the position of fine movement stage 101-1 at that time, based on the moving target provided by moving target providing unit 5101. Furthermore, the position profile generator 5102 generates a target position according to the generated position profile. Acceleration profile generator 5103 generates an acceleration profile indicating the relationship between time and the acceleration of fine movement stage 101-1 at that time, based on the moving target provided by moving target providing unit 5101. Furthermore, the acceleration profile generator 5103 generates a target acceleration according to the generated acceleration profile. FIG. 23 illustrates a position profile generated by position profile generator 5102 and an acceleration profile generated by acceleration profile generator 5103.
[0078] Fine movement position sensor 5156 measures the position of fine movement stage 101-1. The fine movement position control system 5121 generates a manipulated variable by PID calculation or the like according to the deviation between the target position given according to the position profile generated by the position profile generator 5102 and the current position given by the fine movement position sensor 5156. The current amplifier 5122 supplies current according to the operation amount generated by the fine movement position control system 5121 to the fine movement XLM101-4 and fine movement YLM101-5. As a result, fine movement stage 101-1 is feedback-controlled.
[0079] Coarse movement position sensor 5135 measures the position of fine movement base 101-2. The coarse movement position control system 5133 generates a manipulated variable by PID calculation etc. according to the deviation between the target position given according to the position profile generated by the position profile generator 5102 and the current position given by the coarse movement position sensor 5135. . Current amplifier 5131 supplies current to coarse linear motor 106 according to the operation amount generated by coarse movement position control system 5133 and the target acceleration given from acceleration profile generator 5103. As a result, the fine movement base 101-2 is subjected to feedback control and feedforward.
[0080] The target acceleration generated by the acceleration profile generator 5103 is also supplied to the electromagnet current control system 5515, and the electromagnet current control system 5515 controls the fine movement electromagnet 101-3 according to the target acceleration. When accelerating fine movement stage 101-1 (fine movement stage device 101), force is mainly applied to fine movement stage 101-1 by fine movement electromagnet 101-3. The fine movement XLM101-4 and the fine movement YLM101-5 can be controlled to generate a thrust to reduce a slight positional deviation between the target position and the measured current position. Thereby, the heat generated by the fine movement XLM101-4 and fine movement YLM101-5 can be reduced.
[0081] Coarse movement position control system 5133 moves the position of fine movement base 101-2 according to the position profile generated by position profile generator 5102. The micro-moving electromagnet 101-3 is advantageous because it generates a large attraction force with extremely low heat generation. However, the gap between the first end surface E1 and the second end surface E2 of the fine motion electromagnet 101-3 must be maintained. In other words, in order to continue applying the desired force to the fine movement stage 101-1 by the fine movement electromagnet 101-3, the stator (fixed core and coil) of the fine movement electromagnet 101-3 must be moved following the movement of the fine movement stage 101-1. It is necessary to maintain the air gap. Further, the heat generated by the fine movement ZLM can be reduced by reducing the height of the fine movement electromagnet 101-3 on the fine movement base 101-2. As described above, highly accurate position control of fine movement stage 101-1, reduction in heat generation, and reduction in overlay errors can be realized.
[0082] The coarse position control system 5133 realizes this. The coarse movement position, that is, the position of the fine movement base 101-2, is measured by a coarse movement position sensor 5135 represented by an encoder, and the coarse movement linear motor 106 is driven by the coarse movement position control system 5133 based on the deviation between this and the target position. be done. As a result, the position of fine movement stage 101-1 (mover of fine movement electromagnet 101-3) and the position of fine movement base 101-2 (stator of fine movement electromagnet 101-3) are controlled based on the output of position profile generator 5102. The air gap is maintained. Fine movement position sensor 5156 that measures the position of fine movement stage 101-1 may be replaced by a sensor that measures the relative position of fine movement stage 101-1 and fine movement base 101-2.
[0083] The disclosure herein includes the following transfer device and article manufacturing method. (Item 1) A transfer device that transfers a pattern of an original onto a substrate, a coarse movement stage, a coarse movement actuator that drives the coarse movement stage along a predetermined plane, a fine movement stage that holds the substrate, and a fine movement that adjusts the position and attitude of the fine movement stage with respect to the coarse movement stage. an actuator, and an electromagnetic actuator for transmitting the thrust given to the coarse movement stage by the coarse movement actuator to the fine movement stage in a non-contact manner, The electromagnetic actuator includes a fixed iron core fixed to the coarse movement stage and having a first end surface, a coil wound around the fixed iron core, and a movable actuator fixed to the fine movement stage and having a second end surface opposite to the first end surface. including an iron core; A second distance from a first distance between the first end face and the farthest position from the substrate held by the fine movement stage to a second distance between the second end face and the farthest position from the substrate held by the fine movement stage. The maximum value of the subtracted difference is greater than a positive predetermined value, A transcription device characterized by the following. (Item 2) The fine movement actuator drives the fine movement stage so that the difference is maintained in a range of 0 or more. The transfer device according to item 1, characterized in that: (Item 3) The predetermined value is the difference between the maximum thickness of the board that can be handled and the standard board thickness, The transfer device according to item 1 or 2, characterized in that: (Item 4) The fine movement stage has a calibration mark, The predetermined value is the sum of the difference between the maximum thickness of the substrate that can be handled and the standard substrate thickness, and the height difference between the surface of the substrate having the standard substrate thickness and the surface of the calibration mark. The transfer device according to item 1 or 2, characterized in that: (Item 5) The fine movement stage has a calibration mark, The predetermined values include the difference between the maximum thickness of the substrate that can be handled and the standard substrate thickness, the difference in height between the surface of the substrate having the standard substrate thickness and the surface of the calibration mark, and the difference in height for transferring the substrate. The amount of drive of the fine movement stage is the sum of The transfer device according to item 1 or 2, characterized in that: (Item 6) The dimension of the second end surface in the direction perpendicular to the plane is smaller than the dimension of the first end surface in the direction perpendicular to the plane. The transfer device according to item 1 or 2, characterized in that: (Item 7) the central axis of the coil is parallel to the plane; 7. The transfer device according to any one of items 1 to 6, characterized in that: (Item 8) a central axis of the coil is arranged at an angle perpendicular to the plane; 7. The transfer device according to any one of items 1 to 6, characterized in that: (Item 9) The coarse movement stage has an opening, and a part of the fixed iron core is disposed in the opening. The transfer device according to item 8, characterized in that: (Item 10) The fixed iron core and the movable iron core constitute a magnetic circuit, the magnetic circuit includes a laminate made of a plurality of electromagnetic steel sheets, and the lamination direction of the plurality of electromagnetic steel sheets changes at right angles. including a change part that 10. The transfer device according to any one of items 1 to 9, characterized in that: (Item 11) The changing portion includes a contact portion between a first portion in which the lamination direction is a first direction and a second portion in which the lamination direction is a second direction orthogonal to the first direction. The transfer device according to item 10, characterized in that: (Item 12) The changing portion includes a portion where a first portion in which the lamination direction is a first direction and a second portion in which the lamination direction is a second direction orthogonal to the first direction face each other via a solid member. The transfer device according to item 10, characterized in that: (Item 13) The changing portion is provided in at least one of the fixed iron core and the movable iron core, The transfer device according to item 10, characterized in that: (Item 14) The changing portion includes a portion where a first portion in which the lamination direction is a first direction and a second portion in which the lamination direction is a second direction orthogonal to the first direction face each other with a gap therebetween. The transfer device according to item 10, characterized in that: (Item 15) the first portion is provided on the fixed iron core, and the second portion is provided on the movable iron core; The transfer device according to item 14, characterized in that: (Item 16) Each of the fixed core and the movable core is composed of at least one stacked core, 16. The transfer device according to any one of items 10 to 15, characterized in that: (Item 17) At least one of the fixed core and the movable core is composed of a plurality of stacked cores, 16. The transfer device according to any one of items 10 to 15, characterized in that: (Item 18) The plurality of stacked cores are arranged close to each other and fixed by a fixing member, The transfer device according to item 17, characterized in that: (Item 19) The changing portion includes a portion where the stacking direction gradually changes from a first direction to a second direction perpendicular to the first direction. The transfer device according to item 10, characterized in that: (Item 20) The changing part is constituted by a wound core, The transfer device according to item 11, characterized in that: (Item 21) One of the fixed core and the movable core includes at least one stacked core, The other of the fixed core and the movable core includes a wound core, The changing portion is constituted by the wound core, The transfer device according to item 10, characterized in that: (Item 22) Each of the fixed core and the movable core is composed of a wound core, The axial direction of the wound core constituting the fixed core and the axial direction of the wound core constituting the movable core are orthogonal to each other, The variable portion is configured by each of the wound core that constitutes the fixed core and the wound core that constitutes the movable core, The transfer device according to item 10, characterized in that: (Item 23) The variable portion is provided on the fixed core, and the coil is wound around the fixed core. The transfer device according to item 10, characterized in that: (Item 24) The coil is wound around a part of the fixed core that is different from the part where the changing part is arranged. The transfer device according to item 23, characterized in that: (Item 25) a transfer step of transferring the pattern of the original onto the substrate using the transfer device according to any one of items 1 to 24; obtaining an article from the substrate that has undergone the transfer step; A method for manufacturing an article, comprising:
[0084] The invention is not limited to the above-described embodiments, and various modifications and changes can be made within the scope of the invention. [Explanation of symbols]
[0085] SC: Fixed core (1st member), MC: Movable core (2nd member), 101-1: Fine movement stage, 101-2: Fine movement base, 101-36: Coil
Claims
1. A stage apparatus for holding a substrate, comprising: a coarse movement stage, a coarse movement actuator that drives the coarse movement stage along a predetermined plane, a fine movement stage that holds the substrate, a fine movement actuator that adjusts the position and attitude of the fine movement stage relative to the coarse movement stage, and an electromagnetic actuator that transmits a thrust applied to the coarse movement stage by the coarse movement actuator to the fine movement stage in a non-contact manner, the electromagnetic actuator includes a fixed iron core fixed to the coarse movement stage and having a first end surface, a coil wound around the fixed iron core, and a movable iron core fixed to the fine movement stage and having a second end surface facing the first end surface, a maximum value of a difference obtained by subtracting a second distance from a position of the second end face that is farthest from the substrate held by the fine movement stage to a first distance from a position of the first end face that is farthest from the substrate held by the fine movement stage is greater than a positive predetermined value; A stage apparatus comprising:
2. the fine movement actuator drives the fine movement stage so that the difference is maintained within a range of 0 or more; 2. The stage apparatus according to claim 1 .
3. The predetermined value is a difference between the maximum thickness of a handleable substrate and a standard substrate thickness.
2. The stage apparatus according to claim 1 .
4. the fine movement stage has a calibration mark; the predetermined value is the sum of a difference between a maximum thickness of a handleable substrate and a standard substrate thickness, and a height difference between a surface of a substrate having the standard substrate thickness and a surface of the calibration mark; 2. The stage apparatus according to claim 1 .
5. the fine movement stage has a calibration mark; the predetermined value is the sum of a difference between a maximum thickness of a handleable substrate and a standard substrate thickness, a height difference between a surface of a substrate having the standard substrate thickness and a surface of the calibration mark, and a driving amount of the fine movement stage for transferring the substrate.
2. The stage apparatus according to claim 1 .
6. A dimension of the second end surface in a direction perpendicular to the plane is smaller than a dimension of the first end surface in a direction perpendicular to the plane.
2. The stage apparatus according to claim 1 .
7. The central axis of the coil is parallel to the plane.
2. The stage apparatus according to claim 1 .
8. The central axis of the coil is disposed at an angle perpendicular to the plane.
2. The stage apparatus according to claim 1 .
9. the coarse movement stage has an opening, and a portion of the fixed core is disposed in the opening; 9. The stage apparatus according to claim 8.
10. The fixed core and the movable core form a magnetic circuit, the magnetic circuit includes a laminated body composed of a plurality of electromagnetic steel sheets, and the laminated body includes a transition portion where a lamination direction of the plurality of electromagnetic steel sheets changes at a right angle.
10. The stage apparatus according to claim 1, wherein the stage apparatus is a stage unit.
11. The change portion includes a contact portion between a first portion in which the stacking direction is a first direction and a second portion in which the stacking direction is a second direction perpendicular to the first direction, 11. The stage apparatus according to claim 10.
12. The transition portion includes a portion where a first portion, in which the stacking direction is a first direction, and a second portion, in which the stacking direction is a second direction perpendicular to the first direction, face each other via a solid member.
11. The stage apparatus according to claim 10.
13. The change portion is provided on at least one of the fixed core and the movable core.
11. The stage apparatus according to claim 10.
14. The transition portion includes a portion where a first portion in which the stacking direction is a first direction and a second portion in which the stacking direction is a second direction perpendicular to the first direction face each other with a gap therebetween, 11. The stage apparatus according to claim 10.
15. The first portion is provided on the fixed iron core, and the second portion is provided on the movable iron core.
15. The stage apparatus according to claim 14.
16. Each of the fixed core and the movable core is composed of at least one stacked core.
11. The stage apparatus according to claim 10.
17. At least one of the fixed core and the movable core is composed of a plurality of stacked cores.
11. The stage apparatus according to claim 10.
18. The plurality of stacked cores are arranged close to each other and fixed by a fixing member.
20. The stage apparatus of claim 17.
19. The transition portion includes a portion in which the stacking direction gradually changes from a first direction to a second direction perpendicular to the first direction.
11. The stage apparatus according to claim 10.
20. The change portion is constituted by a wound core.
12. The stage apparatus according to claim 11.
21. One of the fixed core and the movable core includes at least one stacked core, the other of the fixed core and the movable core includes a wound core, The change portion is constituted by the wound core.
11. The stage apparatus according to claim 10.
22. Each of the fixed core and the movable core is formed of a wound core, an axial direction of the wound core constituting the fixed core and an axial direction of the wound core constituting the movable core are perpendicular to each other, The transition portion is formed by each of the wound core constituting the fixed core and the wound core constituting the movable core.
11. The stage apparatus according to claim 10.
23. The change portion is provided on the fixed iron core, and the coil is wound around the fixed iron core.
11. The stage apparatus according to claim 10.
24. The coil is wound around a portion of the fixed core different from a portion where the changed portion is disposed.
24. The stage apparatus of claim 23.
25. A transfer apparatus for transferring a pattern of an original onto a substrate, comprising: A stage apparatus comprising: A transfer device characterized by:
26. a transfer step of transferring a pattern of an original onto a substrate by the transfer apparatus according to claim 25; obtaining an article from the substrate that has undergone the transfer process; A method for manufacturing an article, comprising: